• Title/Summary/Keyword: Laser Fabrication

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Display 특성 향상을 위한 MLA 광소자 개발 연구

  • Jeong, Han-Uk;Kim, Gwang-Yeol;Lee, Gong-Su;Sin, Seong-Uk;Park, Hong-Jin;Choe, Byeong-Deok
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.11a
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    • pp.199-199
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    • 2009
  • Recently, polymeric microlens arrays have become important elements in many applications. Microlens arrays have been used to enhance luminance efficiency and luminance power efficiency of light-emitting diodes (LEDs) and organic LEDs. Many processes for fabrication of microlens array are studied. Though the MLA has been fabricated by electroformed mold, LIGA process and reflow method, these methods were required masks, multiple process steps and post processing. In this paper, we proposed rapid and direct UV laser direct fabrication process using colorless liquid photopolymer, NOA60 for polarization activated microlens. The microlens arrays are formed on the NOA60 on glass, after the focused laser energy was irradiated to the material. The diameter of MLA was varied from 42 to 88 ${\mu}m$, and the height from 0.9 to 1.6 ${\mu}m$. The MLA fabricated using NOA60 shows more then 85% transmittance as well as good hardness for optical module.

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Hybrid-integrated Tunable Laser Diode Using Polymer Coupled-ring Reflector (폴리머 결합 링 반사기를 이용한 하이브리드 집적 파장 가변 레이저)

  • Park, Joon-Oh;Lee, Tae-Hyung;Chung, Young-Chul
    • Korean Journal of Optics and Photonics
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    • v.19 no.3
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    • pp.219-223
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    • 2008
  • To realize a widely tunable laser diode, a polymer coupled-ring reflector is hybrid- integrated with reflective semiconductor optical amplifier. Even though ring-ring and ring-bus coupling ratios are changed by fabrication errors in waveguide width and height, they remain very close to the single peak condition, ensuring high yield in fabrication. The tuning range is observed to be about 35 nm, maintaining the side mode suppression ratio of about 30 dB.

Fabrication and Properties of Organic Semiconductor CuPccp LB Thin Film (유기 반도체 CuPccp LB초박막의 제작 및 특성)

  • Jho, Mean Jea;Xouyang, Saiyang;Lee, Jin Su;Ahn, Da Hyun;Jung, Chi Sup
    • Journal of Sensor Science and Technology
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    • v.28 no.1
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    • pp.23-29
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    • 2019
  • A copper tetracumylphenoxy phthalocyanine (CuPccp) thin film was formed on an organic insulator film by Langmuir-Blodgett (LB) deposition for gas sensor fabrication. To increase the reproducibility of film transfer, stearyl alcohol was used as a transfer promoter. The structural properties of the CuPccp layers were optically monitored through attenuated total reflection and polarization-modulated ellipsometry techniques. The average thickness of a single layer of the CuPccp LB film was measured to be 2.5 nm. Despite the role of the transfer promoter, the stability of the layer transfer was not sufficient to ensure homogeneity of the LB film. This was probably due to the presence of aggregates in the molecular structure of the CuPccp LB film. Nevertheless, copper phthalocyanine polymorphism can be greatly suppressed by the LB arrangement, which appears to contribute to the improvement of electrical conductivity. The p-type semiconductor characteristics were confirmed by Hall measurements from the CuPccp LB films.

A Study of Ozone Variations in a Semiconductor Fabrication Facility and Office Related to the Ozone Concentration in the Outdoor Air (외기 오존 농도에 따른 반도체 작업환경 및 사무실에서의 오존 농도 변화 연구)

  • Lee, Ji-Eun;Jung, Myung-Koo;Choi, Kwang-Min
    • Journal of Korean Society of Occupational and Environmental Hygiene
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    • v.26 no.2
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    • pp.188-197
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    • 2016
  • Objectives: The purpose of this study was to evaluate the ozone exposure levels and the variations in ozone concentration in a semiconductor fabrication facility and office in relation to the ozone concentration in the outdoor air. Methods: This study was performed in an office, semiconductor fabrication facility(such as etching, diffusion, diffusion plenum), and outdoors from June to August, 2015. Measurements were taken six times at the same places using an active sampler(pumped) and real-time equipment. Ozone monitoring by the active sampler method and analysis were carried out by OSHA Method ID-214. Real-time measurement was carried out by ozone measuring equipment using a non-dispersive ultraviolet absorption method. Results: Ozone concentrations in the semiconductor fabrication facility and office were 0.7~7.1 ppb in area samples and 0.72~4.07 ppb in real-time measurement, which were 0.88~8.88% of the occupational exposure limit. The concentration of ozone generated by a laser printer in the office was less than 2 ppb. There was not a significant difference between ozone concentrations before and after using the laser printer. The indoor/outdoor concentration ratio(I/O ratio) in the semiconductor fabrication facility and office was 0.05 and 0.06, respectively. Conclusions: All the samples contained ozone levels lower than the occupational exposure limit and it was confirmed that the concentration of outdoor ozone had no significant effect on indoor ozone concentration.