• 한국안전학회지
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• 제24권6호
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• pp.136-143
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• 2009

The injuries as a result of fall accidents is the one of the most common kind of injuries in Korea, especially fall from height is the top most common kind for fatal injuries. Futhermore, the number of fall injuries in manufacturing industry has been steadily increasing from 2000 to 2007. In 2007 the number of fall fatal injuries increased 10.6 % in comparison with the number in 2006. These numbers are 6~17 times higher than those for foreign countries such as the U.K and the USA. So, it is needed to make a study to reduce these numbers for manufacturing industry. To get the goals, we did research as followings. First, this study analyzed statistics by industry, by fall height, by common agent and so on to gain an insight into real aspect of fall injuries. It showed that ladder is the commonly cited agent for manufacturing industry, and 3 risky activities ; the ladder work, the load/unload work, and the maintenance work. Secondly, this study made a survey of manufacturing workers for their understandings of the most 3 risky activities. It showed that 'tendency to work easily' and 'difficulty of applying measures due to inherent working conditions' are main reasons for workers not to implement the preventive measures against the fall accidents. Thirdly, this study tested the slip characteristics of ladder base and lungs. The tests were done based on ANSI standard and KS. In addition to the standard condition, this study performed slip tests in wet and sandy conditions and compared the results with the those of standard condition. It showed that friction coefficient is standard condition > wet condition > sandy condition, and the friction coefficient of ladder for sandy condition is measured to be reduced by 63.9% compared with that for standard condition. Finally, this study developed safety work models for using of portable ladders in consideration of the safety standards of foreign countries such as the U.K, the USA, and the Australia.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2000년도 추계학술발표회 초록집
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• pp.3-4
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• 2000

Many researchers are interested in the synthesis and characterization of carbon nitride and diamond-like carbon (DLq because they show excellent mechanical properties such as low friction and high wear resistance and excellent electrical properties such as controllable electical resistivity and good field electron emission. We have deposited amorphous carbon nitride (a-C:N) thin films and DLC thin films by shielded arc ion plating (SAIP) and evaluated the structural and tribological properties. The application of appropriate negative bias on substrates is effective to increase the film hardness and wear resistance. This paper reports on the deposition and tribological OLC films in relation to the substrate bias voltage (Vs). films are compared with those of the OLC films. A high purity sintered graphite target was mounted on a cathode as a carbon source. Nitrogen or argon was introduced into a deposition chamber through each mass flow controller. After the initiation of an arc plasma at 60 A and 1 Pa, the target surface was heated and evaporated by the plasma. Carbon atoms and clusters evaporated from the target were ionized partially and reacted with activated nitrogen species, and a carbon nitride film was deposited onto a Si (100) substrate when we used nitrogen as a reactant gas. The surface of the growing film also reacted with activated nitrogen species. Carbon macropartic1es (0.1 -100 maicro-m) evaporated from the target at the same time were not ionized and did not react fully with nitrogen species. These macroparticles interfered with the formation of the carbon nitride film. Therefore we set a shielding plate made of stainless steel between the target and the substrate to trap the macropartic1es. This shielding method is very effective to prepare smooth a-CN films. We, therefore, call this method "shielded arc ion plating (SAIP)". For the deposition of DLC films we used argon instead of nitrogen. Films of about 150 nm in thickness were deposited onto Si substrates. Their structures, chemical compositions and chemical bonding states were analyzed by using X-ray diffraction, Raman spectroscopy, X-ray photoelectron spectroscopy and infrared spectroscopy. Hardness of the films was measured with a nanointender interfaced with an atomic force microscope (AFM). A Berkovich-type diamond tip whose radius was less than 100 nm was used for the measurement. A force-displacement curve of each film was measured at a peak load force of 250 maicro-N. Load, hold and unload times for each indentation were 2.5, 0 and 2.5 s, respectively. Hardness of each film was determined from five force-displacement curves. Wear resistance of the films was analyzed as follows. First, each film surface was scanned with the diamond tip at a constant load force of 20 maicro-N. The tip scanning was repeated 30 times in a 1 urn-square region with 512 lines at a scanning rate of 2 um/ s. After this tip-scanning, the film surface was observed in the AFM mode at a constant force of 5 maicro-N with the same Berkovich-type tip. The hardness of a-CN films was less dependent on Vs. The hardness of the film deposited at Vs=O V in a nitrogen plasma was about 10 GPa and almost similar to that of Si. It slightly increased to 12 - 15 GPa when a bias voltage of -100 - -500 V was applied to the substrate with showing its maximum at Vs=-300 V. The film deposited at Vs=O V was least wear resistant which was consistent with its lowest hardness. The biased films became more wear resistant. Particularly the film deposited at Vs=-300 V showed remarkable wear resistance. Its wear depth was too shallow to be measured with AFM. On the other hand, the DLC film, deposited at Vs=-l00 V in an argon plasma, whose hardness was 35 GPa was obviously worn under the same wear test conditions. The a-C:N films show higher wear resistance than DLC films and are useful for wear resistant coatings on various mechanical and electronic parts.nic parts.