• The Transactions of The Korean Institute of Electrical Engineers
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• v.56 no.3
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• pp.566-570
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• 2007

The specific electrical, optical and acoustic properties of Zinc Oxide (ZnO) are important for semiconductor process which has many various applications. Piezoelectric ZnO films has been widely used for such as transducers, bulk and surface acoustic-wave resonators, and acousto-optic devices. In this study, we investigated etch characteristics of ZnO thin films in inductively coupled plasma etch system with $BCl_3/Ar$ gas mixture. The etching characteristics of ZnO thin films were investigated in terms of etch rates and selectivities to $SiO_2$ as a function of $BCl_3/Ar$ gas mixing ratio, RF power, DC bias voltage and process pressure. The maximum ZnO etch rate of 172 nm/min was obtained for $BCl_3$ (80%)/Ar(20%) gas mixture. The chemical states on the etched surface were investigated with X-ray photoelectron spectroscopy (XPS).

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.20 no.3
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• pp.223-227
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• 2007

The effect of Eu contents on the ferroelectric properties of $Bi_{4-x}Eu_xTi_3 O_{12}$ (BET) thin films has been investigated. Bismuth Europium titanate thin films with a Eu contents were prepared on the $Pt/Ti/SiO_2/Si$ substrate by metal-organic decomposition technique. The structure and the morphology of the films were analyzed using X-ray diffraction (XRD) and field emission scanning microscopy (FE-SEM), respectively. From the XRD analysis, it was found that BET thin films have polycrystalline structure, and the layered-perovskite phase is obtained when the Eu contents exceeds 0.2 (x > 0.2). Also, the ferroelectric characteristics of the BET thin films were found to be dependent on the Eu content. Particularly, the BET films doped with x = 0.75 show better ferroelectric properties (remanent polarization 2Pr = 60.99 C/$cm^2$ and only a little polarization fatigue up to $3.5{\times}10^9$ bipolar switching cycling) than those doped with other Eu contents.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.56 no.2
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• pp.349-354
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• 2007

In this work, we investigated etching characteristics of $HfO_2$ thin film and Si using inductive coupled plasma(ICP) system. The ion energy distribution functions in an ICP system was analyzed by quadrupole mass spectrometer(QMS) with an electrostatic ion energy analyzer. The maximum etch rate of $HfO_2$ thin film is 85.5 nm/min at a $BCl_3/(BCl_3+Ar)$ of 20 % and decreased with further addition of $BCl_3$ gas. From the QMS measurements, the most dominant positive ion energy distributions(IEDS) showed a maximum at 20 % of $BCl_3$. These tendency was very similar to the etch characteristics. This result agreed with the universal energy dependency of ion enhanced chemical etching yields. And the maximum selectivity of $HfO_2$ over Si is 3.05 at a $O_2$ addition of 2 sccm into the $BCl_3/(BCl_3+Ar)$ of 20 % plasma.

• Proceedings of the KIEE Conference
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• 2006.10a
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• pp.115-116
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• 2006

Dielectric PST (20/80) / PST (80/20) heterolayered thin films structures were created by a consequent deposition of the PST (20/80) and PST (80/20) thin films on the $Pt/Ti/SiO_2/Si$ substrate using alkoxide-based sol-gel method. Both structural and dielectric properties of heterolayered PST thin films were investigated for the tunable microwave device applications. As the number of coating increases, the lattice distortion decreased. It can be assumed that the lower PST layer affects a nucleation site or a seeding layer for the formation of the upper PST layer. The dielectric constant, dielectric loss and tunability of the PST-6 heterolayered structure measured at 100 kHz were 399, 0.022 and 57.9%, respectively. All these parameters showed an increase with increasing number of coatings due to the decrease in lattice distortion.

• Proceedings of the KIEE Conference
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• 2006.10a
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• pp.117-118
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• 2006

In this work, we investigated etching characteristics of $HfO_2$ thin film and Si using inductive coupled plasma (ICP) system. The ion energy distribution functions in an inductively coupled plasma was analyzed by quadrupole mass spectrometer with an electrostatic ion energy analyzer. The maximum etch rate of $HfO_2$ is 85.5 nm/min at a $BCl_3/(BCl_3+Ar)$ of 20% and decreased with further addition of $BCl_3$ gas. From the QMS measurements, the most dominant positive ion energy distributions (IEDs) showed a maximum at 20 % of $BCl_3$. These tendency was very similar to the etch characteristics. This result agreed with the universal energy dependency of ion enhanced chemical etching yields. And the maximum selectivity of $HfO_2$ over Si is 3.05 at a O2 addition of 2 sccm into the $BCl_3/(BCl_3+ Ar)$ of 20% plasma.

• Proceedings of the KIEE Conference
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• 2007.07a
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• pp.1321-1322
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• 2007

$Ar/Cl_2$, $Ar/CH_4$ 및 $Ar/Cl_{2}/CH_{4}$ 유도결합 플라즈마의 가스 혼합비에 따른 BLT 박막의 식각 메커니즘과 선택비, 식각 후 박막 표면의 조성변화를 조사하였다. BLT 박막의 최대식각률은 $Ar/Cl_2$ 플라즈마에서의 Ar 가스 혼합비가 80%일 때 50.8 nm의 값을 보였다. 이 때, 1sccm의 $CH_4$ 첨가를 통하여 선택비와 식각률을 개선할 수 있었다. 박막 표면의 xPS 분석을 통해 BLT 박막 표면의 조성변화는 Cl 원자와의 반응에 의한 화학적 식각 손상이 H 원자와의 반응에 의한 그것보다 크다는 것을 알 수 있었다.

• Proceedings of the KIEE Conference
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• 2009.07a
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• pp.1966_1967
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• 2009

As an attempt to characterize the pulse behaviors at the three pulse diagnosis positions in the oriental medicine which are called Chon, Gwan, and Cheok, we measure the pluse waveforms by SphygmoCor apparatus, that has been used widely for the evaluation of the arterial stiffness, and examine the Augmentation Index (AIx) at the aorta. For the study, twenty healthy men at the age of twenties have participated as the subject group. The pulse has been measured twice at the three palpation positions, and by two-way repeated measures ANOVA we tested the repeatability and the mean differences in the aortic AIx between Chon, Gwan, and Cheok. The AIx was found to be statistically different between the measurement positions. Duncan's test shows that the AIx is statistically different between Chon and the other two positions. Our study may be used as a reference for further scientific quantification of the pulse diagnosis.

• Proceedings of the KIEE Conference
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• 2008.07a
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• pp.1997-1998
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• 2008

Pulse diagnosis is the one of the most important diagnostic process to traditional medical doctors. Although the pulse diagnosis position, Gwan is apart from Chon or Cheok by 10$\sim$20mm at most, traditional medical doctors applies different indent pressures and even they states different pulse images are felt at Chon, Gwan and Cheok. One the other hand, the education on pulse diagnosis behavior includes tantalizing problem caused by no tool for communication between trainer and trainee. On account of this situation, we tried to develop a system which can measure the hold-down pressure during a pulse diagnosis and compare the hold-down pressure profile of trainer and that of trainee. This system can be divided into three parts - pulse pressure sensing part, signal acquisition part and data storing part. A correction curve was generated by the relation between output voltages and standard weights. Using this system, 3 channel hold-down pressure profile of a oriental medical doctor were recorded three times. In the profile, three period were observed and all period included two process for searching the depth of pulsation and for classifying the pulse feeling into one or more of 28 pulse types. The maximum value of pulse profile was 1.3$kg{\cdot}f$ which was more than reported by previous chinese groups and the mean values of three channel ranged from 240$g{\cdot}f$ to 430$g{\cdot}f$. In frequency domain, each channel has some dominant frequency components - about 10Hz, 35Hz and 75Hz. In further study, we want to collect more profiles from lage number of oriental medicine doctors and hope to develop a measuring system which can measure the hold-down pressure on subject's skin directly.

• Journal of the Korean institute of surface engineering
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• v.41 no.5
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• pp.189-193
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• 2008

In this study, we carried out an investigation of the etching characteristics (etch rate, selectivity to $SiO_2$ and $HfO_2$) of TiN thin films in the $CH_4$/Ar inductively coupled plasma. The maximum etch rate of $274\;{\AA}/min$ for TiN thin films was obtained at $CH_4$(80%)/Ar(20%) gas mixing ratio. At the same time, the etch rate was measured as function of the etching parameters such as RF power, Bias power, and process pressure. The X-ray photoelectron spectroscopy analysis showed an efficient destruction of the oxide bonds by the ion bombardment as well as showed an accumulation of low volatile reaction products on the etched surface. Based on these data, the ion-assisted chemical reaction was proposed as the main etch mechanism for the $CH_4$ containing plasmas.

• Journal of Korea Game Society
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• v.12 no.3
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• pp.69-76
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• 2012

At MMORPGs that has the numerous game users with many interactions at the same virtual world, massive loading that results in delays, resource shortages, and other such problems occur. To solve this, many developers devote research to load-balancing servers, yet due to steady and dynamic map divisions, such research is unreliable. This paper proposes a game user-oriented load balancing scheme for the load balancing of MMORPG servers. This scheme shows effectiveness at dealing with hot-spots and other gatherings of game users at specific servers compared to previous methods.