• 제목/요약/키워드: LCD manufacturing company

검색결과 11건 처리시간 0.023초

From Printing Graphics to Printing Electronics, The Digital Revolution in Display Manufacturing

  • Elizur, Eran
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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    • pp.193-194
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    • 2007
  • In this paper we present work done by Kodak Graphic-Communications-Group and our partners demonstrating applications where laser direct imaging could replace photolithography in display manufacturing. Such applications range from direct manufacturing (e.g. LCD color-filters) to producing “masters” where manufacturing is done by traditional printing methods (e.g. flexography, Gravure-printing).

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FOS improvement through the growth speed increase of A-Si layer in TFT process

  • Kim, Pyung-Hun;Kang, I.B.;Lee, Eui-Wan;Jung, Ji-Man;Gil, W.S.;Lee, Hyung-Gi;Lee, Y.H.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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    • pp.1040-1043
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    • 2004
  • As time goes by, the market demand increases and each LCD panel manufacturing company makes every effort to produce more panels in a limited time. It is necessary to reduce the cost and time of production for the improvement of productivity in manufacturing companies. The increased speed of thin films growth used in the TFT process brings improvement of productivity but it is also accompanied by a drop in display quality due to a characteristic change of the thin film. So in our dissertation, we deal with the increased speed of a-Si layer growth and the proportioned a drop in characteristic quality. We discuss a drop in display quality by a characteristic change of a-Si layer and we propose a counter-plan through panel design improvement. We have already applied our plan to the 15" XGA panel and confirmed the improved result.

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LCD 패널 Review & Repair 장비의 결함수정 자동화 알고리즘 (Auto Defect Repair Algorithm for LCD Panel Review & Repair Machine)

  • 이우철;임성묵;이승기;정수화;홍순국
    • 한국레이저가공학회지
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    • 제15권1호
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    • pp.6-9
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    • 2012
  • In TFT-LCD manufacturing process, various defects are generated by manufacturing machine trouble or particle. These defects can be repaired through the TFT-Laser repair process that only can't be automated in TFT-LCD manufacturing Process. In this Paper, we propose auto defect algorithm for TFT-LCD laser repair machine using image processing algorithm in order to automate process. Proposed algorithm can detect very small defects (< 2um) in 98% success ratio, and generated laser repair path guarantee highly precise position accuracy. Through proposed system, much of the work still done the old-fashioned way, by hand, can be automated and manufacturing company can be strengthed the competitiveness of cost.

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LCD 부품 조립의 생산성 향상을 위한 실증적 연구 (An Empirical Study of Improving Total Productivity using Arena for BLU Assembly Process in LCD)

  • 변의석;이장룡
    • 한국경영과학회:학술대회논문집
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    • 한국경영과학회/대한산업공학회 2005년도 춘계공동학술대회 발표논문
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    • pp.80-83
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    • 2005
  • The competitiveness of the manufacturing company is evaluated in terms of line productivity, quality cost, inventory level, logistics efficiency, and so on. The productivity is defined by the number of products divided by the number of workers within the given operation time. Increasing the productivity is not easy to man-operated situation in the line, since it heavily depends on the standard time of the workers. This paper deals with the productivity of the Back Light Unit assembler for TFT-LCD, and proposes the methodology of investigating the optimal process by simulation of Arena.

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LCD 제조공정의 이온화 장치에 대한 전리방사선 지역노출특성 분석 (Analysis of Local Exposure Levels of Radiation Emitted from Soft X-ray Ionizers in LCD Manufacturing Processes)

  • 김준범;정은교;정기효
    • 한국산업보건학회지
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    • 제31권4호
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    • pp.342-352
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    • 2021
  • Objectives: This study analyzed the local exposure levels of radiation emitted from the equipment with soft X-ray ionizers to investigate the radiation exposure levels in Liquid Crystal Display(LCD) manufacturing processes. Methods: This study measured the local radiation levels for the equipment installed in two LCD manufacturing companies. The equipment were installed at diverse processes and equipped with various number of ionizers. The local radiation levels were measured on the surface of the equipment by using direct reading equipment, and the measurements were converted into annual effective dose by considering the radiation exposure time of workers. Statistical analyses were performed to investigate the radiation exposure characteristics. Results: Annual effective doses for 97.6% of the equipment being measured were less than 1 mSv. However, the range of annual effective doses was 0.004 mSv ~ 2.167 mSv, which indicated a large variation among the equipment. Statistical analyses of the study found that this large variation was raised due to improper shielding of the equipment rather than process and/or equipment characteristics. To pinpoint the cause of this large variation in annual effective dose, this study improved the shielding of the equipment being radiated over 1 mSv and found that their average effective dose was reduced from 1.604 mSv to 0.126 mSv after shielding improvement. Conclusions: Relatively high exposure levels of radiation were observed in some equipment where their shielding were insufficiently thick and/or sealed. This finding implies that the shielding of the equipment is an important engineering countermeasure to control the radiation exposure levels in industries.

중소형 TFT-LCD용 범용 LDI 제어기의 설계 및 FPGA 구현 (The design and FPGA implementation of a general-purpose LDI controller for the portable small-medium sized TFT-LCD)

  • 이시현
    • 한국컴퓨터정보학회논문지
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    • 제12권4호
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    • pp.249-256
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    • 2007
  • 본 논문에서는 휴대 가능한 중소형($4{\sim}9$인치 크기)의 정보단말기에 사용되는 TFT-LCD(Thin Film Transistor addressed -Liquid Crystal Display)의 LDI(LCD Driver Interface) 제어기(controller)를 제조사와 크기에 관계없이 사용할 수 있는 표준화된 범용 TFT-LCD의 LDI를 설계하고 FPGA(Field Programmable Gate Array)로 구현하였다. 설계한 LDI 제어기는 FPGA 테스트 보드(test board)에서 검증하였으며, 상업용 TFT-LCD 패널에서 시험결과 안정적으로 상호 동작하였다. 설계한 범용 LDI 제어기의 장점은 LCD의 제조사와 크기에 관계없이 그 동작을 표준화시켜 설계하였으므로 향후 모든 패널내의 SoG(System on a Glass) 모듈 설계에 적용할 수 있는 것이다. 그리고 기존의 방식에서는 LCD 제조사별, 패널 크기별로 별개의 LDI 제어기 칩을 개발하여 사용하지만, 설계한 LDI 제어기는 모든 휴대 가능한 중소형 패널을 구동시킬 수 있어서 IC의 공급가, AV 보드와 패널의 제조 원가 하락을 가져올 수 있으며 가까운 장래에는 보다 우수한 기능의 패널을 제작하기 위한 TFT-LCD 패널 모듈의 SoG 개발이 필연적으로 요구되고 있다. 연구결과는 TFT-LCD 패널을 더욱 소형화, 경량화 그리고 저가격화가 가능하여 기술 및 시장 경쟁력을 선점할 수 있다. 또한 향후 많은 수요가 예상되는 이동형 정보단말기에 사용되는 TFT-LCD 패널 모듈의 SoG IC(Integrated Circuit) 개발과 제작을 위한 기초 자료로서 활용될 수 있다.

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전자산업 청정실의 작업환경 및 유해물질농도 평가 (Assessment of hazardous substances and workenvironment for cleanrooms of microelectronic industry)

  • 정은교;박현희;신정아;장재길
    • 한국산업보건학회지
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    • 제19권3호
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    • pp.280-287
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    • 2009
  • High-tech microelectronics industry is known as one of the most chemical-intensive industries. In Korea, Microelectronics industry occupied 38% of export and 16% of working employees work in microelectronics industry. But, chemical information and health hazards of high-tech microelectronics manufacturing are poorly understood because of rapid development and its penchant for secrecy. We need to investigate on chemical use and exposure control. We Site-visits to 6 high-tech microelectronics manufacturing company which have cleanroom work using over 1,000kg organic solvents (5 semi-conductor chips and its related parts company, 1 liquid crystal display (LCD)). We reviewed their data on chemical use and ventilation system, and measured TVOCs (Total Volatile Organic Compounds) and carbon dioxide concentration. All cleanroom air passed through hepa filters to acheive low particle levels and only 1 cleanroom uses carbon filters to minimize the organic solvents exposures In TVOC screening test, Cleanroom for semi-conductor chips and its related parts company with laminar down flow system (e.g. class 1~100) showed nondetectable level of TVOCs concentration, but Cleanroom for liquid crystal display (LCD) with conventional flow system (e.g. class 1,000~10,000) showed 327 ppm as TVOCs. Acetone concentration in cleanroom for Jig cleaning, LC Injection, Sealing processes were 18.488ppm (n=14), 49.762 ppm (n=15), 8.656 ppm (n=14) as arithmetric mean. Acetone concentration in cleanroom for LCD inspection process was 40ppm (n=55) as geometric mean, where the range was 7.8~128.7ppm and weakly correlated with ventilation rate efficiency(r=0.44, p<0.05). To control organic solvents in cleanrooms, chemical and carbon filters should be installed with hepa filters. Even though their volatile organic compounds concentration was not exceed to occupational exposure limits, considering of entrance limited cleanroom environment, long-term period exposure effects and adverse health effects of cleanroom worker need further reseach.

Lean 6 Sigma에 의한 LCD TV의 Modular Cell Line 구축에 관한 연구 (Study on Construction of Modular Cell Line for LCD TV by Lean 6 Sigma)

  • 정영관;최성대;유종규;정선환
    • 한국산업융합학회 논문집
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    • 제13권1호
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    • pp.49-54
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    • 2010
  • Lean 6 sigma has recently been used to describe a management system which combines lean management and 6 sigma. The marriage between Lean manufacturing and 6 sigma has proven to be a powerful tool for cutting waste and improving the organization operations. Time and quality are the most important metrics in improving any company's production and profit performance. lean 6 sigma is a management innovation for improving production efficiency, process quality, cost reduction, investment efficiency and customer's satisfaction. in this paper, Advanced cell line is builded the home appliance goods of the LCD TV final assembly line of domestic company line, training the multi-skilled man and controlling the production information system based on Lean 6 sigma.

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LCD 제조공정 종사근로자의 극저주파자기장 노출특성 연구 (A Study on the Extremely Low Frequency Magnetic Fields Exposure Characteristics of Workers in LCD Manufacturing Process)

  • 김준범;강준혁;정은교;정기효
    • 한국산업보건학회지
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    • 제32권1호
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    • pp.10-20
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    • 2022
  • Objectives: The aim of this study is to evaluate exposure levels of the extremely low frequency magnetic fields(ELF-MF) radiated from various electric facilities in Liquid Crystal Display(LCD) manufacturing processes. Methods: This study measured the exposure levels of personal and local ELF-MF for the electronic facilities installed in two LCD manufacturing companies. Samplers were installed around workers' waist during working hours to identify personal exposure levels, and direct reading equipment were located at 3 cm, 10 cm, and 30 cm away from the surface of the electronic facilities to measure local exposure levels. Average and maximum(ceiling) values were calculated for personal and local exposure levels. Results: Average and maximum of personal exposure levels for each worker were 0.56(mean) ± 0.02(SE) µT and 6.31 ± 0.75 µT, respectively. Statistical analyses of the study found that maximum of the personal exposure levels for engineers was significantly higher than that for operators since engineers spend more time near the electronic facilities for repairing. The range of maximum personal exposure levels was 0.50 ~ 43.50 µT and its highest level was equivalent to 4.35 % of ACGIH(American Conference of Governmental Industrial Hygienists) exposure limit value(1 mT). Maximum of local exposure levels was 8.18 ± 0.52 µT and the electronic facilities with higher exposure levels were roof rail and electric panel, which were not related to direct manufacturing. The range of maximum local exposure levels was 0.60 ~ 287.20 µT and its highest level was equivalent to 28.7 % of the ACGIH exposure limit value. Lastly, the local exposure levels significantly decreased as the measurement distance from the electronic facilities increased. Conclusions: Maximum of personal and local exposure levels did not exceed the exposure limit value of ACGIH. However, it is recommended to keep the workers as far as possible from the sources of ELF-MF.

LCD용(用) 편광(偏光)필름제조폐용액(製造廢溶液)으로부터 고순도(高純度) KI결정(結晶) 회수(回收)에 관한 연구(硏究) (Recovery of High Purity KI Crystal from Aqueous Waste of Polarizing Film Manufacturing Process)

  • 김대원;장성태;최순령
    • 자원리싸이클링
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    • 제21권2호
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    • pp.53-58
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    • 2012
  • LCD용 편광필름에 핵심적으로 사용되어진 KI (Potassium Iodide) 폐용액으로부터 정제과정을 통해 KI 고농축액 및 고순도 결정을 회수하는 실험을 행하였다. 본 연구에서는 B 및 PVA 등의 불순물을 포함한 1~4% KI 폐액에서 농축 분별결정을 통해 최대 불순물인 붕소화합물을 제거하여 약 50%의 KI 농축액 및 순도 약 95% 이상의 KI 결정을 얻을 수 있었다. 이 결정물을 용매로 세정함으로서 잔량의 불순물을 제거함으로서 약 99.5% 이상의 고순도 KI결정을 얻을 수 있었다. 그리고 전 과정의 농축과정에서의 KI 회수율은 약 90% 이상의 결과를 얻었다.