• Title/Summary/Keyword: Lattice Defect

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A Study on the Defect Annealing of Hafnium Metal By Positron Annihilation Techniques (양전자소멸기법을 이용한 하프늄금속의 격자결함 회복에 관한 연구)

  • Kang, Myung-Soo;Jung, Sung-Hoon;Yoon, Young-Ku;Park, Yong-Ki
    • Nuclear Engineering and Technology
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    • v.25 no.1
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    • pp.71-79
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    • 1993
  • Positron annihilation characteristics and microhardness of 25% cold worked and isochronally annealed hafnium specimens were measured to study recovery and recrystallization stages of hafnium specimens. The annihilation lifetime of positrons in hafnium has been measured for the distinct cases of annihilation in the annealed lattice and annihilation after trapping at lattice defects generated by cold deformation at room temperature. The annihilation lifetime in the annealed lattice was 187 $\pm$3.7 psec, whereas it was 217 $\pm$ 4.2 psec for positrons trapped at deformation-induced defects (mostly dislocations). The changes in Doppler broadening and hardness showed similar trend in the recrystallization range, however, the measured value of Doppler broadening variation were quite sensitive to changes in the recovery region in which the variation in hardness value was completely insensitive. Recovery of cold worked hafnium initiated at about 623 K and recrystallization occurred at around 1023 K.

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Defect Formatìon and Annealìng Behavìor in MeV Si Self-Implanted Silicon (MeV Si 자기 이온주입된 단결정 Silicon내의 결함 거동)

  • Cho, Nam-Hoon;Jang, Ki-Wan;Suh, Kyung-Soo;Lee, Jeoung-Yong;Ro, Jae-Sang
    • Korean Journal of Materials Research
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    • v.6 no.7
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    • pp.733-741
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    • 1996
  • In this study MeV Si self ion implantations were done to reveal the intrinsic behavior of defect formation by excluding the possibility of chemical interactions between substrate atoms and dopant ones. Self implantations were conducted using Tandem Accelerator with energy ranges from 1 to 3 MeV. Defect formation by high energy ion implantation has a significant characteristics in that the lattice damage is concentrated near Rp and isolated from the surface. In order to investigate the energy dependence on defect formation, implantation energies were varied from 1 to 3 MeV under a constant dose of $1{\times}10^{15}/cm^2$. RBS channe!ed spectra showed that the depth at which as-implanted damaged layer formed increases as energy increases and that near surface region maintains better crystallinity as energy increases. Cross sectional TEM results agree well with RBS ones. In a TEM image as-implanted damaged layer appears as a dark band, where secondary defects are formed upon annealing. In the case of 2 MeV $Si^+$ self implantation a critical dose for the secondary defect formation was found to be between $3{\times}10^{14}/cm^24$ and $5{\times}10^{14}/cm^2$. Upon annealing the upper layer of the dark band was removed while the bottom part of the dark band did not move. The observed defect behavior by TEM was interpreted by Monte Carlo computer simulations using TRIM-code. SIMS analyses indicated that the secondary defect formed after annealing gettered oxygen impurities existed in silicon.

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Evaluation of crystallinity and defect on (100) ZnTe/GaAs grown by hot wall epitaxy

  • Kim, Beong-Ju
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.12 no.6
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    • pp.299-303
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    • 2002
  • The relationship of crystallinity between defects distribution with (100) ZnTe/GaAs using HWE growth was investigated by four crystal rocking curve (FCRC) and transmission electron microscopy (TEM). The thickness dependence of crystal quality in ZnTe epilayer was evaluated. The FWHM value shows a strong dependence on ZnTe epilayer thickness. For the films thinner than 6 ${\mu}{\textrm}{m}$, the FWHM value decreases very steeply as the thickness increases. For the films thicker than 6 ${\mu}{\textrm}{m}$, it becomes an almost constant value. At the thickness of 12 $\mu\textrm{m}$ with the smallest value of 66 arcsec. which is the best value so far reported on ZnTe epilayers was obtained. Investigation into the nature and behavior of dislocations with film thickness in (100) ZnTe/(100)GaAs heterostructures grown by Hot Wall Epitaxy (HWE). This film defects range from interface to 0.7 ${\mu}{\textrm}{m}$ thickness was high density, due to the large lattice mismatch and thermal expansion coefficients. The thickness of 0.7~1.8 ${\mu}{\textrm}{m}$ was exists low defect density. In the thicker range than 1.8 ${\mu}{\textrm}{m}$ thickness was measured hardly defects.

A Study on the Optical Properties of HgGa2S4 Single Crystal (HgGa2S4 단결정의 광학적 특성연구)

  • 이관교;이상열;강종욱;이봉주;김형곤;현승철;방태환
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.11
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    • pp.969-974
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    • 2003
  • HgGa$_2$S$_4$ single crystals were grown by the chemical transport reaction method. The HgGa$_2$S$_4$ single crystal crystallized into a defect chalcopyrite structure (I 4). The lattice constants of the single crystal were found to be a = 5.635 $\AA$ and c = 10.473 $\AA$. The direct and indirect optical energy gaps were found to be 2.84eV and 2.78eV, respectively. Photoluminescence peaks of HgGa$_2$S$_4$ single crystal were observed at 2.37 eV, 2.18 eV, and 1.81 eV. In the single crystal, the donor level of 0.25 eV, the acceptor levels of 0.97 eV and 0.41 eV were obtained by TSC, PICTS, and absorption measurements. The photoluminescence peaks were analyzed to relate to the indirect conduction band, the donor level, and the acceptor levels.

Optical properties of $HgGa_2S_4$ single crystal ($HgGa_2S_4$ 단결정의 광학적 특성)

  • Kim, H.G.;Kim, N.O.;Kim, B.C.;Choi, Y.I.;Kim, D.T.;Hyun, S.C.;Bang, T.H.;Lee, K.S.;Gu, H.B.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.05c
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    • pp.47-52
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    • 2004
  • $HgGa_2S_4$ single crystals were grown by the chemical transport reaction method. The $HgGa_2S_4$ single crystal crystallized into a defect chalcopyrite structure $(I\bar{4})$. The lattice constants of the single crystal were found to be a=5.635 ${\AA}$ and c=10.473 ${\AA}$. The direct and indirect optical energy gaps were found to be 2.84 eV and 2.78 eV, respectively. Photoluminescence peaks of $HgGa_2S_4$ single crystal were observed at 2.37 eV, 2.18 eV, and 1.81 eV. In the single crystal, the donor level of 0.25 eV, the acceptor levels of 0.97 eV and 0.41 eV were obtained by TSC, PICTS, and absorption measurements. The photoluminescence peaks were analyzed to relate to the indirect conduction band, the donor level, and the acceptor levels.

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Specific Heat Characteristics of Ceramic Fuels (산화물핵연료의 비열특성)

  • Kang Kweon Ho;Park Chang Je;Ryu Ho Jin;Song Kee Chan;Yang Myung Seung;Moon Heung Soo;Lee Young Woo;Na Sang Ho
    • Journal of Energy Engineering
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    • v.13 no.4
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    • pp.259-266
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    • 2004
  • Specific heat mechanism of oxide fuel is contributed by lattice vibration, dilatation, conduction electron and defect and excess specific heat. Model of oxide fuel for specific heat consists of specific heat at constant pressure term, dilatation specific heat term and defect specific heat term. In this study experimental and published data on the specific heats of oxide nuclear fuels have been reviewed and analyzed to recommend the best fitting model. The oxide fuels considered in this paper were UO$_2$, mixed (U, Pu) oxides and spent fuel. The specific heat data of spent fuel has been replaced by that of simulated fuel.

Infrared Spectra and Electrical Conductivity of The Solid Solutions X MgO + (1-X) ${\alpha}-Nb_2$ $O_5$; 0.01{\leq}X{\leq}0.09

  • Park Zin;Park, Jong Sik;Lee Dong Hoon;Jun Jong Ho;Yo Chul Hyun;Kim Keu Hong
    • Bulletin of the Korean Chemical Society
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    • v.13 no.2
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    • pp.127-131
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    • 1992
  • Changes in network structures of ${\alpha}-Nb_2O_5$ in the X MgO+(1-X) ${\alpha}-Nb_2O_5$ solid solutions occurring as the MgO doping level (X) was varied were investigated by means of infrared spectroscopy and X-ray analysis. X-ray diffraction revealed that all the synthesized specimens have the monoclinic structure. The FT-IR spectroscopy showed that the system investigated forms the solid solutions in which $Mg^{2+}$ ions occupy the octahedral sites in parent crystal lattice. Electrical conductivities were measured as a function of temperature from 600 to $1050{\circ}$ and $P_{O2}$ form $1{\times}10^{-5}$ to $2{\times}10^{-1}$ atm. The defect structure and conduction mechanism were deduced from the results. The $1}n$ value in ${\alpha}{\propto}{P_{O2}^{1}n}}$ is found to be -1/4 with single possible defect model. From the activation energy ($E{\alpha}$ = 1.67-1.73 eV) and the1/n value, electronic conduction mechanism is suggested with a doubly charged oxygen vacancy.

The synthesis and properties of point defect structure of Cu2-XZnSnS4 (x=0.1, 0.2, and 0.3)

  • Bui D. Long;Le T. Bang
    • Advances in materials Research
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    • v.13 no.1
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    • pp.55-62
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    • 2024
  • Cu-based sulfides have recently emerged as promising thermoelectric (TE) materials due to their low cost, non-toxicity, and abundance. In this research, point defect structure of Cu2-xZnSnS4 (x=0.1, 0.2, 0.3) samples were synthesized by the mechanical alloying method. Mixed powders of Cu, Zn, Sn and S were milled using high energy ball milling at a rotation speed of 300 rpm in Ar atmosphere. The milled Cu2-xZnSnS4 powders were heat-treated at 723 K for 24 h, and subsequently consolidated using spark plasma sintering (SPS) under an applied pressure of 60 MPa for 15 min. The thermal conductivity of the sintered Cu2-xZnSnS4 samples was evaluated. A well-defined Cu2-xZnSnS4 powders were successfully formed after milling for 16 h, with the particle sizes mostly distributed in the range of 60-100 nm. The lattice constants of aand cdecreased with increasing composition value x. The thermal conductivity of sintered x=0.1 sample exhibited the lowest value and attained 0.93 W/m K at 673 K.

Role of CaO in the Sintering of 12Ce-TZP Ceramics (12Ce-TZP 세라믹스의 소결에서의 CaO의 역할)

  • 박정현;문성환;박한수
    • Journal of the Korean Ceramic Society
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    • v.29 no.4
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    • pp.265-272
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    • 1992
  • Role of CaO in the sintering of 12Ce-TZP ceramics was studied. The addition of small amounts of CaO increase the densification rate of 12Ce-TZP by altering lattice defect structure and the diffusion coefficient of the rate controlling species, namely cerium and zirconium cations. CaO also inhibits grain growth during sintering and allows the sintering process to proceed to theoretical density by maintaining a high diffusion flux of vacancies from the pores to the grain boundaries. The inhibition of grain growth is accomplished by the segregation of solute at the grain boundaries, causing a decrease in the grain boundary mobility. The segregation of calcium was revealed by AES study.

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Growth and optical properties of undoped and Co-doped CdS single crystals (CdS 및 CdS:Co2+ 단결정의 성장과 광학적 특성)

  • Oh, Gum-kon;Kim, Nam-oh;Kim, Hyung-gon;Hyun, Seung-cheol;Park, hjung;Oh, Seok-kyun
    • The Transactions of the Korean Institute of Electrical Engineers P
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    • v.51 no.3
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    • pp.137-141
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    • 2002
  • CdS and $CdS:Co^{2+}$ single crystals were grown by CTR method using iodine as transport material. The grown single crystals have defect chalcopyrite structure with direct band gap. The optical energy band gap was decreased according to add of Co-impurity. We can observed the Co-impurity optical absorption peaks assigned to the $Co^{2+}$ ion sited at the $T_d$ symmetry lattice and we consider that they were attributed to the electron transitions between energy levels of ions.