• KSII Transactions on Internet and Information Systems (TIIS)
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• 제18권9호
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• pp.2605-2625
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• 2024

Siamese-based segmentation and tracking algorithms improve accuracy and stability for video object segmentation and tracking tasks simultaneously. Although effective, variability in target appearance and background clutter can still affect segmentation accuracy and further influence the performance of tracking. In this paper, we present a memory propagation-based target-aware and mask-attention decision network for robust object segmentation and tracking. Firstly, a mask propagation-based attention module (MPAM) is constructed to explore the inherent correlation among image frames, which can mine mask information of the historical frames. By retrieving a memory bank (MB) that stores features and binary masks of historical frames, target attention maps are generated to highlight the target region on backbone features, thus suppressing the adverse effects of background clutter. Secondly, an attention refinement pathway (ARP) is designed to further refine the segmentation profile in the process of mask generation. A lightweight attention mechanism is introduced to calculate the weight of low-level features, paying more attention to low-level features sensitive to edge detail so as to obtain segmentation results. Finally, a mask fusion mechanism (MFM) is proposed to enhance the accuracy of the mask. By utilizing a mask quality assessment decision network, the corresponding quality scores of the "initial mask" and the "previous mask" can be obtained adaptively, thus achieving the assignment of weights and the fusion of masks. Therefore, the final mask enjoys higher accuracy and stability. Experimental results on multiple benchmarks demonstrate that our algorithm performs outstanding performance in a variety of challenging tracking tasks.

• 한국산업보건학회지
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• 제32권2호
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• pp.111-115
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• 2022

Objectives: The purpose of this study is to verify whether droplet-induced propagation, the main route of infectious diseases such as COVID-19, can occur in semiconductor FAB (Fabrication), based on research results on general droplet propagation. Methods: Through data surveys droplet propagation was modeled through simulation and experimental case analysis according to general (without mask) and mask-wearing conditions, and the risk of droplet propagation was inferred by reflecting semiconductor FAB operation conditions (air current, air conditioning system, humidity, filter conditions). Results: Based on the results investigated to predict the possibility of spreading infectious diseases in semiconductor FAB, the total amount of droplet propagation (concentration), propagation distance, and virus life in FAB were inferred by reflecting the management parameter of semiconductor FAB. Conclusions: The total amount(concentration) of droplet propagation in the semiconductor fab is most affected by the presence or absence of wearing a mask and the line air dilution rate has some influence. when worn it spreads within 0.35~1m, and since the humidity is constant the virus can survive in the air for up to 3 hours. as a result the semiconductor fab is judged to be and effective space to block virus propagation due to the special environmental condition of a clean room.

• Current Optics and Photonics
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• 제7권1호
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• pp.1-14
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• 2023

Wavefront-coding imaging can achieve high-quality imaging along with a wide range of defocus. In this paper, the anti-laser detection and damage performance of wavefront-coding imaging systems using different asymmetric phase masks are studied, through modeling and simulation. Based on FresnelKirchhoff diffraction theory, the laser-propagation model of the wavefront-coding imaging system is established. The model uses defocus distance rather than wave aberration to characterize the degree of defocus of an imaging system. Then, based on a given defocus range, an optimization method based on Fisher information is used to determine the optimal phase-mask parameters. Finally, the anti-laser detection and damage performance of asymmetric phase masks at different defocus distances and propagation distances are simulated and analyzed. When studying the influence of defocus distance, compared to conventional imaging, the maximum single-pixel receiving power and echo-detection receiving power of asymmetric phase masks are reduced by about one and two orders of magnitude respectively. When exploring the influence of propagation distance, the maximum single-pixel receiving power of asymmetric phase masks decreases by about one order of magnitude and remains stable, and the echodetection receiving power gradually decreases with increasing propagation distance, until it approaches zero.

• 대한전자공학회논문지
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• 제18권4호
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• pp.34-42
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• 1981

PMOS집적기술을 이용하여 512-Bit mask programmable ROM을 설계하고 제작하였다. ROM의 내용은 제작공정에서 gate pattern으로 기억시켰으며 chip의 출력을 512(32×16)개의 점의 행렬로써 오실로스코프에 나타내어 확인하였다. 제작된 chip은 -6V와 - l2V의 범위에서 정상적으로 동작하였다 소모전력과 전달지연시간은 -6V에서 각각 3mW와 13μsec였다. -12V에서는 소모전력이 27mW로 증가하였으며 전달지연시간은 3μsec로 감소하였다. Chip의 출력은 TTL gate의 인력을 직접 구동시킬 수 있었으며 chip select에 의하여 출력을 disable 시켰을 때는 높은 임피던스 상태를 유지하였다.

• 제어로봇시스템학회논문지
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• 제9권5호
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• pp.361-367
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• 2003

We propose an algorithm to detect the face region using a variable ellipsoidal mask and a neural network. Since outlines of human faces are similar to ellipsoid, the ellipsoidal mask that has the fixed ratio of major and minor axis can be used to detect the candidate area. The positions of eyes and lips are extracted in this candidate area, and then the morphological analysis is applied to make features which are consist of six parameters, such as the geometrical ratio of eyes and lips. A back-propagation neural network is used as a classifier to determine the most possible face region. The experimental result is conducted to verify its efficiency compared with those of previous works.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 2002년도 하계종합학술대회 논문집(3)
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• pp.87-90
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• 2002

This paper has been studied a new approach using neural network to detect false laser marks. In the proposed approach, input images are segmented into R, G and B colors and implements mask areas respectively. And then average and variation values of the each mask area are extracted for the learning process to minimize input nodes. Using this technique, the new input data is obtained and implemented to the back-propagation algorithm using multi layer perception. This paper reduces the computational complexity necessary and shows better effectiveness to inspect false laser marks.

• 대한전자공학회논문지SP
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• 제47권1호
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• pp.9-16
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• 2010

이동 객체 검출은 입력 영상에서 배경과 다른 전경 객체를 찾는 것을 말하는 것으로 지능 영상 감시, HCI, 객체 기반 영상 압축 등의 여러 영상 처리 응용 분야에서 필요한 과정이다. 기존의 이동 객체 검출 알고리즘은 상당한 계산량을 요구하여 다채널 영상 감시 응용, 또는 임베디드 시스템에서의 단일 채널의 실시간 응용에 사용하는 데 애로가 많다. 보다 정확한 이동 객체 검출을 위하여 필요한 과정인 전경 마스크 정정은 보통 열림, 닫힘 등의 모폴로지 연산을 통해 수행된다. 모폴로지 연산은 계산량이 적지 않고 게다가 프로세싱 방법이 달라 이동 객체 검출의 다음 단계인 연결 요소 레이블링 루틴과 동시에 처리되기 어렵다. 본 논문에서는 먼저 모폴로지 연산과는 달리 연결 요소 레이블링 루틴에서 사용되는 주변 픽셀 점검 과정을 활용한 전경 마스크 정정 알고리즘인 "주변 전경 픽셀 전파"을 고안하고, 이를 활용하여 전경 마스크 정정과 연결 요소 레이블링이 동시에 수행될 수 있는 이동 객체 검출 방법을 제안한다. 실험을 통해, 제안된 이동 객체 검출 방법이 기존의 모폴로지 연산을 사용한 방법 보다 정확하게 이동 객체를 검출하였으며, 대상 실험 영상 프레임 및 비디오에 대해서는 최소 4배 이상 신속하게 처리됨을 확인하였다.

• JSTS:Journal of Semiconductor Technology and Science
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• 제10권2호
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• pp.134-142
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• 2010

A comparative study on the trade-off between the drive current and the total gate capacitance in double-gate (DG) and triple-gate (TG) FinFETs is performed by using 3-D device simulation. As the first result, we found that the optimum ratio of the hardmask oxide thickness ($T_{mask}$) to the sidewall oxide thickness ($T_{ox}$) is $T_{mask}/T_{ox}$=10/2 nm for the minimum logic delay ($\tau$) while $T_{mask}/T_{ox}$=5/1~2 nm for the maximum intrinsic gate capacitance coupling ratio (ICR) with the fixed channel length ($L_G$) and the fin width ($W_{fin}$) under the short channel effect criterion. It means that the TG FinFET is not under the optimal condition in terms of the circuit performance. Second, under optimized $T_{mask}/T_{ox}$, the propagation delay ($\tau$) decreases with the increasing fin height $H_{fin}$. It means that the FinFET-based logic circuit operation goes into the drive current-dominant regime rather than the input gate load capacitance-dominant regime as $H_{fin}$ increases. In the end, the sensitivity of $\Delta\tau/{\Delta}H_{fin}$ or ${{\Delta}I_{ON}}'/{\Delta}H_{fin}$ decreases as $L_G/W_{fin}$ is scaled-down. However, $W_{fin}$ should be carefully designed especially in circuits that are strongly influenced by the self-capacitance or a physical layout because the scaling of $W_{fin}$ is followed by the increase of the self-capacitance portion in the total load capacitance.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2003년도 춘계학술대회 논문집
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• pp.434-437
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• 2003

Evaluation or the patterning accuracy of e-beam lithography machines requires a high precision inspection system that is capable of measuring the true xy-locations of fiducial marks generated by the e-beam machine under test. Fiducial marks are fabricated on a single photo mask over the entire working area in the form of equally spaced two-dimensional grids. In performing the evaluation, the principles of self-calibration enable to determine the deviations of fiducial marks from their nominal xy-locations precisely, not being affected by the motion errors of the inspection system itself. It is. however, the fact that only repeatable motion errors can be eliminated, while random motion errors encountered in probing the locations of fiducial marks are not removed. Even worse, a random error occurring from the measurement of a single mark propagates and affects in determining locations of other marks, which phenomenon in fact limits the ultimate calibration accuracy of e-beam machines. In this paper, we describe an uncertainty analysis that has been made to investigate how random errors affect the final result of self-calibration of e-beam machines when one uses an optical inspection system equipped with high-resolution microscope objectives and a precision xy-stages. The guide of uncertainty analysis recommended by the International Organization for Standardization is faithfully followed along with necessary sensitivity analysis. The uncertainty analysis reveals that among the dominant components of the patterning accuracy of e-beam lithography, the rotationally symmetrical component is most significantly affected by random errors, whose propagation becomes more severe in a cascading manner as the number of fiducial marks increases

• 대한전자공학회논문지SD
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• 제47권4호
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• pp.20-25
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• 2010

평판형 rib 도파로의 설계 및 공정기술을 바탕으로 632.8 nm에서 동작하는 집적 마흐젠더 간섭계 센서(Mach-Zehnder interferometric sensor)를 제작하였다. 단일모드와 높은 감도의 두 가지 조건을 고려하여 실리카 계열($SiO_2-SiO_xN_y-SiO_2$) rib 도파로를 설계하였고 박막증착, 사진제판, RIE (Reactive Ion Etching)와 같은 반도체 공정들을 이용해 그 기하학적 구조를 구현하였다. 제작된 rib 도파로의 광출력을 cut-back방법으로 분석한 결과, 약 4.82 dB/cm의 전파손실을 측정하였다. 동시에 크롬 식각방지 층 공정을 도입하여 마흐젠더 간섭계 칩 위에 감지영역(sensing zone)을 형상화할 때 발생하는 코어 층 손상을 방지하였다. 제작된 마흐젠더 간섭계 센서를 이용한 증류수/에탄올 혼합물 굴절률 측정실험을 통해 약 $\pi$/($4.04{\times}10^{-3}$)의 소자 감도(sensitivity)를 최종 확인하였다.