• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2001.05a
• /
• pp.57-60
• /
• 2001

The characterization of organic Metal/Insulator/Metal(MIM) devices were investigated from LB films. The physicochemical properties of the LB films were by UV absorption spectrum and AFM. We give pressure stimulation into organic thin films and then manufacture a device under the accumulation condition that the state surface pressure is 2, 10, 30[mN/ml The stable images are probably due to a strong interaction between the monolayer film and glass substrate. We are unable to obtain molecule resolution in images of the films but did see a marked contrast between images of the bare substrate and those with the network structure film deposited onto it.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 1997.04a
• /
• pp.202-205
• /
• 1997

In this paper, we synthesized poly(N-(2-4-imidazolyl) ethyl) maleimide-alt-1-octadecene(IMI-O) polymer that can have function group and improvement of mechnical strength and then confirmed the possibility of molecular device made by LB method. Evaluation of LB film have been processed such as the technique of EA, $^{1}$H-NMR, FT-IR. Also, the deposition status was observed by SEM and Metal/Insulator/Metal(MIM) device was fabricated for investigation of electric properties. In our experimental results. The surface pressure for the solid state was investigated to 20~35[dyne/cm] by the $\pi$ -A isotherm and the limiting area was about 40 ~45 ($\AA$$^2$/molecule). The deposition status of LB films was confirmed by SEM. The conductivity of LB film was found to be 10$^{-14}$ ~10$^{-13}$ [S/cm] by I-V characteristic.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
• /
• 2007.06a
• /
• pp.218-220
• /
• 2007

유기박막트랜지스터(organic thin film transistor, OTFT)의 게이트 절연막으로 PVP(poly-4-vinylphenol) 물질을 이용하여 MIM (metal-insulator-metal) 구조의 캐패시터 소자를 제작하였다. 유기 절연층의 형성은 ITO/Glass 기판 위에 PVP를 용질로, PGMEA(propylene glycol monomethyl ether acetate)를 용매로 사용하였다. 또한 열경화성 수지인 poly(melamine-co-formaldehyde)를 사용하여 cross-linked PVP 절연막을 합성하여 스핀코팅법으로 소자를 형성하였다. 제작된 소자에 대해 절연막 두께에 따른 전기적 특성을 조사한 결과 300 nm 에서 500 nm로 두께가 증가할수록 누설전류는 10.69 nA 에서 0.1 nA 로 크게 감소하였다. 또한 캐패시터 소자의 정전용량은 300 nm 의 두께에서 1.05 nF 으로 500 nm 의 두께에서의 0.65 nF 과 비교하여 보다 양호한 특성이 나타났다.

• Korean Journal of Materials Research
• /
• v.15 no.2
• /
• pp.139-142
• /
• 2005

[ $ZrO_2$ ] gate dielectric thin films were deposited by radio frequency (rf)-magnetron sputtering and its structure, surface morphology and electrical peoperties were studied. As the oxygen flow rate increases, the surface becomes smoother. The experimental results indicate that a high temperature annealing is desirable since it improves the electrical properties of the $ZrO_2$ gate dielectric thin films by decreasing the number of interfacial traps at the $ZrO_2/Si$ interface. The carrier transport mechanism is dominated by the thermionic emission.

• Proceedings of the Korea Electromagnetic Engineering Society Conference
• /
• 2003.11a
• /
• pp.251-255
• /
• 2003

In this paper, a miniaturized directional coupler utilizing lumped element is proposed as a interdigital capacitor. The traditional miniaturization technique of transmission line realized a utilizing MIM(Metal-Insulator-Metal) capacitor on CPW(Coplanar Waveguide). However, we present a simplified design procedure without additional manufacturing process utilizing interdigital capacitor on microstrip with ease of design. The similar characteristics between the conventional directional coupler with ${\lambda}/4$ transmission line and the miniaturized directional coupler with ${\lambda}/8$ transmission line are validated through simulation and measurement results. Miniaturization rate of total size is about 25% while coupled line is about 60%. As a result, this proposed directional coupler can reduce the size of mobile communication system at 2 GHz.

• Proceedings of the KIEE Conference
• /
• 2000.07c
• /
• pp.1708-1710
• /
• 2000

The synthesis and characterization of polymers for organic Metal/Insulator/Metal(MIM) devices were investigated from LB films. The physicochemical properties of the LB films were examined by UV absorption spectrum and AFM. The AFM images showed for network structure of polyurethane monolayer that the film formed an unsymmetry mesh with intermolecular interaction within the large scale. The stable images are probably due to a strong interaction between the monolayer film and Si substrate. We are unable to obtain molecular resolution in images of the films but did see a marked contrast between images of the bare substrate and those with the network structure film deposited onto it.

• Proceedings of the KIEE Conference
• /
• 2006.07c
• /
• pp.1327-1329
• /
• 2006

We give pressure stimulation into organic thin films and then manufacture a device under the accumulation condition that the state surface pressure is 2, 10, 30[mN/m](gas state, liquid state, and solid state). The physicochemical properties of the LB films on the surface of pure water are studied by AFM. Also, we then examined of the Metal-Insulator-Metal(MIM) device by means of I-V.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2012.02a
• /
• pp.161-161
• /
• 2012

질화티타늄(Titanium Nitride, TiN)은 화학적 안정성이 우수하고, N/Ti 원소 비율에 따라 열전도성 및 전기전도성이 변화하는 특성을 가지고 있어서 Metal Insulator Silicon (MIS) 나 Metal Insulator Metal (MIM) capacitor의 metal electrode 물질로 적용되고 있다. $TiCl_4$와 $NH_3$ gas를 이용하여 $500^{\circ}C$ 이상의 고온 조건에서 Chemical Vapor Deposition (CVD) 법으로 TiN 박막을 증착하는 방식이 가장 널리 사용되고 있으나, TiN 박막 내의 Chlorine (Cl) 원소가 SiO2 두께와 누설전류 밀도를 증가시키는 요인으로 작용하므로 Cl의 거동 및 함량 제어를 통한 전기적인 특성의 향상 평가가 요구되고 있다[1-3]. 본 실험에서는 $SiO_2$ 위에 TiN을 적층 한 구조에서 magnetic sector type의 Secondary Ion Mass Spectrometry (SIMS)를 이용하여 Cl 원소의 검출도 개선 방법을 연구하였다. 일반적인 $Cs^+$ 이온을 이용하여 $Cl^-$ 이온을 검출할 경우에는 TiN 하부에 $SiO_2$가 존재함에 따른 charging effect와 mass interference가 발생되는 문제점이 관찰되었다. 이를 개선하기 위해 Cl과 Cs 원소가 결합된 $ClCs^+$ cluster ion을 검출하는 방법을 시도하였으나, Cl- 이온 검출 방식에 비해 오히려 낮은 검출도를 나타내었으나 Cl 원소가 속하는 halogen 족 원소의 높은 전자 친화도 특성을 이용한 $ClCs_2^+$ cluster ion을 검출하는 방법[4]을 적용한 경우에는 $ClCs^+$ 방식에 비해 검출도가 3order 개선되는 결과를 확보하였으며, 이 결과를 토대로 Cl dose ($atoms/cm^2$) 와 Rs (ohm/sq) 간의 상관 관계에 대해 고찰하고자 한다.

• Journal of the Semiconductor & Display Technology
• /
• v.6 no.4
• /
• pp.69-73
• /
• 2007

The MIM(metal-insulator-metal) capacitors with the Al/PMMA/ITO/Glass structures were manufactured according to various PMMA concentration of 1, 2, 4, 6, 8 wt%. The lowest leakage current and the largest capacitance were found to be 2.3 pA and 1.2 nF, respectively, for the device with 2 wt% PMMA concentration. The measured capacitance of the devices was almost same values with the calculated one. The optimum film thickness was obtained at the value of 48 nm, showing that the capacitance and leakage current were 1.92 nF, 0.3 pA at 2 wt%, respectively. From this experiment, the PMMA gate insulator films can be applicable to the organic thin film transistors.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2009.06a
• /
• pp.331-331
• /
• 2009

Hafnium oxide ($HfO_2$) attracted by one of the potential candidates for the replacement of si-based oxides. For applications of the high-k gate dielectric material, high thermodynamic stability and low interface-trap density are required. Furthermore, the amorphous film structure would be more effective to reduce the leakage current. To search the gate oxide materials, metal-insulator-metal (MIM) capacitors was fabricated by pulsed laser deposition (PLD) on indium tin oxide (ITO) coated glass with different oxygen pressures (30 and 50 mTorr) at room temperature, and they were deposited by Au/Ti metal as the top electrode patterned by conventional photolithography with an area of $3.14\times10^{-4}\;cm^2$. The results of XRD patterns indicate that all films have amorphous phase. Field emission scanning electron microscopy (FE-SEM) images show that the thickness of the $HfO_2$ films is typical 50 nm, and the grain size of the $HfO_2$ films increases as the oxygen pressure increases. The capacitance and leakage current of films were measured by a Agilent 4284A LCR meter and Keithley 4200 semiconductor parameter analyzer, respectively. Capacitance-voltage characteristics show that the capacitance at 1 MHz are 150 and 58 nF, and leakage current density of films indicate $7.8\times10^{-4}$ and $1.6\times10^{-3}\;A/cm^2$ grown at 30 and 50 mTorr, respectively. The optical properties of the $HfO_2$ films were demonstrated by UV-VIS spectrophotometer (Scinco, S-3100) having the wavelength from 190 to 900 nm. Because films show high transmittance (around 85 %), they are suitable as transparent devices.