• 제목/요약/키워드: Local doping

검색결과 33건 처리시간 0.018초

Characterization of Wavelength Effect on Photovoltaic Property of Poly-Si Solar Cell Using Photoconductive Atomic Force Microscopy (PC-AFM)

  • Heo, Jinhee
    • Transactions on Electrical and Electronic Materials
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    • 제14권3호
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    • pp.160-163
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    • 2013
  • We investigated the effect of light intensity and wavelength of a solar cell device by using photoconductive atomic force microscopy (PC-AFM). The $POCl_3$ diffusion doping process was used to produce a p-n junction solar cell device based on a Poly-Si wafer and the electrical properties of prepared solar cells were measured using a solar cell simulator system. The measured open circuit voltage ($V_{oc}$) is 0.59 V and the short circuit current ($I_{sc}$) is 48.5 mA. Also, the values of the fill factors and efficiencies of the devices are 0.7% and approximately 13.6%, respectively. In addition, PC-AFM, a recent notable method for nano-scale characterization of photovoltaic elements, was used for direct measurements of photoelectric characteristics in local instead of large areas. The effects of changes in the intensity and wavelength of light shining on the element on the photoelectric characteristics were observed. Results obtained through PC-AFM were compared with the electric/optical characteristics data obtained through a solar simulator. The voltage ($V_{PC-AFM}$) at which the current was 0 A in the I-V characteristic curves increased sharply up to 1.8 $mW/cm^2$, peaking and slowly falling as light intensity increased. Here, $V_{PC-AFM}$ at 1.8 $mW/cm^2$ was 0.29 V, which corresponds to 59% of the average $V_{oc}$ value, as measured with the solar simulator. Also, while light wavelength was increased from 300 nm to 1,100 nm, the external quantum efficiency (EQE) and results from PC-AFM showed similar trends at the macro scale, but returned different results in several sections, indicating the need for detailed analysis and improvement in the future.

전자빔 조사에 의한 유리상 탄소에서의 구조적 변화와 열전 성능의 상관관계 (Correlation between a Structural Change and a Thermoelectric Performance of a Glassy Carbon Thin Film Induced by Electron Beam Irradiation)

  • 오인선;조준현;안기석;유정우
    • Composites Research
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    • 제29권4호
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    • pp.156-160
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    • 2016
  • 유리상 탄소는 열적으로 안정하고, 화학적 반응성이 매우 낮으며, 다양한 크기로 제작이 가능하고, 전기적 저항 또한 낮아서 다양한 극한 환경에서 사용 가능하다. 이 논문에서는 전자빔 조사가 유리상 탄소 박막의 구조 변화에 미치는 영향과 그에 따른 열전효과 변화에 대해 연구하였다. 라만 분광 특성 분석을 바탕으로 유리상 탄소 박막에 전자빔 조사에 따라 결정화 또는 비정질화가 일어나는 것을 확인하였다. 또한, 이러한 결정변화가 유리상 탄소 박막의 자유전자 도핑 농도의 변화시키며 그에 따른 제백 상수나 전기적 전도도의 변화도 확인하였다. 전자빔 조사로 인하여 유리상 탄소의 열전파워 펙터가 최대 200%까지 향상되는 것을 보여 주었다.

Electrical, Electronic Structure and Optical Properties of Undoped and Na-doped NiO Thin Films

  • Denny, Yus Rama;Lee, Kangil;Seo, Soonjoo;Oh, Suhk Kun;Kang, Hee Jae;Yang, Dong-Seok
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.193.1-193.1
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    • 2014
  • This study was to investigate the electronic structure and optical properties of Na doped into NiO thin film using XPS and REELS. The films were grown by electron beam evaporation with varying the annealing temperature. The relationship between the electrical characteristics with the local structure of NiO thin films was also discussed. The x-ray photoelectron results showed that the Ni 2p spectra for all films consist of Ni 2p3/2 which indicate the presence of Ni-O bond from NiO phase and for the annealed film at temperature above $200^{\circ}C$ shows the coexist Ni oxide and Ni metal phase. The reflection electron energy loss spectroscopy spectra showed that the band gaps of the NiO thin films were slightly decreased with Na-doped into films. The Na-doped NiO showed relatively low resistivity compared to the undoped NiO thin films. In addition, the Na-doped NiO thin films deposited at room temperature showed the best properties, such as a p-type semiconducting with low electrical resistivity of $11.57{\Omega}.cm$ and high optical transmittance of ~80% in the visible light region. These results indicate that the Na doping followed by annealing process plays a crucial in enhancing the electrical and optical properties of NiO thin films. We believe that our results can be a good guide for those growing NiO thin films with the purpose of device applications, which require deposited at room temperature.

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