• Title/Summary/Keyword: Metal Pattern

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An Electrochemical Evaluation on the Corrosion Property of Metallizing Film (용사 도막의 내식성에 관한 전기화학적 평가)

  • Moon, Kyung-Man;Shin, Joong-Ha;Lee, Myung-Hoon;Lee, Sung-Yul;Kim, Yun-Hae
    • Journal of Advanced Marine Engineering and Technology
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    • v.34 no.5
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    • pp.670-677
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    • 2010
  • There are many surface protection methods for numerous steel structures being used under severely corrosive environment, one of them, metallizing(thermal spray) is a available protection method which is comparatively and recently developed for surrface protection of various steel structures. However coating film obtained by spraying is to be needed increasingly more good corrosion resistance due to accelerating of environmental contamination. In this study, coating films(DFT:$200{\mu}m$) are performed with arc spray by wire metal and their types of films are pure zinc, pure aluminum, alloy film(Al:Zn=85:15) and alloy film(Al:Zn=95:5). And corrosion resistance of their films was investigated with electrochemical methods in seawater solution. Pure aluminum film showed a relatively somewhat good corrosion resistance compared to among those of other films and alloy films also showed a good corrosion resistance compared to pure zinc film. Especially it was observed that pure aluminum film showed a comparatively good corrosion resistance than that of alloy film named as galvarium spray(Al:Zn=85:15) in seawater solution. Morphology of corroded surface of pure zinc film appeared the pattern like intergranlar corrosion, however films of pure aluminum and alloy metal showed a general corrosion pattern.

Durability of Nano-/micro- Pt Line Patterns Formed on Flexible Substrate (유연기판 위 형성된 나노-마이크로 Pt 금속선 패턴의 내구성 연구)

  • Park, Tae Wan;Choi, Young Joong;Park, Woon Ik
    • Journal of the Microelectronics and Packaging Society
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    • v.25 no.3
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    • pp.49-53
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    • 2018
  • Since various methods to form well-aligned nano-/micro- patterns are underlying technologies to fabricate next generation wearable electronic devices, many efforts have been made to realize finer patterns in recent years. Among lots of patterning methods, the present invention includes a nano-transfer printing (n-TP) process which is advantageous in that a processing cost is low and high-resolution patterns can be formed within a short processing time. We successfully achieved pattern formation of highly ordered Pt lines with line-width of 250 nm, 500 nm, and $1{\mu}m$ on transparent and flexible substrates. In addition, we analyzed the durability of the patterns, showing excellent stability of line-shape even after a physical and repeated bending test of 500 times using a bending machine. As a result, it is expected that a n-TP process is very useful for forming various metal patterns, and it is also expected to be applied to wiring and interconnection technology of next generation flexible electronic devices.

UV-nanoimprint Patterning Without Residual Layers Using UV-blocking Metal Layer (UV 차단 금속막을 이용한 잔류층이 없는 UV 나노 임프린트 패턴 형성)

  • Moon Kanghun;Shin Subum;Park In-Sung;Lee Heon;Cha Han Sun;Ahn Jinho
    • Journal of the Microelectronics and Packaging Society
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    • v.12 no.4 s.37
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    • pp.275-280
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    • 2005
  • We propose a new approach to greatly simplify the fabrication of conventional nanoimprint lithography (NIL) by combined nanoimprint and photolithography (CNP). We introduce a hybrid mask mold (HMM) made from UV transparent material with a UV-blocking Cr metal layer placed on top of the mold protrusions. We used a negative tone photo resist (PR) with higher selectivity to substrate the CNP process instead of the UV curable monomer and thermal plastic polymer that has been commonly used in NIL. Self-assembled monolayer (SAM) on HMM plays a reliable role for pattern transfer when the HMM is separated from the transfer layer. Hydrophilic $SiO_2$ thin film was deposited on all parts of the HMM, which improved the formation of SAM. This $SiO_2$ film made a sub-10nm formation without any pattern damage. In the CNP technique with HMM, the 'residual layer' of the PR was chemically removed by the conventional developing process. Thus, it was possible to simplify the process by eliminating the dry etching process, which was essential in the conventional NIL method.

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Effect of morphology and diameter of implant fixture-abutment connection on mechanical failure of implants (임플랜트 고정체-지대주 연결부의 형태와 직경이 임플랜트의 기계적 실패에 미치는 영향)

  • Yun, Bo-Hyeok;Shin, Hyon-Mo;Yun, Mi-Jung;Huh, Jung-Bo;Jeong, Chang-Mo;Kang, Eun-Sook
    • The Journal of the Korean dental association
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    • v.53 no.9
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    • pp.644-655
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    • 2015
  • Purpose: This study was conducted to evaluate the effect of the fixture abutment connection type and diameter on the screw joint stability in external butt joint for 2nd surgery and internal cone connected type implant system for 1st and 2nd surgery using ultimate fracture strength. Materials and Methods: USII system, SSII system and GSII system of Osstem Implant were used. Each system used the fixture with two different diameters and cement-retained abutments, and tungsten carbide / carbon coated abutment screws were used. Disc shaped stainless steel metal tube was attached using resin-based temporary cement. The experimental group was divided into seven subgroups, including the platform switching shaped specimen that uses a regular abutment in the fixture with a wide diameter in USII system. A static load was increased to the metal tube at 5mm deviated point from the implant central axis until it reached the compression bending strength at a rate of 1mm/min. Then the deformations and patterns of fracture in threaded connection were compared. Results and Conclusion: 1. In the comparison between the Regular diameter, compression bending strength of SSII system was higher than USII system and GSII system. There was no significant difference between USII system and GSII system. 2. In the comparison between wide diameter, compression bending strength was increased in the order of GSII system, USII system, and SSII system. 3. In comparison between the implant diameter, compression bending strength of the wide diameter was greater than the regular diameter in any system(P<0.05). 4. There was no significant difference between the platform switching (III group) and the regular diameter (I group) in USII system. 5. In USII system, fracture of abutment screw and deformation of both fixture and abutment were observed in I, II and III subgroups. 6. Failure pattern of SSII system, which was the fracture of abutment screw and deformation of the abutment and fixture, was observed in both IV and V subgroups. Fracture of some fixtures was observed in subgroup V. 7. Failure pattern of GSII system, which was the fracture of the abutment screw and deformation of the fixture and the abutment, was observed in both VI and VII subgroups. Apart from other subgroups, subgroup VII demonstrated no bending neither the fracture at the top of the fixture. The compressive deformation of internal slope in the fixture was the only thing observed in subgroup VII.

Contact Transfer Printing Using Bi-layer Functionalized Nanobio Interface for Flexible Plasmonic Sensing

  • Lee, Jihye;Park, Jiyun;Lee, Junyoung;Yeo, Jong-Souk
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.413-413
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    • 2014
  • In this paper, we present a fabrication method of functionalized gold nanostructures on flexible substrate that can be implemented for plasmonic sensing application. For biomolecular sensing, many researchers exploit unconventional lithography method like nanoimprint lithography (NIP), contact transfer lithography, soft lithography, colloidal transfer printing due to its usability and easy to functionalization. In particular, nanoimprint and contact transfer lithography need to have anti-adhesion layer for distinctive metallic properties on the flexible substrates. However, when metallic thin film was deposited on the anti-adhesion layer coated substrates, we discover much aggravation of the mold by repetitive use. Thus it would be impossible to get a high quality of metal nanostructure on the transferred substrate for developing flexible electronics based transfer printing. Here we demonstrate a method for nano-pillar mold and transfer the controllable nanoparticle array on the flexible substrates without an anti-adhesion layer. Also functionalization of gold was investigated by the different length of thiol applied for effectively localized surface plasmonic resonance sensing. First, a focused ion beam (FIB) and ICP-RIE are used to fabricate the nanoscale pillar array. Then gold metal layer is deposited onto the patterned nanostructure. The metallic 130 nm and 250 nm nanodisk pattern are transferred onto flexible polymer substrate by bi-layer functionalized contact imprinting which can be tunable surface energy interfaces. Different thiol reagents such as Thioglycolic acid (98%), 3-Mercaptopropionic acid (99%), 11-Mercaptoundecanoic acid (95%) and 16-Mercaptohexadecanoic acid (90%) are used. Overcoming the repeatedly usage of the anti-adhesion layer mold which has less uniformity and not washable interface, contact printing method using bi-layer gold array are not only expedient access to fabrication but also have distinctive properties including anti-adhesion layer free, functionalized bottom of the gold nano disk, repeatedly replicate the pattern on the flexible substrate. As a result we demonstrate the feasibility of flexible plasmonic sensing interface and anticipate that the method can be extended to variable application including the portable bio sensor via mass production of stable nanostructure array and other nanophotonic application.

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Comparison of the fit of the coping pattern constructed by manual and CAD/CAM, depending on the margin of the abutment tooth (지대치 변연 형태에 따른 수작업과 CAD/CAM으로 제작한 coping 패턴의 적합도 비교)

  • Han, Min-soo;Kwon, Eun-Ja;Chio, Esther;Kim, Si-chul
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.16 no.10
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    • pp.6611-6617
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    • 2015
  • The purpose of this study is to compare the marginal and internal fit of metal and zirconia coping which is fabricated by manual and CAD/CAM(Computer Aided Design/Computer Aided Manufacturing). The model is prepared with Urethane material and two abutment teeth are fabricated with a knife and chamfer margin. Silicon replica technique is used to measure the marginal fit of manually fabricated and the CAD/CAM coping. Internal fitting level is measured with a microscope and the image is captured with a CCD camera. The distance between abutment teeth and coping is measured with a callibrated image analyzer software; marginal opening (MO), marginal gap (MG), internal gap (IG) at maximum curvature area, axial gap (AG), and occlusal gap (OG). Two-way ANOVA test is applied to compare fabrication technique and to analysis of abutment pattern. In addition, one-way ANOVA and Scheffe's test is used to analyze each parameter of the test. The result shows that the fit is < $120{\mu}m$ except OG of CAD/CAM and MO of knife margin. The CAD/CAM fabricated coping showed higher fit level at chamfer margin. However, knife margin showed better fitness compared to chamfer margin at MG. AG showed the minimum dimension with a constant result (< $38{\mu}m$).

Fabrication and Characterization of an Antistiction Layer by PECVD (plasma enhanced chemical vapor deposition) for Metal Stamps (PECVD를 이용한 금속 스탬프용 점착방지막 형성과 특성 평가)

  • Cha, Nam-Goo;Park, Chang-Hwa;Cho, Min-Soo;Kim, Kyu-Chae;Park, Jin-Goo;Jeong, Jun-Ho;Lee, Eung-Sug
    • Korean Journal of Materials Research
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    • v.16 no.4
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    • pp.225-230
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    • 2006
  • Nanoimprint lithography (NIL) is a novel method of fabricating nanometer scale patterns. It is a simple process with low cost, high throughput and resolution. NIL creates patterns by mechanical deformation of an imprint resist and physical contact process. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting process. Stiction between the resist and the stamp is resulted from this physical contact process. Stiction issue is more important in the stamps including narrow pattern size and wide area. Therefore, the antistiction layer coating is very effective to prevent this problem and ensure successful NIL. In this paper, an antistiction layer was deposited and characterized by PECVD (plasma enhanced chemical vapor deposition) method for metal stamps. Deposition rates of an antistiction layer on Si and Ni substrates were in proportion to deposited time and 3.4 nm/min and 2.5 nm/min, respectively. A 50 nm thick antistiction layer showed 90% relative transmittance at 365 nm wavelength. Contact angle result showed good hydrophobicity over 105 degree. $CF_2$ and $CF_3$ peaks were founded in ATR-FTIR analysis. The thicknesses and the contact angle of a 50 nm thick antistiction film were slightly changed during chemical resistance test using acetone and sulfuric acid. To evaluate the deposited antistiction layer, a 50 nm thick film was coated on a stainless steel stamp made by wet etching process. A PMMA substrate was successfully imprinting without pattern degradations by the stainless steel stamp with an antistiction layer. The test result shows that antistiction layer coating is very effective for NIL.

A Comparative Study on the Metallurgical Characteristics of the Iron Knife Using Traditional Iron-Making Method (전통 제철법을 적용하여 제작한 철제 칼의 금속학적 특성에 관한 비교 연구)

  • Cho, Sung Mo;Cho, Nam Chul;Han, Jung Uk
    • Journal of Conservation Science
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    • v.34 no.5
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    • pp.433-442
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    • 2018
  • In this study, metal properties were compared by preparingthree iron knives from steel ingots produced via traditional iron-making, and ingot which jointed the steel of modern times. Metal microscope and SEM-EDS analysis revealed fine ferrite and pearlite structures of the hypo-eutectoid steel of Fe-C alloys. All samples also exhibited martensite on the blade of the knife. By Vicker's hardness analysis, the hardness of the sand iron knife (K1) was 533.38 HV, sand iron-nickel steel knife (K3) was 514.8 HV, and sand iron-carbon steel knife (K2) was 477.02 HV. The mass reduction due to wear was 0.058% for K1, 0.059% for K3, and 0.144% for K2. EPMA(Electron probe micro-analyzer) analysis of the surface pattern of the specimens confirmed that the patterns were exposed due to differences in the content of C or the chemical composition. Additional research on heat treatment processes is needed to increase the abrasion resistance of blades. Traditional steel ingots could produce high-quality steel if combined with nickel steel.

A Study on the Character Creation of Traditional Incantatory Pattern for Individual Character Industry (Individual Character 산업을 위한 전통 주술 문양의 캐릭터 개발 연구)

  • 신승택
    • Archives of design research
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    • v.16 no.1
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    • pp.127-136
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    • 2003
  • Each country, each organization and individual have pursued their own identity, which require a unique design discriminated from other countries, cultures and people. As character related industries including character, cartoon, animation and CF appeared everywhere, development of character of mascot concept which can highlight individual personality has been required. This study is to meet these requirements and develop character of Korean subject as the concept of mascot or guard angel in order to develop the unique design with discriminative features from individual identity. For this, this study named it "Individual Character", analyzes the Korean traditional incantatory patterns and develops three patterns such as line art character, five-color 2D character and letter '||'&'||' picture 3D character as a form having individual character with the twelve gods of the earth through examination of materials of traditional patterns home and aborad. These three-typed characters seek strategies by types and are applied to calender, ceramic, metal, animation source, living goods and accessories. Application to commodities include line art and the products of 20 and 3D types based on re-design and add metal, paper, web and ceramic. Therefore this study finds that "Individual Character' using traditional incantatory patterns can discover the cultural identity and originality through Korean design creation and application of "Individual Character" to character industry can develop the pluralistic characters with a material and it can be extended to consumption goods.onsumption goods.

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Parametric Study of Slow Wave Structure for Gain Enhancement and Sidelobe Suppression (이득 증가와 부엽 억제를 위한 저속파 구조의 설계변수에 대한 연구)

  • Park, Se-Been;Kang, Nyoung-Hak;Eom, Soon-Young
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.27 no.12
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    • pp.1059-1068
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    • 2016
  • This paper proposes slow wave structure(SWS) utilized to increase antenna gain of printed dipole antenna(PDA) and to suppress sidelobe level simultaneously, and makes sure of electrical characteristics of the antenna according to parameter variations of components of the slow wave structure. The printed slow wave structure which is composed of a dielectric substrate and a metal rods array is located on excited direction of the PDA, affecting the radiation pattern and its intensity. Parasitic elements of the metal rods are arrayed in narrow consistent gap and have a tendency to gradually decrease in length. In this paper, array interval, element length, and taper angle are selected as the parameter of the parasitic element that effects radiation characteristics. Magnitude and phase distribution of the electrical field are observed and analyzed for each parameter variations. On the basis of these results, while the radiation pattern is analyzed, array methods of parasitic elements of the SWS for high gain characteristics are provided. The proposed antenna is designed to be operated at the Wifi band(5.15~5.85 GHz), and parameters of the parasitic element are optimized to maximize antenna gain and suppress sidelobe. Simulated and measured results of the fabricated antenna show that it has wide bandwidth, high efficiency, high gain, and low sidelobe level.