• 제목/요약/키워드: Laser grating

검색결과 302건 처리시간 0.024초

전자선 묘화를 이용한 장파장 DFB-LD용 격자 구조의 제작 및 특성 분석 (Fabrication & Characterization of Grating Structures for Long Wavelength DFB-LD Using Electron Beam Lithography)

  • 송윤규;김성준;윤의준
    • 전자공학회논문지A
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    • 제32A권1호
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    • pp.200-205
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    • 1995
  • The 1st and 2nd-order grating structure for long wavelength DFB(Distributed FeedBack) laser diodes are successfully fabricated on InP substrates by using electron beam lithography and reactive ion etch techniques, and also characterized non-destructively by diffraction analysis without removal of photo-resis layer. A new composite layer made by lifted-off Cr layer on thin SiO2 film is developed and used as an etch mask, because PMMA, the e-beamresist, is unsuitable for reactive ion etch of InP. In addition, it is experimentally confiremed that diffraction analysis makes it possible to predict the grating parameters, and the analysis can be used as a non-destructive on-line test to prevent incomplete gratings from being successively processed.

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The moving photocarrier grating technique for the determination of transport parameters in a-Se:As films

  • Park, Chang-Hee;Lee, Kwang-Sei;Kim, Jae-Hyung;Nam, Sang-Hee
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
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    • pp.47-48
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    • 2005
  • The moving photocarrier grating(MPG) technique for the determination of the carrier mobilities and the recombination lifetime in a-Se:As films have been studied. The electron and hole drift mobility and the recombination lifetime of a-Se films with arsenic (As) additions have been obtained. We have found an increase in hole drift mobility and recombination lifetime, especially when 0.3% As is added into a-Se film. However, the electron mobility exhibits no observable change up to 0.5% As addition in a-Se films.0.3% As added a-Se film also exhibits the maximum short circuit current densities per laser intensity of $5.29\times10^{-7}$ A/W.

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펨토초 레이저를 이용한 미세 패터닝 기술 (Periodic patterning using a femtosecond laser)

  • 손익부;이만섭;우정식;이상만;정정용
    • 한국레이저가공학회지
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    • 제8권1호
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    • pp.39-44
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    • 2005
  • We report experimental results on the periodic patterning using a Ti:sapphire femtosecond laser (800nm, 100fs, 1kHz). Periodic structures with reproducible basic patterns are produced both on the surface and inside transparent materials. Period patterning for the application to display panel is widely investigated. Also, the submicron dot and line patterns are fabricated inside fused silica glass, which is important for the formation of diffraction grating in integrated optical circuit. finally, we demonstrate the utility of the femtosecond laser application to optical memory by fabricating the three-dimensional dot patterns.

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피코초 레이저 어블레이션을 이용한 미세 가공 연구 (The Study of Micro Fabrication using Picosecond Laser Ablation)

  • 노지환;손현기;서정;이제훈
    • 한국정밀공학회지
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    • 제27권2호
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    • pp.25-28
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    • 2010
  • The micro fabrication on the mold material using picosecond laser ablation processing has been studied. We used the two kind of system with picosecond laser. First one is two mirror type scanner and telecentric f-theta lens. Second one is X-Y stage and objective lens. By using these system, the $100{\mu}m$ size chess patterning and $2{\mu}m$ size patterning was fabricated. Especially $2{\mu}m$ size patterning on the mold material can be used as the decorative rainbow color logo for industrial field. In this paper, it is proved the picosecond laser is effective tool for the laser ablation processing.

QWS-DFB 레이저에서 회절격자 주기의 랜덤 변이에 따른 주모드 파장 분포의 해석적 근사식 (Approximate Analytical Expression of the Laser Wavelength Distribution Incurred by the Grating Period Fluctuation in QWS-DFB Lasers)

  • 하선용;김상배;나상신
    • 대한전자공학회논문지SD
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    • 제38권9호
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    • pp.616-623
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    • 2001
  • 회절격자의 인접한 반주기 길이 사이에 음의 상관관계가 있는 반주기 길이의 랜덤 변이가 QWS-DFB 레이저의 주모드 파장 분포에 미치는 영향을 유효 굴절률 전달 매트릭스 방법으로 알아보았다. 주모드 파장 분포를 쉽게 파악할 수 있도록 주모드 파장 분포를 회절격자 반주기의 정규화된 표준편차 σΛ와 인접 반주기 랜덤 변이 사이의 상관계수 γ 의 해석적인 근사식으로 나타내었다. 이 확률 밀도 함수는 가우스 분포 함수이며, 그 표준편차는 σΛ가 커질수록 커지고 γ가 -1로 갈수록 작아진다.

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Polymer-waveguide Bragg-grating Devices Fabricated Using Phase-mask Lithography

  • Park, Tae-Hyun;Kim, Sung-Moon;Oh, Min-Cheol
    • Current Optics and Photonics
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    • 제3권5호
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    • pp.401-407
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    • 2019
  • Polymeric optical waveguide devices with Bragg gratings have been investigated, for implementing tunable lasers and wavelength filters used in wavelength-division-multiplexed optical communication systems. Owing to the excellent thermo-optic effect of these polymers, wavelength tuning is possible over a wide range, which is difficult to achieve using other optical materials. In this study the phase-mask technology, which has advantages over the conventional interferometeric method, was introduced to facilitate the fabrication of Bragg gratings in polymeric optical waveguide devices. An optical setup capable of fabricating multiple Bragg gratings simultaneously on a 4-inch silicon wafer was constructed, using a 442-nm laser and phase mask. During fabrication, some of the diffracted light in the phase mask was totally reflected inside the mask, which affected the quality of the Bragg grating adversely, so experiments were conducted to solve this issue. To verify grating uniformity, two types of wavelength-filtering devices were fabricated using the phase-mask lithography, and their reflection and transmission spectra were measured. From the results, we confirmed that the phase-mask method provides good uniformity, and may be applied for mass production of polymer Bragg-grating waveguide devices.

Ag 두께의 변화에 따른 chalcogenide layer의 회절효율 특성

  • 남기현;정홍배
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 추계학술대회 논문집
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    • pp.197-197
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    • 2009
  • We have investigated the holographic grating formation on Ag-doped amorphous chalcogenide AsGeSeS thin films with Ag thickness. Holographic gratings have been formed using Diode Pumped Solid State laser (DPSS, 532.0nm) under [P:P] polarized the intensity polarization holography. The diffraction efficiency was obtained by +1st order intensity.

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0.7 kHz 선폭의 단일 주파수 어븀첨가 광섬유 레이저 (Single-Frequency $Er^{3+}$-Doped Fiber Ring Laser with 0.7 kHz Linewidth)

  • 이정찬;김명욱;전영민;김봉규;고성윤;이상배;김상국;최상삼;이상선
    • 한국광학회:학술대회논문집
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    • 한국광학회 1998년도 제15회 광학 및 양자전자 학술발표회 논문집
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    • pp.88-89
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    • 1998
  • 0.7 kHz linewidth, single-frdquency operation was achieved in apolarization-maintaining Er3+-doped filber ring laser at 1547.7 nm with a compact strure using a filber bragg grating (FBG) and a circulator. The single-frequency operation optput power was 3 mW.

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광섬유격자소자와 응용

  • 한국광학기기협회
    • 광학세계
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    • 통권96호
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    • pp.55-59
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    • 2005
  • 광섬유격자 제조기술과 응용기술의 개발은 다양한 응용분야와 관련하여 광산업분야에 필수적인 요소이다. 또한 평판형 광도파로격자소자는 DWDM등 광전송 기술산업에 핵심적이고 원천적인 연구로서, WDM(Wavelength Division Multiplexing: 파중분할다중방식), Add/Drop Multiplexer 등 분야에 대한 응용기술연구가 필요하다. 광섬유 브래그격자(FBG: Fiber Bragg Grating)는 광통신 시스템의 핵심부품 중 하나이다. 제작공정의 특성상 다른 부품에 비하여 삽입손실(Insertion Loss)이 매우 작고, Fiber Laser, Laser wavelength stabilization, 광섬유 증폭기의 pump reflector, add/drop filter, optical circulator, 광증폭기의 이득평탄화 등 매우 다양한 응용분야를 가지고 있으며, 향후 수요시장이 대폭 증가할 것으로 기대된다.

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