• Journal of Sensor Science and Technology
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• v.5 no.6
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• pp.60-67
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• 1996

The interfacial electrical properties of InSb MIS structure with low temperature remote PECVD $SiO_{2}$ have been characterized. The interlace-state density at mid-bandgap of the MIS structure was about $1{\sim}2{\times}10^{11}\;cm^{-2}eV^{-1}$, when the $SiO_{2}$ film was deposited at $105^{\circ}C$. However, large amount of interlace states and trap states were observed in the MIS structure fabricated at temperatures above $105^{\circ}C$. The time constant of $10^{-4}{\sim}10^{-5}\;sec$ of interface states was extracted from G- V measurement. As the deposition temperature increased, the hysteresis of C- V curves were increased due to the high trap density.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.11 no.1
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• pp.38-42
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• 2001

Electric and dielectric(Ba,Sr)$TiO_3$[BST] thin films for emtal-Insulator-Semiconductor(MIS) capacitors have been studied. BST thin films wre deposted on p-Si(100) substrates bythe RF magnetron sputtering with tempratue range of 500~$600^{\circ}C$. The dielectric properties of MIS capacitors consisting of Al/BST/$SiO_2$/Si sandwich structure were evaluated ot redcue the leakage current density. The charge state densities of the MIS capacitors were determined by high frequency (1 MHz) C-V measurement. In order to reduce the leakage current in MIS capacitor, high quality $SiO_2$ layer was deposited on bare p-Si substrate. Depending on the oxygen pressure and substrate temperature both positive and negative polarities of effective oxide charge in the MIS capacitors were evaluated. It is considered that the density of electronic states, generated at the BST/$SiO_2$/p-Si interface due to the asymmetric structure within BST/$SiO_2$/Si structure, and the oxygen vacancy content has influence on the behavior of oxide charge.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.14 no.3
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• pp.90-94
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• 2004

The variation of electrical properties of (Ba,Sr)$TiO_3$ [BST] thin films for Metal-Insulator-Semiconductor (MIS) capacitors was investigated. BST thin films were deposited on p-Si(100) substrates by the RF magnetron sputtering with temperature range of 500~$600^{\circ}C$. The dielectric properties of MIS capacitors consisting of AUBST/$SiO_2$/Si sandwich structure were measured for various conditions. We examined the characteristics of MIS capacitor with various oxygen pressure, substrate temperature and (Ba+Sr)/Ti ratio. It was found that the leakage current was reduced in MIS capacitor with high quality $SiO_2$ layer was grown on bare p-Si substrate by thermal oxidation. The BST MIS structure showed relatively high capacitance even though it is the combination of high-dielectric BST thin films and $SiO_2$ layer. The charge state densities of the MIS capacitors and Current-voltage characteristics of the MIS capacitor were investigated. By applying $SiO_2$ layer between BST thin films and Si substrate, low leakage current of $10^{-10}$ order was observed.

• Journal of the Institute of Electronics Engineers of Korea TC
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• v.47 no.8
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• pp.61-67
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• 2010

A characterization procedure for analyzing symmetric coupled MIS(Metal-Insulator-Semiconductor) transmission line is used the same procedure as a general single layer symmetric coupled line with perfect dielectric substrate from the extraction of the characteristic impedance and propagation constant for even- and odd-mode. In this paper, an analysis for a new substrate shielding symmetric coupled MIS structure consisting of grounded crossbar at the interface between Si and SiO2 layer using the Finite-Difference Time-Domain (FDTD) method is presented. In order to reduce the substrate effects on the transmission line characteristics, a shielding structure consisting of grounded crossbar lines over time-domain signal has been examined. Symmetric coupled MIS transmission line parameters for even- and odd-mode are investigated as the functions of frequency, and the extracted distributed frequency-dependent transmission line parameters and corresponding equivalent circuit parameters as well as quality factor for the new MIS crossbar embedded structure are also presented. It is shown that the quality factor of the symmetric coupled transmission line can be improved without significant change in the characteristic impedance and effective dielectric constant.

• Journal of IKEEE
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• v.18 no.4
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• pp.620-624
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• 2014

In this study, the electrical characteristics of Ni/CNT/$SiO_2$ structures were investigated in order to analyze the mechanism of carbon nanotubes in 4H-SiC MIS device structures. We fabricated 4H-SiC MIS capacitors with or without carbon nanotubes. Carbon nanotubes were dispersed by isopropyl alcohol. The capacitance-voltage (C-V) is characterized at 300 to 500K. The experimental flat-band voltage ($V_{FB}$) shift was positive. Near-interface trapped charge density and oxide trapped charge density values of Ni/CNT/$SiO_2$ structure were less than values of reference samples. With increasing temperature, the flat-band voltage was negative. It has been found that its oxide quality is related to charge carriers or defect states in the interface of 4H-SiC MIS capacitors. Gate characteristics of 4H-SiC MIS capacitors can be controlled by carbon nanotubes between Ni and $SiO_2$.

• Asia pacific journal of information systems
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• v.7 no.3
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• pp.145-165
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• 1997

Thie study examines MIS researchers, research themes, methodology, and intellectual structure in order to analyze general research patterns in the field of MIS. The methods used for this study are subject analysis of the journal articles, citation analysis, and author co-citation analysis, The source articles are all the papers in $\lceil$Journal of Korean MIS Society$\rfloor$ and MIS papers in $\lceil$Korean Management Review$\rfloor$ and $\lceil$Journal of Korean MS/OR Society$\rfloor$. In results, core journals in MIS are MIS Quarterly, Management Science, and Communications of ACM. Core authors inlcude Ives, DeSanctis, Ginzberg, Lucas, Rockart, and Davis. The major areas in Korean MIS research turn out to be information system management, DSS/GDSS strategic information systems and AI applications.

• Journal of the Korea Institute of Military Science and Technology
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• v.4 no.2
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• pp.122-129
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• 2001

A characterization procedure for analyzing symmetric coupled MIS(Metal-Insulator-Semiconductor) transmission line is used the same procedure as a general single layer symmetric coupled line with perfect dielectric substrate from the extraction of the characteristic impedance and propagation constant for even- and odd-mode. In this paper, an analysis for a new substrate shielding symmetric coupled MIS structure consisting of grounded crossbar at the interface between Si and SiO2 layer using the Finite- Difference Time-Domain(FDTD) method is presented. In order to reduce the substrate effects on the transmission line characteristics, a shielding structure consisting of grounded crossbar lines over time-domain signal has been examined. Symmetric coupled MIS transmission line parameters for even- and odd-mode are investigated as the functions of frequency, and the extracted distributed frequency- dependent transmission line parameters and corresponding equivalent circuit parameters as well as quality factor for the new MIS crossbar embedded structure are also presented. It is shown that the quality factor of the symmetric coupled transmission line can be improved without significant change in the characteristic impedance and effective dielectric constant.

• Journal of the Institute of Electronics Engineers of Korea TC
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• v.48 no.12
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• pp.35-41
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• 2011

In this paper, an analysis for a new substrate shielding symmetric coupled MIS structure consisting of grounded crossbar at the interface between Si and SiO2 layer using the Finite-Difference Time-Domain(FDTD) method is presented. In order to reduce the substrate effects on the transmission line characteristics, a shielding structure consisting of grounded crossbar lines over time-domain signal has been examined. Parameters of symmetric coupled MIS transmission line with various gaps between crossbars for even- and odd-mode are investigated as the functions of frequency, and the extracted distributed frequency-dependent transmission line parameters and corresponding equivalent circuit parameters as well as quality factor for the new MIS crossbar embedded structure are also presented. It is shown that the quality factor of the symmetric coupled transmission line can be improved without significant change in the characteristic impedance and effective dielectric constant.

• Management & Information Systems Review
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• v.3
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• pp.399-417
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• 1999

The purpose of this paper id to study the factors influencing MIS user satisfaction. For this purpose. I have reviewed the results of past studies on the performance factor of MIS, and introduced a new model associated with small & Medium Business. On the basis of this model, I have hypothesized that the following variables influence user satisfaction : (gender, age), individual characteristics(user attitude, training for user), managerial characteristic(top management involvement, organizational support) and task characteristics(task structure). There were 195 participants surveyed using questionnaires from 25 different small & medium Business in Pusan. The research model and associated hypotheses were tested by following statistical techniques: reliability test, regression, t-test and ANOVA. The findings of this study are follows; 1. It was found that gender and age are not correlated user satisfaction. 2. Among individual characteristics, only user attitude influence user satisfaction significantly. 3. While organizational supports influence positively user satisfaction, top management involvement do not influence it. 4. Task structure is highly correlated with user satisfaction. In spite of many factors affecting MIS success, this study did not consider all variables affect on user satisfaction. We need integrated model including more various factors.

• Journal of the Institute of Electronics Engineers of Korea TC
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• v.43 no.12 s.354
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• pp.83-88
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• 2006

In this paper, we propose a new cross bar embedded structure for improvement of attenuation characteristics along the different lossy media. A general characterization procedure based on the extraction of the characteristic impedance and propagation constant for analyzing a single MIS(Metal-Insulator-Semiconductor) transmission line used and an analysis for a new substrate shielding MIS structure consisting of grounded crossbars at the interface between Si and Sio2 layer using the Finite-Difference Time-Domain(FDTD) technique is used. In order to reduce the substrate effects on the transmission line characteristics, a shielding structure consisting of grounded cross bar lines over time-domain signal has been examined. The extracted, distributed frequency-dependent transmission line parameters as well as the line voltages and currents, and also corresponding equivalent circuit parameters have been examined as function of frequency. It is shown that the quality factor of the transmission line can be improved without significant changes in the characteristic impedance and effective dielectric constant.