• Title/Summary/Keyword: Local Thermodynamic Equilibrium

Search Result 25, Processing Time 0.027 seconds

Analysis of Hot Gas Flew Considering Arc-Flow Interaction (아크플라즈마와 유동간의 상호작용을 고려한 열가스 유동 해석)

  • Kim, Hong-Gyu;Park, Gyeong-Yeop;Bae, Chae-Yun;Jo, Gyeong-Yeon;Jeong, Hyeon-Gyo
    • The Transactions of the Korean Institute of Electrical Engineers B
    • /
    • v.51 no.3
    • /
    • pp.107-115
    • /
    • 2002
  • This parer presents the analysis of hot gas flow in puffer-type circuit breakers using FVFLIC method. For the analysis of arc-flow interaction, the flow field is analyzed from the equations of conservation for mass, momentum and energy with the assumption of local thermodynamic equilibrium state. The arc is represented as the energy source term composed of ohmic heating and radiation term in the energy conservation equation. Ohmic heating is computed by the electric field analysis only within the conducting plasma region. An approximate radiation transport model is employed for the evaluation of emission and absorption of the radiation. The analysis method was applied to the real circuit breaker model and simulation results such as pressure rise and arc voltage were compared with the experimental ones.

It is surface gravity

  • Lee, Jae-Woo
    • The Bulletin of The Korean Astronomical Society
    • /
    • v.41 no.1
    • /
    • pp.77.3-77.3
    • /
    • 2016
  • In our previous study, we showed that the peculiar globular cluster M22 contains two distinct stellar populations with different physical properties, having different chemical compositions, spatial distributions and kinematics. We proposed that M22 is most likely formed via a merger of two GCs with heterogeneous metallicities in a dwarf galaxy environment and accreted later to our Galaxy. In their recent study, Mucciarelli et al. claimed that M22 is a normal mono-metallic globular cluster without any perceptible metallicity spread among the two groups of stars, which challenges our results and those of others. We devise new strategies for the local thermodynamic equilibrium abundance analysis of red giant branch stars in globuar clusters and show there exists a spread in the iron abundance distribution in M22.

  • PDF

Mathematical Model for Adsorption of Berberine on Encapsulated Adsorbent (캡슬에 고정화된 흡착제에의 Berberine의 흡착에 관한 수학적 모델)

  • 최정우;조상원이원홍
    • KSBB Journal
    • /
    • v.10 no.4
    • /
    • pp.358-369
    • /
    • 1995
  • A mathematical model using local thermodynamic equilibrium isotherms for adsorption in encapsulated adsorbent is proposed in order to optimize the design parameters in situ bioproduct separation process. The model accurately follows the experimental data on the adsorption of berberine, secondary metabolite produced in Thaictrum rugosum plant cell culture. The adsorption rate on encapsulated adsorbent is compared with that on alginate-entrapped adsorbent. The result shows that the higher loading capacity in encapsulated adsorbent is mainly due to the increase in the maximum solid phase concentration. Based on the adsorption rate and loading capacity, the encapsulated adsorbent would be more useful than the entrapped adsorbent when used in situ bioproduct separation process. Design parameters in situ bioproduct separation process, such as the size of the capsule, membrane thickness, the ratio of capsule volume to bulk volume, the ratio of single capsule volume to total capsule volume and the adsorbent content in the capsule, are evaluated by using the model. The ratio of single capsule volume to total capsule volume is the most effective parameter for adsorption of berberine on encapsulated adsorbent.

  • PDF

Fabrication of the Plasma Focus Device for Advanced Lithography Light Source and Its Electro Optical Characteristics in Argon Arc Plasma (차세대 리소그래피 빛샘 발생을 위한 플라스마 집속 장치의 제작과 아르곤 아크 플라스마의 발생에 따른 회로 분석 및 전기 광학적 특성 연구)

  • Lee S.B.;Moon M.W.;Oh P.Y.;Song K.B.;Lim J.E.;Hong Y.J.;Yi W.J.;Choi E.H.
    • Journal of the Korean Vacuum Society
    • /
    • v.15 no.4
    • /
    • pp.380-386
    • /
    • 2006
  • In this study, we had designed and fabricated the plasma focus device which can generate the light source for EUV(Extreme Ultra Violet) lithography. And we also have investigated the basic electrical characteristics of currents, voltages, resistance and inductance of this system. Voltage and current signals were measured by C-dot and B-dot probe, respectively. We applied various voltages of 1.5, 2, 2.5 and 3 kV to the anode electrode and observed voltages and current signals in accordance with various Ar pressures of 1 mTorr to 100 Torr in diode chamber. It is observed that the peak values of voltage and current signals were measured at 300 mTorr, where the inductance and impedance were also estimated to be 73 nH and $35 m{\Omega}$ respectively. The electron temperature has been shown to be 13000 K at the diode voltage of 2.5 kV and this gas pressure of 300 mTorr. It is also found that the ion density Ni and ionization rate 0 have been shown to be $N_i = 8.25{\times}10^{15}/cc$ and ${\delta}$= 77.8%, respectively by optical emission spectroscopy from assumption of local thermodynamic equilibrium(LTE) plasma.

Emission spectroscopic diagnostics of argon arc Plasma in Plasma focus device for advanced lithography light source (차세대 리소그래피 빛샘 발생을 위한 플라스마 집속장치의 아르곤 아크 플라스마의 방출 스펙트럼 진단)

  • Hong, Y.J.;Moon, M.W.;Lee, S.B.;Oh, P.Y.;Song, K.B.;Hong, B.H.;Seo, Y.H.;Yi, W.J.;Shin, H.M.;Choi, E.H.
    • Journal of the Korean Vacuum Society
    • /
    • v.15 no.6
    • /
    • pp.581-586
    • /
    • 2006
  • We have generated the argon plasma in the diode chamber based on the established coaxial electrode type and investigated the emitted visible light for emission spectroscopy. We applied various voltages $2\sim3.5kV$ to the device by 0.5kV, and obtained the emission spectrum data for the focused plasma in the diode chamber on the argon pressure of 330 mTorr. The Ar I and Ar II emission line are observed. The electron temperature and ion density have been measured by the Boltzmann plot and Saha equation from assumption of local thermodynamic equilibrium (LTE) The Ar I and Ar II ion densities have been calculated to be $\sim10^{15}/cc\;and\;~10^{13}/cc$, respectively, from Saha equation.

Measurement of EUV (Extreme Ultraviolet) and electron temperature in a hypocycloidal pinch device for EUV lithography

  • Lee, Sung-Hee;Hong, Young-June;Choi, Eun-Ha
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2010.08a
    • /
    • pp.108-108
    • /
    • 2010
  • We have generated Ne-Xe plasma in dense plasma focus device with hypocycloidal pinch for extreme ultraviolet (EUV) lithography and investigated an electron temperature. We have applied an input voltage 4.5 kV to the capacitor bank of 1.53 uF and the diode chamber has been filled with Ne-Xe(30%) gas in accordance with pressure. If we assumed that the focused plasma regions satisfy the local thermodynamic equilibrium (LTE) conditions, the electron temperature of the hypocycloidal pinch plasma focus could be obtained by the optical emission spectroscopy (OES). The electron temperature has been measured by Boltzmann plot. The light intensity is proportion to the Bolzman factor. We have been measured the electron temperature by observation of relative Ne-Xe intensity. The EUV emission signal whose wavelength is about 6~16 nm has been detected by using a photo-detector (AXUV-100 Zr/C, IRD) and the line intensity has been detected by using a HR4000CG Composite-grating Spectrometer.

  • PDF

Ionization of Hydrogen in the Solar Atmosphere

  • Chae, Jongchul
    • Journal of Astronomy and Space Sciences
    • /
    • v.38 no.2
    • /
    • pp.83-92
    • /
    • 2021
  • The ionization degree of hydrogen is crucial in the physics of the plasma in the solar chromosphere. It specifically limits the range of plasma temperatures that can be determined from the Hα line. Given that the chromosphere greatly deviates from the local thermodynamic equilibrium (LTE) condition, precise determinations of hydrogen ionization require the solving of the full set of non-LTE radiative transfer equations throughout the atmosphere, which is usually a formidable task. In many cases, it is still necessary to obtain a quick estimate of hydrogen ionization without having to solve for the non-LTE radiative transfer. Here, we present a simple method to meet this need. We adopt the assumption that the photoionizing radiation field changes little over time, even if physical conditions change locally. With this assumption, the photoionization rate can be obtained from a published atmosphere model and can be used to determine the degree of hydrogen ionization when the temperature and electron density are specified. The application of our method indicates that in the chromospheric environment, plasma features contain more than 10% neutral hydrogen at temperatures lower than 17,000 K but less than 1% neutral hydrogen at temperatures higher than 23,000 K, implying that the hydrogen temperature determined from the Hα line is physically plausible if it is lower than 20,000 K, but may not be real, if it is higher than 25,000 K. We conclude that our method can be readily exploited to obtain a quick estimate of hydrogen ionization in plasma features in the solar chromosphere.

Multi-phase Flow Modeling of Vapor Explosion Propagation (증기폭발 전파과정 해석을 위한 다상유동 모델 개발)

  • Park, I. K.;Park, G. C.;K. H. Bang
    • Nuclear Engineering and Technology
    • /
    • v.28 no.2
    • /
    • pp.103-117
    • /
    • 1996
  • A mathematical model of vapor explosion propagation is presented. The model predict two-dimensional, transient flow fields and energies of the four fluid phases of melt drop, fragmented debris, liquid coolant and vapor coolant by solving a set of governing equations with the relevant constitutive relations. These relations include melt fragmentation, coolant-phase-change, and heat and momentum exchange models. To allow thermodynamic non-equilibrium between the coolant liquid and vapor, an equation of state for oater is uniquely formulated. A multiphase code, TRACER, has been developed based on this mathematical formulation. A set of base calculations for tin/water explosions show that the model predicts the explosion propagation speed and peak pressure in a reasonable degree although the quantitative agreement relies strongly on the parameters in the constitutive relations. A set of calculations for sensitivity studies on these parameters have identified the important initial conditions and relations. These are melt fragmentation rate, momentum exchange function, heat transfer function and coolant phase change model as well as local vapor fractions and fuel fractions.

  • PDF

Influence of Ne-Xe Gas Mixture Ratio on the Extreme Ultraviolet (EUV) Emission Measurement from the Coaxially Focused Plasma

  • Lee, Sung-Hee;Hong, Young-June;Choi, Duk-In;Uhm, Han-Sup;Choi, Eun-Ha
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2011.02a
    • /
    • pp.220-220
    • /
    • 2011
  • The Ne-Xe plasmas in dense plasma-focus device with coaxial electrodes were generated for extreme ultraviolet (EUV) lithography. The influence of gas mixture ratio, Ne-Xe (1, 10, 15, 20, 25, 30, 50%) mixture gas, on EUV emission measurement, EUV intensity and electron temperature in the coaxially focused plasma were investigated. An input voltage of 4.5 kV was applied to the capacitor bank of 1.53mF and the diode chamber was filled with Ne-Xe mixture gas at a prescribed pressure. The inner surface of the cylindrical cathode was lined by an acetal insulator. The anode was made of tin metal. The EUV emission signal of the wavelength in the range of 6~16 nm has been detected by a photo-detector (AXUV-100 Zr/C, IRD). The visible emission line was also detected by the composite-grating spectrometer of the working wavelength range of 200~1100 nm (HR 4000CG). The electron temperature is obtained by the optical emission spectroscopy (OES) and measured by the Boltzmann plot with the assumption of local thermodynamic equilibrium (LTE).

  • PDF

Measurement of EUV Emission and its Plasma Parameters Generated from the Coaxial Plasma Focus of Mather and Hypocycloidal Pinched Electrodes

  • Lee, Sung-Hee;Lee, Kyung-Ae;Hong, Young-June;Uhm, Han-Sup;Choi, Eun-Ha
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2011.08a
    • /
    • pp.332-332
    • /
    • 2011
  • The extreme ultraviolet (EUV) radiation, whose wavelength is from 120 nm down to 10 nm, and the energy from 10 eV up to 124 eV, is widely utilized such as in photoelectron spectroscopy, solar imaging, especially in lithography and soft x-ray microscopy. In this study, we have investigated the plasma diagnostics as well as the debris characteristics between the two types of dense plasma focusing devices with coaxial electrodes of Mather and hypocycloidal pinch (HCP), respectively. The EUV emission intensity, electron temperature and plasma density have been investigated in these cylindrical focused plasma along with the debris characteristics. An input voltage of 5 kV has been applied to the capacitor bank of 1.53 uF and the diode chamber has been filled with Ar gas at pressure ranged from 1 mTorr and 180 mTorr. The inner surface of the cathode was covered by polyacetal insulator. The central anode electrode has been made of tin. The wavelength of the EUV emission has been measured to be in the range of 6~16 nm by a photo-detector (AXUV-100 Zr/C, IRD). The visible emission has also been measured by the spectrometer with the wavelength range of 200~1,100 nm. The electron temperature and plasma density have been measured by the Boltzmann plot and Stark broadening methods, respectively, under the assumption of local thermodynamic equilibrium (LTE).

  • PDF