• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.1
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• pp.130-133
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• 2004

The characterization of interdigitated capacitors was investigated. The test structures are manufactured by low temperature co-fired ceramic(LTCC) process and their s-parameters were measured. The optimized equivalent circuit models for test structures were obtained using the partial element equivalent circuit(PEEC) method. Predictive modeling was performed on different test structures using optimized parameters to verify the circuit models. From this result, the manufacturability on the process can be improved through the predictive modeling for the characteristics of interdigitated capacitors.

• JSTS:Journal of Semiconductor Technology and Science
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• 제11권4호
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• pp.229-237
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• 2011

In this paper, a 60 GHz LTCC SiP with low-power CMOS OOK modulator and demodulator is presented. The 60 GHz modulator is designed in a 90-nm CMOS process. The modulator uses a current reuse technique and only consumes 14.4-mW of DC power in the on-state. The measured data rate is up to 2 Gb/s. The 60 GHz OOK demodulator is designed in a 130nm CMOS process. The demodulator consists of a gain boosting detector and a baseband amplifier, and it recovers up to 5 Gb/s while consuming low DC power of 14.7 mW. The fabricated 60 GHz modulator and demodulator are fully integrated in an LTCC SiP with 1 by 2 patch antenna. With the LTCC SiP, 648 Mb/s wireless video transmission was successfully demonstrated at wireless distance of 20-cm.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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• pp.357-358
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• 2005

Compact power amplifier modules (PAM) for WCDMA/KPCS and GSM/WCDMA dual-band applications based on multilayer low temperature co-fired ceramic (LTCC) substrates are presented in this paper. The proposed modules are composed of an InGaP/GaAs HBT PAs on top of the LTCC substrates and passive components such as RF chokes and capacitors which are embedded in the substrates. The overall size of the modules is less than 6mm $\times$ 6mm $\times$ 0.8mm. The measured result shows that the PAM delivers a power of 28 dBm with a power added efficiency (PAE) of more than 30 % at KPCS band. The adjacent-channel power ratio (ACPR) at 1.25-MHz and 2.25-MHz offset is -44dBc/30kHz and -60dBc/30kHz, respectively, at 28-dBm output power. Also, the PAM for WCDMA band exhibits an output power of 27 dBm and 32-dB gain at 1.95 GHz with a 3.4-V supply. The adjacent-channel leakage ratio (ACLR) at 5-MHz and 10-MHz offset is -37.5dBc/3.84MHz and -48dBc/3.84MHz, respectively. The measured result of the GSM PAM shows an output power of 33.4 dBm and a power gain of 30.4 dB at 900MHz with a 3.5V supply. The corresponding power added efficiency (PAE) is more than 52.6 %.

• 한국전기전자재료학회논문지
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• 제24권4호
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• pp.297-302
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• 2011

Recently, low temperature co-fired ceramic (LTCC) technology is widely used in sensors, actuators and microsystems fields because of its very good electrical and mechanical properties, high reliability and stability as well as possibility of making 3D micro structures. In this study, we investigated the effects of sputtering gas ratio and annealing temperature on the crystal structure of $Pb(ZrTi)O_3$ (PZT) thin films deposited on LTCC substrate. The LTCC substrate with thickness of $400\;{\mu}m$ were fabricated by laminating 4 green tapes which consist of alumina and glass particle in an organic binder. The PZT thin films were deposited on Pt / Ti / LTCC substrates by RF magnetron sputtering method. The results showed that the crystallization of the films were enhanced as increasing $O_2$ mixing ratio. At about 25% $O_2$ mixing ratio, was well crystallized in the perovskite structure. PZT thin films was annealed at various temperatures. When the annealing temperature is lower, the PZT thin films become a phyrochlore phase. However, when the annealing temperature is higher than $600^{\circ}C$, the PZT thin films become a perovskite phase. At the annealing temperature of $700^{\circ}C$, perovskite PZT thin films with good quality structure was obtained.

• 마이크로전자및패키징학회지
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• 제10권1호
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• pp.31-38
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• 2003

MEMS 소자는 현재의 전자산업환경에서 여러 요구조건을 만족시킬 수 있는 특징을 갖추고 있으며 이러한 MEMS 소자를 이용한 MEMS 구조물의 packaging 방법에 있어서는 내부 MEMS 소자의 동작을 위한 외부 환경으로부터의 보호를 위하여 Hermetic sealing에 대한 요구를 충분히 만족시켜야 한다. 본 논문에서는 이와 같은 MEMS device의 진공 패키지를 구현함에 있어서 기판내부에 수동소자를 실장할 수 있는 LTCC 기술$^{1)}$ 을 이용하여 진공 패키징하는 방법에 대하여 소개한다. 본 기술을 이용하는 경우 기존의 Hermetic sealing이외에 향후 적층 기판 내부에 수동소자를 내장시켜 배선 길이 및 노이즈 성분을 감소시켜 더욱 전기적 성능을 향상시킬 수 있는 장점이 있게된다. 본 논문에서는 LTCC기판을 이용하여 패키징 시킨 후, 내부 진공도에 영향을 줄 수 있는 계면들에서의 시간에 따른 진공도 변화로부터 leakage rate를 측정 (stacked via : $4.1{\pm}1.11{\times}10^{-12}$/Torr1/sec, LTCC 기판/AgPd/solder/Cu의 여러 가지 계면구조: $3.4{\pm}0.33{\times}10^{-12}$/ Torrl/sec)하여 LTCC 기판의 Hermetic sealing 특성에 관하여 조사하였다. 실제 적용의 한 예로 LTCC 기술을 이용하여 Bolometer를 성공적으로 진공패키징할 수 있었으며 실제 관찰된 이미지를 함께 소개한다.

• 한국항행학회논문지
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• 제23권2호
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• pp.172-178
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• 2019

본 논문에서는 LTCC 다층기판으로 구현할 수동 소자를 수축공정과 무수축공정으로 구분하여 설계, 제작하고 분석하였다. 유전율 7 또는40의 두 종류 세라믹 소재를 사용하여 기본 형태의 수동소자를 다양하게 두 가지 공정으로 제작하여 특성을 비교하였다. 유전율40 기판을 사용할 때 수축공정은 X, Y 방향에서 17%, Z 방향에서 36%의 수축율을 보이는 것과 비교하여, 무수축공정은 X,Y 방향에서 변화하지 않고 Z 방향으로만 43% 수축하여 평면상에서 높은 치수 정밀도와 표면 평탄도를 얻을 수 있다. 측정 값으로 부터 매개 변수를 이용한 경험적 해석 식을 이용하여 제작한 LTCC 소자의 인덕턴스 및 커패시턴스를 추정하였으며 설계 라이브러리 형태로 구현하였다. 유전율과 제작 공정에 따라 인덕터의 권선수와 단위 면적에 따른 커패시턴스를 측정하여 권선수 및 단위면적에 따른 소자값을 예측할 수 있는 다항식을 제시하였다.

• 한국정보통신설비학회:학술대회논문집
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• 한국정보통신설비학회 2002년도 하계학술대회 및 세미나
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• pp.17-20
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• 2002

본 논문에서는 세라믹 칩 안테나를 LTCC로 구현하여 다중 대역 특성을 얻는 방법을 제안하고 있다. 휴대용 단말기에 칩 안테나를 내장함으로 물리적 손상을 피하고 위치추적 시스템(GPS) 대역과 단말기 송수신용 대역, 즉 두 대역 이상 사용 가능하고 ${\varepsilon}_r=7.8$인 세라믹 칩 안테나를 LTCC(Low Temperature Co-fired Ceramic)공정을 이용하여 세라믹 칩 내부에 정합 회로를 구현하여 이중 대역 특성을 갖는 구조에 대해 논의하고 있다. 안테나의 전체 크기는 $16mm{\times}4mm{\times}2mm$ 이며 대역폭은 삽입손실 -10dB 기준 대략 1560MHz에서 2160MHz까지 약 600MHz정도이다. 측정은 접지면의 넓이가50mmx50mm이고 두께=0.7874mm, ${\varepsilon}_r=4.6$인 FR4 기판을 이용하여 측정한다.

• 한국세라믹학회지
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• 제41권6호
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• pp.444-449
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• 2004

BaO-Nd$_2$O$_3$-TiO$_2$계 마이크로파 유전체 세라믹스에 결정화유리를 첨가하여 세라믹-결정화유리 복합체 유전재료를 제작하여, 적층 일체형 RF수동소자 모듈 구현을 위한 저온소결 유전재료로서의 응용가능성에 대해 검토하였다. BaO-Nd$_2$O$_3$-TiO$_2$계 유전체 세라믹스에 PbO-TiO$_2$-Al$_2$O$_3$-SiO$_2$ 조성의 결정화 유리를 5∼30 wt% 범위로 첨가하여 소결온도를 130$0^{\circ}C$에서 105$0^{\circ}C$까지 낮출 수 있었으며, 첨가량의 증가에 따라 유리의 연화로 인한 소결밀도의 증가 및 입성장이 뚜렷하게 관찰되었다. 특히, 결정화 유리를 20 wt% 이상 첨가하였을 경우, 105$0^{\circ}C$의 소결온도에서 95% 이상의 상대밀도를 갖는 양호한 소결체를 얻을 수 있었고, 이 때 유전을($\varepsilon$$_{r}$)은 72, 품질계수(Q-f)는 1500이었고, 공진주파수 온도계수($ au$$_{f}$)는 22ppm/$^{\circ}C$을 나타내었다. 이러한 높은 유전율은 유리속의 결정상 PbTiO$_3$의 존재에 기인한 것이다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.259-259
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• 2008

The LTCC (Low Temperature Co-fired Ceramic) technology meets the requirements for high quality microelectronic devices and microsystems application due to a very good electrical and mechanical properties, high reliability and stability as well as possibility of making integrated three dimensional microstructures. The wet process, which has been applied to the etching of the metallic thin film on the ceramic substrate, has multi process steps such as lithography and development and uses very toxic chemicals arising the environmental problems. The other side, Plasma technology like ion beam sputtering is clean process including surface cleaning and treatment, sputtering and etching of semiconductor devices, and environmental cleanup. In this study, metallic multilayer pattern was fabricated by the ion beam etching of Ti/Pd/Cu without the lithography. In the experiment, Alumina and LTCC were used as the substrate and Ti/Pd/Cu metallic multilayer was deposited by the DC-magnetron sputtering system. After the formation of Cu/Ni/Au multilayer pattern made by the photolithography and electroplating process, the Ti/Pd/Cu multilayer was dry-etched by using the low energy-high current ion-beam etching process. Because the electroplated Au layer was the masking barrier of the etching of Ti/Pd/Cu multilayer, the additional lithography was not necessary for the etching process. Xenon ion beam which having the high sputtering yield was irradiated and was used with various ion energy and current. The metallic pattern after the etching was optically examined and analyzed. The rate and phenomenon of the etching on each metallic layer were investigated with the diverse process condition such as ion-beam acceleration energy, current density, and etching time.

• Journal of Electrical Engineering and Technology
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• 제8권1호
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• pp.168-175
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• 2013

This paper presents compact dual-band WLAN filter and filter module. They were developed by embedding all of the passive lumped elements into a LTCC substrate. In order to reduce the size/volume of the filter and avoid EM parasitic couplings between the passive elements, the proposed filter was designed using a 3rd order Chebyshev circuit topology and J-inverter transformation technology. The 3rd order Chebyshev bandpass filter was firstly designed for the band-selection of the 802.11b and was then transformed using finite transmission zeros technologies. Finally, the dual-band filter was realized by adding two notch resonators to the 802.11b filter circuit for the band-selection of the 802.11a/g. The maximum insertion losses in the lower and higher passbands were better than 2.0 and 1.3 dB with minimum return losses of 15 and 14 dB, respectively. Furthermore, the filter was integrated with a diplexer to clearly split the signals between 2 and 5 GHz. The maximum insertion and minimum return losses of the fabricated module were 2.2 and 14 dB at 2.4 - 2.5 GHz, and 1.6 and 19 dB at 5.15 - 5.85 GHz, respectively. The overall volume of the fabricated filter was $2.7{\times}2.3{\times}0.59mm^3$.