• 제목/요약/키워드: Ion-beam assisted deposition

검색결과 121건 처리시간 0.026초

SURFACE ANALYSES OF TITANIUM SUBSTRATE MODIFIED BY ANODIZATION AND NANOSCALE Ca-P DEPOSITION

  • Lee, Joung-Min;Kim, Chang-Whe;Lim, Young-Jun;Kim, Myung-Joo
    • 대한치과보철학회지
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    • 제45권6호
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    • pp.795-804
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    • 2007
  • Statement of problem. Nano-scale calcium-phosphate coating on the anodizing titanium surface using ion beam-assisted deposition (IBAD) has been recently introduced to improve the early osseointegration. However, not much is known about their surface characteristics that have influence on tissue-implant interaction. Purpose. This study was aimed to investigate microtopography, surface roughness, surface composition, and wettability of the titanium surface modified by the anodic oxidation and calcium phosphate coating using IBAD. Material and methods. Commercially pure titanium disks were used as substrates. The experiment was composed of four groups. Group MA surfaces represented machined surface. Group AN was anodized surface. Group CaP/AN was anodic oxidized and calcium phosphate coated surfaces. Group SLA surfaces were sandblasted and acid etched surfaces. The prepared titanium discs were examined as follows. The surface morphology of the discs was examined using SEM. The surface roughness was measured by a confocal laser scanning microscope. Phase components were analyzed using thin-film x-ray diffraction. Wettability analyses were performed by contact angle measurement with distilled water, formamide, bromonaphtalene and surface free energy calculation. Results. (1) The four groups showed specific microtopography respectively. Anodized and calcium phosphate coated specimens showed multiple micropores and tiny homogeneously distributed crystalline particles. (2) The order of surface roughness values were, from the lowest to the highest, machined group, anodized group, anodized and calcium phosphate deposited group, and sandblasted and acid etched group. (3) Anodized and calcium phosphate deposited group was found to have titanium and titanium anatase oxides and exhibited calcium phosphorous crystalline structures. (4) Surface wettability was increased in the order of calcium phosphate deposited group, machined group, anodized group, sandblasted and acid etched group. Conclusion. After ion beam-assisted deposition on anodized titanium, the microporous structure remained on the surface and many small calcium phosphorous crystals were formed on the porous surface. Nanoscale calcium phosphorous deposition induced roughness on the microporous surface but hydrophobicity was increased.

Evaluation of the MgO Protective Layer Deposited by Oxygen Ion-Beam-Assisted-Deposition Method in ac PDPs

  • Li, Zhao-Hui;Cho, Eou-Sik;Hong, Seong-Jae;Kwon, Sang-Jik
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권2호
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    • pp.1372-1375
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    • 2007
  • MgO thin films were deposited by $O^+$ IBAD method and results showed assisting oxygen ion beam energy plays a significant role in characteristics of MgO thin films. The lowest firing inception voltage, the highest brightness and the highest luminous efficiency were obtained when oxygen ion beam energy was 300 eV.

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산소 이온 빔 보조 증착된 AC PDP용 MgO 보호막의 특성 연구 (Structural and Discharge Characteristics of MgO Deposited by Oxygen-Ion-Beam-Assisted Deposition in AC PDP)

  • 이조휘;김광호;안민형;홍성재;임승혁;권상직
    • 한국진공학회지
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    • 제16권5호
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    • pp.338-342
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    • 2007
  • MgO는 플라즈마 디스플레이 패널 (Plasma Display Panel, PDP)의 보호막으로 널리 쓰이고 있다. 본 실험에서는 산소 이온 빔을 이용하여 증착된 MgO 보호막의 특성을 조사하였다. MgO 증착 시 보조 산소 이온 빔의 에너지를 변화시킴에 따라 MgO 보호막의 특성과 PDP 패널 발광특성에 미치는 영향을 분석하였다. 본 연구에서는 산소 이온 에너지가 300 eV 일 때 소자의 방전개시전압이 가장 낮게 나타났고, 발광 휘도 및 발광 효율은 가장 높게 나타났다. 또한 산소 이온 빔의 조사에너지에 따라 MgO 박막의 결정성 및 표면조도가 크게 영향을 받는 것을 확인할 수 있었다. 산소 이온 빔 보조 증착 방법을 이용하여 패널의 발광 휘도와 발광 효율 등 발광특성을 개선하였다.

IBAD-MgO technology for coated conductors

  • Jo, William
    • 한국초전도ㆍ저온공학회논문지
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    • 제18권3호
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    • pp.1-5
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    • 2016
  • Ion-beam assisted deposition (IBAD) technology has been successfully applied to high-temperature superconductor coated conductors (CC) as textured substrates. Since the coated conductors were proposed as a potential framework for utilizing the superior transport characteristics of $YBa_2Cu_3O_7$ and related cuprate oxides, several methods including rolling-assisted bi-axial textured substrates (RABiTS) and inclined substrate deposition (ISD), as well as IBAD, have been attempted. As of 2016, most companies that are trying to commercialize CC adapt IBAD technology except for American Superconductors who use RABiTS predominantly. For the materials in the IBAD process, initial efforts to use yttria-stabilized zirconia (YSZ) or related fluorites in Fujikura in Japan have quickly given way to MgO which technique was developed by Stanford University in the USA. In this review, we present a historical overview of IBAD technology, in particular, for the application of CC. We describe the key scientific understanding of nucleation, the texturing mechanism, and the growth of large bi-axial grains and discuss some potential new IBAD materials and systems for large-scale production.

Epitaxial Growth of $Y_2O_3$ films by Ion Beam Assisted Deposition

  • Whang, C.N.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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    • pp.26-26
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    • 2000
  • High quality epitaxial Y2O3 thin films were prepared on Si(111) and (001) substaretes by using ion beam assisted deposition. As a substrate, clean and chemically oxidized Si wafers were used and the effects of surface state on the film crystallinity were investigated. The crystalline quality of the films were estimated by x-ray scattering, rutherford backscattering spectroscopy/channeling, and high-resolution transmission electron microscopy (HRTEM). The interaction between Y and Si atoms interfere the nucleation of Y2O3 at the initial growth stage, it could be suppressed by the interface SiO2 layer. Therefore, SiO2 layer of the 4-6 layers, which have been known for hindering the crystal growth, could rather enhance the nucleation of the Y2O3 , and the high quality epitaxial film could be grown successfully. Electrical properties of Y2O3 films on Si(001) were measured by C-V and I-V, which revealed that the oxide trap charge density of the film was 1.8$\times$10-8C/$\textrm{cm}^2$ and the breakdown field strength was about 10MV/cm.

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내마모 전동체 제조를 위한 질화탄소코팅의 개발 (Development of Carbon Nitride Coating for High Wear Resistant Rolling Element)

  • 최병영;매원덕차
    • 한국정밀공학회지
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    • 제16권11호
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    • pp.243-247
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    • 1999
  • Carbon nitride coatings on the substrates of 0.55wt% C - 1.68wt% Mn induction-hardened rolling elements were prepared by ion beam assisted deposition. It was found through metallographic observation that the carbon nitride coatings appeared lamellar-type repeated layers parallel to the surface of substrate. Surface roughness of the coated specimens was improved in comparison with that of the substrates. Wear resistance of the coatings was evaluated using Polymet RCF-1 machine with a constant supply of lubricant followed by Weibull statistical analysis and scanning electron microscopy. the results indicated failure due to old-age wear-out of the coatings was mainly caused by numerous micropits formed on the wear track during repeated rolling contact.

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Hole Injection Layer by Ion Beam Assisted Deposition for Organic Electroluminescence Devices

  • Choi, Sang-Hun;Jeong, Soon-Moon;Koo, Won-Hoe;Baik, Hong-Koo
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
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    • pp.1619-1622
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    • 2005
  • The ultra thin hole injection layer (HIL) was deposited on an indium-tin-oxide (ITO) anode by using an ion beam assisted d eposition (IBAD) for the fabrication of an polymeric electroluminescence device for the first time. The device with the HIL deposited by IBAD has higher external quantum efficiency than the device with the HIL by conventional thermal evaporation. It is found that the deposited HIL by IBAD has high surface coverage on ITO anode in a few nm regions because the HIL prepared has high adatom mobility by ion beam energy.

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Ion assisted deposition of $TiO_2$, $ZrO_2$ and $SiO_xN_y$ optical thin films

  • Cho, H.J.;Hwangbo, C.K.
    • 한국진공학회지
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    • 제6권S1호
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    • pp.75-79
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    • 1997
  • Optical and mechanical characteristics of $TiO-2, ZrO_2 \;and\; SiO_xN_y$ thin films prepared by ion assisted deposition (IAD) were investigated. IAD films were bombarded by Ar or nitrogen ion beam from a Kaufman ion source while they were grown in as e-beam evaporator. The result shows that the Ae IAD increases the refractive index and packing density of $TiO_2 films close to those of the bulk. For $ZrO_2$ films the Ar IAD increases the average refractive index decreases the negative inhomogeneity of refractive index and reverses to the positive inhomogeneity. The optical properties result from improved packing density and denser outer layer next to air The Ar-ion bombardment also induces the changes in microstructure of $ZrO_2$ films such as the preferred (111) orientation of cubic phase increase in compressive stress and reduction of surface roughness. Inhomogeneous refractive index SiOxNy films were also prepared by nitrogen IAD and variable refractive index of $SiO_xN_y$ film was applied to fabricate a rugate filter.

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