• Title/Summary/Keyword: Masking by oligomer

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Effect of Argon Ion Beam Incident Angle on Self-Organized Nanostructure on the Surface of Polyethylene Naphthalate Film (알곤 이온빔 입사각에 따른 Polyethylene Naphthalate 필름 표면의 자가나노구조화 분석)

  • Joe, Gyeonghwan;Yang, Junyeong;Byeon, Eun-Yeon;Park, Young-Bae;Jung, Sunghoon;Kim, Do-Geun;Lee, Seunghun
    • Journal of the Korean institute of surface engineering
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    • v.53 no.3
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    • pp.116-123
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    • 2020
  • Ion beam irradiation induces self-organization of nanostructure on the surface of polymer film. We show that the incident angle of Ar ions on polyethylene naphthalate(PEN) film changes self-organized nanostructure. PEN film was irradiated by argon ion beams with the ion incident angle of 0°, 30°, 45°, 60°, and 80°. Nanostructure was altered from dimple to ripple structure as the angle increases. The ripple structure changed to pillar structure after 60°due to that the shallow incident angle increased the ion energy transfer per depth up to 50 eV/Å, which value could induce excessive surface heating and oligomer formation reacting as a physical mask for anisotropic etching. And quantitative analysis of the nanostructures was adapted by using ABC model and fractal dimension theory.