• Journal of Nutrition and Health
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• 제51권6호
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• pp.489-497
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• 2018

본 연구에서는 고지방식이로 유도한 비만군과 저지방식이를 공급한 대조군에서 각 조직의 아연 농도와 아연수송체 발현 수준을 비교하여, 비만 상태가 아연 대사에 미치는 영향을 파악하고자 하였다. C57BL/6J mice를 두 군으로 나누어 각 군당 15마리씩 고지방식이 (비만군) 또는 저지방식이 (대조군)를 총 15주간 공급하였다. 본 연구 결과, 비만군은 대조군에 비해 체중 증가량, 부위별 지방조직, 혈청과 간의 중성지방과 콜레스테롤 농도, 혈청 ALT 및 AST 활성 등이 모두 유의적으로 높게 나타났다. 또한 혈청 렙틴과 염증성 사이토카인인 IL-6의 농도도 비만군에서 유의적으로 증가하였다. 조직 별 아연 농도를 비교한 결과, 간, 소장, 신장, 췌장 등의 측정한 모든 조직에서 비만군이 대조군에 비해 유의적으로 낮게 나타났으며, 대변으로 배설되는 아연 함량은 비만군이 대조군에 비해 유의적으로 높았다. 혈청 아연 농도의 경우 두 군 간 유의적인 차이가 없었으나, 혈청 내 아연-의존 금속효소인 ALP 활성은 비만군에서 대조군에 비해 유의적으로 낮게 나타나 아연의 기능적인 결핍을 확인하였다. 내인성 아연의 체외 배출에 관여하는 췌장 조직에서의 ZnT1 mRNA 수준은 비만군에서 대조군에 비해 유의적으로 높게 나타났으며, 식이 아연 흡수에 관여하는 소장에서의 Zip4와 ZnT1의 mRNA 수준은 두 군간에 유의적인 차이가 없었다. 간 조직의 경우, ZnT1과 Zip10 mRNA이 모두 비만군에서 유의적으로 증가하였다. 이상의 결과를 요약하면, 비만 상태는 아연의 배설 증가와 조직 내 아연 농도 감소를 유발하는 것으로 나타났으며, 이들 아연 대사의 변화는 췌장과 간 조직의 아연 수송체 발현 수준 변화와 밀접한 관련이 있는 것으로 보인다. 비만인들에서 아연 영양상태가 결핍되지 않도록 관심을 가져야 할 것으로 생각되며, 비만으로 인한 아연 대사의 이상 (dysfunction)을 억제하기 위해서는 아연 수송체 발현을 조절할 수 있는 요인들에 대한 이해가 더욱 필요할 것으로 생각된다.

• Archives of Pharmacal Research
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• 제25권6호
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• pp.873-878
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• 2002

OA-8159, a new Phosphodiesterase (PDE) 5 inhibitor, has exhibited potent erectogenic potential in a penile erection test in rats and anesthetized dogs. In this study, we investigated the mechanism of its erectogenic activity by measuring the activity of OA-8159 against a various PDE isozymes and assessing cGMP and cAMP formation in a rabbit corpus cavernosum in vitro. DA-8159 inhibited the PDE 5 activity in rabbit and human platelets, which the $IC_{50}$ was 5.84$\pm$1.70 nM and 8.25$\pm$2.90 nM, respectively. The $IC_{50}$ of DA-8159 on PDE 1, PDE2, PDE 3 and PDE 6 were 870$\pm$57.4 nM, $101\pm$5 $\mu$M, 52.0$\pm$3.53 $\mu$M and 53.3$\pm$2.47 nM, respectively. This suggests that DA-8159 is a potent, highly selective, competitive inhibitor of PDE 5-catalyzed cGMP hydrolysis. The rates of cGMP hydrolysis catalyzed by human platelets-derived PDE 5 as a function of the cGMP concentration (5~100 nM) and two-fixed DA-8159 concentration (11.3 and 18.8 nM) were investigated in order to characterize the mode of PDE 5 inhibition by DA-8159. DA-8159 increased the apparent 4K_{m}$ value for cGMP hydrolysis but had no effect on the apparent $V_{max}$, indicating a competitive mode of inhibition. DA-8159 increased the cGMP concentrations in the rabbit corpus cavernosum dose dependently. In the presence of sodium nitroprusside (SNP), DA-8159 significantly sti\mulated the accu\mulation of cGMP when compared to the control level. This indicated that the enhancement of a penile erection by DA-8159 involved the relaxation of the cavernosal smooth \muscle by NO-sti\mulated cGMP accu\mulation. In conclusion, DA-8159 is a selective inhibitor of PDE 5-catalyzed cGMP hydrolysis and the enhancement of a penile erection by DA-8159 is mediated by the relaxation of the cavernosal smooth \muscle by the NO-sti\mulated cGMP accu\mulation.

• 한국산업보건학회지
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• 제34권2호
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• pp.166-178
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• 2024

Objectives: The 12 occupational exposure limits(OELs) for chromium and its compounds in Korea were set by applying the American Conference of Governmental Industrial Hygienists (ACGIH) Threshold Limit Values (TLVs). However, this is significantly different from the TLVs after the existing TLVs were integrated and withdrawn in 2018, so it is necessary to review the revision. Methods: Various documents related to chromium OELs were reviewed, including the ACGIH TLV Documentations for chromium and its compounds. A field survey was conducted targeting workplaces handling chromium and its compounds. Based on this, a revised OELs were proposed and a socio-economic evaluation was conducted. Results: The OELs for chromium compounds in Korea was first enacted in 2002, and in 2007, the OELs for chromium (hexavalent) compounds (insoluble) was lowered from 0.05 mg/m³ to 0.01 mg/m³. In 2008, the OELs for strontium chromate was newly established as 0.0005 mg/m³, and in 2018, the OELs for calcium chromate was newly established as 0.001 mg/m³. Total chromium and hexavalent chromium were measured for each of 6 samples at 2 welding sites, 4 plating sites, and 2 spray coating sites. When omparing the average of the results measured by ICP, a total chromium analysis method, and the analysis results by IC, a hexavalent chromium analysis method, only workplace 4 was the same, and total chromium was evaluated more, and total chromium was evaluated at 0.0004 to 0.0027 mg/m³. And hexavalent chromium was evaluated as non-detection ~ 0.0014 mg/m³. Amendment ①: The exposure standard for hexavalent chromium is not divided into water soluble, insoluble, chromium ore processing, and other hexavalent chromium compounds, and is integrated into 0.01 mg/m³, which is the level of chromium (hexavalent) compound (insoluble)., OELs for chromium (metal) and chromium (trivalent) compounds are integrated into chromium (trivalent) compounds, and the exposure level is maintained. Amendment ②: As in the amendment ①, the OELs are integrated, but the level is lowered to 0.005 mg/m³, which is the OELs of OSHA, and there is a grace period of 4 years. Amendment ③: As in the amendment ①, the OELs are integrated, but the level is lowered to 0.0002 mg/m³, which is the exposure standard of ACGIH, and there is a grace period of 5 years. Conclusions: Amendment ①: The change in the OELs is insignificant, so the cost required is small, and the benefit/cost ratio is greater than 1, so there is no problem in applying the amendment. Amendment ②: In all scenarios except chromium 6(insoluble), the benefit/cost ratio is greater than 1, so it is thought that there will be no major problem in applying the amendment. Amendment ③: Since the benefit/cost ratio is less than 1 in all scenarios, it is thought that the total social benefit that can be obtained when applying the amendment is not large.

• 한국산학기술학회:학술대회논문집
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• 한국산학기술학회 2010년도 추계학술발표논문집 1부
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• pp.313-317
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• 2010

Li, Zr doped mesoporous silica was synthesized in one pot and investigated for low temperature $CO_2$ adsorption. Herein CTAB and TEOS are used as structural directing agent and silica source respectively. The characteristics of the material was obtained from FT IR, XRD, SEM, TG and BET results. ICP AES results revealed the presence of lithium and zirconium. The material possesses high surface area ($962.22m^2g^{-1}$) with mono dispersed particles of about 2 nm. The maximum $CO_2$ adsorption capacity is 5 wt % (50 mg/g) of $CO_2$/g of sorbent at $25^{\circ}C$, which is regenerable at $200^{\circ}C$. This regeneration temperature of the adsorbent is lower than the reported lithium zirconium silicate powder. Until now, there is no report for the synthesis of Li, Zr doped mesoporous silica. The performance studies illustrate that Li, Zr doped mesoporous silica is tunable, regenerable, recyclable and selective sorbent and hence found to be a promising candidate for $CO_2$ adsorption.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2003년도 춘계학술발표강연 및 논문개요집
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• pp.240-240
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• 2003

SiC 섬유의 고온강도를 향상시키기 위한 소결조제로 boron, aluminum 등을 사용할 수 있다. 본 연구에서는 폴리카보실란에 aluminum precursor를 첨가한 후 중합반응을 거쳐 Al-contained polycarbosilane을 합성하였다. 합성된 Al-contained polycarbosilane을 용융방사하여 섬유화 하고 열분해 공정을 통해 Si-Al-C-O 나노복합 섬유를 제조하였다. 먼저 aluminum butoxide와 polycarbosilane(commercial)을 200m1 xylene에 용해시켜 14$0^{\circ}C$에서 1시간 동안 reflux하였다. evaporator를 이용하여 xylene를 제거한 후 autoclave에서 25$0^{\circ}C$/30$0^{\circ}C$ 중합과정을 통해 가교결합 시켰다 이와 같이 합성된 시료는 ICP분석을 통해 aluminum 함량을 확인하였고 FT-IR(Fig.1) 및 GPC분석(Fig.2)으로부터 화학구조 및 분자량변화를 확인하였다. aluminum 첨가량이 증가함에 따라 Si-H/Si-$CH_3$의 결합크기의 비가 감소하였으며 이로부터 aluminum butoxide와 polycarbosilane의 가교결합이 이루어진 것으로 보이며 중합 후 분자량의 증가 또한 가교결합에 의한 결과로 사료된다 열무게감량(TGA) 측정 결과는 40$0^{\circ}C$부터 유기리간드의 분해가 일어나며 80$0^{\circ}C$이상에서 세라믹화 과정이 완료되었음을 알 수 있었다 또한 aluminum 첨가량이 증가함에 따라 세라믹 수율도 증가하였음을 확인하였다. 합성된 aluminum-contained polycarbosilane은 20$0^{\circ}C$에서 1시간 동안 불융화과정을 거쳐 환원 및 진공 분위기에서 고온 열처리하였으며 이로부터 얻어진 시료에 대해 XRD분석을 수행하였다. SEM과 TEM을 이용하여 미세구조를 관찰하였다.

• 한국조명전기설비학회:학술대회논문집
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• 한국조명전기설비학회 2004년도 학술대회 논문집
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• pp.9-12
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• 2004

Recently, the environmental problem has received considerable attention. so, many lamps have been developing for environmental requirement and energy efficiency. also, at glow discharge lamp researchers try to reduce energy spending that is power saving lamp. this kind requirement agree with strong points of electrodeless fluorescent lamp has received to now lighting sauce. At low pressure as mTorr I.C.P make high density plasma easily, is good to maintain discharge, has high ionization and does not have failing lighting and losing ability of electron radiation by oxidation and volatilization of electrodes, because this tape does not have electrodes This point of I.C.P can use at electrodeless fluorescent lamp in this study ICP display elements and Ar, Ne, Kr are researched for optical characteristic. each gas is looked into optical characteristic, also mixed gases is experiment for optical characteristic.

• 한국신재생에너지학회:학술대회논문집
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• 한국신재생에너지학회 2007년도 춘계학술대회
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• pp.309-312
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• 2007

Sputter deposition followed by surface treatment was studied using reactive RF plasma as a method for preparing titanium oxide($TiO_{2}$) films on indium tin oxide(ITO) coated glass substrate for dye-sensitized solar cells(DSSCs). Anatase structure $TiO_{2}$ films deposited by reactive RF magnetron sputtering under the conditions of $Ar/O_{2}$(5%) mixtures, RF power of 600W and substrate temperature of $400^{\circ}C$ were surface-treated by inductive coupled plasma(ICP) with $Ar/O_{2}$ mixtures at substrate temperature of $400^{\circ}C$, and thus the films were applied to the DSSCs, The $TiO_{2}$ Films made on these exhibited the BET specific surface area of 95, the pore volume of $0.3cm^{2}$ and the TEM particle size of ${\sim}25$ nm. The DSSCs made of this $TiO_{2}$ material exhibited an energy conversion efficiency of about 2.25% at $100mW/cm^{2}$ light intensity.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.701-701
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• 2013

표면조직화는 입사되는 빛의 반사를 줄이고 태양전지 내부에서 빛의 이동거리를 길게하여 효율을 향상시키는 중요한 요소가 된다. 결정질 실리콘 표면 조직화에서 일반적으로 알카리 습식 식각이 많이 사용되며 이 식각 방법으로 반사도를 400~1000 nm의 파장에서 평균 11%까지 줄일 수 있다. 본 논문에서는 빛의 반사를 더 줄여 단락전류를 향상 시키기 위해 기존 NaOH를 이용한 표면 조직화를 수행한 후에 반응성 이온 식각 공정을 적용하는 2단계 표면 조직화 공정을 최적화 하였다. 먼저 NaOH 2%, IPA 7.5%용액에서 $80^{\circ}C$ 유지하면서 35분간 식각을 한 후에 ICP 장치에서 SF6/O2 비율 1:1, 공정 압력 25 mTorr, 시간 200 s로 고정하고 RF 파워를 25~200 W로 변화를 주면서 실험 하였다. 그 결과 마이크로 크기의 피라미드 위에 나노 크기의 피라미드를 형성할 수 있었으며 400~1,000 nm 파장에서 평균 4.96%까지 반사도를 낮출 수 있었다. 기존 알카리 식각 공정에 비해 반사도가 많이 낮아지게 되어 입사되는 빛의 양이 증가함으로서 단락전류가 증가하고 효율이 향상될 것으로 기대된다.

• 한국대기환경학회지
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• 제18권5호
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• pp.363-372
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• 2002

PM$_{10}$ aerosols were collected using low volume air sampler every month intervals from September 1992 to August 1991 in Seoul. These samples were analyzed for 20 trace elements (Al, As, Ba, Br, Ca, Cl, Co, Cr, Fe, K, Mn, Na, Ni, Pb, Sc, Se, Si, Ti, V and Zn) by INAA (instrumental neutron activation analysis), XRF (x-ray fuorescence spectrometer), and ICP (inductively coupled plasma). PM$_{10}$ mass concentrations higher than 70 $\mu$g/m$^3$ were 32% of 60 samples and had significantly higher concentrations in spring and winter than in summer and fall (p-value<0.001). The elements of As, Br, Cl, Ni, Pb, Se, V, and Zn are enriched by factors of 20 to 2,000 relative to their natural abundance in crustal soil. To further identify common sources of pollution-related trace elements, factor analysis was applied to the trace elements concentration data. Major sources that contribute to the atmospheric loading of these elements were found to include fossil fuel combustion, automobile and waste incineration (33.2%), metal processing industry (18.2%), and soil(29.8%).8%).

• 한국전기전자재료학회논문지
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• 제13권12호
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• pp.996-1002
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• 2000

Ferroelectric (Ba, Sr) TiO$_3$(BST) thin films have attracted much attention for use in new capacitor materials of dynamic random access memories (DRAMs). In order to apply BST to the DRAMs, the etching process for BST thin film with high etch rate and vertical profile must be developed. However, the former studies have the problem of low etch rate. In this study, in order to increase the etch rate, BST thin films were etched with a magnetically enhanced inductively coupled plasma(MEICP) that have much higher plasma density than RIE (reactive ion etching) and ICP (inductively coupled plasma). Experiment was done by varying the etching parameters such as CF$_4$/(CF$_4$+Ar) gas mixing ratio, rf power, dc bias voltage and chamber pressure. The maximum etch rate of the BST films was 170nm/min under CF$_4$/CF$_4$+Ar) of 0.1, 600 W/-350 V and 5 mTorr. The selectivities of BST to Pt and PR were 0.6 and 0.7, respectively. Chemical reaction and residue of the etched surface were investigated with X-ray photoelectron spectroscopy (XPS) and secondary ion mass spectroscopy (SIMS).