• 제목/요약/키워드: MOCVD method

검색결과 121건 처리시간 0.024초

MOCVD 방식으로 증착한 Cu 박막의 Electromigration 특성 (Characteristics of electromigration in Cu thin films deposited by MOCVD method)

  • 이정환;이원석;이종현;최시영
    • 대한전자공학회:학술대회논문집
    • /
    • 대한전자공학회 1999년도 하계종합학술대회 논문집
    • /
    • pp.279-282
    • /
    • 1999
  • Acceleration in integration density and speed performance of ULSI circuits require miniaturization of CMOS and interconnections as well as higher current density capabilities for transistors. A leading candidate to substitute A1-alloy is Cu, which has lower resistivity and higher melting point. So we can expect much higher electromigration resistance. In this paper, we are going to explain the major features of EM for MOCVD Cu according to variant conditions. We compared the life time and activation energy of MOCVD Cu with those of E-beam Cu and Al in The same conditions.

  • PDF

양축정렬된 textured Ni 기판위에 MOCVD법을 이용한 YBCO coated conductor 완충층용 NiO 증착 (Deposition of NiO on hi-axially textured Ni substrates fort YBCO coated conductor by a MOCVD method)

  • 선종원;김형섭;박순동;정충환;전병혁;김잔중
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 2002년도 하계학술대회 논문집
    • /
    • pp.531-534
    • /
    • 2002
  • NiO buffer layers for YBCO coated conductors were deposited on hi-axially textured Ni substrates by MOCVD(metal organic chemical vapor deposition) method, using single solution source. To establish the processing condition, oxygen partial pressure and deposition temperature were changed. The surface orientation and degree of texture were estimated by X-ray diffraction, X-ray pole figure and atomic force microscopy. The FWHMs of in-plane and out-of-plane of the NiO films were about 10$^{\circ}$. The surface roughness was a function of deposition temperature. The AFM surface roughness of NiO films is in the range of 3∼10 nm, when NiO films was grown at 450∼530$^{\circ}C$.

  • PDF

MOCVD (metal organic chemical vapor deposition)법으로 제조한 YBCO 초전도 coated conductors (YBCO coated conductors fabricated by a MOCVD (metal organic chemical vapor deposition) method)

  • 김찬중;전병혁;최준규;선종원;김호진
    • 한국초전도저온공학회:학술대회논문집
    • /
    • 한국초전도저온공학회 2003년도 추계학술대회 논문집
    • /
    • pp.21-23
    • /
    • 2003
  • MOCVD method is one of promising techniques which can fabricate YBCO coated conductors in a low Price A continuous reel-to-reel MOCVD device using a dispersed solid source was designed and manufactured. YBCO films were deposited on various substrates of metallic silver, (100) MgO and SrTiO3 single crystals. The chemical composition of the metal organic sources was changed to optimize the processing condition associate to the deposition of the stoichiometric Y3a2Cu3O7-y. We report the superconducting transition temperature, surface morphology and chemical composition of the YBCO film surfaces.

  • PDF

Preparation of SnS Thin Films by MOCVD Method Using Single Source Precursor, Bis(3-mercapto-1-propanethiolato) Sn(II)

  • Park, Jong-Pil;Song, Mi-Yeon;Jung, Won-Mok;Lee, Won-Young;Lee, Jin-Ho;Kim, Hang-Geun;Shim, Il-Wun
    • Bulletin of the Korean Chemical Society
    • /
    • 제33권10호
    • /
    • pp.3383-3386
    • /
    • 2012
  • SnS thin films were deposited on glasses through metal organic chemical vapor deposition (MOCVD) method at relatively mild conditions, using bis(3-mercapto-1-propanethiolato) tin(II) precursor without toxic $H_2S$ gas. The MOCVD process was carried out in the temperature range of $300-400^{\circ}C$ and the average grain size in fabricated SnS films was about 500 nm. The optical band gap of the SnS film was about 1.3 eV which is in optimal range for harvesting solar radiation energy. The precursor and SnS films were characterized through infrared spectroscopy, nuclear magnetic resonance spectroscopy, DIP-EI mass spectroscopy, elemental analyses, thermal analysis, X-ray diffraction, and field emission scanning electron microscopic analyses.

MOCVD를 이용한 GaAs 박막의 에피성장 (Epitaxial Growth of GaAs Thin Films Using MOCVD)

  • 소명기
    • 산업기술연구
    • /
    • 제24권B호
    • /
    • pp.59-64
    • /
    • 2004
  • GaAs thin films were grown epitaxially by MOCVD method on (001) GaAs substrate. And as a surfactant, Bi(bismuth) thin films were deposited on GaAs buffer layer by using TMBi(trimethylbismuth) source. In-situ reflectance difference spectroscopy(RDS) was used to monitor the surface reconstruction of GaAs and Bi thin films. As the results, under the exposure of TBAs(tertiarybuthylarsine) and hydrogen atmosphere, the surface reconstruction of GaAs was changed from As-rich c($4{\times}4$) to As-rich ($2{\times}4$), which was due to the adsoption and desorption of As dimers. The first bismuth surface related RDS signal was reported. At the deposition temperature of $450^{\circ}C$, Bi-terminated GaAs surface showed the RDS spectrum similar to that of Sb-terminated GaAs surface, possibly a ($2{\times}4$) surface. And Bi surface layers were rapidly evaporated with increasing the deposition temperature($550^{\circ}C$), finally becoming As-terminated ($2{\times}4$) surface.

  • PDF

Fabrication of $Yb_2O_3$ Films by MOCVD Method

  • Jung, Woo-Young;Jun, Byung-Hyuk;Park, Hai-Woong;Hong, Gye-Won;Kim, Chan-Joong
    • 한국초전도학회:학술대회논문집
    • /
    • 한국초전도학회 2006년도 High Temperature Superconductivity Vol.XVI
    • /
    • pp.71-71
    • /
    • 2006
  • PDF