• Journal of KSNVE
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• v.9 no.6
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• pp.1227-1233
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• 1999

Modern technology depends on the reliability of extremely high technology equipments. In the production of semiconductor wafer, optical and electron microscopes, ion-beam, laser device must maintain their alignments within a nanometer. This equipment requires a vibration free environment to provide its proper function. Especially, lithography and inspection devices, which have sub-nanometer class high accuracy and resolution, have come to necessity for producing more improved giga and tera class semiconductor wafers. This high technology equipments require very strict environmental vibration standard, vibration criteria, in proportion to the accuracy of the manufacturing, inspecting devices. This paper deals with the structural dynamic design in high class semiconductor factory in order to be satisfied more strict vibration criteria for high sensitive equipment.

• Proceedings of the KIEE Conference
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• 2007.11a
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• pp.134-135
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• 2007

Two-dimensional photonic crystal structures have been fabricated on the chalcogenide material using holography lithography out of many production technical. The fabricated lattice can be observed obliquely by measuring diffraction pattern. The diffraction pattern of the microstructure has been observed with a He-Ne laser beam at wavelength of 632.8 nm. The diffracted beam has been analyzed by using the diffraction efficiency measurement method.

• Proceedings of the KAIS Fall Conference
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• 2004.06a
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• pp.267-269
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• 2004

본 연구에서는 일반적인 미세구조물 제작공정인 lithography 공정을 이용하지 않고 SLS(Selective Laser sintering)형 RP(Rapid Prototyping system)을 이용하여 패턴의 깊이가 400$\mu$m인 미세구조물을 제작하였다. 제작 공정변수 중 재료의 상태가 new powder 이고 배치각이 $0^{\circ}$ 일 때 패턴의 깊이, 선폭과 표면조도가 가장 잘 구현되었다.

• Proceedings of the Korean Society for Noise and Vibration Engineering Conference
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• 2001.11b
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• pp.1376-1383
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• 2001

Modem technology depends on the reliability of extremely high technology equipments. In the production of semiconductor wafer, optical and electron microscopes, ion-beam, laser device must maintain their alignments within a sub-micrometer. This equipment requires a vibration free environment to provide its proper function. Especially, lithography and inspection devices, which have sub-nanometer class high accuracy and resolution, have come to necessity for producing more improved giga and tera class semiconductor wafers. This high technology equipments require very strict environmental vibration standard, vibration criteria, in proportion to the accuracy of the manufacturing, inspecting devices. The vibration criteria of high sensitive equipment should be represented in the form of 'exactness' and 'accuracy', because this is used as basic data for the design of building structure and structural dynamics of equipment. This paper deals with the properties of time and frequency domain in order to obtain more improved vibration criteria for high sensitive equipment.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.32 no.5
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• pp.357-360
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• 2019

We demonstrate an alignment technology using an imprinting process on an inorganic NiOx film. The aligned nanopattern was fabricated on a silicon wafer by laser interference lithography. The aligned nano pattern was then imprinted onto the sol-gel driven NiOx film using an imprinting process at an annealing temperature of $150^{\circ}C$. After the imprinting process, parallel grooves had been formed on the NiOx film. Atomic force microscopy and water contact angle measurements were performed to confirm the parallel groove on the NiOx film. The grooves caused liquid crystal alignment through geometric restriction, similar to grooves formed by the rubbing process on polyimide. The liquid crystal cell exhibited a pretilt angle of $0.2^{\circ}$, which demonstrated homogeneous alignment.

• Journal of the Korean Society for Precision Engineering
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• v.13 no.9
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• pp.70-76
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• 1996

In the Stereolithography process, three-dimensional objects are built by sequentially curing, generated by horizontal slicing of a three-dimensional CAD model. The dimensional accuracy of a menufactured part depends on the accuracy of curing performed by laser beam radius and the half of curing width. When offsetting, some slices have collinear segments, coincident vertices, line jerks and open loops. After remove above issues we have correct offsets data. And in last step, these data are used to scan paths.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2016.10a
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• pp.142-144
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• 2016

Recent promising technologies of the manufacturing sector interest, and the interest in 3D printing that is expected to cause a huge ripple effect rapidly, and various types of products advertised in accordance with the falling price of 3D printers is spreading. However, the personal 3D printers that are currently being advertised is used for Injection output of the simple type that does not require a high processing precision in accordance with the limitation of technical performance, and consumer satisfaction is very low. In this paper, we propose a 3D printer, 3D precision to overcome existing limitations in the way the printer's high SLA 3D printer that combines injection method and the LSU (Laser Scanning Unit) in the office laser printer polygon mirror scanning method. 3D printers which are proposed to improve the accuracy and manufacturing speed is expected to replace the existing entry-level 3D printer.

• Journal of Technologic Dentistry
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• v.45 no.1
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• pp.1-7
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• 2023

Purpose: To evaluate the marginal and internal fit of metal coping fabricated by a metal three-dimensional (3D) printer that uses selective laser melting (SLM). Methods: An extraoral scanner was used to scan a die of the prepared maxillary right first molar, and the coping was designed using computer-aided design software and saved as an stereo lithography (STL) file. Ten specimens were printed with an SLM-type metal 3D printer (SLM group), and 10 more specimens were fabricated by casting the castable patterns output generated by a digital light processing-type resin 3D printer (casting the 3D printed resin patterns [CRP] group). The fit was measured using the silicon replica technique, and 8 points (A to H) were set per specimen to measure the marginal (points A, H) and internal (points B~G) gaps. The differences among the groups were compared using the Mann-Whitney U-test (α=0.05). Results: The mean of marginal fit in the SLM group was 69.67±18.04 ㎛, while in the CRP group was 117.10±41.95 ㎛. The internal fit of the SLM group was 95.18±41.20 ㎛, and that of the CRP group was 86.35±32 ㎛. As a result of statistical analysis, there was a significant difference in marginal fit between the SLM and CRP groups (p<0.05); however, there was no significant difference in internal fit between the SLM group and the CRP group (p>0.05). Conclusion: The marginal and internal fit of SLM is within the clinically acceptable range, and it seems to be applicable in terms of fit.

• JSTS:Journal of Semiconductor Technology and Science
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• v.1 no.4
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• pp.239-247
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• 2001

The Fluorescence-Activated Cell Sorter (FACS) is a well-established instrument used for identifying, enumerating, classifying and sorting cells by their physical and optical characteristics. For a miniaturized FACS device, a disposable plastic microchip has been developed which has a hydrodynamic focusing chamber using soft lithography. As the characteristics of the spatially confined sample stream have an effect on sample throughput, detection efficiency, and the accuracy of cell sorting, systematic fluid dynamic studies are required. Flow visualization is conducted with a laser scanning confocal microscopy (LSCM), and three-dimensional flow structure of the focused sample stream is reconstructed from 2D slices acquired at $1\mutextrm{m}$ intervals in depth. It was observed that the flow structure in the focusing chamber is skewed by unsymmetrical velocity profile arising from trapezoidal cross section of the microchannel. For a quantitative analysis of a microscopic flow structure, Confocal Micro-PIV system has been developed to evaluate the accelerated flow field in the focusing chamber. This study proposes a method which defines the depth of the measurement volume using a detection pinhole. The trajectories of red blood cells (RBCs) and their interactions with surrounding flow field in the squeezed sample stream are evaluated to find optimal shape of the focusing chamber and fluid manipulation scheme for stable cell transporting, efficient detection, and sorting

• Korean Journal of Optics and Photonics
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• v.21 no.4
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• pp.175-178
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• 2010

A transmission type color filter based on a thin film Ag-$SiO_2$-Ag etalon was proposed and realized in a quartz substrate. The device could acquire infrared suppressed transmission and wide effective area compared to costly e-beam lithography and laser interference lithography. The FDTD method was introduced to take into account the effect of the dispersion characteristics of the silver metal and the thickness thereof. Three different color filters were devised: The cavity length for the red, green and blue filters were 160 nm, 130 nm, and 100 nm respectively, with the metal layer unchanged at 25 nm. The observed center wavelengths were measured at 650 nm, 555 nm, and 480 nm for the red, green, and blue devices; the corresponding bandwidths were about 120 nm, 100 nm, and 120 nm; and the peak transmission for all was ~60%. Finally the relative transmission was measured to decline with the angle of the incident beam with the rate of 1%/degree.