• Journal of Bio-Environment Control
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• v.28 no.4
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• pp.461-470
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• 2019

This study was carried out to quantify the drought stress in grafted watermelon seedlings non-destructively by using chlorophyll fluorescence (CF) imaging technique rather than the visual judgment. Six-day old watermelon seedlings were grown under uniform irrigation for 3 days, and then given drought stress. Afterward, the sensor for the measurement of water content in plug tray cell unit was used to classify the drought-stress level into nine groups from D1 (53.0%, sufficient moisture state) to D9 (15.7%, extremely dry stress), and the 16 CF parameters were measured. In addition, re-irrigation was performed on the drought stressed seedlings(D5 - D9) to determine the growth and photosynthesis recovery level, which was not confirmed by visual judgment. The kinetic curve patterns of CF in three different drought stressed seedling groups were found to be different for the early detection of drought stress. All the 16 CF parameters decreased continuously with exposure to drought stress and drastically decreased from D5 (32.1%) where the visual judgment was possible. The fluorescence decline ratio (Rfd_Lss) started to decrease from the initial drought stress level (D5 - D6), and the Maximum PSII quantum yield (Fv/Fm) was significantly decreased in the later extreme drought stress range (D7 - D9) by re-irrigation recovery test. Thus, Rfd_Lss and Fv/Fm parameters were finally selected as potent indicators of growth and photosynthesis recovery in the initial and later stages of drought stress. Also, to the differences in the numerical values of the individual chlorophyll fluorescence parameters, the drought stress level was intuitively confirmed through the image. These results indicate that Rfd and Fv/Fm can be considered as potential CF parameters for the detection of low and extremely high drought stress, respectively. Furthermore, Fv/Fm can be considered as the best CF parameters for recovery at re-irrigation.

• Clean Technology
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• v.28 no.1
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• pp.79-93
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• 2022

In this study, an electronics industrial wastewater activated sludge model (e-ASM) to be used as a Water Digital Twin was calibrated based on real high-tech electronics industrial wastewater treatment measurements from lab-scale and pilot-scale reactors, and examined for its treatment performance, effluent quality prediction, and optimal process selection. For specialized modeling of a high-tech electronics industrial wastewater treatment system, the kinetic parameters of the e-ASM were identified by a sensitivity analysis and calibrated by the multiple response surface method (MRS). The calibrated e-ASM showed a high compatibility of more than 90% with the experimental data from the lab-scale and pilot-scale processes. Four electronics industrial wastewater treatment processes-MLE, A2/O, 4-stage MLE-MBR, and Bardenpo-MBR-were implemented with the proposed Water Digital Twin to compare their removal efficiencies according to various electronics industrial wastewater characteristics. Bardenpo-MBR stably removed more than 90% of the chemical oxygen demand (COD) and showed the highest nitrogen removal efficiency. Furthermore, a high concentration of 1,800 mg L^-1 T MAH influent could be 98% removed when the HRT of the Bardenpho-MBR process was more than 3 days. Hence, it is expected that the e-ASM in this study can be used as a Water Digital Twin platform with high compatibility in a variety of situations, including plant optimization, Water AI, and the selection of best available technology (BAT) for a sustainable high-tech electronics industry.