• Title/Summary/Keyword: MEMS

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A Novel Cooling Method by Acoustic Streaming Induced by Ultrasonic Resonator (초음파 진동자에 의해 유도된 음향유동을 이용한 첨단 냉각법)

  • 노병국;이동렬
    • The Journal of the Acoustical Society of Korea
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    • v.22 no.3
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    • pp.217-223
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    • 2003
  • A novel cooling method induced by acoustic streaming generated by ultrasonic vibration at 30㎑ is presented. Ultrasonic vibration is obtained by piezoelectric devices and the maximum vibration amplitude of 50 m is achieved by including a horn, mechanical vibration amplifier in the system and making the complete system resonate. To investigate the enhancement of heat transfer capability of acoustic streaming, the temperature variations of heat source and air in the vicinity of heat source are measured in real-time. It is observed that acoustic streaming is instantly induced by ultrasonic vibration, resulting in the significant temperature drop due to the bulk air flow caused by acoustic streaming. In addition, it is observed that the cooling effect on the heat source is maximized when the gap between the ultrasonic vibrator and heat source coincides with the multiples of half-wavelength of the ultrasonic wave. This fact results from the resonance of the sound wave. The theoretical analysis of the dependence on the gap is also accomplished and verified by experiment. The advantage of the proposed cooling method by acoustic streaming is noise-free due to the ultrasonic vibration and maintenance-free because of the absence of moving parts. Moreover. This cooling method can be utilized to the nano and micro-electro mechanical systems, where the fan-based conventional cooling method can not be employed.

Direct Design Sensitivity Analysis of Frequency Response Function Using Krylov Subspace Based Model Order Reduction (Krylov 부공간 모델차수축소법을 이용한 주파수응답함수의 직접 설계민감도 해석)

  • Han, Jeong-Sam
    • Journal of the Computational Structural Engineering Institute of Korea
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    • v.23 no.2
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    • pp.153-163
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    • 2010
  • In this paper a frequency response analysis using Krylov subspace-based model reduction and its design sensitivity analysis with respect to design variables are presented. Since the frequency response and its design sensitivity information are necessary for a gradient-based optimization, problems of high computational cost and resource may occur in the case that frequency response of a large sized finite element model is involved in the optimization iterations. In the suggested method model order reduction of finite element models are used to calculate both frequency response and frequency response sensitivity, therefore one can maximize the speed of numerical computation for the frequency response and its design sensitivity. As numerical examples, a semi-monocoque shell and an array-type $4{\times}4$ MEMS resonator are adopted to show the accuracy and efficiency of the suggested approach in calculating the FRF and its design sensitivity. The frequency response sensitivity through the model reduction shows a great time reduction in numerical computation and a good agreement with that from the initial full finite element model.

Bias and Gate-Length Dependent Data Extraction of Substrate Circuit Parameters for Deep Submicron MOSFETs (Deep Submicron MOSFET 기판회로 파라미터의 바이어스 및 게이트 길이 종속 데이터 추출)

  • Lee Yongtaek;Choi Munsung;Ku Janam;Lee Seonghearn
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.41 no.12
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    • pp.27-34
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    • 2004
  • The study on the RF substrate circuit is necessary to model RF output characteristics of deep submicron MOSFETs below 0.2$\mum$ gate length that have bun commercialized by the recent development of Si submicron process. In this paper, direct extraction methods are developed to apply for a simple substrate resistance model as well as another substrate model with connecting resistance and capacitance in parallel. Using these extraction methods, better agreement with measured Y22-parameter up to 30 GHz is achieved for 0.15$\mum$ CMOS device by using the parallel RC substrate model rather than the simple resistance one, demonstrating the RF accuracy of the parallel model and extraction technique. Using this model, bias and gate length dependent curves of substrate parameters in the RF region are obtained by increasing drain voltage of 0 to 1.2V at deep submicron devices with various gate lengths of 0.11 to 0.5㎛ These new extraction data will greatly contribute to developing a scalable RF nonlinear substrate model.

An Energy Balancing Low Power Routing Method for Sensor Network with Fixed Data Acquisition Nodes (고정식 정보획득 노드로 구성된 센서 네트워크에 적용 가능한 에너지 밸런싱 저전력 라우팅 기법)

  • Jeong Gye-Gab;Kim Hwang-Gi;Lee Nam-Il;Kim Jun-Nyun
    • Journal of the Institute of Electronics Engineers of Korea TC
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    • v.41 no.6 s.324
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    • pp.59-68
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    • 2004
  • Thanks to the development of microelectromechanical systems(MEMS), wireless communication technology and microsensor technology, it was Possible to manufacture a very small and low costdata acquisition node with sensing function, processing function, wireless communication function and battery. Thus sensor networks begin to be prevailed. The sensor network is a spontaneous system which sets up automatically routing paths and transmits asignificant data to the destination. Sensor nodes requires low-power operation because most of them use a battery as operating power. Sensor nodes transmit a sensing data to the destination. Moreover, they play a router. In fact, because the later consumes more energy than the former, the low-power routing is very important. Sensor networks don't have a routing standard unlike general wireless Ad-hoc networks. So This paper proposes a low-power routing method for anting to sensor networks. It is based on AODV and adapts a method to drop probably RREQ depending on remaining power. We examined it through simulations. From simulation results, we could confirm to reduce power consumption about $10-20\%$ and distribute equally power consumption among nodes.

Optical True Time-Delay for Planar Phased Array Antennas Composed of a FBG Prism and a Fiber Delay Lines Matrix (FBG 프리즘과 광섬유 지연선로 행렬을 이용한 평면 위상 배열 안테나용 광 실시간 지연선로)

  • Jung, Byung-Min;Shin, Jong-Dug;Kim, Boo-Gyoun
    • Korean Journal of Optics and Photonics
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    • v.17 no.1
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    • pp.7-17
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    • 2006
  • In this paper, we proposed an optical true time-delay (TTD) for planar phased array antennas (PAAs), which is composed of a wavelength-dependent optical true time delay (WDOTTD) followed by a wavelength-independent optical true time delay (WIOTTD). The WDOTTD is a fiber Bragg gratings (FBGs) Prism and the WDOTTD is a fiber delay-lines matrix of which each component consists of a certain length of fiber connected to cross-ports of a 2${\times}$2 MEMS switch. A 10-GHz 2-bit${\times}$4-bit two-dimensional optical TTD has been fabricated by cascading a WDOTTD with a maximum time delay of 810 ps to a WIOTTD of $\pm$50 ps. Time delay and insertion loss for each radiation angle have been measured. Time delay error for the WIOTTD has been measured to be less than $\pm$1 ps. We have also designed a two-dimensional 10-GHz PAA composed of 8${\times}$8 microstrip patch antenna elements driven by the proposed TTD. The radiation patterns of this PAA have been obtained by simulation and analyzed.

Study of Stress Changes in Nanocrystalline Ni Thin Films Eletrodeposited from Chloride Baths (Chloride Bath로부터 전기도금된 나노결정립 니켈 박막의 잔류응력 변화에 대한 연구)

  • Park, Deok-Yong
    • Journal of the Korean Electrochemical Society
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    • v.14 no.3
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    • pp.163-170
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    • 2011
  • Nanocrystalline Ni thin films were electodeposited from chloride baths to investigate the influences of additive concentration, current density and solution pH on residual (or internal) stress, surface morphology, and microstructure of the films. It was observed that residual stress in Ni thin film was changed from tensile stress mode (about 150 MPa) to compressive stress mode (about -100 MPa) with increasing saccharin concentration as an additive. Microstructure of Ni thin films was changed with/without saccharin in baths. Ni thin films electrodeposited from saccharinfree bath mainly consisted of both FCC(111) and FCC(200) phases. However, Ni thin film electrodeposited from the baths containing saccharin exhibited FCC(111), FCC(200) and FCC (311) phases [sometimes, FCC (220)]. Current density influenced residual stress of Ni thin films. It was measured to be the lowest compressive stress value (about-100 MPa) in range of current density of $2.5\sim10mA{\cdot}cm^{-2}$. Solution pH also influenced residual stress of Ni thin film. Addition of saccharin in baths affected grain size of Ni thin films. Grain sizes of Ni thin films were measured to be about 60 nm without saccharin and 24~38 nm with more than 0.0005M saccharin concentration. Surface of Ni thin films was changed from nodular to smooth surface morphology with addition of saccharin.

Electrical and Fluidic Characterization of Microelectrofluidic Bench Fabricated Using UV-curable Polymer (UV경화성 폴리머를 이용한 미소유체 통합접속 벤치 개발 및 전기/유체적 특성평가)

  • Youn, Se-Chan;Jin, Young-Hyun;Cho, Young-Ho
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.36 no.5
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    • pp.475-479
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    • 2012
  • We present a novel polymer fabrication process involving direct UV patterning of a hyperbranched polymer, AEO3000. Compared to PDMS, which is the most widely used polymer in bioMEMS devices, the present polymer has advantages with regard to electrode integration and fast fabrication. We designed a four-chip microelectrofluidic bench having three electrical pads and two fluidic I/O ports. We integrated a microfluidic mixer and a cell separator on the bench to characterize the interconnection performance and sample manipulation. Electrical and fluidic characterization of the microfluidic bench was performed. The measured electrical contact resistance was $0.75{\pm}0.44{\Omega}$, which is small enough for electrical applications, and the pressure drop was 8.3 kPa, which was 39.3% of the value in the tubing method. By performing yeast mixing and a separation test in the integrated module on the bench, we successfully showed that the interconnected chips could be used for bio-sample manipulation.

HIPIMS Arc-Free Reactive Deposition of Non-conductive Films Using the Applied Material ENDURA 200 mm Cluster Tool

  • Chistyakov, Roman
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.96-97
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    • 2012
  • In nitride and oxide film deposition, sputtered metals react with nitrogen or oxygen gas in a vacuum chamber to form metal nitride or oxide films on a substrate. The physical properties of sputtered films (metals, oxides, and nitrides) are strongly influenced by magnetron plasma density during the deposition process. Typical target power densities on the magnetron during the deposition process are ~ (5-30) W/cm2, which gives a relatively low plasma density. The main challenge in reactive sputtering is the ability to generate a stable, arc free discharge at high plasma densities. Arcs occur due to formation of an insulating layer on the target surface caused by the re-deposition effect. One current method of generating an arc free discharge is to use the commercially available Pinnacle Plus+ Pulsed DC plasma generator manufactured by Advanced Energy Inc. This plasma generator uses a positive voltage pulse between negative pulses to attract electrons and discharge the target surface, thus preventing arc formation. However, this method can only generate low density plasma and therefore cannot allow full control of film properties. Also, after long runs ~ (1-3) hours, depends on duty cycle the stability of the reactive process is reduced due to increased probability of arc formation. Between 1995 and 1999, a new way of magnetron sputtering called HIPIMS (highly ionized pulse impulse magnetron sputtering) was developed. The main idea of this approach is to apply short ${\sim}(50-100){\mu}s$ high power pulses with a target power densities during the pulse between ~ (1-3) kW/cm2. These high power pulses generate high-density magnetron plasma that can significantly improve and control film properties. From the beginning, HIPIMS method has been applied to reactive sputtering processes for deposition of conductive and nonconductive films. However, commercially available HIPIMS plasma generators have not been able to create a stable, arc-free discharge in most reactive magnetron sputtering processes. HIPIMS plasma generators have been successfully used in reactive sputtering of nitrides for hard coating applications and for Al2O3 films. But until now there has been no HIPIMS data presented on reactive sputtering in cluster tools for semiconductors and MEMs applications. In this presentation, a new method of generating an arc free discharge for reactive HIPIMS using the new Cyprium plasma generator from Zpulser LLC will be introduced. Data (or evidence) will be presented showing that arc formation in reactive HIPIMS can be controlled without applying a positive voltage pulse between high power pulses. Arc-free reactive HIPIMS processes for sputtering AlN, TiO2, TiN and Si3N4 on the Applied Materials ENDURA 200 mm cluster tool will be presented. A direct comparison of the properties of films sputtered with the Advanced Energy Pinnacle Plus + plasma generator and the Zpulser Cyprium plasma generator will be presented.

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Improved Vapor Recognition in Electronic Nose (E-Nose) System by Using the Time-Profile of Sensor Array Response (센서 응답의 Time-Profile 을 이용한 전자 후각 (E-Nose) 시스템의 Vapor 인식 성능 향상)

  • Yoon Seok, Yang
    • Journal of Biomedical Engineering Research
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    • v.25 no.5
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    • pp.329-334
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    • 2004
  • The electronic nose (E-nose) recently finds its applications in medical diagnosis, specifically on detection of diabetes, pulmonary or gastrointestinal problem, or infections by examining odors in the breath or tissues with its odor characterizing ability. The odor recognition performance of E-nose can be improved by manipulating the sensor array responses of vapors in time-profile forms. The different chemical interactions between the sensor materials and the volatile organic compounds (VOC's) leave unique marks in the signal profiles giving more information than collection of the conventional piecemal features, i.e., maximum sensitivity, signal slopes, rising time. In this study, to use them in vapor recognition task conveniently, a novel time-profile method was proposed, which is adopted from digital image pattern matching. The degrees of matching between 8 different vapors were evaluated by using the proposed method. The test vapors are measured by the silicon-based gas sensor array with 16 CB-polymer composites installed in membrane structure. The results by the proposed method showed clear discrimination of vapor species than by the conventional method.

Thickness Dependence of Orientation, Longitudinal Piezoelectric and Electrical Properties of PZT Films Deposited by Using Sol-gel Method (솔젤법에 의해 제조한 PZT(52/48) 막의 두께에 따른 우선배향성의 변화 및 이에 따른 압전 및 전기적 물성의 변화 평가)

  • Lee, Jeong-Hoon;Kim, Tae-Song;Yoon, Ki-Hyun
    • Journal of the Korean Ceramic Society
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    • v.38 no.10
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    • pp.942-947
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    • 2001
  • Thickness dependence of orientation on piezoelectric and electrical properties was investigated by PZT (52/48) films by diol based sol-gel method. The thickness of each layer by spinning at one time was $0.2{\mu}m$ and crack-free films could be successfully deposited on 4 inches Pt/Ti/$SiO_2$/Si substrates by 0.5 mol solutions in the range from $0.2{\mu}m$ to $3.8{\mu}m$. Excellent P-E hysteresis curves were achieved, which were attributed to the well-densified PZT films and columnar grain without pores or any defects between interlayers. The (111) preferred orientation of films were shown in the range of thickness below $1{\mu}m$. As the thickness increased, the (111) preferred orientation disappeared from $1{\mu}m$ to $3{\mu}m$ region, and the orientation of films became random above $3{\mu}m$. Dielectric constants and longitudinal piezoelectric coefficient, $d_{33}$, measured by pneumatic method were saturated around the value of about 1400 and 300 pC/N respectively above the thickness of $1{\mu}m$.

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