• 한국재료학회지
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• 제19권4호
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• pp.224-227
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• 2009

Nanofabrication is an essential process throughout industry. Technologies that produce general nanofabrication, such as e-beam lithography, dip-pen lithography, DUV lithography, immersion lithography, and laser interference lithography, have drawbacks including complicated processes, low throughput, and high costs, whereas nano-transfer printing (nTP) is inexpensive, simple, and can produce patterns on non-plane substrates and multilayer structures. In general nTP, the coherency of gold-deposited stamps is strengthened by using SAM treatment on substrates, so the gold patterns are transferred from stamps to substrates. However, it is hard to apply to transfer other metallic materials, and the existing nTP process requires a complicated surface treatment. Therefore, it is necessary to simplify the nTP technology to obtain an easy and simple method for fabricating metal patterns. In this paper, asnTP process with poly vinyl alcohol (PVA) mold was proposed without any chemical treatment. At first, a PVA mold was duplicated from the master mold. Then, a Mo layer, with a thickness of 20 nm, was deposited on the PVA mold. The Mo deposited PVA mold was put on the Si wafer substrate, and nTP process progressed. After the nTP process, the PVA mold was removed using DI water, and transferred Mo nano patterns were characterized by a Scanning electron micrograph (SEM) and Energy Dispersive spectroscopy (EDS).

• 한국재료학회지
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• 제21권12호
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• pp.697-702
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• 2011

Two-dimensional (2D) nano patterns including a two-dimensional Bravais lattice were fabricated by laser interference lithography using a two step exposure process. After the first exposure, the substrate itself was rotated by a certain angle, $90^{\circ}$ for a square or rectangular lattice, $75^{\circ}$ for an oblique lattice, and $60^{\circ}$ for a hexagonal lattice, and the $90^{\circ}$ and laser incident angle changed for rectangular and the $45^{\circ}$ and laser incident angle changed for a centered rectangular; we then carried out a second exposure process to form 2D bravais lattices. The band structure of five different 2D nano patterns was simulated by a beam propagation program. The presence of the band-gap effect was shown in an oblique and hexagonal structure. The oblique latticed ZnO nano-photonic crystal array had a pseudo-bandgap at a frequency of 0.337-0.375, 0.575-0.596 and 0.858-0.870. The hexagonal latticed ZnO nano-crystallite array had a pseudo-bandgap at a frequency of 0.335-0.384 and 0.585-0.645. The ZnO nano structure with an oblique and hexagonal structure was grown through the patterned opening window area by a hydrothermal method. The morphology of 2D nano patterns and ZnO nano structures were investigated by atomic force microscopy and scanning electron microscopy. The diameter of the opening window was approximately 250 nm. The height and width of ZnO nano-photonic crystals were 380 nm and 250 nm, respectively.

• 소성∙가공
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• 제14권5호
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• pp.473-476
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• 2005

The demand of on-chip total analyzing system with MEMS (micro electro mechanical system) bio/chemical sensor is rapidly increasing. In on-chip total analyzing system, to detect the bio/chemical products with submicron feature size, a filtration system with nano-filter is required. One of the conventional methods to fabricate nano-filter is to use direct patterning or RIE (reactive ion etching). However, those procedures are very costly and are not suitable fur mass production. In this study, we suggested new fabrication method for a nano-filter based on replication process, which is simple and low cost process. After the Si master was fabricated by laser interference lithography and reactive ion etching process, the polymeric mold was replicated by UV-imprint process. Metallic nano-filter was fabricated after removing the polymeric part of metal deposited polymeric mold. Finally, our fabrication method was applied to metallic nano-filter with $1{\mu}m$ pitch size and $0.4{\mu}m$ hole size for bacteria sensor application.

• 전기학회논문지
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• 제59권5호
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• pp.922-926
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• 2010

We have investigated the grating coupled surface plasmon resonance (GC-SPR) sensors using ZnO nano-grating structures to enhance the sensitivity of an SPR sensor. The GC-SPR sensors were analyzed using the finite-difference time-domain method. The optimum resonance angles of 49 degrees are obtained in the 150 nm wide grating structure with a period of 300 nm for the ZnO thickness of 30 nm. Then, the ZnO nano-grating patterns were fabricated by using laser interference lithography. The measured resonance angle of nano-grating patterns was around 49 degrees. Here, an enhanced evanescent field is obtained due to the surface plasmon on the edge of the bandgap when the ZnO grating structures are used to excite the surface palsmon.

• 한국전기전자재료학회논문지
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• 제32권5호
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• pp.357-360
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• 2019

We demonstrate an alignment technology using an imprinting process on an inorganic NiOx film. The aligned nanopattern was fabricated on a silicon wafer by laser interference lithography. The aligned nano pattern was then imprinted onto the sol-gel driven NiOx film using an imprinting process at an annealing temperature of $150^{\circ}C$. After the imprinting process, parallel grooves had been formed on the NiOx film. Atomic force microscopy and water contact angle measurements were performed to confirm the parallel groove on the NiOx film. The grooves caused liquid crystal alignment through geometric restriction, similar to grooves formed by the rubbing process on polyimide. The liquid crystal cell exhibited a pretilt angle of $0.2^{\circ}$, which demonstrated homogeneous alignment.

• 한국광학회지
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• 제21권4호
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• pp.175-178
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• 2010

본 논문에서는 은-산화막-은 구조의 박막형 에탈론 기반의 투과형 컬러필터를 제안하고 구현하였다. 제안된 박막형 소자는 전자빔 리소그래피 방식에 비해 넓은 유효면적을 갖고 적외선 대역에서의 차단 특성이 우수하다. 또한 금속의 분산특성 및 두께 그리고 기판의 영향 등을 고려하기 위하여 FDTD 방법을 도입함으로써 제안된 소자를 설계 및 분석하였다. 설계된 청색, 녹색, 적색 필터 소자의 산화막 캐비티 두께는 각각 100, 130, 160 nm였으며, 은 박막의 두께는 25 nm였다. 얻어진 측정결과를 살펴보면, 중심파장은 각각 480, 555, 650 nm, 대역폭은 각각 약 120, 100, 120 nm였으며 투과율은 약 60%였다. 그리고 빔의 입사각에 대한 상대적인 투과율 변화율은 ~1%/degree 였다.

• 한국인쇄학회지
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• 제29권3호
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• pp.105-124
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• 2011

TFT-LCD consists of LCD panel on the top, circuit unit on the side and BLU on the bottom. The recent development issues of BLU-dependent TFT-LCD have been power consumption minimization, slimmerization and size maximization. As a result of this trend, LED is adopted as BLU instead of CCFL to increase brightness and to reduce thickness. In liquid crystal displays, the light efficiency is below 10% due to the loss of light in the path from a light source to an LCD panel and presence of absorptive polarizer. This low efficiency results in low brightness and high power consumption. One way to circumvent this situation is to use a reflective polarizer between backlight units and LCD panels. Since a nano-wire grid polarizer has been known as a reflective polarizer, an idea was proposed that it can be used for the enhancement of the brightness of LCD. The use of reflective polarizing film is increasing as edge type LED TV and 3D TV markets are growing. This study has been carried out to fabrication of the nano-wire grid polarizer(NWGP) and investigated the brightness enhancement of LCD through polarization recycling by placing a NWGP between an c and a backlight unit. NWGPs with a pitch of 200nm were fabricated using laser interference lithography and aluminum sputtering and wet etching. And The NWGP fabrication process was using by the UV imprinting and was applied to plastic PET film. In this case, the brightness of an LCD with NWGPs was 1.21 times higher than that without NWGPs due to polarization recycling.

• 전기전자학회논문지
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• 제23권2호
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• pp.594-598
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• 2019

HfZnO 박막 위 패턴 전사 기법을 이용하여 기존의 러빙법을 대체하는 배향 공정에 대하여 연구하였다. 정렬 패턴은 레이저 간섭 리소그래피를 이용하여 실리콘 웨이퍼 위에 제작하였다. 졸겔 공정을 이용하여 HfZnO 용액을 제작하였고, 유리기판 위에 스핀코팅하였다. 미리 제작한 정렬패턴을 스핀코팅된 HfZnO 위에 올려놓고, $100^{\circ}C$에서 30분간 소성하였다. HfZnO 박막에 평행한 그루브가 형성되었음을 atomic force microscopy 와 scanning electron microscopy로부터 확인할 수 있었다. HfZnO 박막을 이용하여 액정 셀을 제작하였으며, POM 분석으로부터 액정이 균일하게 정렬되었음을 확인할 수 있었다. 액정은 $0.25^{\circ}$의 프리틸트 각을 가졌으며, 수평배향 특성을 보여주었다. 액정 분자는 평행한 그루브에 의한 HfZnO 박막 표면 이방성에 의하여 균일하게 정렬되었음을 확인할 수 있었다.

• 전기전자학회논문지
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• 제25권1호
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• pp.64-68
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• 2021

정렬 패턴을 전사공정을 이용하여 BiLaO 박막 위에 패터닝하고 소성온도에 따른 액정 배향 특성에 대하여 연구 하였다. 졸겔 공정을 제작한 BiLaO 은 유리 기판 위에 스핀코팅으로 증착한 후 미리 제작된 정렬패턴을 전사하여 100, 150, 200, 250 ℃ 의 온도에서 소성하였다. POM분석으로부터 200℃ 이하의 소성온도에서 액정배향은 균일하지 않았고, 250 ℃의 소성온도에서 균일한 액정 배향 특성을 확인 할 수 있었고, 결정 회절 법 분석으로 부터도 확인 가능하였다. 전사 공정 시 250 ℃의 온도에서 패턴이 전사되었음을 Atomic force microscopy 을 통하여 확인 할 수 있었다. 250 ℃의 온도에서 전사된 정렬 패턴에 의하여 박막의 이방성을 획득 하였고 이방성 박막 위에서 액정 분자들이 고르게 배향 될 수 있었다. 따라서 BiLaO 산화막의 전사에 의한 액정 배향 공정은 소성온도에 영향을 받는다는 것을 확인 할 수 있었다.