• Korean Journal of Materials Research
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• v.11 no.9
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• pp.792-796
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• 2001

For electron beam lithography and SEM(scanning electron microscopy) applications, miniaturized electrostatic lenses called a microcolumn have been fabricated. In this paper, we report the fabrication technique for 20~30$\mu\textrm{m}$ apertures of electron lenses based on silicon and Mo membrane using an active Q-switched Nd:YAG laser. Experimental conditions of laser micromachining for silicon and Mo membrane are improved. The geometrical structures, such as the diameter and the preciseness of the micron-size aperture are dependent upon the total energy of the laser pulse train, laser pulse width, and the diameter of laser spot.

• Proceedings of the Polymer Society of Korea Conference
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• 2006.10a
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• pp.231-231
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• 2006

We fabricated a polymer sub-microstructure for optical device application by two-photon-induced laser lithography technique. Polymer pattern could be minimized as small as ${\sim}100\;nm$. The photopolymerization resin contains laser-dye, thus promising a high level of the optical gain. We utilized the lithography technique to the photonic crystal application, where the template of the two-dimensional photonic crystal was modified by polymer gain medium as defect-shape and line-shape orientations. Photonic band gap effect from polymer-doped photonic crystals is expected to exploit the application such as organic solid-state laser device.

• Korean Journal of Optics and Photonics
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• v.8 no.2
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• pp.169-173
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• 1997

Most conventional lithography systems have been oriented to fabricate electronic devices. Therefore, it is not so easy to fabricate large aspect ratios of waveguide patterns with those systems. When considering costs and efficiencies, a laser lithography system provides number of benefit in realizing waveguide patterns. However, because the conventional laser lithography system could make only positive tone masks, it is inconvenient in determining the direction of the waveguide. A simple and reliable technique to produce negative tone masks was developed by using the laser beam writing. This technique was not sensitive to environmental situations such as dust, vibration, intensity variation. Making use of the technique a variety of device patterns such as Y-branch, directional coupler, and highly smooth S-shape bend could be successfully fabricated with a good contrast.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2004.10a
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• pp.123-126
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• 2004

We have demonstrated the fabrication of patterned 3D photonic crystals by holographic lithography in conjunction with soft lithography. Holographic lithography created 3D ordered macroporous structures and soft lithography made tailored defects. Because the hard baked photoresist pattern possessed high resistance against the uncured photoresist solution and the refractive index did not change appreciably by hard baking, a crosslinked photoresist was used as a relief pattern for the holographic fabrication of patterned 3D photonic crystals. More complicated defect geometries might be easily obtained with more complicated patterns on PDMS stamps. Moreover, the present results might be used as templates for 3D PCs of highindex defects that can be exploited as optical waveguides and optical circuits.

• Proceedings of the Optical Society of Korea Conference
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• 1998.08a
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• pp.192-193
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• 1998

At Rutherford Appleton Laboratory(RAL), a high-repetition rate ps exicmer laser-plasma x-ray source has been developed for x-ray lithography with a calibrated output of up to 1 watt X-ray average power at 1nm wavelength. In a previous reports this compact x-ray source was used to print 0.18$\mu$m lines for a gate on Si-FET devices and deep three-dimensional structure with 100$\mu$m length, 25$\mu$m width, and 48 $\mu$m depth for a nanotechnology. The deep X-ray lithography is called as LIGA thchnology and getting a wide interest as a new technology for a nano-device. In this report all this works are summarized.

• Korean Journal of Optics and Photonics
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• v.2 no.4
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• pp.186-192
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• 1991

For the micro-lithography using a excimer laser beam $(\lambda\leq0.248$\mu\textrm{m})$. a mirror system consisting of four spherical surfaces with reductlon magnification 5X is designed. Initially the aplanat, flat field and the distortion free condition of the system are analytically investigated within Seidel 3rd order aberrations. And the computer-aided optimization technique has been employed for the further improved performance of the system. The final system has N.A. of 0.15 and image field diameter 3.3 mm, and has the diffraction-limited performance for KrF eximer laser beam.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2008.06a
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• pp.395-396
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• 2008

• Proceedings of the Optical Society of Korea Conference
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• 1996.09a
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• pp.26-26
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• 1996

• Journal of the Korean Magnetics Society
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• v.17 no.3
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• pp.137-140
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• 2007

The ordering of nanopores in AAO has been improved by using laser interference lithography. After growing Fe and Cu on this substrate in vacuum and removing AAO, Fe nanodots are fabricated. The nanopores in AAO and nanodots are ordered in one dimension following the prepatterning. It has been confirmed from the magnetic hysteresis loop that the Fe nanodots have vortex structure and the dipolar interaction is dominant among them.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2009.06a
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• pp.421-422
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• 2009