• 제목/요약/키워드: Mechanical etching

검색결과 400건 처리시간 0.022초

고분자 안경 렌즈의 재질별 화학적 식각 반응성 비교 (Comparison of Properties of Polymer Based Glass Lenses by Chemical Etching Reaction)

  • 이정화;노혜란
    • 한국안광학회지
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    • 제17권2호
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    • pp.119-126
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    • 2012
  • 목적: 안경 렌즈 코팅 막을 불화수소산을 이용하여 상온에서 단시간 화학적으로 식각한 뒤 코팅 막과 렌즈 원재료의 변화를 살펴보고자 하였다. 방법: GRAY 70%로 염색된 vinyl ester계 고분자(Lens A)와 thiourethane계 고분자렌즈(Lens B)를 불화수소산을 이용해 5분, 10분 또는 15분 동안 식각한 뒤 재료의 기계적 물성과 하드코팅과 반사방지코팅 등 코팅 막의 손상 정도, 그리고 굴절률 광투과율 등 렌즈의 특성 변화를 관찰하였다. 결과: 두 재료 모두 식각 전과 후의 굴절력에는 큰 변화가 없었지만 반사방지코팅과 하드코팅이 차례로 제거되었고 렌즈 표면에도 손상을 주어 UV 투과율이 증가되었으며 기계적 물성은 소하였다. 화학적 식각으로 인한 렌즈의 물성 변화는 thiourethane계 고분자 렌즈에서 더 크게 나타났다. 결론: 고분자 재료의 특성에 따라 불화수소산에 대한 반응성이 다르기 때문에 식각에 따른 렌즈 자체의 물성 변화가 다르게 나타남을 알 수 있었다.

공정 디자인에 따른 클래드강 맞대기 용접부의 기계적 특성에 관한 연구 (A Study on the Mechanical Properties of Butt Welding Zone of Clad Steel According to the Process Design)

  • 이정현;박재원
    • 한국생산제조학회지
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    • 제21권4호
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    • pp.532-540
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    • 2012
  • In this study, some considerations have been suggested in developing on-site techniques to evaluate the sensitization of stainless steels. Electrochemical potentiokinetic reactivation (EPR) technique is known to be a candidate tool for field applications since it enables quantitative assessment in reasonable test time, compared to oxalic etching (ditch) technique. The on-site application of the test method imposes additional restrictions on the selection of the test method (for example, minimum surface preparation requirement, insensitivity to testing temperature, etc.). The EPR and etching techniques have been compared in order to sensitization of stainless steel structures. It has been widely reported that the maximum sensitivity in the welded structure of stainless steel is shown at heat-affected zone (HAZ) than weldments with cast structure. In this work, sectioned weldments and external surfaces were investigated to reveal the degree of sensitization by the etching and the results were compared with those of EPR test. The EPR test showed little sensitivity to surface roughness and test temperature.

Structure and Magnetic Properties of a Fe73.5Si13.5B9Nb3Cu1 Alloy Nanopowder Fabricated by a Chemical Etching Method and Milling Procedure

  • Hong, Seong-Min;Kim, Jeong-Gon;Kim, Cheol-Gi
    • Journal of Magnetics
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    • 제14권2호
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    • pp.71-74
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    • 2009
  • The magnetic and structural properties of FINEMET (the Hitachi product name of the Fe-Si-B-Nb-Cu alloy) nanopowder with a composition of $Fe_{73.5}Si_{13.5}B_9Nb_3Cu_1$ atomic percent were investigated after annealing, chemical etching, and mechanical milling. The primary and secondary crystallization temperatures were 523 and $550^{\circ}C$, respectively. The grain size of the particles was adjusted by annealing time. Optimally annealed particles exhibited a homogenous microstructure composed of nanometer-sized crystalline grains. The grain boundary of the annealed particles was etched preferentially by chemical etching. Chemically etched particles were broken at the grain boundary by high-energy ball milling. As a result, a nanometer-sized FINEMET powder with a uniform size of crystalline grains was fabricated.

비이온계 계면활성제기반 고순도 알루미늄 습식식각을 통한 균일한 마이크로패턴 어레이 제작 (Fabrication of uniform micropattern arrays using nonionic surfactant-based wet etching process of high purity aluminum)

  • 장웅기;전은채;최두선;김병희;서영호
    • 한국기계가공학회지
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    • 제13권4호
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    • pp.13-20
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    • 2014
  • In this paper, the effects of a nonionic surfactant on the etch uniformity and the etch profile during the wet-etching process of high-purity aluminum were investigated for the fabrication of uniform micropattern arrays. To improve the surface roughness of a high-purity aluminum plate, a mechanical lapping process and an electrolytic polishing process were used. After electrolytic polishing process, the surface roughness, Ra, of the high-purity aluminum plate was improved from $1.25{\mu}m$ to $0.02{\mu}m$. A photoresist was used as an etching mask during the aluminum etching process, where the mixture of phosphoric acid, acetic acid, nitric acid, a nonionic surfactant and water was used as the aluminum etchant. Different amounts of the Triton X-100 nonionic surfactant were added to the aluminum etchant to investigate the effect of a nonionic surfactant during the wet-etching process of high-purity aluminum. The etch rate and the etch profile were measured by an optical interferometer and a scanning electron microscope.

무전해 니켈 도금과 실리콘의 이방성 식각을 이용한 미세 가동 구조물의 제작방법에 관한 연구 (A Study of Micro Freestanding Structure Fabrication using Nickel Electroless Plating And Silicon Anisotropic Etching)

  • 김성혁;김용권;이재호;허진
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제49권6호
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    • pp.367-374
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    • 2000
  • This paper presents a method to fabricate freestanding structures by (100) silicon anisotropic etching and nickel electroless plating. The electroless plating process is simpler than the electroplating, and provides good coating uniformity and improved mechanical properties. Furthermore, the (100) silicon anisotropic etching in KOH solution with being aligned to <100> direction provides vertical (100) sidewalls on etched (100) surface. In this paper, the effects of the nickel electroless plating condition on the properties of electroless plated metal structures are investigated to apply fabrication of micro structures and then various micro structures are fabricated by nickel electroless plating. And then, the structures are released by silicon anisotropic etching in KOH solution with a large gap between the structure and the substrate. The fabricated cantilever structures are $210\mum$. wide, $5\mum$. thick and $15\mum$. over the silicon substrate, and the comb structure has the comb electrodes which are $4\mum$. wide and $4.3\mum$. thick separated by$1\mum$. It is released by silicon anisotropic etching in KOH solution. The gap between the structure and the substrate is $2.5\mum$.

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입계부식법에 의한 사용중인 화력발전소 요소의 잔여수명평가 (Assessment of Residual Life for In-Service Fossil Power Plant Components Using Grain Boundary Etching Method)

  • 한상인;윤기봉;정세희
    • 대한기계학회논문집A
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    • 제21권1호
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    • pp.22-31
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    • 1997
  • The grain boundary etching method as a method for assessing degradation of structural materials has received much attention because it is simple, inexpensive and easy to apply to real components. In this study, the effectiveness of the method is verified by successfully applying the technique to in-service components of aged fossil power plants such as main steam pipes, boiler headers an turbine rotors. A new degradation parameter, intersecting number ratio (N$_{1}$/N$_{0}$), is employed. The intersecting number ratio (N$_{1}$/N$_{0}$) is defined as the ratio of intersection number (N$_{1}$) obtained from 5-minute picric acid etched surface to the number (N$_{0}$) obtained from nital etched surface. Two kinds of test materials, 2.25Cr-1Mo steel and 1Cr-1Mo-0.25V steel, were artificially thermal-aged at 630.deg. C in different levels of degradation., (N$_{1}$/N$_{0}$) were measured. And, correlations between the measured values and LMP values calculated from aging temperature and aging time were sought. To check the validity of the correlations obtained in laboratory, similar data were measured from service components in four old Korean fossil power plants. These on-site measurement data were in good correlation with those obtained in the laboratory.oratory.

Microelectromechnical system 소자 제작을 위한 유기금속분해법에 의한 압전성 PZT(53/47)박막의 증착 (Deposition of Piezoelectric PZT(53/47) Film by Metalorganic Decomposition for Micro electro mechanical Device)

  • 윤영수;정형진;신영화
    • 한국전기전자재료학회논문지
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    • 제11권6호
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    • pp.458-464
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    • 1998
  • This paper gives characterization of substrate and PZT(53/47) thin film deposited by metalorganic decomposition, which is concerned in deposition process and device fabrication process, to fabricate micro electro mechanical system (MEMS) device with piezoelectric material. The PZT thin films deposited by MOD at 700^{\circ}C$ for 30 minutes had a polycrystallinity, that is, no substrate dependence, while different interface were developed depending on the bottom electrodes. Such a structural variation could influence on not only the properties of the PZT film but also etching process for fabricating MEMS devices. Therefore the electrode structure is a very important factor in the deposition of the PZT film during etching process by HF acid for MEMS device with piezoelectric material. Piezoelectric coefficients of the PZT films on the different substrates were 40 and 80 pm/V at an applied voltage of 4V. Based in these results, it was possible for deposition of the PZT film by MOD to apply MEMS device fabrication process based on piezoelectricity after selection of proper bottom electrode.

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Powder blasting을 이용한 Fused silica glass의 마이크로 채널 가공 및 특성 평가에 관한 연구 (Evaluation of micro-channel characteristics of fused silica glass using powder blasting)

  • 이정원;김태민;신봉철
    • Design & Manufacturing
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    • 제14권1호
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    • pp.36-41
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    • 2020
  • Recently, due to the development of MEMS technology, researches for the production of effective micro structures and shapes have been actively conducted. However, the process technology based on chemical etching has a number of problems such as environmental pollution and time problems due to multi-process. Various processes to cope with this process are being studied, and one of the mechanical etching processes is the powder blasting process. This process is a method of spraying fine particles, which has the advantage of being an effective process in manufacturing hard brittle materials. However, it is also a process that adversely affects the material surface roughness and material properties due to the impact of the injection of fine particles. In this study, after fabricating micro-channels in fused silica glass with excellent optical properties among the hard brittle materials, we used the nano indentation system to analyze the micro parts using nano-particles as well as machinability and surface roughness analysis of the processed surface. The analysis was performed for the effective processing of powder blasting.

RF Plasma법으로 증착된 TiCN박막의 구조 및 기계적 거동에 관한 연구 (Structure & Mechanical Behavior of TiCN Thin Films by rf Plasma Deposition)

  • 백창현;박상렬;홍주화;위명용;강희재
    • 열처리공학회지
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    • 제13권2호
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    • pp.91-97
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    • 2000
  • The structure and mechanical properties of TiN and TiCN thin films deposited on STD61 steel substrates by the RF-sputtering methods has been studied by using XPS, XRD, micro-hardness tester, scratch tester, and wear-resistance tester. XPS results showed that the TiCN thin film formed with chemical bonding state. The TiN thin films grew with (111) orientation having the lowest strain energy by compressive stress, whereas the TiCN thin films grew with both (111) and (200) orientation, but (200) orientation having the lowest surface energy becomes dominant as carbon contents increase. The pre-etching treatment of substrate did not affect on the preferred orientation of thin films, but it played an important role in improving mechanical properties of thin films such as the hardness, adhesion and wear- resistance. Especially, the TiCN thin films showed the superior wear resistances due to high hardness and low friction coefficient compared with TiN thin films.

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