• 한국정보디스플레이학회:학술대회논문집
• /
• 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
• /
• pp.752-754
• /
• 2009

High efficiency white organic light emitting diodes were fabricated by using an alignment free mask patterning method. Only red/green emission without any blue emission was observed in the red/green patterned region and blue emission was emitted in other area. A combination of the red/green and blue emission gave a high efficiency white emission. A maximum current efficiency of 30.7 cd/A and a current efficiency of 25.9 cd/A at 1000 cd/$m^2$ were obtained with a color coordinate of (0.38, 0.45).

• 한국정밀공학회지
• /
• 제24권1호
• /
• pp.71-78
• /
• 2007

Abrasive jet machining (AJM) has been traditionally used for removing rusts or paints. Nowadays, this is promising technology for micro bulk machining where brittle substrate materials are used. In order to get accurate details, masks such as metal, polymer or elastomer is inevitable. Among them, photo polymer which is sensitive to the light has been attractive for it's high accuracy using photolithography. In this research, SU-8 as a photo polymer is used since it is adequate for making thick mask. So, this paper describes how to make AJM masks using SU-8 with a photolithography process, and investigates the characteristics of SU-8 masks during AJM process. Also, an example of fabrication using AJM was shown.

• 정보저장시스템학회논문집
• /
• 제7권1호
• /
• pp.42-46
• /
• 2011

Holographic Data Storage System (HDSS), one of the next generation data storage devices, is a 2-dimensional page oriented memory system using volume hologram. HDSS has many noise sources such as crosstalk, scattering and inter pixel interference, etc. The noise source is changing intensity of the light used for carrying the data signal in HDSS. The inter pixel interference results in decrease of Signal to Noise Ratio and increase of Bit Error Rate. In order to improve these problems, this paper proposes to compensate the inter pixel interference with simple interference mask.

• 한국정보통신학회논문지
• /
• 제25권3호
• /
• pp.490-493
• /
• 2021

This paper proposes an embedded system that detects mask and face recognition based on a microprocessor instead of Nvidia Jetson Board what is popular development kit. We use a class of efficient models called Mobilenets for mobile and embedded vision applications. MobileNets are based on a streamlined architechture that uses depthwise separable convolutions to build light weight deep neural networks. The device used a Maix development board with CNN hardware acceleration function, and the training model used MobileNet_V2 based SSD(Single Shot Multibox Detector) optimized for mobile devices. To make training model, 7553 face data from Kaggle are used. As a result of test dataset, the AUC (Area Under The Curve) value is as high as 0.98.

• 한국전기전자재료학회논문지
• /
• 제19권6호
• /
• pp.538-546
• /
• 2006

We report on characteristics of specially designed inductively-coupled-plasma chemical vapor deposition (ICP-CVD) system for top-emitting organic light emitting diodes (TOLEDs). Using high-density plasma on the order of $10^{11}$ electrons/$cm^3$ generated by linear-type antennas connected in parallel and specially designed substrate cooling system, a 100 nm-thick transparent $SiN_{x}$ passivation layer was deposited on thin Mg-Ag cathode layer at substrate temperature below $50\;^{\circ}C$ without a noticeable plasma damage. In addition, substrate-mask chucking system equipped with a mechanical mask aligner enabled us to pattern the $SiN_x$ passivation layer without conventional lithography processes. Even at low substrate temperature, a $SiN_x$ passivation layer prepared by ICP-CVD shows a good moisture resistance and transparency of $5{\times}10^{-3}g/m^2/day$ and 92 %, respectively. This indicates that the ICP-CVD system is a promising methode to substitute conventional plasma enhanced CVD (PECVD) in thin film passivation process.

• 한국정밀공학회지
• /
• 제22권1호
• /
• pp.199-206
• /
• 2005

Mask manufacturing is a high COC and COO process in developing of semiconductor devices because of mask production tool with high resolution. Direct writing has been thought to be the one of the patterning method to cope with development or small-lot production of the device. This study consists two categories. One is the additional process of the direct and maskless patterning generation using SLA for easy and convenient application and the other is a removal process using wet-etching process. In this study, cured status of epoxy pattern is most important parameter because of the beer-lambert law according to the diffusion of UV light. In order to improve the contact force between patterns and substrate, prime process was performed and to remove the semi-cured resin which makes a bad effects to the pattern, spin cleaning process using TPM was also performed. At a removal process, contact force between photo-curable resin as an etching mask and Si wafer is important parameter.

• 한국산업보건학회지
• /
• 제30권2호
• /
• pp.124-133
• /
• 2020

Objectives: Mask fit is a crucial factor in preventing respiratory infections among healthcare workers. The current coronavirus(COVID-19) pandemic calls for the replacement of imported N95 medical masks with domestic N95 versions. In this study, we aimed to determine whether these masks provide proper protection. Methods: Thirty-five participants from three healthcare institutions donned four types of masks and Quantitative Fit Tests(Portacount, USA) were performed. The order of fit test for the four types of masks was randomized, and a three-minute washout period was applied between test times(2 min 29 sec) to reduce potential error stemming from physical exhaustion. Results: There were no significant differences in the Fit Factor for the four types of masks, and there were no gender differences. However, the Fit Factor significantly differed across the three healthcare institutions (p=0.007). With eight of the 35 participants passing, the pass rate with the criteria of 100 or higher was 21%. Conclusions: The mask used in this study was a new domestic N95 medical mask, and the participants were unfamiliar with how to wear it. They reported difficulties with mask fitting. In light of a previous finding that mask fit improved with frequently used masks, wearer preferred masks, or when masks that are regularly worn are used during fit training, the fact that participants were unfamiliar with the mask used in this study is a limitation that should not be overlooked.

• 대한한의학회지
• /
• 제31권5호
• /
• pp.60-63
• /
• 2010

Objectives: The purpose was to take a closer look at the fundamental principles of Intense Pulsed Light (IPL) and to investigate its clinical applications for Korean medical fields. Results: IPL is a type of light treatment that is employed by radiating the short-pulse wave, which is transformed from high-intensity light. It may be used to stimulate skin along meridian channels in clinical fields of Korean medicine like acupuncture, moxibustion, cupping therapy, Guasha therapy, and other related traditional techniques. So, it may be feasible to treat not only lentigines, freckles, facial dermatitis, and acne, but also other applications. In addition, it could be recommended for use with herb remedies or herb facial mask packs. Conclusions: IPL may be a plausible method in phototherapy of Korean medicine.

• 한국광학회:학술대회논문집
• /
• 한국광학회 2004년도 하계학술발표회
• /
• pp.130-131
• /
• 2004

• 정신신체의학
• /
• 제32권1호
• /
• pp.10-23
• /
• 2024

본 연구는 코로나19 팬데믹 동안 마스크 착용자에 대한 매력도와 사회적 인식 변화를 고찰한다. 코로나19 이전에는 마스크가 감염 신호로 여겨져 매력도를 감소시켰으나, 팬데믹 이후 마스크 착용이 일상화되면서 인식 메커니즘이 복잡해졌다. 마스크 착용자에 대한 매력도와 사회적 인식은 착용자의 기본 매력도, 인종, 마스크에 대한 인식 등에 따라 달라진다. 이로 인해 연구 결과가 일관되지 않다. 이는 실험 방법의 불일치와 피험자 개인차를 고려하지 못한 결과다. 정신의학적 관점에서 팬데믹 상황에서의 매력 인식을 연구하기 위해서는 행동면역계와 관련된 심리적 메커니즘을 중심으로 새로운 가설을 수립하고 검증해야 한다. 이는 대인 지각과 혐오가 정신건강에 미치는 영향을 이해하는 데 중요한 단서를 제공할 수 있다.