• 제목/요약/키워드: Micro Etching

검색결과 423건 처리시간 0.029초

불산-오존-희석 암모니아수 세정에 의한 실리콘 웨이퍼 표면의 미세입자 제거 (Particle Removal on Silicon Wafer Surface by Ozone-HF-NH4OH Sequence)

  • 이건호;배소익
    • Korean Chemical Engineering Research
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    • 제45권2호
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    • pp.203-207
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    • 2007
  • 불산과 오존 세정 시 실리콘 웨이퍼 표면의 미세입자를 효과적으로 제거할 수 있는 세정 방법에 대하여 연구하였다. 불산의 농도가 0.3 vol% 이상이 되어야 미세입자가 제거 되었으며, 초음파가 인가된 오존수를 사용 시 제거 효율은 증가되었다. 오존과 불산 세정 단계 이후에 추가로 극미량의(0.01 vol%) 희석 암모니아수 세정을 하면 미세입자가 99%이상 제거됨을 확인하였다. 이는 암모니아수에 의한 웨이퍼 표면의 미세 에칭 효과와 알칼리 영역에서의 재흡착 방지 효과가 동시에 작용함에 기인된다고 보인다. 한편, 불산-오존-희석 암모니아수 세정은 통상의 SC-1 세정과 비교할 때 표면 미세 거칠기가 개선되는 경향을 보였다. 불산-오존-희석 암모니아수 세정은 상온에서도 미세입자를 효과적으로 제거할 수 있는 세정 방법으로, 고온 공정 및 과다한 화학액을 사용하는 기존 습식세정의 대안으로서 기대된다.

초소형 광정보저장기기용 웨이퍼 스케일 대물렌즈 제작을 위한 회절광학소자 성형기술 개발 (Fabrication of Diffractive Optical Element for Objective Lens of Small form Factor Data Storage Device)

  • 배형대;임지석;정기봉;한정원;유준모;박노철;강신일
    • 소성∙가공
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    • 제15권1호
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    • pp.3-8
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    • 2006
  • The demand fer small and high-capacity optical data storage devices has rapidly increased. The areal density of optical disk is increased by using higher numerical aperture objective lens and shorter wavelength source. A wafer-scale stacked micro objective lens with a numerical aperture of 0.85 and a focal length of 0.467mm for the 405nm blue- violet laser was designed and fabricated. A diffractive optical element (DOE) was used to compensate the spherical aberration of the objective lens. Among the various fabrication methods for micro DOE, the UV-replication process is more suitable fur mass-production. In this study, an 8-stepped DOE pattern as a master was fabricated by photolithography and reactive ion etching process. A flexible mold was fabricated for improving the releasing properties and shape accuracy in UV-replication process. In the replication process, the effects of exposing time and applied pressure on the replication quality were analyzed. Finally, the surface profiles of master, mold and molded pattern were measured by optical scanning profiler. The geometrical deviation between the master and the molded DOE was less than $0.1{\mu}m$. The diffraction efficiency of the molded DOE was measured by DOE efficiency measurement system which consists of laser source, sample holder, aperture and optical power meter, and the measured value was $84.5\%$.

3D Lithography using X-ray Exposure Devices Integrated with Electrostatic and Electrothermal Actuators

  • Lee, Kwang-Cheol;Lee, Seung S.
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제2권4호
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    • pp.259-267
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    • 2002
  • We present a novel 3D fabrication method with single X-ray process utilizing an X-ray mask in which a micro-actuator is integrated. An X-ray absorber is electroplated on the shuttle mass driven by the integrated micro-actuator during deep X-ray exposures. 3D microstructures are revealed by development kinetics and modulated in-depth dose distribution in resist, usually PMMA. Fabrication of X-ray masks with integrated electrothermal xy-stage and electrostatic actuator is presented along with discussions on PMMA development characteristics. Both devices use $20-\mu\textrm{m}$-thick overhanging single crystal Si as a structural material and fabricated using deep reactive ion etching of silicon-on-insulator wafer, phosphorous diffusion, gold electroplating, and bulk micromachining process. In electrostatic devices, $10-\mu\textrm{m}-thick$ gold absorber on $1mm{\times}1mm$ Si shuttle mass is supported by $10-\mu\textrm{m}-wide$, 1-mm-long suspension beams and oscillated by comb electrodes during X-ray exposures. In electrothermal devices, gold absorber on 1.42 mm diameter shuttle mass is oscillated in x and y directions sequentially by thermal expansion caused by joule heating of the corresponding bent beam actuators. The fundamental frequency and amplitude of the electrostatic devices are around 3.6 kHz and $20\mu\textrm{m}$, respectively, for a dc bias of 100 V and an ac bias of 20 VP-P (peak-peak). Displacements in x and y directions of the electrothermal devices are both around $20{\;}\mu\textrm{m}$at 742 mW input power. S-shaped and conical shaped PMMA microstructures are demonstrated through X-ray experiments with the fabricated devices.

실리콘 빔이 실리콘 고무 멤브레인에 삽입된 빗살형 차압센서의 설계 및 제조 (Design and fabrication of a comb-type differential pressure sensor with silicon beams embedded in a silicone rubber membrane)

  • 박정용;공성수;서창택;신장규;고광락;이종현
    • 센서학회지
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    • 제9권6호
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    • pp.424-429
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    • 2000
  • 실리콘 고무 멤브레인(membrane)에 실리콘 빔(beam)들이 삽입된 형태의 저차압센서를 개발하였다. 제작된 저차압센서는 실리콘 고무(silicone rubber)를 멤브레인으로 사용함으로써 열악한 환경에서도 다양한 응용분야에 적용 가능하도록 하였다. 실리론 고무 멤브레인을 사용한 압저항형 저차압센서는 선택적으로 도핑(doping)된 (100) n/n+/n 웨이퍼 상에 다공질 마이크로머시넝(micro-machining) 기술을 이용하여 제작되었다. 제조된 센서의 감도(sensitivity)는 $0.66{\mu}V/mmHg$이고, 0.1% 이하의 비선형성(non-linearity)을 보였다.

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열간압연 클래드강의 맞대기용접부 내식성 및 용접성 평가 (Evaluation of Corrosion Resistance and Weldability for the Butt Welding Zone of Hot Rolled Clad Steel Plates)

  • 박재원;이철구
    • Journal of Welding and Joining
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    • 제31권5호
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    • pp.47-53
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    • 2013
  • We have investigated the traits of clad metals in hot-rolled clad steel plates, including the sensitization and mechanical properties of STS 316 steel plate and carbon steel (A516), under various specific circumstances regarding post heat treatment, multilayered welds, and thick or repeated welds for repair. For evaluations, sectioned weldments and external surfaces were investigated to reveal the degree of sensitization by micro vickers hardness, tensile, and etching tests the results were compared with those of EPR tests. The clad steel plates were butt-welded using FCAW and SAW with the time of heat treatment as the variable, a that was conducted at $625^{\circ}C$, for 80, 160, 320, 640, and 1280 min. Then, the change in corrosion resistance was evaluated in these specimens. With carbon steel (A516), as the heat treatment time increased, the annealing effect caused the tensile strength to decrease. The micro-hardness gradually increased and decreased after 640 min. The elongation and contraction of the area also increased gradually. The oxalic acid etch test and EPR test on STS316 and the clad metal showed STEP structure and no sensitization. From the test results on multi-layered and repair welds, it could be concluded that there is no effect on the corrosion resistance of clad metals. The purpose of this study was to suggest some considerations for developing on-site techniques to evaluate the sensitization of stainless steels.

KAIST의 MAV용 MEMS 엔진 개발 현황 (Prgress in MEMS Engine Development for MAV Applications)

  • 이대훈;박대은;윤의식;권세진
    • 한국항공우주학회지
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    • 제30권6호
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    • pp.1-6
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    • 2002
  • 마이크로 연소실을 장착한 MAV 추진 장치용 단기통 MEMS 엔진을 제작하였다. 본연구에서는 MEMS 크기의 왕복운동 내연기관의 타당성을 검증하고 실용화를 위한 설계 및 가공데이터를 축적하고자 하였다. 엔진 블록은 가공의 정밀도와 내열성등을 고려하여 감광유리 웨이퍼를 사용하였으며, 점화 전극은 베이스 플레이트 위에 니켈 도금으로 제작하였다. 감광유리판은 등방성 에칭의 특성이 탁월하여 마이크로 엔진의 실린더와 피스톤과 같이 비교적 깊은 식각이 가능함을 확인하였다. 전체 엔진은 세 개의 별도 가공된 레이어를 접착하여 조립한다. 본연구의 엔진 연소실은 깊이는 1mn, 폭 2mn이며, 피스턴은 수소-공기 예 혼합 가스의 연소압력에 의하여 구동된다. 가공된 엔진의 연소실험을 통하여, 점화, 화염전파 및 피스턴 구동을 확인하였으며, 실용화를 위한 연구가 요구되고 있다.

Micro-gap DBD Plasma and Its Applications

  • Zhang, Zhitao;Liu, Cheng;Bai, Mindi;Yang, Bo;Mao, Chengqi
    • 동굴
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    • 제76호
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    • pp.37-42
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    • 2006
  • The Dielectric Barrier Discharge (DBD) is a nonequilibrium gas discharge that is generated in the space between two electrodes, which are separated by an insulating dielectric layer. The dielectric layer can be put on either of the two electrodes or be inserted in the space between two electrodes. If an AC or pulse high voltage is applied to the electrodes that is operated at applied frequency from 50Hz to several MHz and applied voltages from a few to a few tens of kilovolts rms, the breakdown can occur in working gas, resulting in large numbers of micro-discharges across the gap, the gas discharge is the so called DBD. Compared with most other means for nonequilibrium discharges, the main advantage of the DBD is that active species for chemical reaction can be produced at low temperature and atmospheric pressure without the vacuum set up, it also presents many unique physical and chemical process including light, heat, sound and electricity. This has led to a number of important applications such as ozone synthesizing, UV lamp house, CO2 lasers, et al. In recent years, due to its potential applications in plasma chemistry, semiconductor etching, pollution control, nanometer material and large area flat plasma display panels, DBD has received intensive attention from many researchers and is becoming a hot topic in the field of non-thermal plasma.

마이크로-나노 구조가 있는 표면에서의 액적 계면 거동 현상에 대한 연구 (Interfacial Behavior of Water Droplet on Micro-Nano Structured Surfaces)

  • 곽호재;유동인;김무환;박현선;키요후미 모리야마;안호선;김동억
    • 대한기계학회논문집B
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    • 제39권5호
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    • pp.449-453
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    • 2015
  • 최근 표면개질을 통한 젖음성 향상을 위하여, 마이크로와 나노 구조가 계층적(hierarchical)으로 존재하는 표면에 대한 연구가 공학 및 다양한 연구 분야에서 활발하게 진행되고 있다. 계층적구조가 존재하는 표면에서 초친수성(super-hydrophillic)은 대개 물방울(water droplet)의 계면 거동에 의해 그 특성이 확인된다. 따라서, 본 연구에서는 초친수성 표면위에서의 물방울 계면 거동에 대한 실험적 연구를 수행하였다. 포토리소그래피(photo lithography)공정과 건식 식각공정을 이용하여, 정량적으로 표면을 제작하였으며, 실험 표면에서의 계면 거동은 초고속카메라로 가시화하였다. 가시화 자료를 바탕으로, 물방울 계면거동은 표면에 존재하는 마이크로 및 나노구조의 지형학적 특성에 의해 영향을 받음을 확인하였다.

Piezo-electrically Actuated Micro Corner Cube Retroreflector (CCR) for Free-space Optical Communication Applications

  • Lee, Duk-Hyun;Park, Jae-Y.
    • Journal of Electrical Engineering and Technology
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    • 제5권2호
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    • pp.337-341
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    • 2010
  • In this paper, an extremely low voltage operated micro corner cube retroreflector (CCR) was fabricated for free-space optical communication applications by using bulk silicon micromachining technologies. The CCR was comprised of an orthogonal vertical mirror and a horizontal actuated mirror. For low voltage operation, the horizontal actuated mirror was designed with two PZT cantilever actuators, torsional bars, hinges, and a mirror plate with a size of $400{\mu}m{\times}400{\mu}m$. In particular, the torsional bars and hinges were carefully simulated and designed to secure the flatness of the mirror plate by using a finite element method (FEM) simulator. The measured tilting angle was approximately $2^{\circ}$ at the applied voltage of 5 V. An orthogonal vertical mirror with an extremely smooth surface texture was fabricated using KOH wet etching and a double-SOI (silicon-on-insulator) wafer with a (110) silicon wafer. The fabricated orthogonal vertical mirror was comprised of four pairs of two mutually orthogonal flat mirrors with $400{\mu}m4 (length) $\times400{\mu}m$ (height) $\times30{\mu}m$ (thickness). The cross angles and surface roughness of the orthogonal vertical mirror were orthogonal, almost $90^{\circ}$ and 3.523 nm rms, respectively. The proposed CCR was completed by combining the orthogonal vertical and horizontal actuated mirrors. Data transmission and modulation at a frequency of 10 Hz was successfully demonstrated using the fabricated CCR at a distance of approximately 50 cm.

초소형 광정보저장기기용 웨이퍼 스케일 대물렌즈 제작을 위한 회절광학소자 성형기술 개발 (Fabrication of diffractive optical element for objective lens of small form factor data storage device)

  • 배형대;임지석;정기봉;한정원;유준모;박노철;강신일
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2005년도 금형가공,미세가공,플라스틱가공 공동 심포지엄
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    • pp.35-40
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    • 2005
  • The demand for small and high-capacity optical data storage devices has rapidly increased. The areal density of optical disk is increased using higher numerical aperture objective lens and shorter wavelength source. A wafer-scale stacked micro objective lens with a numerical aperture of 0.85 and a focal length of 0.467mm for the 405nm blue- violet laser was designed and fabricated. A diffractive optical element (DOE) was used to compensate the spherical aberration of the objective lens. Among the various fabrication methods for micro DOE, the UV-replication process is more suitable for mass-production. In this study, an 8-stepped DOE pattern as a master was fabricated by photolithography and reactive ion etching process. A flexible mold was fabricated for improving the releasing properties and shape accuracy in UV-molding process. In the replication process, the effects of exposing time and applied pressure on the replication quality were analyzed. Finally, the shapes of master, mold and molded pattern were measured by optical scanning profiler. The deviation between the master and the molded DOE was less than 0.1um. The efficiency of the molded DOE was measured by DOE efficiency measurement system which consists of laser source, sample holder, aperture and optical power meter, and the measured value was $84.5\%$.

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