• Title/Summary/Keyword: Lithography technology

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마그네트론 스퍼터링에 의해 제조된 CrAlSiN 박막의 화학성분에 따른 온도저항계수와 미세구조

  • Mun, Seon-Cheol;Ha, Sang-Min;Kim, Sang-Ho
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.100-102
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    • 2013
  • Magnetron-sputtering법을 사용하여 기존에 연구하였던 CrAlN (Cr 7:Al 3)박막에 Si를 첨가하여 Si의 함량 변화에 따라 미세구조와 화학적 결합상태, 온도저항계수(TCR) 및 산화저항의 영향과 기계적특성 개선을 통한 multi-functional heater resistor layer로써의 가능성을 연구하였다. CrAlSiN 박막의 Si 함량에 변화에 따라 온도저항계수 변화를 확인하였으며 X-선 회절 분석(XRD) 패턴 분석결과 CrAlSiN 박막의 결정구조가 Bl-NaCl 구조를 가지고 있는 것을 확인하였으며 SEM과 AFM을 통한 표면 및 미세구조 분석결과 Si의 함량이 증가할수록 입자가 조밀해짐을 알 수 있었다. 최근 digital priting technology의 핵심 기술로 부각되고 있는 inkjet priting technology는 널리 태양전지뿐만 아니라 thin film process, lithography와 같은 반도체 공정 기술에 활용 할 수 있기 때문에 반도체 제조장비에도 사용되고 있으며, 현재 thermal inkjet 방식을 사용하고 있다. Inkjet printing technology는 전기 에너지를 잉크를 배출하기 위해 열에너지로 변환하는 thermal inkjet 방식을 사용하고 있는데, 이러한 thermal inkjet 방식은 기본적으로 전기저항이 필요하지만 electrical resistor layer는 잉크를 높은 온도에서 순간적으로 가열하기 때문에 부식이나 산화 등의 문제가 발생할 수 있어 이에 대한 보호층을 필요로 한다. 하지만, 고해상도, 고속 잉크젯 프린터, 대형 인쇄 등을 요구되고 있어 저 전력 중심의 잉크젯 프린터의 열효율을 방해하는 보호층 제거에 필요성이 제기되고 있다. 본 연구는 magnetron-sputtering을 사용하여 기존의 CrAlN 박막에 Si를 합성하여 anti-oxidation, corrosion resistance 그리고 low temperature coefficient of resistance 값을 갖는 multi-functional heater resistor layer로써 CrAlSiN 박막의 Si 함량에 따른 효과에 초점을 두었다. 본 실험은 CrAlN 박막에 Si 함량을 4~11 at%까지 첨가시켜 함량의 변화에 따른 특성변화를 확인하였다. 함량이 증가할수록 amorphous silicon nitride phase의 영향으로 박막의 roughness는 감소하였으며 XRD 분석결과 (111) peak의 Intensity가 감소함을 확인하였으며 SEM 관찰시 모든 박막이 columnar structure를 나타내었으며 Si함량이 증가할수록 입자가 치밀해짐을 보여주었다.Si함량이 증가할수록 CrAlN 박막에 비하여 면저항은 증가하였으며 TCR 측정결과 Si함량이 6.5 at%일 때 가장 안정한 TCR값을 나타내었다. Multi-functional heater resistor layer 역할을 하기 위해서, CrAlSiN 박막의 원소 분포, 표면 거칠기, 미세조직, 전기적 특성 등을 조사하였다. CrAlN 박막의 Si의 첨가는 크게 XRD 분석결과 주상 성장을 억제 할 수 있으며 SEM 분석을 통하여 Si 함량이 증가할수록 Si3N4 형성이 감소하며 입자크기가 작아짐을 확인하였다. 면저항의 경우 Si 함량이 증가함에 따라 높은 면저항을 나타내었으며 Si함량이 6.5 at%일 때 가장 낮은 TCR 값인 3120.53 ppm/K값을 보였다. 이 값은 상용되고 있는 heater resistor보다 높지만, CrAlSiN 박막이 더 우수한 기계적 특성을 가지고 있기 때문에 hybrid heater resistor로 적용할 수 있을 것으로 기대된다.

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Transferring Calibrations Between on Farm Whole Grain NIR Analysers

  • Clancy, Phillip J.
    • Proceedings of the Korean Society of Near Infrared Spectroscopy Conference
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    • 2001.06a
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    • pp.1210-1210
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    • 2001
  • On farm analysis of protein, moisture and oil in cereals and oil seeds is quickly being adopted by Australian farmers. The benefits of being able to measure protein and oil in grains and oil seeds are several : $\square$ Optimize crop payments $\square$ Monitor effects of fertilization $\square$ Blend on farm to meet market requirements $\square$ Off farm marketing - sell crop with load by load analysis However farmers are not NIR spectroscopists and the process of calibrating instruments has to the duty of the supplier. With the potential number of On Farm analyser being in the thousands, then the task of calibrating each instrument would be impossible, let alone the problems encountered with updating calibrations from season to season. As such, NIR technology Australia has developed a mechanism for \ulcorner\ulcorner\ulcorner their range of Cropscan 2000G NIR analysers so that a single calibration can be transferred from the master instrument to every slave instrument. Whole grain analysis has been developed over the last 10 years using Near Infrared Transmission through a sample of grain with a pathlength varying from 5-30mm. A continuous spectrum from 800-1100nm is the optimal wavelength coverage fro these applications and a grating based spectrophotometer has proven to provide the best means of producing this spectrum. The most important aspect of standardizing NIB instruments is to duplicate the spectral information. The task is to align spectrum from the slave instruments to the master instrument in terms of wavelength positioning and then to adjust the spectral response at each wavelength in order that the slave instruments mimic the master instrument. The Cropscan 2000G and 2000B Whole Grain Analyser use flat field spectrographs to produce a spectrum from 720-1100nm and a silicon photodiode array detector to collect the spectrum at approximately 10nm intervals. The concave holographic gratings used in the flat field spectrographs are produced by a process of photo lithography. As such each grating is an exact replica of the original. To align wavelengths in these instruments, NIR wheat sample scanned on the master and the slave instruments provides three check points in the spectrum to make a more exact alignment. Once the wavelengths are matched then many samples of wheat, approximately 10, exhibiting absorbances from 2 to 4.5 Abu, are scanned on the master and then on each slave. Using a simple linear regression technique, a slope and bias adjustment is made for each pixel of the detector. This process corrects the spectral response at each wavelength so that the slave instruments produce the same spectra as the master instrument. It is important to use as broad a range of absorbances in the samples so that a good slope and bias estimate can be calculated. These Slope and Bias (S'||'&'||'B) factors are then downloaded into the slave instruments. Calibrations developed on the master instrument can then be downloaded onto the slave instruments and perform similarly to the master instrument. The data shown in this paper illustrates the process of calculating these S'||'&'||'B factors and the transfer of calibrations for wheat, barley and sorghum between several instruments.

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Dry Etching of Flexible Polycarbonate and PMMA in O2/SF6/CH4 Discharges (O2/SF6/CH4 플라즈마를 이용한 플렉시블 Polycarbonate와 PMMA의 건식 식각)

  • Joo, Y.W.;Park, Y.H.;Noh, H.S.;Kim, J.K.;Lee, J.W.
    • Journal of the Korean Vacuum Society
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    • v.18 no.2
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    • pp.85-91
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    • 2009
  • There has been a rapid progress for flexible polymer-based MEMS(Microelectromechanical Systems) technology. Polycarbonate (PC) and Poly Methyl Methacrylate (PMMA), so-called acrylic, have many advantages for optical, non-toxic and micro-device application. We studied dry etching of PC and PMMA as a function of % gas ratio in the $O_2/SF_6/CH_4$ temary plasma. A photoresist pattern was defined on the polymer samples with a mask using a conventional lithography. Plasma etching was done at 100 W RIE chuck power and 10 sccm total gas flow rate. The etch rates of PMMA were typically 2 times higher than those of PC in the whole experimental range. The result would be related to higher melting point of PC compared to that of PMMA. The highest etch rates of PMMA and PC were found in the $O_2/SF_6$ discharges among $O_2/SF_6$, $O_2/CH_4$ and $SF_6/CH_4$ and $O_2/SF_6/CH_4$ plasma composition (PC: ${\sim}350\;nm/min$ at 5 sccm $O_2/5$ sccm $SF_6$, PMMA: ${\sim}570\;nm/min$ at 2.5 sccm $O_2/7.5$ sccm $SF_6$). PC has smoother surface morphology than PMMA after etching in the $O_2/SF_6/CH_4$ discharges. The surface roughness of PC was in the range of 1.9$\sim$3.88 nm. However, that of PMMA was 17.3$\sim$26.1 nm.

The Fabrication of $n^+-p^+$ InP Solar Cells by the Diffusion of Sulphur (S확산에 의한 $n^+-p^+$ InP 태양전지의 제작)

  • Jung, Ki-Ung;Kim, Seon-Tai;Moon, Dong-Chan
    • Solar Energy
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    • v.10 no.3
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    • pp.60-65
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    • 1990
  • [ $n^+-p^+$ ] InP homojunction solar cells were fabricated by thermal diffusion of sulphur into a $p^+$-InP wafer($p=4{\times}10^{18}cm^{-3}$), and a SiO film($600{\AA}$ thick) was coated on the $n^+$ layer as an antireflection(AR) coating by an e-beam evaporator. The volume of the cells were $5{\times}5{\times}0.3mm^3$. The front contact grids of the cells with 16 finger pattern of which width and space were $20{\mu}m$ and $300{\mu}m$ respectively, were formed by photo-lithography technique. The junction depth of sulphur were as shallow as about 0.4r m We found out the fabricated solar cells that, with increasing the diffusion time, short circuit current densities($J_{sc}$), series resistances($R_s$) and energy conversion efficiencies(${\eta}$) were increased. The cells show good spectral responses in the region of $5,000-9,000{\AA}$. The short circuit current density, the open circuit voltage( $V_{oc}$), the fill factor(F.F) and the energy conversion efficiency of the cell were $13.16mA/cm^2$, 0.38V, 53.74% and 10.1% respectively.

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Splitting of Surface Plasmon Resonance Peaks Under TE- and TM-polarized Illumination

  • Yoon, Su-Jin;Hwang, Jeongwoo;Lee, Myeong-Ju;Kang, Sang-Woo;Kim, Jong-Su;Ku, Zahyun;Urbas, Augustine;Lee, Sang Jun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.296-296
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    • 2014
  • We investigate experimentally and theoretically the splitting of surface plasmon (SP) resonance peaks under TE- and TM-polarized illumination. The SP structure at infrared wavelength is fabricated with a 2-dimensional square periodic array of circular holes penetrating through Au (gold) film. In brief, the processing steps to fabricate the SP structure are as follows. (i) A standard optical lithography was performed to produce to a periodic array of photoresist (PR) circular cylinders. (ii) After the PR pattern, e-beam evaporation was used to deposit a 50-nm thick layer of Au. (iii) A lift-off processing with acetone to remove the PR layer, leading to final structure (pitch, $p=2.2{\mu}m$; aperture size, $d=1.1{\mu}m$) as shown in Fig. 1(a). The transmission is measured using a Nicolet Fourier-transform infrared spectroscopy (FTIR) at the incident angle from $0^{\circ}$ to $36^{\circ}$ with a step of $4^{\circ}$ both in TE and TM polarization. Measured first and second order SP resonances at interface between Au and GaAs exhibit the splitting into two branches under TM-polarized light as shown in Fig. 1(b). However, as the incidence angle under TE polarization is increased, the $1^{st}$ order SP resonance peak blue-shifts slightly while the splitting of $2^{nd}$ order SP resonance peak tends to be larger (not shown here). For the purpose of understanding our experimental results qualitatively, SP resonance peak wavelengths can be calculated from momentum matching condition (black circle depicted in Fig. 2(b)), $k_{sp}=k_{\parallel}{\pm}iG_x{\pm}jG_y$, where $k_{sp}$ is the SP wavevector, $k_{\parallel}$ is the in-plane component of incident light wavevector, i and j are SP coupling order, and G is the grating momentum wavevector. Moreover, for better understanding we performed 3D full field electromagnetic simulations of SP structure using a finite integration technique (CST Microwave Studio). Fig. 1(b) shows an excellent agreement between the experimental, calculated and CST-simulated splitting of SP resonance peaks with various incidence angles under TM-polarized illumination (TE results are not shown here). The simulated z-component electric field (Ez) distribution at incident angle, $4^{\circ}$ and $16^{\circ}$ under TM polarization and at the corresponding SP resonance wavelength is shown in Fig. 1(c). The analysis and comparison of theoretical results with experiment indicates a good agreement of the splitting behavior of the surface plasmon resonance modes at oblique incidence both in TE and TM polarization.

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Fabrication and loss measurement of $P_2O_5-SiO_2$ optical waveguides on Si (Si을 기판으로한 $P_2O_5-SiO_2$ 광도파로의 제작 및 손실측정)

  • 이형종;임기건;정창섭;정환재;김진승
    • Korean Journal of Optics and Photonics
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    • v.3 no.4
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    • pp.258-265
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    • 1992
  • A low loss optical waveguide of $P_{2}O_{5}-SiO_{2}$on Si substrate is produced by using the chemical vapour deposition method of $SiO_2$ thin films used in Si technology. Propagation loss of the waveguide layer was 1.65 dB/cm as produced and reduced down to 0.1 dB/cm after heat treatment at $1100^{\circ}C$. By using laser lithography and reactive ion etching method $P_{2}O_{5}-SiO_{2}$ waveguide was produced and subsequently annealed at $1100^{\circ}C$.As a result of this annealing the shape of the waveguide core was changed from rectangular to semi-circular form, and the propagation loss was reduced as down to 0.03 dB/cm at 0.6328$\mu$m and 0.04dB/cm at 1.53$\mu$m. We think that the mechanism of the reduction in propagation loss during the heat treatment is the following: 1) The hydrogen bonding in waveguide layer, which causes absorption loss, is dissociated and diffused out. 2) The roughness of the interface and the micro-structure of the waveguide layer is removed. 3) The irregularities in the cross-sectional shape of the waveguide which was induced during the lithographic process were disappeared by flowing of the waveguide core.

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Application of 3D printer in dental clinic (치과 진료실에서 3D 프린트의 활용)

  • Kim, Hyun Dong
    • Journal of the Korean Academy of Esthetic Dentistry
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    • v.27 no.2
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    • pp.82-96
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    • 2018
  • 3D printing is a process of producing 3d object from a digital file in STL format by joining, bonding, sintering or polymerizing small volume elements by layer. The various type of 3d printing is classified according to the additive manufacturing strategies. Among the types of 3D printer, SLA(StereoLithography Apparatus) and DLP(Digital Light Processing) 3D printer which use polymerization by light source are widely used in dental office. In the previous study, a full-arch scale 3d printed model is less precise than a conventional stone model. However, in scale of quadrant arch, a 3d printed model is significantly precise than a five-axis milled model. Using $3^{rd}$ Party dental CAD program, full denture, provisional crowns and diagnostic wax-up model are fabricated by 3d printer in dental office. In Orthodontics, based on virtual setup model, indirect bracket bonding tray can be generated by 3d printer. And thermoforming clear aligner can be fabricated on the 3d printed model. 3D printed individual drilling guide enable the clinician to place the dental implant on the proper position. The development of layer additive technology enhance the quality of 3d printing object and shorten the operating time of 3D printing. In the near future, traditional dental laboratory process such as casting, denture curing will be replaced by digital 3D printing.

Fabrication and application of cell-based microfluidic chip for eye-irritation test of chemicals (화학 물질의 안자극 시험용 세포 기반 미세유체 칩의 제작 및 응용)

  • Cho, Sujin;Rhee, Seog Woo
    • Analytical Science and Technology
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    • v.34 no.6
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    • pp.275-283
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    • 2021
  • This study presents the development of cell-based microfluidic chips for the performance of acute eye irritation tests due to chemicals and examined some of their applications. Microfluidic chips were fabricated by photolithography and soft lithography, and they had three compartments with different areas for cell culture. Rabbit corneal epithelial cells were used for the eye irritation test. The death of cells cultured inside the chip was monitored at regular time intervals after treatment with an aqueous solution of chemicals, and the cell death rate constants were calculated based on the viability curve. The performance of the microfluidic chip was verified by examining the effects of cell-cell junctions, cell-substrate adhesion, and initial cell numbers compared to cell death rates. Eye irritation tests were performed at various concentrations of an aqueous solution of sodium dodecyl sulfate (SDS), a standard substance for the eye irritant test. The cells were exposed to the SDS aqueous solution for 300 s, and the resulting eye irritation was assessed by cell viability. Finally, the equation for calculating the toxicity score (TS) was derived based on the weighting factor for each compartment in the chip. The cell-based microfluidic chip developed in this study may be used for eye irritation tests from chemicals used in cosmetics and pharmaceuticals.

A Study on Hydrophobic Surface Treatment for Microfluidic System Fabrication Based on SLA 3D Printing Method (SLA 3D 프린팅 방식 기반의 미세 유체 시스템 제작을 위한 소수성 표면 처리 연구)

  • Jae Uk Heo;Seo Jun Bae;Do Jin Im
    • Korean Chemical Engineering Research
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    • v.62 no.1
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    • pp.105-111
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    • 2024
  • The SLA (Stereolithography Apparatus) method is a type of 3D printing technique predicated on the transformation of liquid photocurable resin into a solid form through UV laser exposure, and its application is increasing in various fields. In this study, we conducted research to enhance the hydrophobicity and transparency of SLA 3D printing surfaces for microfluidic system production. The enhancement of surface hydrophobicity in SLA outputs was attainable through the application of hydrophobic coating methods, but the coating durability under different conditions varied depending on the type of hydrophobic coating. Additionally, to simultaneously achieve the required transparency and hydrophobic properties for the fabrication of microfluidic systems, we applied hydrophobic coatings to the proposed transparency enhancement method from prior research and compared the changes in contact angles. Teflon coating was proposed as a suitable hydrophobic coating method for the fabrication of microfluidic systems, given its excellent transparency and high coating durability in various environmental conditions, in comparison to titanium dioxide coating. Finally, we produced an Electrophoresis of Charged Droplet (ECD) chip, one of the digital microfluidics systems, using SLA 3D printing with the proposed Teflon coating method (Fluoropel 800). Droplet manipulation was successfully demonstrated with the fabricated chip, confirming the potential application of SLA 3D printing technology in the production of microfluidic systems.

Efficacy and Accuracy of Patient Specific Customize Bolus Using a 3-Dimensional Printer for Electron Beam Therapy (전자선 빔 치료 시 삼차원프린터를 이용하여 제작한 환자맞춤형 볼루스의 유용성 및 선량 정확도 평가)

  • Choi, Woo Keun;Chun, Jun Chul;Ju, Sang Gyu;Min, Byung Jun;Park, Su Yeon;Nam, Hee Rim;Hong, Chae-Seon;Kim, MinKyu;Koo, Bum Yong;Lim, Do Hoon
    • Progress in Medical Physics
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    • v.27 no.2
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    • pp.64-71
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    • 2016
  • We develop a manufacture procedure for the production of a patient specific customized bolus (PSCB) using a 3D printer (3DP). The dosimetric accuracy of the 3D-PSCB is evaluated for electron beam therapy. In order to cover the required planning target volume (PTV), we select the proper electron beam energy and the field size through initial dose calculation using a treatment planning system. The PSCB is delineated based on the initial dose distribution. The dose calculation is repeated after applying the PSCB. We iteratively fine-tune the PSCB shape until the plan quality is sufficient to meet the required clinical criteria. Then the contour data of the PSCB is transferred to an in-house conversion software through the DICOMRT protocol. This contour data is converted into the 3DP data format, STereoLithography data format and then printed using a 3DP. Two virtual patients, having concave and convex shapes, were generated with a virtual PTV and an organ at risk (OAR). Then, two corresponding electron treatment plans with and without a PSCB were generated to evaluate the dosimetric effect of the PSCB. The dosimetric characteristics and dose volume histograms for the PTV and OAR are compared in both plans. Film dosimetry is performed to verify the dosimetric accuracy of the 3D-PSCB. The calculated planar dose distribution is compared to that measured using film dosimetry taken from the beam central axis. We compare the percent depth dose curve and gamma analysis (the dose difference is 3%, and the distance to agreement is 3 mm) results. No significant difference in the PTV dose is observed in the plan with the PSCB compared to that without the PSCB. The maximum, minimum, and mean doses of the OAR in the plan with the PSCB were significantly reduced by 9.7%, 36.6%, and 28.3%, respectively, compared to those in the plan without the PSCB. By applying the PSCB, the OAR volumes receiving 90% and 80% of the prescribed dose were reduced from $14.40cm^3$ to $0.1cm^3$ and from $42.6cm^3$ to $3.7cm^3$, respectively, in comparison to that without using the PSCB. The gamma pass rates of the concave and convex plans were 95% and 98%, respectively. A new procedure of the fabrication of a PSCB is developed using a 3DP. We confirm the usefulness and dosimetric accuracy of the 3D-PSCB for the clinical use. Thus, rapidly advancing 3DP technology is able to ease and expand clinical implementation of the PSCB.