• Proceedings of the Materials Research Society of Korea Conference
• /
• 2003.11a
• /
• pp.116-116
• /
• 2003

Most of all nano-structures, SiC had a high electrical conductivity and mechanical strengths ay high temperatures. So It was considered a useful materials for nanosized device materials and added materials for strength hardening. Much methods were developed for SiC nanowire and nanorods like CVD, carbothermal reduction, Laser ablation and CNT-confined reduction. These methods used the VLS (Vapor-Liquid-Solid) growth mechanism. In these experiments, SiC nanowire was grown by SLS (Sold-Liquid-Solid) growth mechanism used Graphite substrate, And we characterized its microstructure to compare with VLS growth mechanism.

• Proceedings of the Materials Research Society of Korea Conference
• /
• 2003.11a
• /
• pp.151-151
• /
• 2003

열화학기상증착법(Thermal-CVD)을 이용하여 SOI(snilicon-on-insulator)기판과 실리콘기판 상에 단결정 3C-SiC 이종박막을 동시에 성장하고, 그 특성을 비교 분석하였다. 결정성 평가로는 X-선 회절(XRD)분석과 Raman 산란 분광분석, 그리고 투과전자현미경을 이용하였고, 잔류 웅력 비교 분석으로는 laser scanning 방법 과 Raman 산란 분광분석의 3C-SiC LO peak의 위치변화, 그리고 X-선 회절분석의 3C-SiC(004) peak의 위치변화를 이용하였다. 그 결과 SOI 기판과 실리콘 기판상에 고품위의 단결정 3C-SiC 박막이 성장됨을 확인하였고, SOI 기판을 사용한 경우 실리콘 기판에 비해 성장된 3C-SiC 이종박막의 잔류 응력이 실제로 감소됨을 확인하였다.

• Proceedings of the Materials Research Society of Korea Conference
• /
• 2003.11a
• /
• pp.164-164
• /
• 2003

UV 발광소자 재료로서 유망한 ZnO film을 ALE법으로 증착하고 photoluminescence특성을 조사하였다. Zn소스로서 DEZn(Diethylzinc)를, 산소 소스로서 DI water를 사용하였고 $N_2$ gas로서 챔버내에 주입된 소스물질을 purge하였다. ALE 공정온도 범위인 17$0^{\circ}C$와 CVD 반응온도 범위인 40$0^{\circ}C$로 ZnO 박막을 증착하고 이 시편을 산소 분위기에서 600-100$0^{\circ}C$의 온도로 1시간 동안 열처리하였다. 그리고 He-Cd laser를 사용하여 photoluminescence를 측정하였다. 17$0^{\circ}C$와 40$0^{\circ}C$ 에서 증착된 시편 모두 as-grown 상태에서는 거의 발광특성을 나타내지 못하였으나 후열처리를 거치면서 발광특성을 나타내었고 열처리 온도가 높을수록 발광강도가 증가하였다. 40$0^{\circ}C$에서의 증착된 시편의 경우는CVD반응이 발생하여 Zn-Zn결합이 많이 생성되어 열처리 온도가 증가하여도 발광강도가 약하였고 가시광 영역의 발광 또한 크게 증가하였으며 17$0^{\circ}C$에서 증착된 시편의 경우는 열처리 온도가 증가할수록 UV영역의 발광강도만이 크게 증가하였으며 가시광 영역의 발광은 거의 증가하지 않았다.

• Carbon letters
• /
• v.14 no.3
• /
• pp.175-179
• /
• 2013

Isolated single wall carbon nanotubes (SWCNTs) were synthesized by chemical vapor deposition (CVD) using a liquid precursor (xylene) as a carbon source. Transmission electron microscopy (TEM) and atomic force microscopy confirmed the isolated structure of the SWCNTs. Micro-Raman measurements showed a tangential G-band peak ($1590cm^{-1}$) and radial breathing mode (RBM) peaks ($150-240cm^{-1}$). The tube diameters determined from the RBM frequencies are in good agreement with those obtained from TEM. The chirality of the isolated SWCNTs could be determined based on the energy of the laser and their diameter. A further preliminary study on the nitrogen doping of isolated SWCNTs was carried out by the simple use of acetonitrile dissolved in the precusor.

• Carbon letters
• /
• v.14 no.3
• /
• pp.131-144
• /
• 2013

The carbon nanotube (CNT) represents one of the most unique inventions in the field of nanotechnology. CNTs have been studied closely over the last two decades by many researchers around the world due to their great potential in different fields. CNTs are rolled graphene with $SP^2$ hybridization. The important aspects of CNTs are their light weight, small size with a high aspect ratio, good tensile strength, and good conducting characteristics, which make them useful as fillers in different materials such as polymers, metallic surfaces and ceramics. CNTs also have potential applications in the field of nanotechnology, nanomedicine, transistors, actuators, sensors, membranes, and capacitors. There are various techniques which can be used for the synthesis of CNTs. These include the arc-discharge method, chemical vaporize deposition (CVD), the laser ablation method, and the sol gel method. CNTs can be single-walled, double-walled and multi-walled. CNTs have unique mechanical, electrical and optical properties, all of which have been extensively studied. The present review is focused on the synthesis, functionalization, properties and applications of CNTs. The toxic effect of CNTs is also presented in a summarized form.

• Journal of the Korean Vacuum Society
• /
• v.1 no.1
• /
• pp.212-222
• /
• 1992

To use polycrystalline Si Thin Film Transistor (poly-Si TFT) in high density SRAM instead of High Load Resistor (HLR), TFT is needed to show good electrical characteristics such as large carrier mobility, low leakage current, high driver current and low subthreshold swing. To satisfy these electrical characteristics, the trap state density must be reduced in the channel poly. Technological issues pertinent to the channel poly fabrication process are investigated and discussed. They are solid phase growth (SPG), Si-ion implantation, laser annealing and hydrogenation. The electrical properties of several CVD oxides used as the gate oxide of TFT are compared. The dependence of the electrical characteristics of TFT on source-drain ion-implantation dose, drain offset length and dopant lateral diffusion are also described.

• Proceedings of the KIEE Conference
• /
• 1999.07d
• /
• pp.1504-1507
• /
• 1999

We have grown vertically aligned carbon nanotubes in a large area of Co-Ni codeposited Si substrates by the thermal CVD using $C_2H_2$ gas. Since the discovery of carbon nanotubes, Synthesis of carbon nanotubes for mass production has been achieved by several methods such as laser vaporization arc discharge, and pyrolysis. In particular, growth of vertically aligned nanotubes is of technological importance for applications to FED. Recently, vertically aligned carbon nanotubes have been grown on glass by PECVD Aligned carbon nanotubes can be also grown on mesoporous silica and Fe patterned porous silicon using CVD. Despite such breakthroughs in the growth, the growth mechanism of the alignment are still far from being clearly understood. Furthermore, FED has not been clearly demonstrated yet at a practical level. Here, we demonstrate that carbon nanotubes can be vertically aligned on catalyzed Si substrate when the domain density reaches a certain value. We suggest that steric hindrance between nanotubes at an initial stage of the growth forces nanotubes to align vertically and then nanotubes are further grown by the cap growth mechanism.

• Clean Technology
• /
• v.22 no.4
• /
• pp.232-240
• /
• 2016

Recently, various research studies have been conducted and many are in progress for the suitable alternative materials for ITO based touch screen panel (TSP) due to limitations in size and flexibility. Various researches from all over the world have been attempted to fabricate the fine electrode less than $5{\mu}m$ for the rapid developing of display technology. Research is also being carried out in metal mesh methods using the existing technologies and alternative materials at commercial level. However, by using the existing technologies certain discrepancies are observed like low transparency and low yield which also results in the distortion of patterns. For repairing the damaged pattern, the conventional laser CVD technique has also been used but there are some challenges observed in CVD technique like achieving a stable fine electrode of $10{\mu}m$ or less and avoiding the formation of satellite drops. To overcome these issues, a new printing process named Electrohydrodynamic (EHD) printing, has been introduced by which $5{\mu}m$ fine patterns can be printed in one step. This EHDA printing technique has been applied to print very fine electrodes of $5{\mu}m$ or less by using conductive inks of various viscosities. This study also presents the optimized process parameters for printing $5{\mu}m$ fine electrode patterns during experiments by controlling the applied voltage and supply flow rate. The $5{\mu}m$ repair electrodes were fabricated for repairing $50{\mu}m$ shorted electrode samples.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2011.08a
• /
• pp.259-259
• /
• 2011

염료감응형 태양전지(Dye-Sensitized Solar Cells:DSSC)는 환경 친화적이며, 저가의 공정에 대한 가능성으로 기존의 고가의 결정질 실리콘 태양전지의 경제적인 대안으로 각광을 받고 있다. 최근 염료감응형 태양전지는 투명 전도성 산화막(Transparent Conducting Oxide : TCO)으로 사용되는 Fluorine Tin Oxide (FTO)가 증착된 유리기판 위에 주로 제작된다. FTO는 낮은 비저항과 가시광선 영역에서 높은 투과도를 가지는 우수한 전기-광학적 특성을 갖지만, 비교적 공정이 까다로운 Chemical Vapor Deposition (CVD)법으로 제조하며, 전체 공정비용의 60%를 차지하는 높은 생산단가로 인해 현재 FTO를 대체할 재료개발 연구가 활발히 진행되고 있다. 그 중 ZnO (Zinc Oxide)는 우수한 전기-광학적 특성과 비교적 저렴한 가격으로 새로운 TCO로써 주목받고 있다. ZnO는 넓은 energy band gap (3.4 [eV])의 육방정계 울자이트(hexagonal wurtzite) 결정 구조를 가지는II-VI족 n형 반도체 물질이며, III족 금속원소인 Al, Ga 및 In 등의 불순물을 첨가하면 TCO로서 우수한 전기-광학적 특성과 안정성을 나타낸다. 이들 물질중 $Zn^{2+}$ (0.060 nm)의 이온반경과 유사한 $Ga^{2+}$0.062 nm) 이온이 ZnO의 격자반경을 최소화 시킬 수 있다는 장점으로 최근 주목 받고 있다. 하지만 Ga-doped ZnO (GZO)의 경우 DSC에 사용되는 루테늄 계열의 산성 염료 하에 장시간 두면 표면이 파괴되는 문제가 발생하며, $TiO_2$ paste를 Printing 후 열처리하는 과정에서도 박막의 파괴가 발생할 수 있다. 이를 방지하기 위해 $TiO_2$ Blocking Layer를 GZO 투명전극 위에 증착하였다. 또한, $TiO_2$ Blocking Layer를 적용한 GZO 박막을 전면전극으로 이용하여 DSC를 제작하여 효율을 확인하였다. 2wt%의 $Ga_2O_3$가 도핑된 ZnO 박막은 20mTorr 400$^{\circ}C$에서 Pulsed Laser Deposition (PLD)에 의해 성장되었고, $TiO_2$박막은 Ti 금속을 타겟으로 이용하여 30mTorr 400$^{\circ}C$에서 증착되었다. Scanning electron microscopy (FE-SEM)을 이용한 박막 분석 결과 $TiO_2$가 증착된 GZO 박막의 경우 표면 파괴가 일어나지 않았다. Solar Simulator을 이용하여 I-V특성 측정결과 상용 FTO를 사용한 DSC 수준의 효율을 나타내었다. 이에 따라 Pulsed Laser Deposition을 이용해 제작된 GZO 기판은 $TiO_2$ Blocking Layer를 이용하여 표면 파괴를 방지할 수 있었으며, 이는 향후 염료감응형 태양전지의 투명전극에 적용 가능 할 것으로 판단된다.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2016.02a
• /
• pp.421.1-421.1
• /
• 2016

We studied indium-doped zinc oxide (IZO) film grown by atomic layer deposition (ALD) as transparent conductive oxide (TCO). A variety of TCO layer, such as ZnO:Al (AZO), InSnO2(ITO), Zn (O,S) etc, has been grown by various method, such as ALD, chemical vapor deposition (CVD), sputtering, laser ablation, sol-gel technique, etc. Among many deposition methods, ALD has various advantages such as uniformity of film thickness, film composition, conformality, and low temperature deposition, as compared with other techniques. In this study, we deposited indium-doped zinc oxide thin films using diethyl[bis(trimethylsilyl)amido]indium [Et2InN(TMS)2] as indium precursor, DEZn as zinc precursor and H2O as oxidant for ALD and investigated the optical and electrical properties of IZO films. As an alternative, this liquid In precursor would has several advantages in indium oxide thin-film processes by ALD, especially for low resistance indium oxide thin film and high deposition rate as compared to InCp, InCl3, TMIn precursors etc. We found out that Indium oxide films grown by Et2InN(TMS)2 and H2O precursor show ALD growth mode and ALD growth window. We also found out the different growth rate of Indium oxide as the substrate and investigated the effect of the substrate on Indium oxide growth.