• 제목/요약/키워드: MgO film

검색결과 509건 처리시간 0.022초

경사증착법을 이용한 PM-OLED용 무기박막형 보호층 연구 (Study on the MgO Passivated PM-OLED using the Tilt & Rotate Technique)

  • 김광호;김훈;김재경;도이미;한정인;주병권
    • 한국전기전자재료학회논문지
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    • 제16권9호
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    • pp.812-815
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    • 2003
  • In this study, the MgO thin-film passivation layer was adopted to protect passive matrix organic light emitting diode(PMOLED) with the cathode separator from moisture and oxygen. Using the substrate rotate and tilt technique during the deposition, the organic and cathode layers were perfectly covered with MgO. And then, we analyzed the difference of the current-voltage and luminescence characteristics between passivated OLED of the MgO and non-passivated OLED. It was found that the number of dark spot generated from the degradated pixel was decreased owing to the Mgo thin-film passivation layer using the tilt & rotate technique. And the half-life time passivated OLED was improved two times more. Thus, the MgO could be vaccum-deposited under the low temperature and had a merit that the organic layer was not much affected. We can consider that MgO thin film passivation method can be adopted to protect the OLED from moisture and oxygen and can offer the enhancement of lifetime.

p-type (100) Cz 단결정 실리콘 태양전지의 $MgF_2/CeO_2$ 반사 방지막에 관한 연구 ($MgF_2/CeO_2$ AR Coating on p-type (100) Cz Silicon Solar Cells)

  • 이수은;최석원;박성현;강성호;이준신
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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    • pp.593-596
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    • 1999
  • This paper presents a process optimization of antireflectiun (AR) coating on crystalline Si solar cells. Theoretical and experimental investigations were performed on a doble-layer AR(DLAR) coating of MgF$_2$/CeO$_2$, We investigated CeO$_2$ films as an All layer because they hale a proper refractive index of 2.46 and demonstrate the same lattice constant as Si substrate. RF sputter grown CeO$_2$ film showed strong dependence on a deposition temperature. The CeO$_2$ film deposited at 400 $^{\circ}C$ exhibited a strong (111) preferred orientation and the lowest surface roughness of 6.87 $\AA$. Refractive index of MgF$_2$ film was measured as 1.386 for the most of growth temperature. An optimized DLAR coating showed a reflectance as low as 2.04 % in the wavelengths ranged from 0.4 7m to 1.1 7m. We achieved the efficiencies of solar cells greater than 15% with 3.12 % improvement with DLAR coatings . Further details on MgF$_2$, CeO$_2$ films, and cell fabrication Parameters are presented in this paper.

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MgO 증착 변수에 따른 AC-PDP의 수명 특성 연구 (A Study on the Lifetime Characteristics of AC-PDP as a Parameter of MgO Preparation)

  • 최민석;김영락;최윤창;박차수;김동현;이호준;박정후
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2002년도 하계학술대회 논문집 C
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    • pp.1631-1635
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    • 2002
  • In order to be good display, the ac PDP lifetime should be guaranteed over 30000 hours. Therefore, to satisfy these demands, it is need to find out main factors in ac PDP affecting the lifetime. In this paper, the characteristics of lifetime as a parameter of the MgO deposition rate conditions is investigated. MgO protective layers is fabricated by E-beam. Before measuring the lifetime we have carefully peformed high temperature evacuation and aging procedure, which is essential for providing the initial condition of our experiment. If MgO deposition rate increased, MgO film becomes dense and an adhesive power of MgO film gets better and because occurrence rate of the MgO cluster decreases, lifetime of MgO will be improved. As a result, ac PDP lifetime can be improved due to the improvement of MgO by MgO preparation conditions.

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A New Xenon Plasma Flat Fluorescent Lamp Enhanced with MgO Nano-Crystals for Liquid Crystal Display Applications

  • Lee, Yang-Kyu;Heo, Seung-Taek;Lee, You-Kook;Lee, Dong-Gu
    • Transactions on Electrical and Electronic Materials
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    • 제11권4호
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    • pp.186-189
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    • 2010
  • Nano-sized MgO single crystal powders have recently been reported to emit ultraviolet by stimulation of electrons in a vacuum. In this study, nanocrystalline MgO powders were applied to a xenon plasma flat fluorescent lamp (FFL) for a liquid crystal display backlight to improve its emission efficiency through the extra ultraviolet from the nano-MgO crystals. For comparison, a MgO nano-thin film was applied directly on the phosphors inside a lamp panel through e-beam evaporation. Adding MgO nano-crystal powders to the phosphors improved the luminance and efficiency of FFLs by around 20% and MgO nano-crystal coverage of 40% of the phosphor provided the best FFL emission characteristics; however, application of MgO thin film to the phosphors degraded the emission characteristics, even compared to FFLs without MgO. This was due to insufficient ultraviolet stimulation of the phosphors and the crystallinity and low secondary electron coefficient of the MgO.

Surface Discharge Characteristics of New Flat Fluorescent Lamp Enhanced by MgO Nano-Crystals

  • Lee, Yang-Kyu;Heo, Seung-Taek;Lee, You-Kook;Lee, Dong-Gu
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.687-690
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    • 2009
  • It has been recently reported that nano-sized MgO single crystal powders emit ultraviolet by stimulation of electrons under vacuum condition. Therefore, in this study, nano-crystalline MgO powders were applied to a xenon plasma flat fluorescent lamp for LCD backlight to improve emission efficiency of the lamp by help of extra ultraviolet from nano-MgO. For comparison with nano-crystalline MgO powders, MgO nano-thin film was applied directly on phosphors inside a lamp panel through e-beam evaporation The luminance and efficiency of FFL with an addition of MgO nano-crystal powders on phosphors were improved by around 20%. Application of MgO thin film to phosphors worsened the emission characteristics of FFLs, even rather than FFL without MgO. The reason came from insufficient stimulation of phosphors by UV, crystallinity of MgO, and low secondary electron coefficient.

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SUPPRESSION OF THE TETRAGONAL DISTORTION IN THIN Pb(Zr, Ti)$O_3$/MgO(100)

  • Kang, H.C.;Noh, D.Y.;Je, J.H.
    • 한국진공학회지
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    • 제6권S1호
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    • pp.141-153
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    • 1997
  • The paraelectric cubic-to-ferroelectric tetragonal phase transition of the thin Pb(Zr, Ti)$O_3$ (PZT) films grown on MgO(001) substrate was investigated in a series of synchrotron x-ray scattering experiments. As the thickness of the film decreases the transition temperature and the amount of the tetragonal distortion were decreased continuously Different from only the c-domains were existent in the thinnest 25nm thick film. Based on this we propose a model for the domain structure of the tetragonal PZT/MgO(100) film that is very different from the ones suggested in literature. We attribute the suppression of the transition to the substrate field that prefers the c-type domains near the interface and suppresses the tetragonal distortion to minimize the film-substrate lattice mismatch.

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TFT-LCDs 게이트 전극에 적용한 Cu(Mg) 합금 박막의 건식식각 (A Dry-patterned Cu(Mg) Alloy Film as a Gate Electrode in a Thin Film Transistor Liquid Crystal Displays (TFT- LCDs))

  • 양희정;이재갑
    • 한국재료학회지
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    • 제14권1호
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    • pp.46-51
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    • 2004
  • The annealing of a Cu(4.5at.% Mg)/$SiO_2$/Si structure in ambient $O_2$, at 10 mTorr, and $300-500^{\circ}C$, allows for the outdiffusion of the Mg to the Cu surface, forming a thin MgO (15 nm) layer on the surface. The surface MgO layer was patterned, and successfully served as a hard mask, for the subsequent dry etching of the underlying Mg-depleted Cu films using an $O_2$ plasma and hexafluoroacetylacetone [H(hfac)] chemistry. The resultant MgO/Cu structure, with a taper slope of about $30^{\circ}C$ shows the feasibility of the dry etching of Cu(Mg) alloy films using a surface MgO mask scheme. A dry-etched Cu(4.5at.% Mg) gate a-Si:H TFT has a field effect mobility of 0.86 $\textrm{cm}^2$/Vs, a subthreshold swing of 1.08 V/dec, and a threshold voltage of 5.7 V. A novel process for the dry etching of Cu(Mg) alloy films, which eliminates the use of a hard mask, such as Ti, and results in a reduction in the process steps is reported for the first time in this work.

MgO(100) 기판 위에 증착된 Ag/CoFeB 박막의 스퍼터링 조건에 따른 미세성장구조 변화 연구 (Effects of Sputtering Conditions on the Growth of Ag/CoFeB Layer on MgO(100) Substrate)

  • 전보건;정종율
    • 한국자기학회지
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    • 제21권6호
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    • pp.214-218
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    • 2011
  • 본 연구에서는 DC 마그네트론 스퍼터링을 이용해 MgO 단결정 기판 위에 성장된 Ag/CoFeB 박막의 스퍼터링 조건에 따른 박막 미세구조의 변화를 연구하였다. Ag 박막의 결정성 및 표면 거칠기는 인가전력(sputtering power) 및 증착온도의 변화에 따라 증착온도가 증가하는 경우 (200) 방향의 결정성이 향상되는 것을 확인하였으며, 인가전력이 증가되는 경우 표면 거칠기가 감소하는 것을 확인하였다. 또한 고분해능 TEM(transmission electron microscopy) 및 XRR(X-ray reflectivity) 측정을 통해 MgO 기판 위 Ag층의 켜쌓기 성장 및 MgO 기판과 Ag층 사이에 산화층에 해당하는 계면층이 존재하는 것을 알 수 있었으며, 증착온도의 증가에 따른 Ag의 섬상구조 형성 및 intermixing 효과에 의한 Ag/CoFeB 계면층의 변화 및 자기적 특성의 변화를 연구하였다.

The Role of (111)MgO Underlayer in Growth of c-axis Oriented Barium Ferrite Films

  • Erickson, D.W.;Hong, Y.K.;Gee, S.H.;Tanaka, T.;Park, M.H.;Nam, I.T.
    • Journal of Magnetics
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    • 제9권4호
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    • pp.116-120
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    • 2004
  • Hexagonal barium-ferrite ($BaFe_{12}O_{19}$, magnetoplumbite structure; BaM) film with perpendicularly c-axis orientation was successfully deposited on (100) silicon substrates with an MgO (111) underlayer by rf diode sputtering and in-situ heating at $920^{\circ}C$. The magnetic and structural properties of 0.27 ${\mu}m$ thick BaM films on MgO (111) underlayers were compared to films of the same thickness deposited onto single-crystal MgO (111) and c-plane ($000{\ell}$) sapphire ($Al_2O_3$) substrates by vibrating sample magnetometry (VSM), x-ray diffractometer (XRD), and atomic force microscopy (AFM). The thickness dependence of MgO (111) underlayers on silicon wafer was found to have a large effect on both magnetic and structural properties of the BaM film. The thickness of 15 nm MgO (111) underlayers produced BaM films with almost identical magnetic and structural properties as the single-crystal substrates; this can be explained by the lower surface roughness for thinner underlayer thicknesses. The magnetization saturation ($M_s$) and the ratio $H_{cII}/H_{c{\bot}}$ for the BaM film with a 15 nm MgO (111) underlayer is 217 emu/cc and 0.24, respectively. This is similar to the results for the BaM films deposited on the single-crystal MgO (111) and sapphire substrates of 197 emu/cc and 0.10, 200 emu/cc and 0.12, respectively. Therefore, the proposed MgO (111) underlayer can be used in many applications to promote c-axis orientation without the cost of expensive substrates.

Mg2SiO4/Glass Composite계 세라믹스를 이용한 음이온 발생용 후막형 클러스터 (Thick Film Type duster in Mg2SiO4/Glass composite ceramics for Anion Generation)

  • 여동훈;신효순;홍연우
    • 한국전기전자재료학회논문지
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    • 제23권2호
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    • pp.118-123
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    • 2010
  • The eco-friendly technologies have been extended as matter of international concern due to various diseases and syndromes according to an environmental pollution. In this study, we have manufactured a ceramic cluster with thick film type for anion generation equipment which is maximized anion but minimized ozone contents generated. To develop the formulation of ceramic cluster, we conducted the $Mg_2SiO_4$ powders doped with 10 vol% glass frits as Na-Zn-B-O system and sintered at $1050^{\circ}C$ for 2 hours in air for starting materials and investigated the matching properties between the Ag-Pd electrode and the starting materials. The sintered sample for the composition of cluster has 6.7 of dielectric constant and 32 kV/mm of withstand voltage. The yield of anions was measured according to an electrode pattering, discharge gap between electrode, and thickness of electrode protective layer in the cluster of thick film type. We have manufactured the ceramic clusters with optimized thick film structure that have an anion over a hundred particles and the ozone of 0.6 ppb generated.