• Title/Summary/Keyword: Light-extraction optical film

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Fabrication and Optical Properties of 2D Photonic Crystal Assisted Thin Film Phosphors

  • Oh, Jeong-Rok;Ko, Ki-Young;Do, Young-Rag
    • 한국정보디스플레이학회:학술대회논문집
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    • 2008.10a
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    • pp.594-597
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    • 2008
  • This presentation introduces a simple strategy for producing 2D photonic crystal layers (PCL) with different structures. In an attempt to improve extraction efficiency from the thin film phosphors (TFPs), this study have examined the effects of the structural variables of the 2D PCLs on the light extraction efficiency of TFPs.

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Light Efficiency Enhancement Technology of OLED: Fabrication of Random Nano External Light Extraction Composite Layer (OLED의 광 효율 향상 기술: 랜덤 나노 외부 광 추출 복합 층 제작)

  • Choi, Geun Su;Jang, Eun Bi;Seo, Ga Eun;Park, Young Wook
    • Journal of the Semiconductor & Display Technology
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    • v.21 no.3
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    • pp.39-44
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    • 2022
  • The light extraction technology for improving the light efficiency of OLEDs is the core technology for extracting the light inside the OLEDs to the outside. This study demonstrates a simple method to generate random nanostructures (RNSs) containing high refractive index nanoparticles to improve light extraction and viewing angle characteristics. A simple dry low-temperature process makes the nanostructured scattering layer on the polymer resin widely used in the industry. The scattering layer has the shape of randomly distributed nanorods. To control optical properties, we focused on changing the shape and density of RNSs and adjusting the concentration of high refractive index nanoparticles. As a result, the film of the present invention exhibits a perpendicular transmittance of 85% at a wavelength of 550 nm. This film was used as a scattering layer to reduce substrate mode loss and improve EL efficiency in OLEDs.

Electrical and Optical Properties of Top Emission OLEDs with CsCl Passivation Layer (CsCl 보호막을 이용한 전면발광 OLED의 전기 및 광학적 특성)

  • Kim, So-Youn;Moon, Dae-Gyu;Han, Jeong-In
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.21 no.2
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    • pp.173-177
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    • 2008
  • We have developed the transparent passivation layer for top emission organic light emitting diodes using CsCl thin film by the thermal evaporation method. The CsCl film was deposited on the Ca/Ag semitransparent cathode. The optical transmittance of Ca/ Ag/CsCl triple layer is higher than that of Ca/Ag double layer in the visible range. The device with a structure of glass/Ni/2-TNATA/a-NPD/Alq3:C545T/BCP/Alq3/Ca/Ag/CsCl results in higher efficiency than the device without CsCl passivation layer. The device without CsCl thin film shows a current efficiency of 7 cd/A, whereas the device passivated with CsCl layer shows an efficiency of 10 cd/A. This increase of efficiency isresulted from the increased optical extraction by the CsCl passivation layer.

Fabrication of Viewing Angle Direction Brightness-Enhancement Optical Films using Surface Textured Silicon Wafers

  • Jang, Wongun;Shim, Hamong;Lee, Dong-Kil;Park, Youngsik;Shin, Seong-Seon;Park, Jong-Rak;Lee, Ki Ho;Kim, Insun
    • Journal of the Optical Society of Korea
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    • v.18 no.5
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    • pp.569-573
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    • 2014
  • We demonstrate a low-cost, superbly efficient way of etching for the nano-, and micro-sized pyramid patterns on (100)-oriented Si wafer surfaces for use as a patterned master. We show a way of producing functional optical films for the viewing angle direction brightness-enhancement of Lambertian LED (light emitting diode)/OLED (organic light emitting diode) planar lighting applications. An optimally formulated KOH (Potassium hydroxide) wet etching process enabled random-positioned, and random size-distributed (within a certain size range) pyramid patterns to be developed over the entire (100) silicon wafer substrates up to 8" and a simple replication process of master patterns onto the PC (poly-carbonate) and PMMA (poly-methyl methacrylate) films were performed. Haze ratio values were measured for several film samples exhibiting excellent values over 90% suitable for LED/OLED lighting purposes. Brightness was also improved by 13~14% toward the viewing angle direction. Computational simulations using LightTools$^{TM}$ were also carried out and turned out to be in strong agreement with experimental data. Finally, we could check the feasibility of fabricating low-cost, large area, high performance optical films for commercialization.

Roll-to-roll microcontact-printed microlens array for light extraction film of organic light-emitting diodes (유기발광다이오드의 외부 광추출층을 위한 롤투롤 마이크로컨택 방식으로 인쇄된 마이크로렌즈 어레이)

  • Hwa, Subin;Sung, Baeksang;Lee, Jae-Hyun;Lee, Jonghee;Kim, Min-Hoi
    • Journal of IKEEE
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    • v.26 no.2
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    • pp.205-210
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    • 2022
  • We demonstrated roll-to-roll microcontact printed (mCP) microlens array (MLA) to enhance the light extraction of organic light emitting diodes (OLEDs). The commercially provided microlens array is used as a template for polydimethylsiloxane (PDMS) roll stamp. The fluorinated film is formed on the PDMS roll stamp from fluorinated ink with low boiling point and printed onto the bottom side of the organic light emitting diode without high pressure and high thermal treatment. With optimized concentration of ink, the pattern which is almost identical to that of the template MLA was successfully printed. Due to the structure and low optical absorbance of microcontact printed MLA, the external quantum efficiency of OLED was improved by about 18%.

GaN Film Growth Characteristics Comparison in according to the Type of Buffer Layers on PSS (PSS 상 버퍼층 종류에 따른 GaN 박막 성장 특성 비교)

  • Lee, Chang-Min;Kang, Byung Hoon;Kim, Dae-Sik;Byun, Dongjin
    • Korean Journal of Materials Research
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    • v.24 no.12
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    • pp.645-651
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    • 2014
  • GaN is most commonly used to make LED elements. But, due to differences of the thermal expansion coefficient and lattice mismatch with sapphire, dislocations have occurred at about $109{\sim}1010/cm^2$. Generally, a low temperature GaN buffer layer is used between the GaN layer and the sapphire substrate in order to reduce the dislocation density and improve the characteristics of the thin film, and thus to increase the efficiency of the LED. Further, patterned sapphire substrate (PSS) are applied to improve the light extraction efficiency. In this experiment, using an AlN buffer layer on PSS in place of the GaN buffer layer that is used mainly to improve the properties of the GaN film, light extraction efficiency and overall properties of the thin film are improved at the same time. The AlN buffer layer was deposited by using a sputter and the AlN buffer layer thickness was determined to be 25 nm through XRD analysis after growing the GaN film at $1070^{\circ}C$ on the AlN buffer CPSS (C-plane Patterned Sapphire Substrate, AlN buffer 25 nm, 100 nm, 200 nm, 300 nm). The GaN film layer formed by applying a 2 step epitaxial lateral overgrowth (ELOG) process, and by changing temperatures ($1020{\sim}1070^{\circ}C$) and pressures (85~300 Torr). To confirm the surface morphology, we used SEM, AFM, and optical microscopy. To analyze the properties (dislocation density and crystallinity) of a thin film, we used HR-XRD and Cathodoluminescence.

Thickness Measurement of a Transparent Thin Film Using Phase Change in White-Light Phase-Shift Interferometry

  • Kim, Jaeho;Kim, Kwangrak;Pahk, Heui Jae
    • Current Optics and Photonics
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    • v.1 no.5
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    • pp.505-513
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    • 2017
  • Measuring the thickness of thin films is strongly required in the display industry. In recent years, as the size of a pattern has become smaller, the substrate has become larger. Consequently, measuring the thickness of the thin film over a wide area with low spatial sampling size has become a key technique of manufacturing-yield management. Interferometry is a well-known metrology technique that offers low spatial sampling size and the ability to measure a wide area; however, there are some limitations in measuring the thickness of the thin film. This paper proposes a method to calculate the thickness of the thin film in the following two steps: first, pre-estimation of the thickness with the phase at the peak position of the interferogram at the bottom surface of the thin film, using white-light phase-shift interferometry; second, accurate correction of the measurement by fitting the interferogram with the theoretical pattern through the estimated thickness. Feasibility and accuracy of the method has been verified by comparing measured values of photoresist pattern samples, manufactured with the halftone display process, to those measured by AFM. As a result, an area of $880{\times}640$ pixels could be measured in 3 seconds, with a measurement error of less than 12%.

OLED Light Enhancement with Nanostructured Films

  • Lamansky, Sergey;Le, Ha;Hao, Encai;Stegall, David;Wang, Ding;Lu, Yi;Zhang, Jun-Ying;Smith, Terry L.;Gardiner, Mark;Kreilich, Leslie;Anim-Addo, Jonathan;McCormick, Fred B.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.282-285
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    • 2009
  • Nanostructured OLED light extraction films have been made via roll-to-roll coating processes. Their on-axis and integrated outcoupling efficiencies reach 2X and 1.3-1.8X, respectively. Optical performance and effects of the nanostructured film on pixel blur and image ghosting will be discussed.

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Carbon nanotube/silicon hybrid heterojunctions for photovoltaic devices

  • Castrucci, Paola
    • Advances in nano research
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    • v.2 no.1
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    • pp.23-56
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    • 2014
  • The significant growth of the Si photovoltaic industry has been so far limited due to the high cost of the Si photovoltaic system. In this regard, the most expensive factors are the intrinsic cost of silicon material and the Si solar cell fabrication processes. Conventional Si solar cells have p-n junctions inside for an efficient extraction of light-generated charge carriers. However, the p-n junction is normally formed through very expensive processes requiring very high temperature (${\sim}1000^{\circ}C$). Therefore, several systems are currently under study to form heterojunctions at low temperatures. Among them, carbon nanotube (CNT)/Si hybrid solar cells are very promising, with power conversion efficiency up to 15%. In these cells, the p-type Si layer is replaced by a semitransparent CNT film deposited at room temperature on the n-doped Si wafer, thus giving rise to an overall reduction of the total Si thickness and to the fabrication of a device with cheaper methods at low temperatures. In particular, the CNT film coating the Si wafer acts as a conductive electrode for charge carrier collection and establishes a built-in voltage for separating photocarriers. Moreover, due to the CNT film optical semitransparency, most of the incoming light is absorbed in Si; thus the efficiency of the CNT/Si device is in principle comparable to that of a conventional Si one. In this paper an overview of several factors at the basis of this device operation and of the suggested improvements to its architecture is given. In addition, still open physical/technological issues are also addressed.

Feasibility Study of the Light-outcoupling Characteristics of a Diffraction-grating-imprinted Light-guide Plate for an LCD Backlight Unit (LCD 백라이트 유닛의 서브 마이크론 회절 격자 도광판의 광 출사 특성 연구)

  • Choi, Hwan Young
    • Korean Journal of Optics and Photonics
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    • v.31 no.4
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    • pp.176-182
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    • 2020
  • The possibility of replacing the condensing-prism film used in conventional backlight units with a light-guide plate engraved with a submicrometer-periodic diffraction grating was investigated. The optimal period for the diffraction grating was determined through simulation and experiment, and the transmission-mode efficiency of the diffraction grating was calculated in terms of the polar angle and azimuthal angle of the incident light. In addition, the effects of the two methods of optimizing the polar angle and the directional angle were compared by simulation, by suggesting the shape and configuration of the light-guide plate, so that more light could be extracted by diffraction. By using a ray-tracing program, the luminance angular distribution of the light-guide plate engraved with the diffraction grating was calculated and compared to the luminance angular distribution for each actual prototype.