• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.226-226
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• 2010

Microstructure, magnetic and transport properties of as-deposited electron-doped $La_{1-x}Ce_xMnO_3$ and hole-doped $La_{1-x}Ce_xMnO_3$ films prepared by pulse laser deposition, with x = 0.1 and 0.3, have been investigated. The microstructural analysis reveals that the $La_{1-x}Ce_xMnO_3$ films have a column-like microstructure and a strip-domain phase with a periodic spacing of about 3c, which were not found for the $La_{1-x}Ce_xMnO_3$ ones. At the same time, the experimental results manifest that there is no fundamental difference in the magnetic and the transport properties between electron- and hole-doped manganite films, except the appearance of ferromagnetic response in the low-doped $La_{0.9}Ce_{0.1}MnO_3$ film at temperatures above the Curie point. The observed magnetic behavior, typical for the Griffiths-like phase, for this film is explained by the percolation mechanism of the ferromagnetic transition and by the presence of strip-domain phase which stimulates the magnetic phase separation.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.195-195
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• 2010

$Ga_2O_3$ thin films have been grown on Si(001) substrates by metalorganic chemical vapor deposition (MOCVD) using dimethylgallium isopropoxide ($Me_2GaO^iPr$, DMGIP) with oxygen as the reactant gas. Suitability of the precursor for CVD was confirmed by thermogravimetric analysis (TGA) and vapor pressure measurement. Deposition was carried out in the substrate temperature range $450-650^{\circ}C$. Spectroscopic ellipsometry, X-ray diffraction (XRD), and X-ray photoelectron spectroscopy (XPS) and Rutherford back-scattering spectroscopy (RBS) were used to determine the thickness, crystallinity, and composition and stoichiometry of the films, respectively. From the slope of the Arrhenius plot in the temperature range $500-550^{\circ}C$, the activation energy of deposition was found to be $225.5\;kJ\;mol^{-1}$. As-deposited films were amorphous, but the monoclinic $\beta-Ga_2O_3$ phase was revealed after annealing the films in air at $1050^{\circ}C$. The XPS and RBS analyses indicate that the $Ga_2O_3$ films obtained by using DMGIP were found to be almost stoichiometric.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.328-328
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• 2010

반도체 및 LCD 공정이 진행되는 진공 챔버는 유량계, 진공 펌프 및 밸브 등을 이용하여 적절한 공정용 기체와 압력을 제어하게 된다. 공정에 따라 매우 높은 온도를 유지해야 하는 경우도 있다. 챔버 내부의 압력은 유입되는 기체의 시간에 따른 유량 변화에 의하여 주기적으로 변화하게 된다. 이러한 유량 변화는 장기적으로는 결국 펌프의 신뢰성(내구수명)에 영향을 주게 되며, 특히 고유량 및 저유량을 반복하게 되는 공정에 있어서는 더욱 큰 영향을 미치게 된다. 또한 챔버 내부는 다양한 화학적 반응이 일어나며 이러한 공정 기체들의 높은 온도는 결국 챔버에 연결된 펌프의 성능 및 신뢰성에도 영향을 주게 된다. 대부분의 반도체 및 LCD 공정이 이루어지는 압력에서는 전도 및 대류의 열전달 형태 보다는 열복사에 의한 영향을 받게 되어 챔버를 적절히 설계한다면 펌프에 직접적으로 전달되는 복사량은 상대적으로 낮고, 펌프에 미치는 영향도 크지 않게 된다. 그러나 압력의 변화에 따라 전도 및 대류의 영향이 커지게 되는 경우에는 펌프 자체 및 성능에 큰 영향을 주게 될 것이다. 터보형 펌프의 국내(KS) 및 국제규격(ISO)의 성능시험방법에는 이러한 온도에 따른 펌프의 성능 특성 변화를 다루고 있지 않으며, 크라이오 펌프인 경우 열복사의 영향에 대한 시험방법이 일부 공개되어 있다[J. Vac. Sci. Technol. A17(5)]. 본 연구에서는 기체의 유량 및 온도 변화에 따른 진공 펌프의 성능 특성 변화를 고찰하고자 하며, 향후 이러한 시험방법에 대한 표준 절차를 확립하고자 한다.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.190-190
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• 2010

Zinc oxide is the most attractive material due to the large direct band gap (3.37 eV), excellent chemical and thermal stability, and large exciton binding energy (60 meV). Recently, ZnO nanorods were used as the high efficient antireflection coating layer of solar cells based on silicon (Si). In this reports, we studied the effects of rapid thermal annealing (RTA) treatment on optical properties of ZnO nanorods. For fabrication of ZnO nanorods, there are many methods such as hydrothermal method, sol-gel method, and metal organic chemical vapor deposition method. Among of them, we used the conventional wet chemical method which is simple and low temperature growth. In order to synthesize the ZnO nanorods, the ZnO films were deposited on Si substrate by RF magnetron sputtering at room temperature and the samples were dipped to aqua solution containing the zinc nitrate and hexamethylentetramines (HMT). The synthesis process was achieved in keeping with temperature of $90-95^{\circ}C$ and under constant stirring. The morphology of ZnO nanorods on glass and Si was characterized by scanning electron microscopy. For the analysis of antireflection performance, the reflectance and transmittance were measured by spectrophotometer. And for analyzing the effects of RTA treatment on ZnO nanorods, crystalline properties were investigated by X-ray diffraction measurements and optical properties was estimated by photoluminescence spectra.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.43-43
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• 2010

We have characterized the parametric and functional properties of live cell and cancer cell according to plasma treatment conditions using Atmospheric Pressure (AP) Plasma with uniquely designed low temperature arc-free unit. AP plasma system showed very highly efficient capabilities of reacting and interfacing directly with live and cancer cells. The parametric results with the types of gases, applied power, applied gap, and process times on cells will be presented in accordance with functional studies of the works. The growth of cancer cells is directly influenced by AP plasma exposure with evaluating plasma conditions in several human cancer cells and understanding how plasma exposure alters molecular signaling pathways. The cells exhibit a slower or faster growth rates compared with untreated cells, depending on the cell types. These results strongly support the conclusion that alterations in one or more of each gene are responsible, at least in part, for plasma-induced apoptosis in cancer cells. In addition, it also will be presented that AP plasma has an important role for the improvement of sensor performance due to excellent interface property between enzyme and metal electrode for bio sensor manufacturing process.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.434-434
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• 2010

Axial type 가상음극발진기를 이용하여 전극의 기하학적 구조와 고출력 마이크로파의 출력 특성을 분석하고, 최대 파워의 조건에 대한 전자기기 효과를 알아보았다. 고출력 마이크로파 발생 장치인 Vircator는 강렬한 상대론적 전자빔 발생장치로 최대전압 600 kV, 최대전류 88 kA, 펄스폭 60 ns의 특성을 가진다. Anode와 cathode의 간격은 4 mm로 최적화 하였고, 이 조건에서 마이크로파의 출력 특성을 분석하여 보았을 때 WR-137 수신안테나에서 최대 출력143 MW와 5.4 GHz의 진동수를 측정하였다. 출력 효율을 증가시키기 위해서 도파관 중앙에 폭이 10 mm인 반사판을 사용하였고, 그 결과 반사판이 공진구조에 기여하여 정상파(standing wave)를 형성하여 마이크로파 출력 효율 향상하여 WR-137에서 최대 549 MW의 출력을 보였다. 향상된 마이크로파의 출력을 이용하여 각도와 거리를 변화해 가며 컴퓨터와 전자소자로 제작된 회로에 대해 전자기기 효과 실험을 실시하였다. 그 결과 컴퓨터의 경우 $0^{\circ}$ 1 m에서 hard kill 상태가 되었다. 전자소자 회로의 경우는 $0^{\circ}$ 30 cm에서 hard kill의 상태로 되었다. 또한 면적 대비 출력 파워로 비교 했을 경우 약 $0.484\;{\mu}J$의 마이크로파의 영향임을 확인할 수 있었다.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.323-323
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• 2010

Saw damage of crystalline silicon wafer is unavoidable factor. Usually, alkali treatment for removing the damage has been carried out as the saw damage removal (SDR) process for priming the alkali texture. It usually takes lots of time and energy to remove the sawed damages for solar grade crystalline silicon wafers We implemented two different mixed acidic solution treatments to obtain the improved surface structure of silicon wafer without much sacrifice of the silicon wafer thickness. At the first step, the silicon wafer was dipped into the mixed acidic solution of $HF:HNO_3$=1:2 ration for polished surface and at the second step, it was dipped into the diluted mixed acidic solution of $HF:HNO_3:H_2O$=7:3:10 ratio for porous structure. This double treatment to the silicon wafer brought lower reflectance (25% to 6%) and longer carrier lifetime ($0.15\;{\mu}s$ to $0.39\;{\mu}s$) comparing to the bare poly-crystalline silicon wafer. With optimizing the concentration ratio and the dilution ratio, we can not only effectively substitute the time consuming process of SDR to some extent but also skip plasma enhanced chemical vapor deposition (PECVD) process. Moreover, to conduct alkali texture for pyramidal structure on silicon wafer surface, we can use only nitric acid rich solution of the mixed acidic solution treatment instead of implementing SDR.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.377-377
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• 2010

FINEMET type nanocrystalline materials synthesized by controlled crystallization of amorphous ribbons[1] exhibit excellent soft magnetic properties making them attractive for technological applications. Present work reports the electronic structure studies of Co-substituted FINEMET to get information on the effect of successive Co substitution on local environment around Fe and Co atom by using near edge x-ray absorption fine structure (NEXAFS) and x-ray magnetic circular dichroism (XMCD) measurements. NEXAFS spectroscopy and XMCD measurements have been carried out at Fe $L_{3,2}$ and Co $L_{3,2}$-edges to investigate the chemical states and electronic structure of FINEMET [$(Fe_{100-x}Co_x)_{78}Si_9Nb_3Cu_1Ba$](0$L_{3,2}$-edge reveal that Fe is in 2+ state and in tetrahedral symmetry with other elements. The magnetic properties exhibiting soft magnetic behavior[2] are discussed on the basis of the electronic structure studied through XMCD.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.366-366
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• 2010

Single crystalline Fe/NiO bilayers were epitaxially grown on Ag(001) and on MgO(001), and investigated by Low Energy Electron Diffraction (LEED), Magneto-Optic Kerr Effect (MOKE), and X-ray Magnetic Linear Dichorism (XMLD). We find that while the Fe film has an in-plane magnetization in both Fe/NiO/Ag(001) and Fe/NiO/MgO(001) systems, the NiO spins switch from out-of-plane direction in Fe/NiO/MgO(001) to in-plane direction in Fe/NiO/Ag(001). These two different NiO spin orientations generate remarkable different effects that the NiO induced magnetic anisotropy in the Fe film is much greater in Fe/NiO/Ag(001) than in Fe/NiO/MgO(001). XMLD measurement shows that the much greater magnetic anisotropy in Fe/NiO/Ag(001) is due to a 90o-coupling between the in-plane NiO spins and the in-plane Fe spins which causes a switching of the NiO spins during the Fe magnetization reversal.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.342-342
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• 2010

We have investigated an Au intercalated monolayer graphene on Ni(111) using angle-resolved photoemission spectroscopy (ARPES), high resolution photoemission spectroscopy (HRPES), and low energy electron diffraction (LEED) at the 3A2 ARUPS beamline in Pohang Accelerator Laboratory. We find the monolayer graphene is well grown on the Ni(111) surface by the adsorption of acetylene. However, the graphene does not show the characteristic $\pi$ band near the Fermi level due to its strong interaction with the underlying substrate. When Au is adsorbed on the surface and then annealed at high temperature, we observe that Au is intercalated underneath the monolayer graphene. The process of the Au intercalation was monitored by HRPES of corresponding Au 4f and C 1s core levels as well as the electronic structure of the $\sigma$, $\pi$ states at $\Gamma$, K points. The $\sigma$, $\pi$ bands of graphene shift towards the Fermi level and the $\pi$ band is clearly observed at K point after the intercalation of full monolayer Au. The full width at half maximum (FWHM) of the C 1s peak narrows to approximately 0.42 eV after intercalation. These results imply that the interaction between the graphene and substrate is considerably weakened after the Au intercalation. We will discuss the graphene is really closer to ideal free standing graphene suggested recently.