• Title/Summary/Keyword: Large-area plasma

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Design and Synthesis of Multi Functional Noble Metal Based Ternary Nitride Thin Film Resistors

  • Kwack, Won-Sub;Choi, Hyun-Jin;Lee, Woo-Jae;Jang, Seung-Il;Kwon, Se-Hun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.93-93
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    • 2013
  • In recent years, multifunctional ternary nitride thin films have received extenstive attention due to its versatility in many applications. In particular, noble metal based ternary nitride thin films showed a promising properties in the application of Multifunctional heating resistor films because its good electrical properties and excellent resistance against oxidation and corrosion. In this study, we prepared multifunctional noble metal based ternary nitride thin films by atomic layer deposition (ALD) and plasma-enhanced ALD (PEALD) method. ALD and PEALD techniques were used due to their inherent merits such as a precise composition control and large area uniformity, which is very attractive for preparing multicomponent thin films on large area substrate. Here, we will demonstrate the design concept of multifunctional noble metal based ternary thin films. And, the relationship between microstructural evolution and electrical resistivity in noble metal based ternary thin films will be systemically presented. The useful properties of noble metal based ternary thin films including anti-corrosion and anti-oxidation will be discussed in terms of hybrid functionality.

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The Improved Efficiency Network Life-time in TEEN

  • Lee, WooSuk;Lee, Seong Ro;Lee, Jong-Yong
    • International journal of advanced smart convergence
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    • v.5 no.1
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    • pp.59-65
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    • 2016
  • In this paper, we're compared network protocol which is network lifetime longer when using LEACH Protocol, SEP, and TEEN in a heterogeneous Wireless Sensor Network with a Large Sensor Area. Also, we propose a method of divided layer the wide-area sensor filed and transmitting a multi-hop to improve the network lifetime. And we're compared network protocol which is network lifetime more improved apply the proposed method to LEACH Protocol, SEP, and TEEN. We tried to compare results, TEEN showed the best network lifetime. Apply the proposed method to divided the sensor field, L-TEEN (Layered TEEN)'s network lifetime rates of improvement is highest.

Fabrication of Master Replication by Nanoimprint Lithography (나노 임프린트 리소그라피에 의한 마스터 복제 공정)

  • Jeong, Myung-Yung
    • Proceedings of the KSME Conference
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    • 2003.04a
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    • pp.1078-1082
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    • 2003
  • A feasibility study for the fabrication of master replication with nanostructures by Nanoimprint Lithography (NIL) was investigated for application of polymer Photonic Bandgap (PBG) devices used in photonic IC. Large area gratings of $9{\times}15(mm^2)$ with p = 400 nm was successfully embossed on PMMA on silicon wafer and the embossing parameters (temperature, pressure, time) were established. A precise control of $O_2$ plasma Reactive Ion Etching (RIE) process time allowed window opening over the whole area despite the presence of wafer bending. Master replication with aspect ratio 1 was successfully fabricated, but master replication with aspect ratio 3 needs to optimize parameters. All replications were done in a NIL process.

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THE FINE STRUCTURE OF THE FIBROBLAST IN INFLAMED HUMAN PULP TISSUE (염증성치수조직중(炎症性齒髓組織中) 섬유아세포(纖維牙細胞)의 미세구조(微細構造)에 관(關)한 연구(硏究))

  • Bae, Kwang-Shik
    • Restorative Dentistry and Endodontics
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    • v.8 no.1
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    • pp.7-17
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    • 1982
  • The purpose of this study was to investigate the fine structural modifications of fibroblasts in the coronal region of inflamed human pulps from carious teeth. Six untreated human teeth with large carious lesions and two normal teeth as control were selected from male and female patients between the ages of 20 and 39. The teeth were divided into 4 groups by light microscopic findings: the normal control group, the chronic inflammatory cell-appeared group, the acute and chronic inflammatory cell-appeared group, and the total necrosis group. All tissues were fixed in 2.5% glutaraldehyde in 0.1M sodium cacodylate buffer at pH 7.4 and 1% osmic acid in same buffer. They were embedded in Epon 812. The ultrathin sections were stained conventionally and examined with a AEI Corynth 500 electron microscope. The results were as follows; 1. The fibroblasts of the normal pulps were almost in a quiescent state. 2. The active and the quiescent fibroblasts were found in the pulps of the chronic inflammatory cell-appeared group. Lymphocytes and plasma cells were also seen scattered among these fibroblasts. 3. In the pulps of the acute and chronic inflammatory cell-appeared group, active, degenerative and necrotic fibroblasts were found in the PMN appeared area. And all the fibroblasts in the fibrosis area were active. In the area of chronic inflammatory cellular infiltration, almost all the fibroblasts were active, but seldom were quiescent fibroblasts observed. Some fibroblasts in the pulps of two teeth had large vacuoles that contained banded collagen fibrils. The phagosomes had small beaded vesicles or large lysosome-like varicosity. In two of the teeth, microorganisms were present and two morphological shapes were identified, a rod and a coccus. 4. Vacuolar, vesicular, lamellar, fibrous and myelin structures were observed in the pulp of the total necrosis group, and cocci were also seen.

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Fabrication of Large Area Transmission Electro-Absorption Modulator with High Uniformity Backside Etching

  • Lee, Soo Kyung;Na, Byung Hoon;Choi, Hee Ju;Ju, Gun Wu;Jeon, Jin Myeong;Cho, Yong Chul;Park, Yong Hwa;Park, Chang Young;Lee, Yong Tak
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.220-220
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    • 2013
  • Surface-normal transmission electro-absorption modulator (EAM) are attractive for high-definition (HD) three-dimensional (3D) imaging application due to its features such as small system volume and simple epitaxial structure [1,2]. However, EAM in order to be used for HD 3D imaging system requires uniform modulation performance over large area. To achieve highly uniform modulation performance of EAM at the operating wavelength of 850 nm, it is extremely important to remove the GaAs substrate over large area since GaAs material has high absorption coefficient below 870 nm which corresponds to band-edge energy of GaAs (1.424 eV). In this study, we propose and experimentally demonstrate a transmission EAM in which highly selective backside etching methods which include lapping, dry etching and wet etching is carried out to remove the GaAs substrate for achieving highly uniform modulation performance. First, lapping process on GaAs substrate was carried out for different lapping speeds (5 rpm, 7 rpm, 10 rpm) and the thickness was measured over different areas of surface. For a lapping speed of 5 rpm, a highly uniform surface over a large area ($2{\times}1\;mm^2$) was obtained. Second, optimization of inductive coupled plasma-reactive ion etching (ICP-RIE) was carried out to achieve anisotropy and high etch rate. The dry etching carried out using a gas mixture of SiCl4 and Ar, each having a flow rate of 10 sccm and 40 sccm, respectively with an RF power of 50 W, ICP power of 400 W and chamber pressure of 2 mTorr was the optimum etching condition. Last, the rest of GaAs substrate was successfully removed by highly selective backside wet etching with pH adjusted solution of citric acid and hydrogen peroxide. Citric acid/hydrogen peroxide etching solution having a volume ratio of 5:1 was the best etching condition which provides not only high selectivity of 235:1 between GaAs and AlAs but also good etching profile [3]. The fabricated transmission EAM array have an amplitude modulation of more than 50% at the bias voltage of -9 V and maintains high uniformity of >90% over large area ($2{\times}1\;mm^2$). These results show that the fabricated transmission EAM with substrate removed is an excellent candidate to be used as an optical shutter for HD 3D imaging application.

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Tolerability and pharmacokinetics of ginsenosides Rb1, Rb2, Rc, Rd, and compound K after single or multiple administration of red ginseng extract in human beings

  • Choi, Min-Koo;Jin, Sojeong;Jeon, Ji-Hyeon;Kang, Woo Youl;Seong, Sook Jin;Yoon, Young-Ran;Han, Yong-Hae;Song, Im-Sook
    • Journal of Ginseng Research
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    • v.44 no.2
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    • pp.229-237
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    • 2020
  • Background: We investigated the tolerability and pharmacokinetic properties of various ginsenosides, including Rb1, Rb2, Rc, Rd, and compound K, after single or multiple administrations of red ginseng extract in human beings. Methods: Red ginseng extract (dried ginseng > 60%) was administered once and repeatedly for 15 days to 15 healthy Korean people. After single and repeated administration of red ginsengextract, blood sample collection, measurement of blood pressure and body temperature, and routine laboratory test were conducted over 48-h test periods. Results: Repeated administration of high-dose red ginseng for 15 days was well tolerated and did not produce significant changes in body temperature or blood pressure. The plasma concentrations of Rb1, Rb2, and Rc were stable and showed similar area under the plasma concentration-time curve (AUC) values after 15 days of repeated administration. Their AUC values after repeated administration of red ginseng extract for 15 days accumulated 4.5- to 6.7-fold compared with single-dose AUC. However, the plasma concentrations of Rd and compound K showed large interindividual variations but correlated well between AUC of Rd and compound K. Compound K did not accumulate after 15 days of repeated administration of red ginseng extract. Conclusion: A good correlation between the AUC values of Rd and compound K might be the result of intestinal biotransformation of Rb1, Rb2, and Rc to Rd and subsequently to compound K, rather than the intestinal permeability of these ginsenosides. A strategy to increase biotransformation or reduce metabolic intersubject variability may increase the plasma concentrations of Rd and compound K.

POLYMER SURFACE MODIFICATION WITH PLASMA SOURCE ION IMPLANTATION TECHNIQUE

  • Han, Seung-Hee;Lee, Yeon-Hee;Lee, Jung-Hye;Yoon, Jung-Hyeon;Kim, Hai-Dong;Kim, Gon-ho;Kim, GunWoo
    • Journal of the Korean institute of surface engineering
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    • v.29 no.5
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    • pp.345-349
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    • 1996
  • The wetting property of polymer surfaces is very important for practical applications. Plasma source ion implantation technique was used to improve the wetting properties of polymer surfaces. Poly(ethylene terephtalate) and other polymer sheets were mounted on the target stage and an RF plasma was generated by means of an antenna located inside the vacuum chamber. High voltage pulses of up to -10kV, 10 $\mu$sec, and up to 1 kHz were applied to the stage. The samples were implanted for 5 minutes with using Ar, $N_2,O_2,CH_4,CF_4$ and their mixture as source gases. A contact angle meter was used to measure the water contact angles of the implanted samples and of the samples stored in ambient conditions after implantation. The modified surfaces were analysed with Time-Of-Flight Mass Spectrometer (TOF-SIMS) and Auger Electron Spectroscopy (AES). The oxygen-implanted samples showed extremely low water contact angles of $3^{\circ}C$ compared to $79^{\circ}C$ of unimplanted ones. Furthermore, the modified surfaces were relatively stable with respect to aging in ambient conditions, which is one of the major concerns of the other surface treatment techniques. From TOF-SIMS analysis it was found that oxygen-containing functional groups had been formed on the implanted surfaces. On the other hand, the $CF_4$-implanted samples turned out to be more hydro-phobic than unimplanted ones, giving water contact angles exceeding $100^{\circ}C$ . The experiment showed that plasma source ion implantation is a very promising technique for polymer surface modification especially for large area treatment.

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Effect of Gas now Modulation on Etch Depth Uniformity for Plasma Etching of 150 mm GaAs Wafers (150 mm GaAs 웨이퍼의 플라즈마 식각에서 식각 깊이의 균일도에 대한 가스 흐름의 최적화 연구)

  • 정필구;임완태;조관식;전민현;임재영;이제원;조국산
    • Journal of the Korean Vacuum Society
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    • v.11 no.2
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    • pp.113-118
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    • 2002
  • We developed engineering methods to control gas flow in a plasma reactor in order to achieve good etch depth uniformity for large area GaAs etching. Finite difference numerical method was found quite useful for simulation of gas flow distribution in the reactor for dry etching of GaAs. The experimental results in $BCl_3/N_2/SF_6/He$ ICP plasmas confirmed that the simulated data fitted very well with real data. It is noticed that a focus ring could help improve both gas flow and etch uniformity for 150 mm diameter GaAs plasma etch processing. The simulation results showed that optimization of clamp configuration could decrease gas flow uniformity as low as $\pm$ 1.5% on an 100 mm(4 inch) GaAs wafer and $\pm$ 3% for a 150 m(6 inch) wafer with the fixed reactor and electrode, respectively. Comparison between simulated gas flow uniformity and real etch depth distribution data concluded that control of gas flow distribution in the chamber would be significantly important in order or achieve excellent dry etch uniformity of large area GaAs wafers.

Characterization of structural properties of CNTs grown by ICP-CVD (ICP-CVD 방법을 이용한 탄소나노튜브의 제작 및 물성분석)

  • Chang, Seok-Mo;Kim, Young-Do;Park, Chang-Kyun;Uhm, Hyun-Seok;Park, Jin-Seok
    • Proceedings of the KIEE Conference
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    • 2002.07c
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    • pp.1533-1535
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    • 2002
  • Carbon nanotubes (CNTs) were grown with high density on a large area of Ni-coated silicon oxide substrates by using an inductively coupled plasma-chemical vapor deposition (ICP-CVD) of $C_2H_2$ at temperatures ranging from 600 to $700^{\circ}C$. The Ni catalyst was formed using an RF magnetron sputtering system with varying the operating pressure and exposure time of $NH_3$ plasma. The surface morphology of nickel catalyst films and CNTs was examined by SEM and AFM. The graphitized structure of CNTs was confirmed by Ramman spectra, SEM, and TEM. The growth of CNTs was observed to be strongly influenced by the surface morphology of Ni catalyst, which depended on the pre-treatment time and growth temperature. Dense CNTs with uniform-sized grains were successfully grown by ICP-CVD.

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Electrical and Electromagnetic Characteristics of Xe Plasma Flat Lamp by Electrode Structure (Xe 플라즈마 평판형 광원의 전극 구조에 따른 전기.자기적 특성)

  • Choi, Yong-Sung;Moon, Jong-Dae;Lee, Kyung-Sup;Lee, Sang-Heon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.05a
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    • pp.82-85
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    • 2006
  • As a display becomes large recently, Acquisition of high luminance and Luminance uniformity is becoming difficult in the existing CCFL or EEFL backlight system. So, study for a performance enhancement has enforced. but lamp development of flat type is asked for high luminance and a luminance uniformity security in of LCD and area anger trend ultimately. In this paper, we changed a tip shape of an electrode for production by the most suitable LCD backlight surface light source, and confirmed discharge characteristic along discharge gas pressure and voltage, and confirmed electric field distribution and discharge energy characteristic through a Maxwell 2D simulation. Therefore the discharge firing voltage characteristic showed a low characteristic than a rectangular type and round type in case of electrode which used tip of a triangle type, and displayed a discharge electric current as a same voltage was low.

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