• Title/Summary/Keyword: Laser Fabrication

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Status of Research on Selective Laser Sintering of Nanomaterials for Flexible Electronics Fabrication (나노물질의 선택적 레이저소결을 이용한 유연전기소자 구현 연구현황)

  • Ko, Seung-Hwan
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.35 no.5
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    • pp.533-538
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    • 2011
  • A plastic-compatible low-temperature metal deposition and patterning process is essential for the fabrication of flexible electronics because they are usually built on a heat-sensitive flexible substrate, for example plastic, fabric, paper, or metal foil. There is considerable interest in solution-processible metal nanoparticle ink deposition and patterning by selective laser sintering. It provides flexible electronics fabrication without the use of conventional photolithography or vacuum deposition techniques. We summarize our recent progress on the selective laser sintering of metals and metal oxide nanoparticles on a polymer substrate to realize flexible electronics such as flexible displays and flexible solar cells. Future research directions are also discussed.

Fabrication of Microcellular Polyimide Film using Hybrid Laser Process with Chemical Blowing Agents (화학적 발포와 레이저 하이브리드 공정을 이용한 마이크로 셀루러 폴리이미드 필름 제조)

  • Ma, Yong Won;Kang, Moon Suk;Oh, Jae Yong;Shin, Bo Sung
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.12 no.6
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    • pp.17-22
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    • 2013
  • Recently, microcellular polymer films have been widely used as absorbents, support cells, and sensors in the industrial fields of IT, NT, BT, and ST. The conventional fabrication methods of microcellular polymer films are not only more complicated than those of non-microcellular polymer films, but also require a longer production time. In this paper, we propose a new hybrid fabrication method for microcellular polymer films; films can be rapidly made using UV laser processing with chemical blowing agents. The experimental results show that the number of the micropores increased with respect to the laser fluence and the concentration of the chemical blowing agents.

Analysis on Design and Fabrication of High-diffraction-efficiency Multilayer Dielectric Gratings

  • Cho, Hyun-Ju;Lee, Kwang-Hyun;Kim, Sang-In;Lee, Jung-Hwan;Kim, Hyun-Tae;Kim, Won-Sik;Kim, Dong Hwan;Lee, Yong-Soo;Kim, Seoyoung;Kim, Tae Young;Hwangbo, Chang Kwon
    • Current Optics and Photonics
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    • v.2 no.2
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    • pp.125-133
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    • 2018
  • We report an in-depth analysis of the design and fabrication of multilayer dielectric (MLD) diffraction gratings for spectral beam combining at a wavelength of 1055 nm. The design involves a near-Littrow grating and a modal analysis for high diffraction efficiency. A range of wavelengths, grating periods, and angles of incidence were examined for the near-Littrow grating, for the $0^{th}$ and $-1^{st}$ diffraction orders only. A modal method was then used to investigate the effect of the duty cycle on the effective indices of the grating modes, and the depth of the grating was determined for only the $-1^{st}$-order diffraction. The design parameters of the grating and the matching layer thickness between grating and MLD reflector were refined for high diffraction efficiency, using the finite-difference time-domain (FDTD) method. A high reflector was deposited by electron-beam evaporation, and a grating structure was fabricated by photolithography and reactive-ion etching. The diffraction efficiency and laser-induced damage threshold of the fabricated MLD diffraction gratings were measured, and the diffraction efficiency was compared with the design's value.

Fabrication of Titanium Microchannels by using Ar+ Laser-assited Wet Etching (레이저 유도에칭을 이용한 티타늄 미세채널 제조)

  • 손승우;이민규;정성호
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2004.10a
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    • pp.709-713
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    • 2004
  • Characteristics of laser-assisted wet etching of titanium in phosphoric acid were investigated to examine the feasibility of this method for fabrication of high aspect ratio microchannels. Laser power, number of scans, etchant concentration, position of beam waist and scanning speed were taken into consideration as the major process parameters exerting the temperature distribution and the cross sectional profile of etched channels. Experimental results indicated that laser power influences on both etch width and depth while number of scans and scanning speed mainly affect on the etch depth. At a low etchant concentration, the cross sectional profile of an etched channel becomes a U-shape but it gradually turns into a V-shape as the concentration increases. On the other hand, surface of the laser beam focus with respect to the sample surface is found to be a key factor determining the bubble dynamics and thus the process stability. It is demonstrated that metallic microchannels with different cross sectional profiles can be fabricated by properly controlling the process parameters. Microchannels of aspect ratio up to 8 with the width and depth ranges of 8∼32 m and 50∼300 m, respectively, were fabricated.

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A Study on Rapid Fabrication of Micro Lens Array using 355nm UV Laser Irradiation (355nm UV 레이저를 이용한 마이크로 렌즈 어레이 쾌속 제작에 관한 연구)

  • Je, S.K.;Park, S.H.;Choi, C.K.;Shin, B.S.
    • Transactions of Materials Processing
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    • v.18 no.4
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    • pp.310-316
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    • 2009
  • Micro lens array(MLA) is widely used in information technology(IT) industry fields for various applications such as a projection display, an optical power regulator, a micro mass spectrometer and for medical appliances. Recently, MLA have been fabricated and developed by using a reflow method having the processes of micro etching, electroplating, micro machining and laser local heating. Laser thermal relaxation method is introduced in marking of microdots on the surface of densified glass. In this paper, we have proposed a new direct fabrication process using UV laser local thermal-expansion(UV-LLTE) and investigated the optimal processing conditions of MLA on the surface of negative photo-resist material. We have also studied the 3D shape of the micro lens obtained by UV laser irradiation and the optimal process conditions. And then, we made chrome mold by electroplating. After that, we made MLA using chrome mold by hot embossing processing. Finally, we have measured the opto-physical properties of micro lens and then have also tested the possibility of MLA applications.

An Experimental Study for Drawing of Optimal Process Condition in the SLS Process (SLS 공정에서 최적 공정 조건 도출을 위한 실험적 연구)

  • Bae, Sung-Woo;Yoo, Seong-Yeon;Kim, Dong-Soo
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.21 no.3
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    • pp.516-524
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    • 2012
  • Selective Laser Sintering(SLS) system consists of various element technologies. Main components of the system include a position control system, a speed control system of the roller, and nitrogen atmosphere furtherance for the powdered sintering. Other systems which make the core of the SLS system are build room and the feed room for powder epitaxial, a temperature control system, and a scan path generator for the laser. The powder material for laser sintering is necessary to produce prototypes in Solid Freeform Fabrication(SFF) based on SLS process. This powder material is sintered in powder room using $CO_2$ laser after spreading evenly using roller to reproduce mold via SFF. This study addresses an SFF system by using the SLS process which applies single laser system to enable manufacturing of 3D shape. And to evaluate applicability of the single laser system, experiments were conducted with optimal fabricating process.

Process Optimization of Industrial Solid Freeform Fabrication System (산업용 임의형상제작(Solid Freeform Fabrication)시스템의 공정변수 최적화)

  • Kwak, Sung-Jo;Lee, Doo-Yong
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.32 no.7
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    • pp.602-609
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    • 2008
  • This paper presents experimental optimization of process parameters for a newly developed SFF(Solid Freeform Fabrication) system. Two critical process parameters, layering thickness and curing period, which have a large effect on the quality of the product, are optimized through experiments. Specimens are produced using layering thicknesses of 60, 80, 100, 120, 140, and $160\;{\mu}m$ and curing periods of 0, 10, 20, and 30 minutes under the same processing conditions, i.e., build-room temperature, feed-room temperature, roller speed, laser power, scan speed, and scan spacing. The specimens are tested to compare and analyze performance indices such as thickness accuracy, flatness, stress-strain characteristics, and porosity. The experimental result indicates that layering thickness of $80{\sim}100\;{\mu}m$ and curing period of $20{\sim}30$ minutes are recommended for the developed industrial SFF system.

Fabrication of Barrier Ribs for PDP by $CO_2$ Laser Scribing Method ($CO_2$ Laser Scribing법을 이용한 PDP용 격벽 제조)

  • 안정식;이석영;김원용;전형조;이용호;김용석
    • Journal of the Korean Ceramic Society
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    • v.37 no.1
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    • pp.57-62
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    • 2000
  • In this study, an attempt was made to demonstrate the possibility of using laser scribing method in manufacturing the barrier ribs of plasma display panel. The scribing with a CO2 laser was conducted on the green tape produced by the doctor blade tape casting method. Among the processing parameters, the quenching gas pressure, shape of mask, and laser power were found to affect the depth and angle of the scibed barrier ribs.

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Visible light emission from $C_60$ and Si nanoparticle film by laser process (C60 및 Si 초미립자 박막의 Laser 반응에 의한 가시광선발광)

  • ;Hideomi Koinuma
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.11a
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    • pp.598-601
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    • 2000
  • We investigated the fabrication of Si nanoparticle and $C_{60}$ thin films by pulsed laser ablation. As a result, we observed visible green photoluminescence spectra in the Si/C$_{60}$ multilayer films after laser annealing. It is considered that this green photoluminescence is occurred from SiC particles, which is produced reaction of Si nanoparticles with $C_{60}$ via laser annealing.ing.

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Cure depth control using photopolymerization inhibitor in microstereolithography and fabrication of three dimensional microstructures (액속주사법을 이용한 마이크로 광조형시 광폴리머에 대한 중합억제제의 영향분석 및 삼차원 미세구조물 제조)

  • 김성훈;주재영;정성호
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2004.10a
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    • pp.714-719
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    • 2004
  • Controlling the cure depth of the Fa1260T photopolymer enhances the quality of a microstructure and minimizes its size in microstereolithography. In this work, variation of cure depth of the Fa1260T photopolymer is investigated while the concentration of a photopolymerization inhibitor as a radical quencher was varied. The energy source inducing photopolymerization was a He-Cd laser and a motorized stage controled the laser beam path accurately. The effects of process variables such as laser beam power and scan speed on the cure depth were examined. Optimum conditions for the minimum cure depth were determined as laser power of 230 W and scan speed of 40-50 m/s at the concentration of the radical quencher of 5%. The minimum cure depth at the optimal condition was 14 m. The feasibility of the fabrication of microstructures such as a microcup, microfunnel, and microgrid of 100 m size is demonstrated using Super IH process.

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