• Title/Summary/Keyword: Laser Interference Lithography(LIL)

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Large Area Nanostructure Fabrication by Laser Interference Lithography (레이저 간섭 리소그래피를 이용한 대면적 나노 구조체 제작)

  • Jeong, Il Gyu;Kim, Jongseok;Hahn, Jae Won;Lee, Sung Ho
    • Journal of the Semiconductor & Display Technology
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    • v.11 no.1
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    • pp.7-11
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    • 2012
  • One dimensional and two dimensional nano patterns were fabricated on a 4-inch substrate by Laser Interference Lithography (LIL). Mach-Zehnder interferometer was setup to obtain the interference patterns and adjusted the pattern sizes with change of incident angle. We could obtain a periodic structure with a period of 440 nm using 266 nm laser, and demonstrated a pattern size with $293{\pm}25nm$ over a 4-inch substrate.

Fabrication of Fe Nanodot Using AAO Prepatterned by Laser Interference Lithography (레이저 간섭 석판술로 전처리된 AAO을 이용한 Fe 나노점 제작)

  • Hwang, H.M.;Kang, J.H.;Lee, S.G.;Lee, J.
    • Journal of the Korean Magnetics Society
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    • v.17 no.3
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    • pp.137-140
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    • 2007
  • The ordering of nanopores in AAO has been improved by using laser interference lithography. After growing Fe and Cu on this substrate in vacuum and removing AAO, Fe nanodots are fabricated. The nanopores in AAO and nanodots are ordered in one dimension following the prepatterning. It has been confirmed from the magnetic hysteresis loop that the Fe nanodots have vortex structure and the dipolar interaction is dominant among them.