• Journal of the Korean Vacuum Society
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• v.13 no.1
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• pp.39-45
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• 2004

Ultraviolet-nanoimprint lithography (UV-NIL) is a promising method for cost-effectively defining nanoscale structures at room temperature and low pressure. A 5${\times}$5${\times}$0.09 in. quartz stamp is fabricated using the etch process in which a Cr film was employed as a hard mask for transferring nanostructures onto the quartz plate. FAS(Fluoroalkanesilane) is used as a material for anti-adhesion surface treatment on the stamp and a thin organic film to improve adhesion on a wafer is formed by spin-coating. The low viscosity resin droplets with a nanometer scale volume are dispensed on the whole area of the coated wafer. The UV-NIL experiments have been performed using the EVG620-NIL. 370 nm - 1 m features on the stamp have been transferred to the thin resin layer on the wafer using the multi-dispensing method and UV-NIL process. We have measured the imprinted patterns and residual layer using SEM and AFM to evaluate the potential of the process.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.19 no.1
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• pp.596-602
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• 2018

Nanoimprint lithography (NIL) is an emerging technology that enables cost-effective and high-throughput nanofabrication. In ultraviolet (UV) NIL, low-cost and high-speed production can be achieved using a non-vacuum environment at room temperature and low pressure. However, there are problems with the formation of bubble defects in such an environment. This paper investigates the shape of the mold cavity and the bubble defect formation in UV NIL in a non-vacuum environment. The bubble defect formation was simulated using two-dimensional flow analysis and the VOF method for commonly used cavity mold shapes (rectangular, elliptical, and triangular). The characteristics of the resist flow front and various contact angles were also analyzed. The shape of the mold cavity had a very significant effect on the bubble defect formation. For all cavity shapes, a smaller contact angle with the mold and larger contact angle with the substrate decreased the possibility of bubble defect formation. The elliptical shape was the most effective for preventing bubble defect formation.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.14 no.9
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• pp.4178-4184
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• 2013

Nanoimprint lithography (NIL) is an emerging technology enabling cost-effective and high-throughput nanofabrication. Recently, the major trends of NIL are high throughput and large area patterning. UV curable type NIL (UV NIL) can be performed at room temperature and low pressure. And one advantage of UV NIL is that it does not need vacuum, which greatly simplifies tool construction, so that vacuum oprated high-precision stages and a large vacuum chamber are no longer needed. However, one key issue in non-vacuum environment is air bubble formation problem. Namely, can the air bubbles be completely removed from the resist. In this paper, the air bubbles formation by the method of droplet application in UV NIL with non-vacuum environment are experimentally studied. The effects of the volume of droplet and the number of dispensing points on air bubble formation are investigated.