• 제목/요약/키워드: Laser lithography

검색결과 158건 처리시간 0.026초

Micro-Lithography를 위한 4 구면경계의 설계 및 수차해석 (Optical CAD and Analyses of Four Spherical Mirror System for Micro-Lithography)

  • 조영민
    • 한국광학회:학술대회논문집
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    • 한국광학회 1991년도 제6회 파동 및 레이저 학술발표회 Prodeedings of 6th Conference on Waves and Lasers
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    • pp.88-89
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    • 1991
  • For the micro-lithography using a KrF excimer laser beam(λ=0.248${\mu}{\textrm}{m}$) a mirror system consisting of four spherical surfaces with reduction magnification 5$\times$ is designed. Initially the aplanat condition of the mirror system is considered. And for the further improved performance of the system the distortion free condition and flat field condition within Seidel 3rd order aberrations are added to the above condition. During the process of designing the computer-aided optimization technique is extensively employed. The spherical aberration, coma, field curvature and distortion of the optimized four-spherical mirror system are removed to the diffraction limit, and residual astigmatism and off-axial vignetting are not corrected enough.

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Roll-to-Roll UV 나노 임프린팅 리소그래피에 의한 대면적 17인치의 나노 와이어 그리드의 제작 (Fabrication of a 17inch Area Size Nano-Wire Grid using Roll-to-Roll UV Nano-Imprinting Lithography)

  • 허종욱;남수용
    • 한국인쇄학회지
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    • 제29권3호
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    • pp.17-30
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    • 2011
  • The polarizer is an important optical element used in a variety of applications. Nano-wire grid polarizers in the form of sub-wavelength metallic gratings are an attractive alternative to conventional polarizers, because they provide high extinction ratio. This study has been carried out to fabrication of the 17inch area size nano-wire grid polarizer(NWGP) The master for NWGPs with a pitch of 200nm and the area size $730mm{\times}450mm$ were fabricated using laser interference lithography and aluminum sputtering and wet etching. And The NWGP fabrication process was using by the Roll to-Roll UV imprinting and was applied to flexible PET film. The results were a transmission of light (Tp) 46.7%, reflectance (Rs) 40.1% and Extinction ratio of above 16 for the visible light range.

Magnetic Force Microscopy (MFM) Study of Remagnetization Effects in Patterned Ferromagnetic Nanodots

  • Chang, Joon-Yeon;Fraerman A. A.;Han, Suk-Hee;Kim, Hi-Jung;Gusev S. A.;Mironov V. L.
    • Journal of Magnetics
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    • 제10권2호
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    • pp.58-62
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    • 2005
  • Periodic magnetic nanodot arrays were successfully produced on glass substrates by interference laser lithography and electron beam lithography methods. Magnetic force microscopy (MFM) observation was carried out on fabricated nanodot arrays. MFM tip induced magnetization effects were clearly observed in ferromagnetic elliptical nanodots varying in material and aspect ratio. Fe-Cr dots with a high aspect ratio show reversible switching of the single domain magnetization state. At the same time, Co nanomagnets with a low aspect ratio exhibit tip induced transitions between the single domain and the vortex state of magnetization. The simple nanolithography is potentially an efficient method for fabrication of patterned magnetic arrays.

고밀도 플라즈마에 의한 EUV 발생기술 (EUV Generation by High Density Plasma)

  • 진윤식;이홍식;김광훈;서길수;임근희
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2000년도 하계학술대회 논문집 C
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    • pp.2092-2094
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    • 2000
  • As a next generation lithography (NGL) technology for VLSI semiconductor fabrication, electron beam, ion beam, X-ray and extreme ultraviolet(EUV) are considered as possible candidates. Among these methods, EUV lithography(EUVL) is thought to be the most probable because it is easily realized by improving current optical lithography technology. In order to set EUV radiation which can be applied to EUVL, it is essential to generate very high density and high temperature plasma stably. The method using a pulse power laser and a high voltage pulse discharge is commonly used to accomplish such a high density and high temperature plasma. In this paper we review the recent trends of the EUV generation technique by high density and high temperature plasma.

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Attenuated Phase Shift Mask에 광 근접 효과 보정을 적용한 고립 패턴의 해상 한계 분석 (Resolution Limit Analysis of Isolated Patterns Using Optical Proximity Correction Method with Attenuated Phase Shift Mask)

  • 김종선;오용호;임성우;고춘수;이재철
    • 한국전기전자재료학회논문지
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    • 제13권11호
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    • pp.901-907
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    • 2000
  • As the minimum feature size for making ULSI approaches the wavelength of light source in optical lithography, the aerial image is so hardly distorted because of the optical proximity effect that the accurate mask image reconstruction on wafer surface is almost impossible. We applied the Optical Proximity Correction(OPC) on isolated patterns assuming Attenuated Phase Shift Mask(APSM) as well as binary mask, to correct the widening of isolated patterns. In this study, we found that applying OPC to APSM shows much better improvement not only in enhancing the resolution and fidelity of t도 images but also in enhancing the process margin than applying OPC to the binary mask. Also, we propose the OPC method of APSM for isolated patterns, the size of which is less than the wavelength of the ArF excimer laser. Finally, we predicted the resolution limit of optical lithography through the aerial image simulation.

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Damage Profile of HDPE Polymer using Laser-Induced Plasma

  • Tawfik, Walid;Farooq, W. Aslam;Alahmed, Z.A.
    • Journal of the Optical Society of Korea
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    • 제18권1호
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    • pp.50-54
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    • 2014
  • In this paper we studied the laser-induced crater depth, mass, and emission spectra of laser-ablated high-density polyethylene (HDPE) polymer using the laser-induced plasma spectroscopy (LIPS) technique. This study was performed using a Nd:YAG laser with 100 mJ energy and 7 ns pulse width, focused normal to the surface of the sample. The nanoscale change in ablated depth versus number of laser pulses was studied. By using scanning electron microscope (SEM) images, the crater depth and ablated mass were estimated. The LIPS spectral intensities were observed for major and minor elements with depth. The comparison between the LIPS results and SEM images showed that LIPS could be used to estimate the crater depth, which is of interest for some applications such as thin-film lithography measurements and online measurements of thickness in film deposition techniques.

UV 레이저 어블레이션에 의한 3차원 형상 미세 구조물의 쾌속제작 (Rapid Manufacturing of 3D-Shaped Microstructures by UV Laser Ablation)

  • 신보성;양성빈;장원석;김재구;김정민
    • 한국정밀공학회지
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    • 제21권7호
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    • pp.30-36
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    • 2004
  • Recently, the lead-time of a product is to be shortened in order to satisfy consumer's demand. It is thus important to reduce the manufacturing time and the cost of 3D-shaped microstructures. Micro-Electro-Mechanical Systems (MEMS) and devices are usually fabricated by lithography-based methods. Above method is not flexible for the rapid manufacture of 3D-shaped microstructures because it depends on work's experiences and requires excessive cost and time for making many masks. In this paper, the effective laser micrornachining is developed to fabricate UV sensitive polymer microstructures using laser ablation. The proposed process, named by laser microRP, is a very useful method on rapid manufacturing for 3D-shaped microstructures.

Ag 두께의 변화에 따른 chalcogenide layer의 회절효율 특성

  • 남기현;정홍배
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 추계학술대회 논문집
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    • pp.197-197
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    • 2009
  • We have investigated the holographic grating formation on Ag-doped amorphous chalcogenide AsGeSeS thin films with Ag thickness. Holographic gratings have been formed using Diode Pumped Solid State laser (DPSS, 532.0nm) under [P:P] polarized the intensity polarization holography. The diffraction efficiency was obtained by +1st order intensity.

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비가간섭광을 이용한 내부전반사 홀로그래픽 리소그라피 (Total-internal-reflection Holographic Photo-lithography by Using Incoherent Light)

  • 이준섭;박우제;이지환;송석호;이성진
    • 한국광학회지
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    • 제20권6호
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    • pp.334-338
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    • 2009
  • 최근 디스플레이 기기의 수요가 증대되면서 대면적 노광에 대한 요구가 증대되고 있는데, 내부전반사(total internal reflection: TIR)홀로그래픽 리소그라피는 대면적 노광을 위한 효과적인 방법으로 연구가 진행되고 있다. TIR 홀로그래피에서는 일반적으로 레이저를 이용하여 영상을 기록하고 재생한다. 그러나 자외선 램프와 같은 비가간섭광을 이용하여 재생한다면, 가간섭성에 의해 나타나는 영상잡음을 줄일 수 있고, 대면적 노광에도 보다 용이할 것이다. TIR 홀로그램의 재생을 위하여 자외선 램프를 이용할 때, 램프의 유한한 선폭과 확산각이 재생 영상에 미치는 영향을 분석하고, 재생패턴에 나타나는 선폭 확대 결과를 실험을 통하여 검증하였다. ${\mu}m$ 규모의 선폭을 갖는 대면적 패턴을 TIR 홀로그램으로부터 얻기 위한 재생 광원으로, 가간섭성 광원인 레이저 대신 저잡음성과 경제성을 갖춘 일반적인 자외선 램프의 사용이 가능할 것으로 기대된다.

Rapid Manufacturing of 3D Micro-products using UV Laser Ablation and Phase-change Filling

  • Shin Bo-Sung;Kim Jae-Gu;Chang Won-Suk;Whang Kyung-Hyun
    • International Journal of Precision Engineering and Manufacturing
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    • 제7권3호
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    • pp.56-59
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    • 2006
  • UV laser micromachining is generally used to create microstructures for micro-products through a sequence of lithography-based photo-patterning steps. However, the micromachining process is not suitable for rapid realization of complex 3D micro-products because it depends on worker experience. In addition, the cost and time required to make many masks are excessive. In this paper, a more effective and rapid micro-manufacturing process, which was developed based on laser micromachining, is proposed for fabricating micro-products directly using UV laser ablation and phase-change filling. The filling process is useful for holding the micro-products during the ablation step. The proposed rapid micro-manufacturing process was demonstrated experimentally by fabricating 3D micro-products from functional UV-sensitive polymers using 3D CAD data.