• Korean Journal of Optics and Photonics
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• v.24 no.4
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• pp.159-167
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• 2013

The liquid crystal(LC) display is the most promising technology of the flat panel displays covering all applications from small mobile to large television applications. To understand the operating principles and improve the performances of the various LC displays, one should grasp the anisotropic nature of the LC and the propagation of light in the anisotropic media. Basic formulas governing the distribution of the LC molecules, directly related to the electro-optic effects of the LC devices, are described in view of the macroscopic interaction. Based on the matrix representation, the polarization analysis for the LC devices is also presented.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.33 no.5
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• pp.386-392
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• 2020

In this study, the drift current characteristics of charged particles are analyzed for panels fabricated by varying the waveform biasing of the active particle loading method (APLM), which is a method driven by the electrophoretic principle of loading charged particles into a cell of a barrier rib-type electronic paper. We prepare 3 panels using APLM and 1 panel without APLM. The waveform of APLM uses square wave and ramp wave, and the step voltage wave is applied to the driving voltage. The drift currents measured from the square wave and ramp wave with the same period applied by APLM are 4.872 µC and 5.464 µC, respectively, and the ramp wave is shown to be relatively advantageous for loading charged particles that have a large q/m. The time-current curve results confirm that the abrupt movement of charged particles is occurring. When the step form wave signal with a short time of 1s is first applied, initial large movement of the charged particles is confirmed to occur in all samples, which is understood as the effect of applying the voltage necessary to remove the imaging force. The results of this study are expected to improve the loading of charged particles into the electronic paper cell, driven by the electrophoretic principle and optimization of the driving conditions.

• The Journal of the Convergence on Culture Technology
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• v.7 no.1
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• pp.662-667
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• 2021

Vibrotactile feedback is a major function of the latest touch displays, which greatly improves the user's operability and immersion when interacting with the interface on the screen. In this study, we propose a vibrotactile actuator suitable for mounting on the back side of a mid- to large-sized display because it can generate a strong vibration output by applying an electrostatic force-based mechanism and can be manufactured in a thin flat panel type. The proposed actuator was developed in a structure capable of amplifying the vibration force by alternating up and down with electrostatic force by the upper and lower electrodes that are spaced apart from the electrically grounded mass suspended from a radial leaf spring. As a result of the performance evaluation, the developed bar-type module with two built-in actuators showed excellent vibration output of up to 3.3 g at 170 Hz, confirming the possibility of providing haptic feedback in medium and large touch displays.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.18 no.5
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• pp.674-680
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• 2017

Touch Screen Panel (TSP) is a widely used personal handheld device and as a large display apparatus. This study examines micro bump fabrication technology for TSP test process. In the testing process, as TSP is changed, should make a new micro bump for probing and modify the testing program. In this paper we use a maskless lithography system to confirm the potential to fabricatemicro bump to reducecost and manufacturing time. The requiredmaskless lithography system does not use a mask so it can reduce the cost of fabrication and it flexible to cope with changes of micro bump probing. We conducted electro field simulation by pitches of micro bump and designed the lithography pattern image for the maskless lithography process. Then we conducted Photo Resist (PR) patterning process and electro-plating process that are involved in MEMS technology to fabricate micro bump.

• 한국정보디스플레이학회:학술대회논문집
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• 2004.08a
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• pp.1058-1061
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• 2004

Recently, According to companies of TFT LCD are making large sized products more and more. In the vortex of Products with a monitor and LCD TV is applied in a technique of a high viewing angle(FFS, IPS, VA). Also, as a high luminance, high speed response time, high degree of a color purity, and so on are continuing to develop a high performance, it is necessary to improve a specific character of high luminance that apply to LCD TV as a LCD BLU. Because a LCD panel for TV usually has a lower resolution that compare to a monitor, the structure of present backlight system can't put out its power even though it has a merit in transmission. Therefore, the examination of improvement about the high luminance direct typed BLU for LCD TV that presupposes several uses of CCFL(Cold Cathode Fluorescent Lamp) or EEFL(External Electrode Fluorescent Lamp)is actively being progressed. Although it is necessary to increase the number of lamps for applying high performance by the direct type, in this case, because we can design the character of luminance for adoption of high performance. We can satisfy with a level of luminance for LCD TV. Accordingly, we analyzed a change of the number of CCFL, mechanical and optical character to produce the direct typed backlight in 32inches spec. Consequently, we achieved luminance of 6597nit,which was including polarization film, and secured the standard for LCD TV.

• Journal of Korea Multimedia Society
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• v.8 no.10
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• pp.1360-1368
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• 2005

PDP is the flat panel display, suitable for high definition television because of large-sire and high-brightness. It has many advantages such as fast response, wide viewing angle, low weight, and simple manufacturing process for fabrication. However, there are some disadvantages and one of them is the image quality degradation, which is dependent on the digital signal processing. Although image quality of PDP is improving by many researches and experimentations, it still isn't as good as that of CRT because of various factors. One of them is worm-like pattern generated by an error diffusion process. And the worm-like pattern is severely increased after an APL process. An increased worm-like pattern occur a drop of resolution in image and a change of CCT according to each grayscale. In this paper, a method for improvement of image quality using the error diffusion which considers the APL process is proposed. In the proposed method, the APL process is performed before the error diffusion process. Simulation results showed that the proposed method has better performances for resolution in images and CCT uniformity according to each grayscale than the conventional method.

• Current Photovoltaic Research
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• v.3 no.3
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• pp.101-105
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• 2015

ZnO is gathering great interest for large square optoelectrical devices of flat panel display (FHD) and solar cell as a transparent conductive oxide (TCO). Herewith, Mg and IIIA (Al, In) co-doped ZnO films were prepared on SLG substrate using RF magnetron sputtering system. The effect of variation of atomic weight % of Mg and ZnO have been investigated. The atomic weight % Al and In are of 3% and kept constant throughout. The numbers of samples were prepared according to their different contents, which are $M_{3%}AZO_{94%}$, $M_{4%}AZO_{93%}-(MAZO)$ and $M_{3%}IZO_{94%}$, $M_{4%}IZO_{93%}-(MIZO)$ respectively. A RF power of 225 W and working pressure of 6 m Torr was used for the deposition at $300^{\circ}C$. All of the two thin film show good uniformity in field emission scanning electron microscopy image. $M_{3%}AZO_{94%}$ thin film shows overall better performance among the all. The film shows the best lowest resistivity, carrier concentration, mobility and Sheet resistance and is found to be are of $8.16{\times}10^{-4}{\Omega}cm$, $4.372{\times}10^{20}/cm^3$, $17.5cm^2/vs$ and $8.9{\Omega}/sq$ respectively. Also $M_{3%}AZO_{94%}$ thin film shows the relatively high optical band gap energy of 3.7 eV with high transmittance more than 80% in visible region required for the better solar cell performance.

• Journal of KIEE
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• v.11 no.1
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• pp.41-45
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• 2001

The addressing time should be reduced by modifying cell structure and/or driving method in order to replace the dual scan system by single scan and increase the luminance in large ac plasma display panel(PDP). In this paper, the effects of the dielectric layer thickness and the barrier rib height on the addressing time of ac PDP are investigated. It is found out that the addressing time was decreased with decreasing thickness of dielectric layer on the front glass and thickness of white dielectric layer on the rear glass. The decreasing rate were 160ns/10${\mu}{\textrm}{m}$ and 270nsd/10${\mu}{\textrm}{m}$, respectively. Also in case of decreasing the height of barrier rib, addressing time was decreased at the rate of 550ns/10${\mu}m$.

• The Transactions of the Korean Institute of Power Electronics
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• v.15 no.2
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• pp.111-118
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• 2010

Recently, LCD TV using LED backlight has a great attention due to its low power consumption, slim construction, mercury free, wide color gamut and fast response. For the uniform brightness of the LCD panel, multi channel LEDs and DC/DC converter for each LED are required in conventional system. Therefore energy conversion efficiency is poor, the system size bulky and the cost of production high. To overcome these above mentioned drawbacks, a new current-balancing multi-channel LED driver is proposed in this paper. It can not only drive multi-channel LEDs with one DC/DC converter but also provide all LEDs with constant balanced current. To confirm the validity of the proposed driver, its operation and performance are verified on a prototype for 46" LCD TV.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.08a
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• pp.146-147
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• 2011

Processing a large area substrate for liquid crystal display (LCD) or solar panel applications in a capacitively coupled plasma (CCP) reactor is becoming increasingly challenging because of the size of the substrate size is no longer negligible compared to the wavelength of the applied radio frequency (RF) power. The situation is even worse when the driving frequency is increased to the Very High Frequency (VHF) range. When the substrate size is still smaller than 1/8 of the wavelength, one can obtain reasonably uniform process results by utilizing with methods such as tailoring the precursor gas distribution by adjustingthrough shower head hole distribution or hole size modification, locally adjusting the distance between the substrate and the electrode, and shaping shower head holes to modulate the hollow cathode effect modifying theand plasma density distribution by shaping shower head holes to adjust the follow cathode effect. At higher frequencies, such as 40 MHz for Gen 8.5 (2.2 m${\times}$2.6 m substrate), these methods are not effective, because the substrate is large enough that first node of the standing wave appears within the substrate. In such a case, the plasma discharge cannot be sustained at the node and results in an extremely non-uniform process. At Applied Materials, we have studied several methods of modifying the standing wave pattern to adjusting improve process non-uniformity for a Gen 8.5 size CCP reactor operating in the VHF range. First, we used magnetic materials (ferrite) to modify wave propagation. We placed ferrite blocks along two opposing edges of the powered electrode. This changes the boundary condition for electro-magnetic waves, and as a result, the standing wave pattern is significantly stretched towards the ferrite lined edges. In conjunction with a phase modulation technique, we have seen improvement in process uniformity. Another method involves feeding 40 MHz from four feed points near the four corners of the electrode. The phase between each feed points are dynamically adjusted to modify the resulting interference pattern, which in turn modulate the plasma distribution in time and affect the process uniformity. We achieved process uniformity of <20% with this method. A third method involves using two frequencies. In this case 40 MHz is used in a supplementary manner to improve the performance of 13 MHz process. Even at 13 MHz, the RF electric field falls off around the corners and edges on a Gen 8.5 substrate. Although, the conventional methods mentioned above improve the uniformity, they have limitations, and they cannot compensate especially as the applied power is increased, which causes the wavelength becomes shorter. 40 MHz is used to overcome such limitations. 13 MHz is applied at the center, and 40 MHz at the four corners. By modulating the interference between the signals from the four feed points, we found that 40 MHz power is preferentially channeled towards the edges and corners. We will discuss an innovative method of controlling 40 MHz to achieve this effect.