To reduce the environmental pollution by $NO_x$ from ship engine, International maritime organization (IMO) announced Tier III regulation, which is the emmision regulation of ship's exhaust gas in Emission control area (ECA). Selective catalytic reduction (SCR) process is the most commercial $De-NO_x$ system in order to meet the requirement of Tier III regulation. In generally, commercial ceramic honeycomb SCR catalyst has been installed in SCR reactor inside marine vessel engine. However, the ceramic honeycomb SCR catalyst has some serious issues such as low strength and easy destroution at high velocity of exhaust gas from the marine engine. For these reasons, we design to metallic structured catalyst in order to compensate the defects of the ceramic honeycomb catalyst for applying marine SCR system. Especially, metallic structured catalyst has many advantages such as robustness, compactness, lightness, and high thermal conductivity etc. In this study, in order to support catalyst on metal substrate, coating slurry is prepared by changing binder. we successfully fabricate the metallic structured catalyst with strong adhesion by coating, drying, and calcination process. And we carry out the SCR performance and durability such as sonication and dropping test for the prepared samples. The MFC01 shows above 95% of $NO_x$ conversion and much more robust and more stable compared to the commercial honeycomb catalyst. Based on the evaluation of characterization and performance test, we confirm that the proposed metallic structured catalyst in this study has high efficient and durability. Therefore, we suggest that the metallic structured catalyst may be a good alternative as a new type of SCR catalyst for marine SCR system.
Journal of Advanced Marine Engineering and Technology
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v.39
no.3
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pp.223-229
/
2015
Surface modification is a technology to form a new surface layer and overcome the intrinsic properties of the base material by applying thermal energy or stress onto the surface of the material. The purpose of this technique is to achieve anti-corrosion, beautiful appearance, wear resistance, insulation and conductance for base materials. Surface modification techniques may include plating, chemical conversion treatment, painting, lining and surface hardening. Among which, a surface modification process using electrolytes has been investigated for a long time in connection with research on its industrial application. The technology is highly favoured by various fields because it provides not only high productivity and cost reduction opportunities, but also application availability for components with complex geometry. In this study, an electrochemical experiment was performed on the surface of 5083-O Al alloy to determine an optimal electrolyte temperature, which produces surface with excellent corrosion resistance under marine environment than the initial surface. The experiment result, the modified surface presented a significantly lower corrosion current density with increasing electrolyte temperature, except for $5^{\circ}C$ of electrolyte temperature at which premature pores was created.
1. Production of the artificial zeolite from coal ash Coal fly ash is mainly composed of several oxides including $SiO_2$ and $Al_2O_3$ derived from inorganic compounds remained after burning. As minor components, $Fe_2O_3$ and oxides of Mg, Ca, P, Ti (trace) are also contained in the ash. These components are presented as glass form resulting from fusion in the process of the combustion of coal. In other word, coal ash may refer to a kind of aluminosilicate glass that is known to easily change to zeolite-like materials by hydrothermal reaction. Lots of hot seawater is disposing near thermal power plants after cooling turbine generator periodically. Using seawater in the hydrothermal reaction caused to produce low price artificial zeolite by reduction of sodium hydroxide consumption, heating energy and water cost. As coal ash were reacted hydrothermally, peaks of quartz and mullite in the ash were weakened and disappeared, and new Na-Pl peaks were appeared strengthily. Si-O-Si bonding of the bituminous coal ash was changed to Si-O-Al (and $Fe^{3+}$) bonding by the reaction. Therefore the produced Na-Pl type zeolite had high CEC of 276.7 $cmol^+{\cdot}kg^{-1}$ and well developed molecular sieve structure with low concentration of heavy metals. 2. Utilization of the artificial zeolite in agro-environment The artificial zeolite(1g) could remove 123.5 mg of zinc, 164.7 mg copper, 184.4 mg cadmium and 350.6 mg lead in the synthetic wastewater. The removability is higher 2.8 times in zinc, 3.3 times in copper, 4.7 times in cadmium and 4.8 times in lead than natural zeolite and charcoal powder. When the heavy metals were treated at the ratio of 150 $kg{\cdot}ha^{-1}$ to the rice plant, various growth inhibition were observed; brownish discoloration and death of leaf sheath, growth inhibition in culm length, number of panicles and grains, grain ripening and rice yield. But these growth inhibition was greatly alleviated by the application of artificial zeolite, therefore, rice yield increased $1.1{\sim}3.2$ times according to the metal kind. In addition, the concentration of heavy metals in the brown rice also lowered by $27{\sim}75%$. Artificial Granular Zeolites (AGZ) was developed for the purification of wastewater. Canon exchange capacity was 126.8 $cmol^+{\cdot}kg^{-1}$. AGZ had Na-Pl peaks mainly with some minor $C_3S$ peaks in X-ray diffractogram. In addition, AGZs had various pore structure that may be adhere the suspended solid and offer microbiological niche to decompose organic pollutants. AGZ could remove ammonium, orthophosphate and heavy metals simultaneously. Mixing ratio of artificial zeolite in AGZs was related positively with removal efficiency of $NH_4\;^+$ and negatively with that of $PO_4\;^{3-}$. Root growth of rice seedling was inhibited severely in the mine wastewater because of strong acidity and high concentration of heavy metals. As AGZ(1 kg) stayed in the wastewater(100L) for 4days, water quality turned into safely for agricultural usage and rice seedlings grew normally.
Kim, Myung-Chan;Heo, Cheol-Ho;Boo, Jin-Hyo;Cho,Yong-Ki;Han, Jeon-Geon
Proceedings of the Korean Vacuum Society Conference
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1999.07a
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pp.211-211
/
1999
Titanium nitride (TiN) thin films have useful properties including high hardness, good electrical conductivity, high melting point, and chemical inertness. The applications have included wear-resistant hard coatings on machine tools and bearings, decorative coating making use of the golden color, thermal control coatings for widows, and erosion resistant coatings for spacecraft plasma probes. For all these applications as feature sizes shrink and aspect ratios grow, the issue of good step coverage becomes increasingly important. It is therefore essential to manufacture conformal coatings of TiN. The growth of TiN thin films by chemical vapor deposition (CVD) is of great interest for achieving conformal deposition. The most widely used precursor for TiN is TiCl4 and NH3. However, chlorine impurity in the as-grown films and relatively high deposition temperature (>$600^{\circ}C$) are considered major drawbacks from actual device fabrication. To overcome these problems, recently, MOCVD processes including plasma assisted have been suggested. In this study, therefore, we have doposited Ti(C, N) thin films on Si(100) and D2 steel substrates in the temperature range of 150-30$0^{\circ}C$ using tetrakis diethylamido titanium (TDEAT) and titanium isopropoxide (TIP) by pulsed DC plamsa enhanced metal-organic chemical vapor deposition (PEMOCVD) method. Polycrystalline Ti(C, N) thin films were successfully grown on either D2 steel or Si(100) surfaces at temperature as low as 15$0^{\circ}C$. Compositions of the as-grown films were determined with XPS and RBS. From XPS analysis, thin films of Ti(C, N) with low oxygen concentration were obtained. RBS data were also confirmed the changes of stoichiometry and microhardness of our films. Radical formation and ionization behaviors in plasma are analyzed by optical emission spectroscopy (OES) at various pulsed bias and gases conditions. H2 and He+H2 gases are used as carrier gases to compare plasma parameter and the effect of N2 and NH3 gases as reactive gas is also evaluated in reduction of C content of the films. In this study, we fond that He and H2 mixture gas is very effective in enhancing ionization of radicals, especially N resulting is high hardness. The higher hardness of film is obtained to be ca. 1700 HK 0.01 but it depends on gas species and bias voltage. The proper process is evident for H and N2 gas atmosphere and bias voltage of 600V. However, NH3 gas highly reduces formation of CN radical, thereby decreasing C content of Ti(C, N) thin films in a great deal. Compared to PVD TiN films, the Ti(C, N) film grown by PEMOCVD has very good conformability; the step coverage exceeds 85% with an aspect ratio of more than 3.
We synthesized phase pure CrN having surface areas up to $47m^2/g$ starting from $CrCl_{3}$ with $NH_{3}$. Thermal Gravimetric Analysis coupled with X-ray diffraction was carried out to identify solid state transition temperatures and the phase after each transition. In addition, the BET surface areas, pore size distributions, and crystalline diameters for the synthesized materials were analyzed. Space velocity influenced a little to the surface areas of the prepared materials, while heating rate did not. We believe it is due to the fast removal of reaction by-products from the system. Temperature programmed reduction results revealed that the CrN was hardly passivated by 1% $O_{2}$. Molecular nitrogen was detected from CrN at 700 and $950^{\circ}C$, which may be from lattice nitrogen. In temperature programmed oxidation with heating rate of 10 K/min in flowing air, oxidation started at or higher than $300^{\circ}C$ and resulting $Cr_{2}O_{3}$ phase was observed with XRD at around $800^{\circ}C$. However the oxidation was not completed even at $900^{\circ}C$. CrN catalysts were highly active for n-butane dehydrogenation reaction. Their activity is even higher than that of a commercial $Pt-Sn/Al_{2}O_{3}$ dehydrogenation catalyst in terms of volumetric reaction rate. However, CrN was not active in pyridine hydrodenitrogenation.
Journal of the Institute of Convergence Signal Processing
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v.19
no.2
/
pp.61-67
/
2018
Welding preheating means that the surface of the base material to which the metal is welded before the main welding is heated to a constant temperature. It prevents the cracks of the adjacent influences such as reduction of material hardening degree by controlling the cooling rate, suppression of segregation of impurities, prevention of thermal deformation, and moisture removal. For this reason, it is a necessary operation for high quality welding. Induction heating is an efficient heating method that converts electric energy into heat energy by applying electromagnetic induction phenomenon. Compared with combustion heat generated by gas and liquid, it is clean, stable, and economical as well as rapid heating. It can be heated regardless of the shape, depth and material of the heating body by modifying the shape of the frequency and the coil with a simple structure. In this paper, we implemented a low frequency welding preheating system using induction heating technique and observed the temperature changes of coil resistance, inductance and automotive transmission parts according to the height of each transmission in winding coil for three kinds of automotive transmission parts. We confirmed that the change of current is a very important factor in the low frequency heating.
Proceedings of the Korean Vacuum Society Conference
/
2012.02a
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pp.100-101
/
2012
The plasma damage free and room temperature processedthin film deposition technology is essential for realization of various next generation organic microelectronic devices such as flexible AMOLED display, flexible OLED lighting, and organic photovoltaic cells because characteristics of fragile organic materials in the plasma process and low glass transition temperatures (Tg) of polymer substrate. In case of directly deposition of metal oxide thin films (including transparent conductive oxide (TCO) and amorphous oxide semiconductor (AOS)) on the organic layers, plasma damages against to the organic materials is fatal. This damage is believed to be originated mainly from high energy energetic particles during the sputtering process such as negative oxygen ions, reflected neutrals by reflection of plasma background gas at the target surface, sputtered atoms, bulk plasma ions, and secondary electrons. To solve this problem, we developed the NBAS (Neutral Beam Assisted Sputtering) process as a plasma damage free and room temperature processed sputtering technology. As a result, electro-optical properties of NBAS processed ITO thin film showed resistivity of $4.0{\times}10^{-4}{\Omega}{\cdot}m$ and high transmittance (>90% at 550 nm) with nano- crystalline structure at room temperature process. Furthermore, in the experiment result of directly deposition of TCO top anode on the inverted structure OLED cell, it is verified that NBAS TCO deposition process does not damages to the underlying organic layers. In case of deposition of transparent conductive oxide (TCO) thin film on the plastic polymer substrate, the room temperature processed sputtering coating of high quality TCO thin film is required. During the sputtering process with higher density plasma, the energetic particles contribute self supplying of activation & crystallization energy without any additional heating and post-annealing and forminga high quality TCO thin film. However, negative oxygen ions which generated from sputteringtarget surface by electron attachment are accelerated to high energy by induced cathode self-bias. Thus the high energy negative oxygen ions can lead to critical physical bombardment damages to forming oxide thin film and this effect does not recover in room temperature process without post thermal annealing. To salve the inherent limitation of plasma sputtering, we have been developed the Magnetic Field Shielded Sputtering (MFSS) process as the high quality oxide thin film deposition process at room temperature. The MFSS process is effectively eliminate or suppress the negative oxygen ions bombardment damage by the plasma limiter which composed permanent magnet array. As a result, electro-optical properties of MFSS processed ITO thin film (resistivity $3.9{\times}10^{-4}{\Omega}{\cdot}cm$, transmittance 95% at 550 nm) have approachedthose of a high temperature DC magnetron sputtering (DMS) ITO thin film were. Also, AOS (a-IGZO) TFTs fabricated by MFSS process without higher temperature post annealing showed very comparable electrical performance with those by DMS process with $400^{\circ}C$ post annealing. They are important to note that the bombardment of a negative oxygen ion which is accelerated by dc self-bias during rf sputtering could degrade the electrical performance of ITO electrodes and a-IGZO TFTs. Finally, we found that reduction of damage from the high energy negative oxygen ions bombardment drives improvement of crystalline structure in the ITO thin film and suppression of the sub-gab states in a-IGZO semiconductor thin film. For realization of organic flexible electronic devices based on plastic substrates, gas barrier coatings are required to prevent the permeation of water and oxygen because organic materials are highly susceptible to water and oxygen. In particular, high efficiency flexible AMOLEDs needs an extremely low water vapor transition rate (WVTR) of $1{\times}10^{-6}gm^{-2}day^{-1}$. The key factor in high quality inorganic gas barrier formation for achieving the very low WVTR required (under ${\sim}10^{-6}gm^{-2}day^{-1}$) is the suppression of nano-sized defect sites and gas diffusion pathways among the grain boundaries. For formation of high quality single inorganic gas barrier layer, we developed high density nano-structured Al2O3 single gas barrier layer usinga NBAS process. The NBAS process can continuously change crystalline structures from an amorphous phase to a nano- crystalline phase with various grain sizes in a single inorganic thin film. As a result, the water vapor transmission rates (WVTR) of the NBAS processed $Al_2O_3$ gas barrier film have improved order of magnitude compared with that of conventional $Al_2O_3$ layers made by the RF magnetron sputteringprocess under the same sputtering conditions; the WVTR of the NBAS processed $Al_2O_3$ gas barrier film was about $5{\times}10^{-6}g/m^2/day$ by just single layer.
Park, Byung Chan;Chang, Il Ho;Kim, Sun Tae;Hwang, Taek Sung;Lee, Seungho
Analytical Science and Technology
/
v.22
no.4
/
pp.285-292
/
2009
It has been observed that, after long term storage, some ammunitions are misfired by tamping (combustionstopping) due to aging of the chemicals loaded in the ammunitions. Used in ammunitions are percussion powder which provides the initial energy, igniter which ignites the percussion powder, and a delay system that delays the combustion for a period of time. The percussion powder is loaded first, followed by the igniter and then the delay system, and the ammunitions explode by the energy being transferred in the same order. Tamping occurs by combustion-stopping of the igniter or insufficient energy transfer from the igniter to the delay system or the combustion-stopping of the delay system, which are suspected to be caused by low purity of the components, inappropriate mixing ratio, size distribution of particulate components, type of the binder, blending method, hydrolysis by the humidity penetrated during the long term storage, and chemical changes of the components by high temperature. Goal of this study is to find the causes of the combustion-stopping of the igniter and the delay system of the ammunitions after long term storage. In this study, a method was developed for testing of the combustion-stopping, and the size distributions of the particulate components were analyzed with field-flow fractionation (FFF), and then the mechanism of chemical change during long term storage was investigated by thermal analysis (differential scanning calorimetry), XRD (X-ray diffractometry), and XPS (X-ray photoelectron spectroscopy). For the ignition system, M (metal)-O (oxygen) and M-OH peaks were observed at the oxygen's 1s position in the XPS spectrum. It was also found by XRD that $Fe_3O_4$ was produced. Thus it can be concluded that the combustion-stopping is caused by reduction in energy due to oxidation of the igniter.
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