• 대한통합의학회지
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• 제7권3호
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• pp.85-94
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• 2019

Purpose: The purpose of this study was to observe the degree of mask contamination in dental hygienist for general and oral bacteria and to identify areas of mask contamination after treatment. Methods: Masks were collected with every fifty dental hygienists who currently working in the department of preventive dentistry, prosthodontics, and orthodontics in Busan. The mask bacteria were collected in specific upper and side parts of the mask. Hand germs were collected using sterile cotton swabs, and then placed in a sterile conical tube. These were transferred to the laboratory. Hand germs and mask bacteria were incubated with nutrient broth (NB) and brain heart infusion broth (BHI) for 24 hrs and each cultured with NB and BHI plate at $37^{\circ}C$ for 48 hrs. Collected data were analyzed using the SPSS Window 20. Results: The number of bacteria was observed in the order of the department of preventive dentistry ($10.1{\times}10^5CFU/ml$), prosthodontics ($14.7{\times}10^5CFU/ml$), and orthodontics ($23.3{\times}10^5CFU/ml$) in the hand. In general bacteria, the difference of contamination was seen by the parts of the mask, but there was no significant difference. However, the oral bacteria were observed highly contaminated upper part of the mask in preventive dentistry. The mask contamination according to the medical departments was observed. Especially, the contamination of mask in preventive dentistry was significantly higher than other departments in oral bacteria. Conclusion: This study suggested that correct mask replacement and recognition of contamination areas can contribute to the prevention of infectious disease. and it would be necessary to increase hand hygiene performance to prevent cross-infection with masks. Also, this study may give an idea for making guidelines for mask management and supporting to establish clear criteria for the education program of personal protective equipment.

• 한국재료학회지
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• 제28권4호
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• pp.208-213
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• 2018

Epitaxial ($11{\bar{2}}0$) a-plane GaN films were grown on a ($1{\bar{1}}02$) R-plane sapphire substrate with photoresist (PR) masks using metal organic chemical vapor deposition (MOCVD). The PR mask with striped patterns was prepared using an ex-situ lithography process, whereas carbonization and heat treatment of the PR mask were carried out using an in-situ MOCVD. The heat treatment of the PR mask was continuously conducted in ambient $H_2/NH_3$ mixture gas at $1140^{\circ}C$ after carbonization by the pyrolysis in ambient $H_2$ at $1100^{\circ}C$. As the time of the heat treatment progressed, the striped patterns of the carbonized PR mask shrank. The heat treatment of the carbonized PR mask facilitated epitaxial lateral overgrowth (ELO) of a-plane GaN films without carbon contamination on the R-plane sapphire substrate. Thhe surface morphology of a-plane GaN films was investigated by scanning electron microscopy and atomic force microscopy. The structural characteristics of a-plane GaN films on an R-plane sapphire substrate were evaluated by ${\omega}-2{\theta}$ high-resolution X-ray diffraction. The a-plane GaN films were characterized by X-ray photoelectron spectroscopy (XPS) to determine carbon contamination from carbonized PR masks in the GaN film bulk. After $Ar^+$ ion etching, XPS spectra indicated that carbon contamination exists only in the surface region. Finally, the heat treatment of carbonized PR masks was used to grow high-quality a-plane GaN films without carbon contamination. This approach showed the promising potential of the ELO process by using a PR mask.

• 대한의생명과학회지
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• 제28권4호
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• pp.317-321
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• 2022

Due to COVID-19 pandemic, wearing face masks is obligatory to prevent respiratory virus transmissions in the community. However, there are few studies of the desirable number of wearing a face mask, and how to store them for reuse. Therefore, in this study, a survey was conducted among 208 healthy adults, and 27 kf-94 masks worn for 1, 2, and 3 days were collected. To estimate the risk of bacterial contamination, we analyzed the extent of bacterial contamination of the BHI medium and 16S rRNA gene sequencing. With an increase in the number of days of using the mask, the degree of bacterial contamination of the used mask gradually increased. As a result of 16S rRNA PCR performed for strain identification, Staphylococcus, known as a pathogenic bacterium, was identified the most. In conclusion, we found that wearing a cotton KF mask provides an optimal environment for microbes, which are related to the skin and respiratory system, to thrive. Therefore, it is also important to reduce the risk of bacterial infection of the face mask with appropriate sterilization methods.

• 한국산업보건학회지
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• 제33권4호
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• pp.395-402
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• 2023

Objectives: Microbial contamination of face masks used by healthcare professionals can vary depending on the degree of exposure to bioaerosols in various healthcare environments. However, research on this topic is limited. Therefore, we analyzed microbial contamination of N95 respirators used in hospital offices, wards, and outpatient settings. Methods: Samples isolated from N95 respirators worn for 2, 4, and 6 hours were incubated at a temperature of 35-37℃ or 25-28℃ for 24 hours or for 3-7 days, and colony-forming units were counted in chocolate agar, tryptic soy agar, and Sabouraud dextrose agar plates. Total indoor airborne bacteria were also measured in the healthcare environments. Finally, microbial species were identified using Gram staining with a microscopic speculum. Results: The three types of environments did not deviate from the maintenance of standard indoor air quality. There was no difference between the microbial species identified in the healthcare environment and mask contamination. However, the number of bacteria in the masks worn in each environment differed, and the degree of contamination increased with mask-wearing time (p<0.05). Conclusions: Therefore, care must be taken to avoid recontamination of masks due to improper use and exposure to biological hazards in healthcare environments. In conclusion, scientific evidence is necessary for safe mask-wearing times. Based on the results of this study, we hope to conduct further research to establish guidelines for the safe use of face masks during respiratory disease epidemics.

• 한국산업보건학회지
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• 제31권4호
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• pp.427-439
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• 2021

Objectives: This study aims to investigate differences in microbial contamination according to the duration and environment of mask wearing. Methods: Forty-five participants were recruited from workers in an offices, multi-purpose facilities, and a schools. After wearing of KF94 mask for two. four, and six hours, the microorganisms adsorbed on the outer and inner layers of the mask were inoculated on BAP(Blood Agar Plate), Chocolate agar, and SDA plates. The bacterial count (CFUs: colony-forming units) cultured in each plate was measured and analyzed for changes in filtration efficiency. Results: The microbial contamination of masks worn in classrooms, offices, and multi-purpose facilities showed a significant difference depending on the environment (p<0.000). The measured CFUs increased significantly according to the time wearing the mask. The difference between the inner and outer layers of the mask was also significant (p<0.05). However, there was no statistical difference in the filtration efficiency of the masks by duration time (p=0.515). Conclusions: Masks worn by workers in the offices, multi-purpose facilities, and schools showed an increase of microbial contamination with the amount of time wearing the mask. The results indicate that the masks used in daily life may have adverse health effects if they are worn for a long time or reused over several days without the realizing that the masks can be contaminated with biological hazards. Guidelines on the safe threshold time for mask use should be established through further research.

• 한국전기전자재료학회논문지
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• 제21권2호
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• pp.111-117
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• 2008

We have studied surface roughness, contamination of impurity, bonding with some gas element, reflectance and zeta potential on masks to be generated or changed during photolithography/dry or wet etching process. Mask surface roughness was not changed after photolithography/dry etching process. But surface roughness was changed on some area under MoSi film of Cr/MoSi/Qz. There was not detected any impurity on mask surface after plasma dry etching process. Reflectance of mask was increased after variable plasma etching treatment, especially when mask was treated with plasma including $O_2$ gas. Blank mask was positively charged when the mask was treated with Cr plasma etching gas($Cl_2:250$ sccm/He:20 $sccm/O_2:29$ seem, source power:100 W/bias power:20 W, 300 sec). But this positive charge was changed to negative charge when the mask was treated with $CF_4$ gas for MoSi plasma etching, resulting better wet cleaning. There was appeared with negative charge on MoSi/Qz mask treated with Cr plasma etching process condition, and this mask was measured with more negative after SC-1 wet cleaning process, resulting better wet cleaning. This mask was charged with positive after treatment with $O_2$ plasma again, resulting bad wet cleaning condition.

• 한국콘텐츠학회:학술대회논문집
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• 한국콘텐츠학회 2017년도 춘계 종합학술대회 논문집
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• pp.385-386
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• 2017

진단을 위해 조영제를 연속해서 사용하는 검사는, 첫 번째 주입으로 인해 조영제가 영상에 미치는 효과를 고려해야 한다. 본 연구에서는 mask 영상의 획득 시점을 통해 이를 개선하고자, 관류영상 획득 후 조영영상을 감산하는 새로운 방법을 제시하여, 혈관 겹침의 원인이 정맥의 신호강도를 유의하게 감소시켰다. 따라서, 본 연구의 방법을 이용하면, 복잡한 재구성이나 추가적인 기법 없이도, 효율적으로 정맥신호를 제거 할 수 있어 유용하리라 사료된다.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.I
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• pp.598-601
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• 2005

Z-correction is new method to be used when measuring pattern registration of photomasks. The method is based on measurement of the plate profile in the Zaxis and takes into account the impact on the registration deviations caused by plate support, contamination as well as the photomask flatness itself. Z-correction further facilitates a more neutral way of judging the overlay properties between individual photomasks within a mask set.

• 한국의류산업학회지
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• 제22권6호
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• pp.826-833
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• 2020

When it is necessary to wear masks for long periods, such as during the current COVID-19 pandemic, the essential function of masks to prevent contamination (or transmission to others) as well as comfortableness are important. For this study, we used three-dimensional (3D) facial measurements of adult women to compile basic face shape data for designing comfortable and effective masks. This study analyzed the 3D facial data of 127 subjects in their 20s to 30s of the 6th Size Korea. Factor analysis of the survey data produced seven factors that formed the composition of adult female faces. These factors combined to produce three facial types: square (long face and a large lower middle face), oval (smallest central and lower body in the middle), and triangle (short face with a small central and lower large nose). These types reflect that the facial types of adult women show the differences in the nose angle, nose length, bitragion-subnasal arc, bitragion-menton arc. Therefore, properly fitting masks for fine dust particle filtration require 3D customization of a mask's breathing apparatus to fit differently shaped central and lower face parts that interfere with mask fit.

• 문화기술의 융합
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• 제8권1호
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• pp.591-596
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• 2022

WHO에서 다양한 코로나19 방역지침과 국가별로 조치가 취해지고 있지만, 확진 자는 크게 감소되지 않고 있다. 개인의 비말을 통해 코로나가 유입 및 유출되는 것을 방지하기 위해 언제 어디서나 마스크착용을 의무화하고 있다. 그렇지만 마스크에 들어온 바이러스세균들이 증폭되면서 마스크를 오염시키고, 역겨운 냄새를 유발한다. 본 논문에서는 장시간 사용한 마스크에 유입된 코로나세균을 치과용 가걸 수의 스프레이로 마스크를 살균하는 방법으로 코로나전파를 예방하는 새로운 방법을 제안하였다. 치과용 가걸 수는 보통 수돗물의 전기 분해로 생성되는데, 물에 녹아있는 불안정 상태의 이온 수(HOCl)가 각종바이러스의 세포장벽에 침투하여 그 핵의 작용을 무산시켜 물의 자정작용을 일으킨다. 실험결과 장시간 사용한 마스크를 가걸 수의 스프레이로 세척하였을 때, 세척된 마스크는 10분 후에 건조되었고, 바이러스 비말이나 침 냄새가 거의 사라졌다. 특히 마스크세정에 참여한 피험자들에게 그 착용감을 MOS테스트한 결과 평균 4.4로 우수하게 얻어졌다. 따라서 마스크가 1회 용이었지만, 하루에 2회 이상 제안한 방법으로 스프레이 세척하게 되면, 그 마스크를 1주일 이상 쾌적한 상태로 사용할 수 있게 되었다.