• Title/Summary/Keyword: Laser Diffraction

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Residual Stress Analysis for Wide-band laser Heat Treatment Using Finite Element Method (유한요소법에 의한 광폭 레이저 표면경화의 잔류응력해석)

  • Kim, Jae-Do;Maeng, Ju-Won
    • Journal of the Korean Society for Precision Engineering
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    • v.16 no.11
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    • pp.68-73
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    • 1999
  • In this paper, the residual stresses for the wide-band laser heat treatment using a polygon mirror have been analyzed. The results of FE analysis are compared with the experimental results. ANSYS Version 5.3, a commercial FE-code, is used for the FE stress analysis. The structural analysis was performed on after thermal analysis. The residual stress distribution across the hardened area was measured by the X-ray diffraction technique. The laser hardening conditions, 2kW laser power and 2mm/s travel speed, were used for the experiment and the FE analysis. Analysis results, which is maximum tensile residual stress is about 143MPa and maximum compressive residual stress is about -380MPa. Under same parameters with the analysis, experimental results indicate that MTRS is about 152MPa and MCRS is about -312MPa. The experimental results is about 6% higher than the FE analysis. As a result, residual stress data from the experiment close well with that of the FE analysis.

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Laser-Induced Recrystallization of Perovskite Materials for High-Performance Flexible Light-Emitting Diode (고성능 유연 발광 다이오드 소자 구현을 위한 레이저 기반 페로브스카이트 소재의 재결정화)

  • Jae Chan Heo;Ji Eun Kim;Dong Gyu Lee;Yun Sik Hwang;Yu Mi Woo;Han Eol Lee;Jung Hwan Park
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.36 no.3
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    • pp.286-291
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    • 2023
  • Perovskite materials are promising candidates for next-generation optoelectronic devices owing to their outstanding external quantum efficiency, high color purity, and ability to tune the light emission wavelength. However, conventional thermal annealing processes caused the degradation of perovskite, resulting in poor optoelectronic properties and a short lifetime. Herein, we propose a laser-induced recrystallization of perovskite thin film to enhance its light-emitting properties. Laser-induced recrystallization process was performed using rapid and instantaneous laser heating, which successfully induced grain growth of the perovskite material. The laser processing conditions were thoroughly optimized based on theoretical calculations and various material analyses such as x-ray diffraction, scanning electron microscope, and photoluminescence spectroscopy.

Holographic grating formation of $MgF_2$/As-Ge-Se-S multi-layer ($MgF_2$/As-Ge-Se-S 다층 박막에서의 홀로그래픽 격자 형성)

  • Na, Sun-Woong;Yeo, Cheol-Ho;Park, Jung-Il;Lee, Young-Jong;Chung, Hong-Bay
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07b
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    • pp.1042-1045
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    • 2002
  • We have carried out two-beam interference experiments to form holographic gratings on amorphous $MgF_2$/As-Ge-Se-S multi-layer. In this study, holographic gratings have been formed using He-Ne laser(632.8nm). under different polarization combinations. The diffraction efficiency was obtained by +1st order intensity. The maximum diffraction efficiency of As-Ge-Se-S single layer and $MgF_2$/As-Ge-Se-S multi-layer were 0.8% and 1.4%

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Fabrication of Microholographic Gratings on Al2O3 Grown by Atomic Layer Deposition Using a Femtosecond Laser

  • Bang, Le Thanh;Fauzi, Anas;Heo, Kwan-Jun;Kim, Sung-Jin;Kim, Nam
    • Journal of the Optical Society of Korea
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    • v.18 no.6
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    • pp.685-690
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    • 2014
  • Microholographic gratings were prepared on an aluminum oxide ($Al_2O_3$) surface using a 140-fs pulse at a center wavelength of 800 nm. The $Al_2O_3$ was deposited on a silicon wafer and on indium tin oxide glass to a thickness of approximately 25 nm using an atomic layer deposition process. The silicon wafer substrate exhibited reflection-type gratings that were measured as a function of the incidence angle. The diffraction efficiency of the fabricated gratings was measured, with a maximum diffraction efficiency of 45% at an incidence angle of approximately $30^{\circ}$.

Characteristics of the diffraction grating formation for SeGe (SeGe 재료의 회절 격자 형성 특성)

  • Park, Jeong-Il;Park, Jong-Hwa;Kim, Jin-Woo;Yeo, Cheol-Ho;Lee, Young-Jong;Chung, Hong-B.
    • Proceedings of the KIEE Conference
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    • 2001.07c
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    • pp.1445-1447
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    • 2001
  • We have investigated about the grating formation of the $a-Se_{75}-Ge_{25}$ chalcogenide thin films. In this study, holographic gratings have been formed by using He-Ne laser(632.8nm) with different polarization states(linear, circular polarization). The diffraction efficiency was obtained by +1st order intensity of the diffracted beam. We have obtained maximum efficiency for Ag-doped thin film. It is observed the difference of the diffraction efficiency with polarization states. S:S-polarized state is shown high efficiency than the other polarization.

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Measuring System of Surface Roughness for On-The-Machine using Diffraction Light (회절광을 이용한 기상계측용 표면거칠기의 측정시스템)

  • 김성훈;이기용;강명창;김정석;김남경
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2000.05a
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    • pp.803-807
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    • 2000
  • This paper deals wi th the establishment of the method of non-contact surface roughness measurement by developed system. One of the most Important factor of determinating quality of a produced manufacture is surface roughness The tendency of manufacturing method is changing from small amount manufactures / high-volume production to large amount manufactures / low volume production, and the study of reducing time for surface roughness measurement has been actively investigated The non-contact surface roughness method by using laser which is different from contact method has been only used to the polished surface, so new surface roughness measurement method was adopted by virtue of Fraunhofer diffraction in the periodic surface for on-the-machine. in this paper, we establish the method of non-contact surface roughness measurement which can reduce measuring time in the periodic surface

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Non-Paraxial Diffraction Effect of High NA Objectives (높은 개구수를 가지는 대물렌즈의 비근축 회절효과)

  • Lee, Jong Ung
    • Korean Journal of Optics and Photonics
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    • v.25 no.1
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    • pp.8-13
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    • 2014
  • By using finite ray-tracing and curve fitting, a numerical method to determine the non-paraxial pupil function of a high-NA objective is presented. MTF degradations caused by the non-paraxial diffraction effect are analyzed for on-axial imaging of a far-infrared objective and aberration-free ellipsoidal mirror system. The ellipsoidal mirror system has the same paraxial specifications as the far-infrared objective.

Fabrication of the Photoresist Surface-Relief Phase Holographic Grating and Its Performance Test (포토레지스트 surface-Relief 위상형 홀로그라피 분광회절격자의 제작 및 성능평가)

  • 정만호;이인원;이상배;박민용
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.24 no.5
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    • pp.868-873
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    • 1987
  • Holographic diffraction gratings which are the core element of the optical instruments such as a spectrophotometer have been fabricated using the photoresist as a recording material. A 488nm line from an argon laser is used in making the gratings. Transmission type surface-relief phase grating and reflection type which is fabsricated by coating the aluminum on the transmission type with thickness 2000\ulcornerare fabricated, the spatical frequency of which are 1200 lines/mm. Diffraction efficiency, scattered light and wave-front aberratin are measured to test the performance of the developed gratings. A marimum diffraction efficiency is given when light is incident at the Bragg angle. Theoretical efficiency is about 80%, but measured efficiency of the transmission type and reflection type is 50% and 45%, respectively.

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The recording of surface relief grating on the chalcogenide thin film (비정질 칼코게나이드 박막에 Surface Relief 격자 형성)

  • 박종화;장선주;박정일;여철호;이영종;정홍배
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.299-302
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    • 2000
  • In this study, we have made the large holographic surface relief gratings on amorphous chalcogenide $As_{40}$$Ge_{10}$$Se_{15}$$S_{35}$ films by two beam interference using a He-Ne laser(632.8nm) light. The film thickness was about 0.6$\mu\textrm{m}$, we could magnify beam size by using beam expander. We made use $90^{\circ}$ holder which was made of reflection mirror and sample. Formed the surface relief structures were investigated using optical microscope. The diffraction efficiency was obtained by measuring +lst order intensity. In addition we investigated grating formation and diffraction efficiency as a function of polarization states which is linear or circular polarization. The results indicate that the grating was formed by linear polarized beam is better clear than that by circular polarized beam.

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Characteristic research of the Chalcogenide thin film for 2-Dimensional photonic crystal formation (2차원 광결정 형성을 위한 칼코게나이드 박막의 특성 연구)

  • Nam, Ki-Hyeon;Ju, Long-Yun;Kim, Hyun-Koo;Chung, Hong-Bay
    • Proceedings of the KIEE Conference
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    • 2007.11a
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    • pp.134-135
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    • 2007
  • Two-dimensional photonic crystal structures have been fabricated on the chalcogenide material using holography lithography out of many production technical. The fabricated lattice can be observed obliquely by measuring diffraction pattern. The diffraction pattern of the microstructure has been observed with a He-Ne laser beam at wavelength of 632.8 nm. The diffracted beam has been analyzed by using the diffraction efficiency measurement method.

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