• Title/Summary/Keyword: LCD Process

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Development of an IV Infusion Rate Regulator Using Optical Drip Rate Meter (광센서 점적계를 이용한 정맥내 주입률 조절기의 개발)

  • Yang, Y.S.;Kim, H.C.
    • Proceedings of the KOSOMBE Conference
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    • v.1998 no.11
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    • pp.127-128
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    • 1998
  • It is necessary to maintain constant intravenous (IV) infusion rate. While infusion pump is able to control infusion rate with great accuracy, its rather large size and weight make it difficult for patients to move around. The most commonly used infusion device is gravity IV infusion set with its administration chamber being clamped according to the observed drip rate. In this case it may be easier and more accurate to maintain IV rate to given value if we automate the drip-counting process and tube-clamping work by electronic devices. We calculated volume infusion rate of specific fluid using optical drip rate meter which we had developed. To regulate fluid flow rate, we equipped the rate meter which we had developed with a miniaturized clamping apparatus using DC motor. Also, we Implemented drip detection and clamp control algorithm with PIC16C73 $\mu$-controller (Microchip). This system provides user interface through LCD display and key buttons.

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Development of Roll-to-Roll Printing System for Fine Line-width Printing (미세 선폭 프린팅을 위한 롤투롤 장비 개발)

  • Kim C.H.;Ryu B.S.;Lim K.J.;Lee M.H.;Lee T.M.;Youn S.N.;Choi B.O.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2006.05a
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    • pp.583-584
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    • 2006
  • Printing technology has begun to get into the spotlight in many ways due to the low cost effectiveness to existent semi-conductor process. It also has very useful application areas, not only paper printing but also patterning for LCD color tilter, Photovoltaic patterning, RFID antenna, OLED, and so on. In this study, an apparatus of gravure offset printing was developed for fine line width printing. The pattern was composed of $20{\mu}m$ size of continuous lines of which pitch size was $40{\mu}m$. The printed pattern shows that it is possible to make around $20{\mu}m$ line-width printing pattern. The roll-to-roll printing system for fine line-width printing based on primary experiment is presented. For testing of multi-layer printing, the system was designed to be capable of printing two different materials from each printing unit using gravure-offset printing method and have a function of alignment of two printed materials.

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Si Deep Etching Process Study for Fine Pitch Probe Unit

  • Han, Myeong-Su;Park, Il-Mong;Han, Seok-Man;Go, Hang-Ju;Kim, Hyo-Jin;Sin, Jae-Cheol
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.296-296
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    • 2012
  • LCD panel 검사를 위한 Probe unit은 대형 TV 및 모바일용 스마트폰을 중심으로 각광을 받고 있는 소모성 부품으로 최근 pitch의 미세패턴화가 급속히 진행되고 있다. 본 연구에서는 Slit Wafer 제작 공정을 최적화하기 위해 25 um pitch의 마스크를 설계, 제작하였다. 단공과 장공을 staggered 형태로 배열하여 25 um/25 um line/space pitch로 설계하였다. 또한 단위실험을 위해 직접 25 um pitch로 설계하여, 동일한 실험조건을 적용하여 최적 조건을 찾고자 하였다. 반응변수는 Etch rate 및 profile angle로 결정하였으며, 약 200~400 um 에칭된 slit의 상단과 하단의 폭, 그리고 식각깊이를 SEM 측정사진을 통해 정한 후 etch rate 및 profile angle을 결정하였다. 인자는 식각속도 및 wall의 각도를 결정하는 식각 및 passivation 가스의 유량, chamber 압력(etching/passivation), 식각시간 등으로 정하였으며, 이들의 최대값과 최소값 2 수준으로 실험계획을 설계하였다. 식각 조건에 따라 8회의 실험을 수행하였다. 가스의 유량은 SF6 400 sccm, C4F8 400 sccm, 식각 싸이클 시간은 5.2~10.4 sec, passivation 싸이클시간 4 sec로 하였으며, 압력은 식각시 7.5 Pa, passivation 시 10 Pa로 할 경우가 가장 sharp하게 나타났다. Coil power 와 platen power는 각각 2.6 KW, 0.14 KW로 하였으며, 최적화를 위한 인자의 값들은 이 범위에서 조절하였다. 이러한 인자의 조건 조절을 통해 etch rate는 5.6 um/min~6.4 um/min, $88.9{\sim}89.1^{\circ}$의 profile angle을 얻을 수 있었다.

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The Development of 12.1' SVGA Reflective Color Thin Film Transistor Liquid Crystal Display with The New Structured Reflector and Optimized Optical Films

  • Shin, Jong-Eup;Joo, Young-Kuil;Jang, Yong-Kyu;Kang, Myeon-Koo;Souk, Jun-Hyung
    • 한국정보디스플레이학회:학술대회논문집
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    • 2000.01a
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    • pp.19-20
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    • 2000
  • We have developed the 12.1" SVGA reflective type color TFT-LCD(Thin Film Transistor - Liquid Crystal Display) with the high aperture ratio and well designed reflector for the applications such as mini note PC, Note PC and electronic book. The panel shows the high reflectance(30%) and contrast ratio(20:1) resulted from optimizing the optical films and designing the embossing shaped reflector. By improving the chromacity, the color reproducibility was increased up to 20%. As removing the backlight unit, we reduced the power consumption, thickness and weight of the panel to 0.8W, 2.2mm, and 250gram, respectively. According to the above performances, we have obtained fabrication process for mass production, and furthermore, could have access to fast market launching.

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The Property Change of ITO Prepared by Reactive R.F. Sputtering in POP manufacturing Process (반응성 스퍼트링으로 형성된 ITO의 유전채 소성에 따른 특성변화)

  • Nam, Sang-Ok;Chi, Sung-Won;Sohn, Je-Bong;Huh, Keun-Do;Cho, Jung-Soo;Park, Chung-Hoo
    • Proceedings of the KIEE Conference
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    • 1997.07d
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    • pp.1411-1413
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    • 1997
  • The thin film that is electrically conductive and optically transparent is called conductive transparent thin film. ITO(Indium-Tin Oxide) which is a kind of conductive transparent thin film has been widely used in solar cell, transparent electrical heater, selective optical filter, FDP(Flat Display Panel) such as LCD (Liquid Crystal Display), PDP(Plasma Display Panel) and so on. Especially in PDP, ITO films is used as a transparent electrode in order to maintain discharge and decrease consumption power through the improvement of cell structure. In this study, we prepared ITO by reactive r.f. sputtering with indium-tin(Sn wt 10%) alloy target instead of indium-tin oxide target. The ITO films deposited at low temperature $150^{\circ}C$ and 8% $O_2$ partial pressure showed about $3.6{\Omega}/{\square}$. At the end of firing, the resistance of ITO was decreased, the optical transparence was improved above 90%.

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A Study on the Laser Direct Imaging for FPD ( I ) (평판 디스플레이용 Laser Direct Imaging에 관한 연구( I ))

  • Kang, H.S.;Kim, K.R.;Kim, H.W.;Hong, S.K.
    • Proceedings of the Korean Society of Laser Processing Conference
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    • 2005.11a
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    • pp.37-41
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    • 2005
  • When screen size of the Flat Panel Display (FPD) becomes larger, the traditional photo-lithography using photomasks and UV lamps might not be possible to make patterns on Photo Resist (PR) material due to limitation of the mask size. Though the maskless photo-lithography using UV lasers and scanners had been developed to implement large screen display, it was very slow to apply the process for mass-production systems. The laser exposure system using 405 nm semi-conductor lasers and Digital Micromirror Devices (DMD) has been developed to overcome above-mentioned problems and make more than 100 inches FPD devices. It makes very fine patterns for full HD display and exposes them very fast. The optical engines which contain DMD, Micro Lens Array (MLA) and projection lenses are designed for 10 to 50 ${\mu}m$ bitmap pattern resolutions. The test patterns for LCD and PDP displays are exposed on PR and Dry Film Resists (DFR) which are coated or laminated on some specific substrates and developed. The fabricated edges of the sample patterns are well-defined and the results are satisfied with tight manufacturing requirements.

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Low Temperature Deposition of ITO Thin Films for Flat Panel Displays by ICP Assisted DC Magnetron Sputtering (유도결합 플라즈마(ICP) Sputtering에 의한 평판 디스플레이(FPD)용 ITO 박막의 저온 증착)

  • 구범모;정승재;한영훈;이정중;주정훈
    • Journal of the Korean institute of surface engineering
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    • v.37 no.3
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    • pp.146-151
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    • 2004
  • Indium tin oxide (ITO) is widely used to make a transparent conducting film for various display devices and opto-electric devices. In this study, ITO films on glass substrate were fabricated by inductively coupled plasma (ICP) assisted dc magnetron sputtering. A two-turn rf coil was inserted in the process chamber between the substrate and magnetron for the generation of ICP. The substrates were not heated intentionally. Subsequent post-annealing treatment for as-deposited ITO films was not performed. Low-temperature deposition technique is required for ITO films to be used with heat sensitive plastic substrates, such as the polycarbonate and acrylic substrates used in LCD devices. The surface roughness of the ITO films is also an important feature in the application of OLEDs along with the use of a low temperature deposition technique. In order to obtain optimum ITO thin film properties at low temperature, the depositions were carried out at different condition in changing of Ar and $O_2$ gas mixtures, ICP power. The electrical, optical and structural properties of the deposited films were characterized by four-point probe, UV/VIS spectrophotometer, atomic force microscopy(AFM) and x-ray diffraction (XRD). The electrical resistivity of the films was -l0$^{-4}$ $\Omega$cm and the optical transmittance in the visible range was >85%. The surface roughness ( $R_{rms}$) was -20$\AA$.>.

Mechanism of Formation of Three Dimensional Structures of Particles in a Liquid Crystal

  • West, John L.;Zhang, Ke;Liao, Guangxun;Reznikov, Yuri;Andrienko, Denis;Glushchenko, Anatoliy V.
    • Journal of Information Display
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    • v.3 no.3
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    • pp.17-23
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    • 2002
  • In this work we report methods of formation of three-dimensional structures of particles in a liquid crystal host. We found that, under the appropriate conditions, the particles are captured and dragged by the moving isotropic/nematic front during the phase transition process. This movement of the particles can be enhanced significantly or suppressed drastically with the influence of an electric field and/or with changing the conditions of the phase transition, such as the rate of cooling. As a result, a wide variety of particle structures can be obtained ranging from a fine-grained cellular structure to stripes of varying periods to a course-grained "root" structures. Changing the properties of the materials, such as the size and density of the particles and the surface anchoring of the liquid crystal at the particle surface, can also be used to control the morphology of the three-dimensional particle network and adjust the physical properties of the resulting dispersions. These particle structures may be used to affect the performance of LCD's much as polymers have been used in the past.

Analysis of Heat Transfer of a Magnetic Fluid Seal (자성유체씰의 열전달 해석)

  • Kim, Ock-Hyun;Lee, Hee-Bok;Lee, Min-Ki;Hong, Jeong-Hui;Kwak, Yong-Woon
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.19 no.3
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    • pp.365-369
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    • 2010
  • Magnetic fluid seal is characterized by its simple design, low friction and being dustless. Those advantages are deduced from the fact that the sealing element is not a solid such as rubber or plastic but it is a fluid. Those are critical for application to a rotating shaft which is inserted into a vacuum chamber where high level of vacuum and cleanness are required. For the reason the magnetic fluid seal has become a standard for vacuum chambers for semiconductor and LCD processing. It should be noted that its sealing performance is sensitive to temperature. If necessary, water cooling should be considered. Thus anticipation of the temperature distribution of the magnetic fluid seal is important before applying it. In this paper an FEM analysis of the heat transfer has been executed and compared with experimental results. An overall convective heat transfer coefficient has been adopted for the analysis, which results in satisfactory consistency of the theoretical and experimental results.

Product Quality Index for Concept Design Evaluation (개념 설계 평가를 위한 제품 품질지수)

  • Jeong, Jin-Ha;Park, Young-Won
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.19 no.4
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    • pp.521-528
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    • 2010
  • A product system will be improved continually until requirements are satisfied. It is true that considering alternative designs to improve product system is hard work; it is also true that selecting an adequate design idea that represents the needs of stakeholders concerned and meets effectiveness factors properly is not an easy work, either. In the process of driv-ing an idea and designing, which is called Design Phase, there are lots of existing tools for testing the driven idea in DFSS. But, those kinds of tools do not offer the function that helps to select the technically better design idea among alternative design ideas that have the same evaluation level. Moreover it is inappropriate to select adequate alternative design ideas by just verifying only the evaluation table in pugh matrix, since satisfied deviation val-ues are low when there is a too competitive mass product system in a market. Also, for the IT product with short life cycle, faster and more effective testing tool is needed. Therefore, the 'roduct quality index' is suggested in order to select an appropriate candidate design concept for system development that meets requirements by using 'deality concept' pro-vided by TRIZ. According to the result of this research, it is possible to select technically better idea fast and effectively; it is confirmed by applying the approach to the case of LCD BLU (Back Light Unit).