• 제목/요약/키워드: MIM (Metal-Insulator-Metal)

검색결과 105건 처리시간 0.026초

Polyethersulfone(PES) 및 유리 기판위에 제작된 PVP 게이트 절연막의 전기적 특성 (Electrical Properties of PVP Gate Insulation Film on Polyethersulfone(PES) and Glass Substrates)

  • 신익섭;공수철;임현승;박형호;장호정
    • 마이크로전자및패키징학회지
    • /
    • 제14권1호
    • /
    • pp.27-31
    • /
    • 2007
  • 휨성 유기박막트랜지스터(organic thin film transistor, OTFT)를 제작하기 위하여 게이트 절연막으로 PVP(poly-4-vinylphenol) 유기막을 이용하여 MIM (metal-insulator-metal) 구조의 캐패시터 소자를 제작하였다. 유기 절연층의 형성은 Al/PES (polyethersulfone) 기판과 ITO/Glass 기판 위에 PVP를 용질로, PGMEA(propylene glycol monomethyl ether acetate)를 용매로 사용하였다 또한 열경화성 수지인 poly(melamine-co-(ormaldehyde)를 사용하여 cross-linked PVP 절연막을 합성하여 스핀코팅법으로 소자를 형성하였다. 제작된 소자에 대해 절연막 두께와 기판 종류에 따른 전기적 특성을 조사한 결과 Al/PES 기판을 사용하였을때 누설전류는 1.3 nA로 ITO/glass 기판을 사용했을때의 27.5 nA보다 크게 개선되었다. 또한 제작된 모든 캐패시터 소자의 정전용량은 $1.0{\sim}1.2nF/cm^2$ 범위로 나타났으며 계산값과 매우 유사한 결과를 얻을 수 있었다.

  • PDF

Fabrication of Metal-insulator-metal Capacitors with SiNx Thin Films Deposited by Plasma-enhanced Chemical Vapor Deposition

  • Wang, Cong;Kim, Nam-Young
    • Transactions on Electrical and Electronic Materials
    • /
    • 제10권5호
    • /
    • pp.147-151
    • /
    • 2009
  • For integrated passive device (IPD) applications, we have successfully developed and characterized metalinsulator-metal (MIM) capacitors with 2000 $\AA$ plasma-enhanced chemical vapor deposition (PECVD) silicon nitride which are deposited with the $SiH_4/NH_3$ gas mixing rate, working pressure, and RF power of PECVD at $250^{\circ}C$. Five PECVD process parameters are designed to lower the refractive index and lower the deposition rate of $Si_3N_4$ films for the high breakdown electric field. For the PECVD process condition of gas mixing rate (0.957), working pressure (0.9 Torr), and RF power (60 W), the atomic force microscopy (AFM) root mean square (RMS) value of about 2000 $\AA$ $Si_3N_4$ on the bottom metal is lowest at 0.862 nm and the breakdown electric field is highest at about 8.0 MV/cm with a capacitance density of 326.5 pF/$mm^2$. A pretreatment of metal electrodes is proposed, which can reduce the peeling of nitride in the harsh test environment of heat, pressure, and humidity.

Improved Plasmonic Filter, Ultra-Compact Demultiplexer, and Splitter

  • Rahimzadegan, Aso;Granpayeh, Nosrat;Hosseini, Seyyed Poorya
    • Journal of the Optical Society of Korea
    • /
    • 제18권3호
    • /
    • pp.261-273
    • /
    • 2014
  • In this paper, metal insulator metal (MIM) plasmonic slot cavity narrow band-pass filters (NBPFs) are studied. The metal and dielectric of the structures are silver (Ag) and air, respectively. To improve the quality factor and attenuation range, two novel NBPFs based on tapered structures and double cavity systems are proposed and numerically analyzed by using the two-dimensional (2-D) finite difference time domain (FDTD) method. The impact of different parameters on the transmission spectrum is scrutinized. We have shown that increasing the cavities' lengths increases the resonance wavelength in a linear relationship, and also increases the quality factor, and simultaneously the attenuation of the wave transmitted through the cavities. Furthermore, increasing the slope of tapers of the input and output waveguides decreases attenuation of the wave transmitted through the waveguide, but simultaneously decreases the quality factor, hence there should be a trade-off between loss and quality factor. However, the idea of adding tapers to the waveguides' discontinuities of the simple structure helps us to improve the device total performance, such as quality factor for the single cavity and attenuation range for the double cavity. According to the proposed NBPFs, two, three, and four-port power splitters functioning at 1320 nm and novel ultra-compact two-wavelength and triple-wavelength demultiplexers in the range of 1300-1550 nm are proposed and the impacts of different parameters on their performances are numerically investigated. The idea of using tapered waveguides at the structure discontinuities facilitates the design of ultra-compact demultiplexers and splitters.

금속이온 착체에 의한 IMI-O 고분잔 LB막의 전기적 특성 (Electrical Properties of IMI-O Polymer LB Films in Complexed Metal Ion)

  • 정상범;유승엽;박재철;권영수
    • 대한전기학회:학술대회논문집
    • /
    • 대한전기학회 1997년도 하계학술대회 논문집 C
    • /
    • pp.1519-1521
    • /
    • 1997
  • In this paper, poly (N-(2-4-imidazolyl) ethyl) maleimide-alt-1-octadecene (IMI-O) polymer which can complex metal ion was used to confirm the possibility of molecular device made by Langmuir-Blodgett method. Metal/Insulator/Metal (MIM) device was fabricated for investigation of electric properties. In the ${\pi}$-A isotherm, surface pressure at collapse point was different as to the molecular weight of metal ion complexed respectively, In I-V characteristics, currents of MiM devices were different at the same voltage. It was thought that phenomena was occurred by interaction between function group and metal ion.

  • PDF

Au/$Ta_2$$O_5$/Pt MIM Capacitor의 annealing과 유전 특성 (A Study on the Dielectric and Annealing Properties in Au/$Ta_2$$O_5$/Pt MIM Capacitor)

  • 김인성;정순종;송재성;윤문수;박정후
    • 한국전기전자재료학회논문지
    • /
    • 제14권12호
    • /
    • pp.1016-1022
    • /
    • 2001
  • This study presents the microstructure-electrical property relationship of reactive-sputtered Ta$_2$O$_{5}$ MIM capacitor structure processed by annealing in a vacuum and $O_2$ ambience. A microstructural investigation showed the existence of amorphous phase in as-deposited condition and the formation of preferentially oriented-Ta$_2$O$_{5}$ in $700^{\circ}C$ annealing. On annealing under the $O_2$ atmosphere, the Ta$_2$O$_{5}$ film exhibited the trend of its composition\`s approaching to stoichiometry from off-stoichiometry, analyzed by EPMA, the leakage current decrease and the enhanced temperature-capacitance characteristic stability. In the case of low temperature vacuum-annealing treatment, the leakage current behavior was stable irrespective of applied electric field. In the high temperature-annealed film at a vacuum condition, the electrical properties was observed to deteriorate. The results state that in Ta$_2$O$_{5}$ film annealed at $O_2$ atmosphere, gives rise to improvement of electrical characteristics in the capacitor were improved by reducing oxygen-vacancy and dandling Ta-O bond.-O bond.

  • PDF

Single-pixel Autofocus with Plasmonic Nanostructures

  • Seok, Godeun;Choi, Seunghwan;Kim, Yunkyung
    • Current Optics and Photonics
    • /
    • 제4권5호
    • /
    • pp.428-433
    • /
    • 2020
  • Recently, the on-chip autofocus (AF) function has become essential to the CMOS image sensor. An auto-focus usually operates using phase detection of the photocurrent difference from a pair of AF pixels that have focused or defocused. However, the phase-detection method requires a pair of AF pixels for comparison of readout. Therefore, the pixel variation may reduce AF performance. In this paper, we propose a color-selective AF pixel with a plasmonic nanostructure in a 0.9 μ㎡ pixel. The suggested AF pixel requires one pixel for AF function. The plasmonic nanostructure uses metal-insulator-metal (MIM) stack arrays instead of a color filter (CF). The color filters are formed at the subwavelength, and they transmit the specific wavelength of light according to the stack period and incident angles. For the optical analysis of the pixel, a finite-difference time-domain (FDTD) simulation was conducted. The analysis showed that the MIM stack arrays in the pixels perform as an AF pixel. As the primary metric of AF performance, the resulting AF contrasts are 1.8 for the red pixels, 1.6 for green, and 1.5 blue. Based on the simulation results, we confirmed the autofocusing performance of the MIM stack arrays.

Numerical Investigation of Tunable Band-pass\band-stop Plasmonic Filters with Hollow-core Circular Ring Resonator

  • Setayesh, Amir;Mirnaziry, Sayyed Reza;Abrishamian, Mohammad Sadegh
    • Journal of the Optical Society of Korea
    • /
    • 제15권1호
    • /
    • pp.82-89
    • /
    • 2011
  • In this paper, we numerically study both band-pass and band-stop plasmonic filters based on Metal-Insulator-Metal (MIM) waveguides and circular ring resonators. The band-pass filter consists of two MIM waveguides coupled to each other by a circular ring resonator. The band-stop filter is made up of an MIM waveguide coupled laterally to a circular ring resonator. The propagating modes of Surface Plasmon Polaritons (SPPs) are studied in these structures. By substituting a portion of the ring core with air, while the outer dimensions of the ring resonator are kept constant, we illustrate the possibility of red-shift in resonant wavelengths in order to tune the resonance modes of the proposed filters. This feature is useful for integrated circuits in which we have limitations on the outer dimensions of the filter structure and it is not possible to enlarge the dimension of the ring resonator to reach to longer resonant wavelengths. The results are obtained by a 2D finite-difference time-domain (FDTD) method. The introduced structures have potential applications in plasmonic integrated circuits and can be simply fabricated.

Variation of Dielectric Constant with Various Particle Size and Packing Density on Inkjet Printed Hybrid $BaTiO_3$ Films

  • Lim, Jong-Woo;Kim, Ji-Hoon;Yoon, Young-Joon;Yoon, Ho-Gyu;Kim, Jong-Hee
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 2010년도 하계학술대회 논문집
    • /
    • pp.271-271
    • /
    • 2010
  • $BaTiO_3$(BT) has high permittivity so that has been applied to dielectric and insulator materials in 3D system-level package integration. In order to achieve excellent performance of device, the BT layer should be highly dense. In this study, BT thick films were prepared by the inkjet printing method. And these films were cured at $280^{\circ}C$ after infiltration of polymer resin. As a result, we have successfully fabricated not only the inkjet-printed hybrid BT film but also metal-insulator-metal(MIM) capacitor without sintering process. Changes in the dielectric constant of BT hybrid film with particle size and packing density were investigated. The dielectric constant was increased with increasing packing density and particle size. Further, the BT hybrid film using two different size particles had even higher packing density and dielectric constant.

  • PDF

유기박막의 전기적 특성 연구 (A Study on Electrical Characteristics of Organic Thin Film)

  • 최용성;송진원;문종대;이경섭
    • 한국전기전자재료학회논문지
    • /
    • 제19권10호
    • /
    • pp.953-959
    • /
    • 2006
  • Langmuir-Blodgett(LB)layers of Arachidic acid deposited by LB method were deposited onto slide glass as Y-type film. The structure of manufactured device is Au/arachidic acid/Al, the number of accumulated layers are $9{\sim}21$. Also, we then examined of the Metal-Insulator-Metal(MIM) device by means of I-V. The I-V characteristics of the device are measured from -3 to +3 V. The insulation property of a thin film is better as the distance between electrodes is larger.

Flavin-Viologen 복합 LB막으로 구성된 분자광다이오드에서의 광유도 전자전달 (Photoinduced Electron Transfer in Molecular Photodiode Consisted of Flavin-Viologen Hetero-LB Films)

  • 김민진;최정우;정성욱;오세용;이원흥;신동명
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 1995년도 추계학술대회 논문집
    • /
    • pp.281-284
    • /
    • 1995
  • A molecular photodiode was fabricated with hetero-Langmuir-Blodgett (LB) film consisting of an electron accepter(A) and sensitizer. N-Allyl-N-[3-propylamido-N\",N\"-야(n-octadecyl)]-4,4-bipyridum Dibromide and 7,8-dimethyl-10-dodecyl isoalloxan-zine were used as A and S units, respectively. By aligning hefter-LB film of A/S units on ITO glass with an aluminium thin film, a molecular photodiode with the structure of Metal/Insulator/Metal(MIM) was constructed. Due to excitation by irradiation with a 460nm monochromatic light source, the photo-induced unidirectional flow of electrons in the MIM device could be achieved and was detected as photocurrents. The direction of energy flow was in accordance with the energy level profile across the LB films. The photo switching function was achieved and the rectifying characteristics was obserbed in the molecular devise.

  • PDF