• Korean Journal of Materials Research
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• v.21 no.12
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• pp.697-702
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• 2011

Two-dimensional (2D) nano patterns including a two-dimensional Bravais lattice were fabricated by laser interference lithography using a two step exposure process. After the first exposure, the substrate itself was rotated by a certain angle, $90^{\circ}$ for a square or rectangular lattice, $75^{\circ}$ for an oblique lattice, and $60^{\circ}$ for a hexagonal lattice, and the $90^{\circ}$ and laser incident angle changed for rectangular and the $45^{\circ}$ and laser incident angle changed for a centered rectangular; we then carried out a second exposure process to form 2D bravais lattices. The band structure of five different 2D nano patterns was simulated by a beam propagation program. The presence of the band-gap effect was shown in an oblique and hexagonal structure. The oblique latticed ZnO nano-photonic crystal array had a pseudo-bandgap at a frequency of 0.337-0.375, 0.575-0.596 and 0.858-0.870. The hexagonal latticed ZnO nano-crystallite array had a pseudo-bandgap at a frequency of 0.335-0.384 and 0.585-0.645. The ZnO nano structure with an oblique and hexagonal structure was grown through the patterned opening window area by a hydrothermal method. The morphology of 2D nano patterns and ZnO nano structures were investigated by atomic force microscopy and scanning electron microscopy. The diameter of the opening window was approximately 250 nm. The height and width of ZnO nano-photonic crystals were 380 nm and 250 nm, respectively.

• Korean Journal of Optics and Photonics
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• v.30 no.5
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• pp.187-192
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• 2019

In this paper a pump combiner, a key component of a high-power fiber laser, was fabricated, and its output characteristics measured using a high-power performance measuring instrument. The $(18+1){\times}1$ pump combiner consists of an optical-fiber bundle of one signal fiber and 18 pump fibers, an output optical fiber, and housing. The signal and output fibers were fabricated using polarization-maintaining optical fiber. By measuring the loss of signal light along the tapering length of the optical-fiber bundle, the tapering length was optimized to 18 mm. Signal-light insertion loss, pump-light transmittance, and polarization extinction ratio of the fabricated $(18+1){\times}1$ pump combiner were measured as 6.5%, 98.07%, and 18.0 dB respectively. The temperature distribution of the pump combiner, at a high power of 2 kW using 18 pump laser diodes, was measured and analyzed using a thermal-imaging camera.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.19 no.11
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• pp.319-325
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• 2018

The use of 3D printing (Additive Manufacturing) technology has expanded from initial model production to the mass production of parts in the industrial field based on the continuous research and development of materials and process technology. As a representative polymer material for 3D printing, the polyamide-based material, which is one of the high-strength engineering plastics, is used mainly for manufacturing parts for automobiles because of its light weight and durability. In this study, the specimens were fabricated using Selective Laser Sintering, which has excellent mechanical properties, and the flexural characteristics were analyzed according to the temperature of the two types of polyamide 12 and glass bead reinforced PA12 materials. The test specimens were prepared in the directions of $0^{\circ}$, $45^{\circ}$, and $90^{\circ}$ based on the work platform, and then subjected to a flexural test in three test temperature environments of $-25^{\circ}C$, $25^{\circ}C$, and $60^{\circ}C$. As a result, PA12 had the maximum flexural strength in the direction of $90^{\circ}$ at $-25^{\circ}C$ and $0^{\circ}$ at $25^{\circ}C$ and $60^{\circ}C$. The glass bead-reinforced PA12 exhibited maximum flexural strength values at all test temperatures in the $0^{\circ}$ fabrication direction. The tendency of the flexural strength changes of the two materials was different due to the influence of the plane direction of the lamination layer depending on the type of stress generated in the bending test.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.20 no.9
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• pp.481-487
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• 2019

Additive manufacturing is a state-of-the-art manufacturing process technology in which three-dimensional structures are fabricated by laminating two-dimensional sections of a structure using various materials such as plastic, ceramics, and metals. The additive manufacturing technology has the advantage of high design freedom, while the surface property (roughness) of the finished product varies depending on the process conditions, which necessitates performing a post-process after the products are manufactured. In this study, the surface roughness of a structure made of polyamide 12, which was manufactured by SLS (Selective Laser Sintering) and MJF (Multi Jet Fusion) process was compared. The processing condition was classified by the building orientation of structure as 0, 45, and 90 degrees, which is the angle between the analytical surface and the horizontal plane of the fabrication platform. Structures with a hole of various diameters ranging from 1mm to 10mm were manufactured and the hole characteristics (ratio of hole depth to diameter) and results of the specimens were compared. As a result of the surface characteristics analysis, the surface roughness value of the specimens manufactured with a building orientation of $45^{\circ}$ was the highest in both technologies. In the case of the through-hole structure fabrication, the shape was maintained with 5mm and 10mm diameter holes regardless of the building orientation, although the hole forming was difficult for the smaller holes.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.319-319
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• 2013

Even though the fabrication methods of metal oxide based thin film capacitor have been well established such as RF sputtering, Sol-gel, metal organic chemical vapor deposition (MOCVD), ion beam assisted deposition (IBAD) and pulsed laser deposition (PLD), an applicable capacitor of printed circuit board (PCB) has not realized yet by these methods. Barium Strontium Titanate (BST) and other high-k ceramic oxides are important materials used in integrated passive devices, multi-chip modules (MCM), high-density interconnect, and chip-scale packaging. Thin film multi-layer technology is strongly demanded for having high capacitance (120 nF/$mm^2$). In this study, we suggest novel multi-layer thin film capacitor design and fabrication technology utilized by plasma assisted deposition and photolithography processes. Ba0.6Sr0.4TiO3 (BST) was used for the dielectric material since it has high dielectric constant and low dielectric loss. 5-layered BST and Pt thin films with multi-layer sandwich structures were formed on Pt/Ti/$SiO_2$/Si substrate by RF-magnetron sputtering and DC-sputtering. Pt electrodes and BST layers were patterned to reveal internal electrodes by photolithography. SiO2 passivation layer was deposited by plasma-enhanced chemical vapor deposition (PE-CVD). The passivation layer plays an important role to prevent short connection between the electrodes. It was patterned to create holes for the connection between internal electrodes and external electrodes by reactive-ion etching (RIE). External contact pads were formed by Pt electrodes. The microstructure and dielectric characteristics of the capacitors were investigated by scanning electron microscopy (SEM) and impedance analyzer, respectively. In conclusion, the 0402 sized thin film multi-layer capacitors have been demonstrated, which have capacitance of 10 nF. They are expected to be used for decoupling purpose and have been fabricated with high yield.

• 한국초전도학회:학술대회논문집
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• v.9
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• pp.71-74
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• 1999

We have fabricated high-T$_c$ superconducting YBa$_2Cu_3O_{7-{\delta}}\;/SrTiO_3/\;YBa_2Cu_3O_{7-{\delta}}$ (YBCO/STO/YBCO) multilayer structure on (001) $SrTiO_3$ substrate by using pulsed laser deposition technique for applying to ground plane of single flux quantum digital circuits. In this structure, the top and bottom YBCO layers were connected through the holes in the STO insulating layer. The critical temperature of the two YBCO layers connected each other was 86 K after annealing at 500 $^{\circ}C$ in $O_2$ atm for about 60 hr. This result shows that the annealing process is very important fabricating YBCO/STO/YBCO multilayer structure An experiment to optimize the fabrication process of YSCO/ST0/YBCO multilayer structure with good quality is in progress.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.41 no.12
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• pp.35-42
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• 2004

In this paper, we report Mach Zehnder Interleaver of optical fiber type is fabricated by the fabrication system only for interfermeter design, and it is used $CO_2$ laser to adjust precisely the wavelength. The optical fiber is very sensitive in the thermal variation around. Thus, When fabrication the prototype, it is applied a technique to compensate the optical thermal effect because the center wavelength at the output is shifted according to the thermal variation around. it can he done by applying a substrate with high thermal expansion coefficient as well as an adjusting the position between two optical fiber couplers. Consequently, the output wavelength is shifted within 0.05 nm when the surrounding temperature varies until $60^{\circ}C$.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.658-658
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• 2013

Graphene is an attractive material for various device applications due to great electrical properties and chemical properties. However, lack of band gap is significant hurdle of graphene for future electrical device applications. In the past few years, several methods have been attempted to open and tune a band gap of graphene. For example, researchers try to fabricate graphene nanoribbon (GNR) using various templates or unzip the carbon nanotubes itself. However, these methods generate small driving currents or transconductances because of the large amount of scattering source at edge of GNRs. At 2009, Bai et al. introduced graphene nanomesh (GNM) structures which can open the band gap of large area graphene at room temperature with high current. However, this method is complex and only small area is possible. For practical applications, it needs more simple and large scale process. Herein, we introduce a photosensitive graphene device fabrication using CdSe QD coated nano-porous graphene (NPG). In our experiment, NPG was fabricated by thin film anodic aluminum oxide (AAO) film as an etching mask. First of all, we transfer the AAO on the graphene. And then, we etch the graphene using O2 reactive ion etching (RIE). Finally, we fabricate graphene device thorough photolithography process. We can control the length of NPG neckwidth from AAO pore widening time and RIE etching time. And we can increase size of NPG as large as 2 $cm^2$. Thin CdSe QD layer was deposited by spin coatingprocess. We carried out NPG structure by using field emission scanning electron microscopy (FE-SEM). And device measurements were done by Keithley 4200 SCS with 532 nm laser beam (5 mW) irradiation.

• Proceedings of the Materials Research Society of Korea Conference
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• 2009.05a
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• pp.16.1-16.1
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• 2009

We have fabricated solution processed oxide semiconductor active layer for thin film transistors (TFTs). The oxide semiconductor layers were prepared by ink-jet printing the sol-gel precursor solution based on doped-ZnO. Inorganic ZnO-based thin films have drawn significant attention as an active channel layer for TFTs applications alternative to conventional Si-based materials and organic semiconducting materials, due to their wide energy band gap, optical transparency, high mobility, and better stability. However, in spite of such excellent device performances, the fabrication methods of ZnO related oxide active layer involve high cost vacuum processes such as sputtering and pulsed laser deposition. Herein we introduced the ink-jet printing technology to prepare the active layers of oxide semiconductor. Stable sol-gel precursor solutions were obtained by controlling the composition of precursor as well as solvents and stabilizers, and their influences on electrical performance of the transistors were demonstrated by measuring electrical parameters such as off-current, on-current, mobility, and threshold voltage. Microstructure and thermal behavior of the doped ZnO films were investigated by SEM, XRD, and TG/DTA. Furthermore, we studied the influence of the ink-jet printing conditions such as substrate temperature and surface treatment on the microstructure of the ink-jet printed active layers and electrical performance. The mobility value of the device with optimized condition was about 0.1-1.0 $cm^2/Vs$ and the on/off current ratio was about $10^6$. Our investigations demonstrate the feasibility of the ink-jet printed oxide TFTs toward successful application to cost-effective and mass-producible displays.

• Journal of the Korean Society for Nondestructive Testing
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• v.31 no.5
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• pp.522-528
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• 2011

Artificial basilar membranes made of PVDF(polyvinylidene fluoride) are manufactured using microfabrication processes. The mechanical behavior of PVDF artificial basilar membrane was measured to evaluate its performance as a mechanical frequency analyzer using scanning LDV(laser Doppler vibrometer). The experimental setup consists of the microfabricated artificial basilar membrane, a loud speaker connected to an amplifier for generating acoustic pressure of specific spectral pattern, and a scanning LDV with controlling unit for measuring the displacement of the membrane on the incoming acoustic stimulation. The microfabricated artificial basilar membrane was attached tightly upon a package containing a chamber which can be filled with silicone oil before placed on the experimental setup stage. The experiment results showed that the microfabricated artificial basilar membrane has a property as a mechanical frequency analyzer.