• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.06a
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• pp.297-297
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• 2008

Buffer layers play an important role in the development of high critical current density coated conductor. $LaMnO_3$, $SrTiO_3$ and $BaZrO_3$ buffer layers were compatible with MgO surfaces and also provide a good template for growing high current density REBCO(RE=Rare earth) films. Systematic studies on the influences of pulsed laser deposition parameters (deposition temperature, deposition pressure, processing gas, laser energy density, etc.) on microstructure and texture properties of $LaMnO_3$, $SrTiO_3$ and $BaZrO_3$ films as buffer layer deposited on ion-beam assisted deposition MgO (IBAD_MgO) template by pulse laser deposition method, were carried out. These results will be presented together with the discussion on the possible use of this material in HTS coated conductor as buffer.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.07a
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• pp.282-283
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• 2005

Ion beam assisted deposition(IBAD) technique was used to produce biaxially textured polycrystalline MgO thin films for high critical current YBCO coated conductor. Hastelloy tapes were continuous electropolished with very smooth surface for IBAD-MgO deposition, RMS roughness of Hastelloy tape values below 2 nm and local slope of less than $1^{\circ}$. After the polishing of the tape an amorphous $Y_2O_3$ and $Al_2O_3$ are deposited Biaxially textured MgO was deposited on amorphous layer bye-beam evaporation with a simultaneous bombardment of high energy ions. We had developed the RHEED to measure in-situ biaxial texture of film surface as thin as tens angstrom. And also ex-situ characterization of buffer layers was studied using XRD and SEM. The full-width at half maximum(FWHM) out of plane texture of IBAD-MgO template is $4^{\circ}$.

• Fire Science and Engineering
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• v.18 no.4
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• pp.22-26
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• 2004

The static eliminator is used for prevention of disasters by static discharge, improvement of production efficiency, protection of a sensitive electronic element on the discharge of static, and it is handled for elimination of static in the painting plant, the film manufacturing plant, the producing semi-conductor factory. This study described on the explosion appearance by discharge phenomena on the voltage input type eliminator's ion generation bar of inflammable gas through an experimental tests. It was used Hydrogen, Ethylene, Propane, Methane gas with the inflammable gas and it was studied on the ignition phenomena by the length of ion-generation static bar, the number of ion-generation electrode and the variation of input voltage to the ion-generation electrode. As a result of this study it was confirmed that the shorter of the bar's length, the greater of explosion danger. And it is considered that there will not ignite at general using inflammable gas, in case of more than 900 mm bar and one electrode.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.523-523
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• 2012

As the wafer geometric requirements continuously complicated and minutes in tens of nanometers, the expectation of real-time add-on sensors for in-situ plasma process monitoring is rapidly increasing. Various industry applications, utilizing plasma impedance monitor (PIM) and optical emission spectroscopy (OES), on etch end point detection, etch chemistry investigation, health monitoring, fault detection and classification, and advanced process control are good examples. However, process monitoring in semiconductor manufacturing industry requires non-invasiveness. The hypothesis behind the optical monitoring of plasma induced ion current is for the monitoring of plasma induced charging damage in non-invasive optical way. In plasma dielectric via etching, the bombardment of reactive ions on exposed conductor patterns may induce electrical current. Induced electrical charge can further flow down to device level, and accumulated charges in the consecutive plasma processes during back-end metallization can create plasma induced charging damage to shift the threshold voltage of device. As a preliminary research for the hypothesis, we performed two phases experiment to measure the plasma induced current in etch environmental condition. We fabricated electrical test circuits to convert induced current to flickering frequency of LED output, and the flickering frequency was measured by high speed optical plasma monitoring system (OPMS) in 10 kHz. Current-frequency calibration was done in offline by applying stepwise current increase while LED flickering was measured. Once the performance of the test circuits was evaluated, a metal pad for collecting ion bombardment during plasma etch condition was placed inside etch chamber, and the LED output frequency was measured in real-time. It was successful to acquire high speed optical emission data acquisition in 10 kHz. Offline measurement with the test circuitry was satisfactory, and we are continuously investigating the potential of real-time in-situ plasma induce current measurement via OPMS.

• KEPCO Journal on Electric Power and Energy
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• v.5 no.4
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• pp.249-256
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• 2019

A full-scale test line was established to verify the electrical environmental interferences caused by the HVDC ±500 kV Double Bipole overhead transmission line with metallic return conductor, which is scheduled for construction in Korea and the fullscale test was conducted for one year. And through the human perception test of the DC electric-field under the HVDC Double Bipole line, the threshold value at which the human detects DC electric field was investigated to verify the validity of the design guide for the HVDC ±500 kV Double Bipole overhead transmission line. The polarity configuration of the HVDC ±500 kV Double Bipole test line was arranged diagonally with the same polarity in terms of the electrical environment disturbance and operation. The test line utilized the 6-bundle arrangement to prevent the corona discharge taking into account the domestic social acceptability. The test results show that the HVDC ±500 kV Double Bipole transmission line generated very little corona discharge from the conductors. Therefore, both DC electric field and ion current density met the domestic design guide for DC overhead transmission lines. Also, the human perception test of DC electric fields under the test line showed that 70% of participants did not recognize the DC electric field even when exposed to 23 kV/m.

• Bulletin of the Korean Chemical Society
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• v.32 no.spc8
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• pp.3031-3038
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• 2011

Ion-coordinating ruthenium complexes [cis-Ru(dcbpy)(L)(NCS)$_2$, where dcbpy is 4,4'-dicarboxylic acid-2,2'-bipyridine and L is 1,4,7,10-tetraoxa-13-azacyclopentadecane, JK-121, or bis(2-(2-methoxy-ethoxy)ethyl) amine, JK-122] have been synthesized and characterized using $^1H$ NMR, Fourier transform IR, UV/vis spectroscopy, and cyclic voltammetry. The effect of $Li^+$ in the electrolyte on the photovoltaic performance was investigated. With the stepwise addition of $Li^+$ to a liquid electrolyte, the device shows significant increase in the photo-current density, but a small decrease in the open circuit voltage. The solar cell with a hole conductor, the addition of $Li^+$ resulted in a 30% improvement in efficiency. The JK-121 sensitized cells in the liquid and solid-state electrolyte give power conversion efficiencies of 6.95% and 2.59%, respectively, under the simulated sunlight.

• Journal of the Korean Vacuum Society
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• v.8 no.4B
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• pp.507-513
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• 1999

8mol%-yttria-stabilized zirconia(YSZ) thin films as oxygen ion conductor were deposited by rf-magnetron sputtering, and the oxygen gas sensors with the structure of $SiO_2$ substrate/Ni-NiO mixed reference layer/Pt/YSZ/Pt were fabricated and their oxygen sensing properties were investigated. The steady-state electro-motive force (EMF) values were measured as a function of oxygen partial pressure ($PO_2;form 1.013\times10^3 \textrm{Pa \;to}\; 1.013\times10^5$Pa) and operating temperature ($300^{\circ}C$ to $700^{\circ}C$). The fabricated YSZ oxygen sensor showed the best oxygen sensing properties at 50$0^{\circ}C$. However, oxygen sensing properties were very low at the temperature lower than 30$0^{\circ}C$ due to the lack of oxygen ion mobility and at the temperature higher than $700^{\circ}C$ due 새 intermixing of materials between the layers. Especially, the YSZ sensor operating at $500^{\circ}C$ and oxygen partial pressure above $1.565\times10^4$Pa showed the oxygen sensing properties close to the values predicted by ideal Nernst equation.

• Journal of Sensor Science and Technology
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• v.14 no.4
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• pp.258-264
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• 2005

Li+-ion conducting ($Li_{3}PO_{4}$) thin films with thickness of $0.3{\mu}m$, $0.65{\mu}$, $1.2{\mu}$ were deposited on $Al_{2}O_{3}$ substrate at room temperature by thermal evaporation. They were sintered at $700^{\circ}C$ and $800^{\circ}C$ for 2 hours, respectively. Reference electrode and sensing electrode were printed on Au-electrode by silk printing method. The EMF and the ${\Delta}EMF$/dec were increased with increasing the electrolyte thickness and sintering temperature. The sample sintered at $800^{\circ}C$ was shown a good response and recovery characteristics more than those sintered at $700^{\circ}C$. The Nernst's slop of 75 mV per decade was obtained at operating temperature of $500^{\circ}C$.

• Journal of the Korean Vacuum Society
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• v.7 no.4
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• pp.410-414
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• 1998

The dependence of substrate material and electrode position were studied by radiation analysis of Ar discharge, and electron beam radiation was applied to confirm the crosslinked structure of the film. Comparing the conductor substrate with the insulator substrate, the former had lager peak density of radiation spectrum than latter. From the result of peak density of metastable state and ion, it was confirmed that the peak density of ion was falling to the down limit with increasing the distance of electrode by analyzing the radiation spectrum of polymerized films. When the polymerized styrene films was exposed to electron beam, it was possible to form a pattern with the insulator substrate.

• Proceedings of the Materials Research Society of Korea Conference
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• 2011.10a
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• pp.7-7
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• 2011

Quantum beam technology has been expected to develop breakthroughs for nanotechnology during the third basic plan of science and technology (2006~2010). Recently, Green- or Life Innovations has taken over the national interests in the fourth basic science and technology plan (2011~2015). The NIMS (National Institute for Materials Science) has been conducting the corresponding mid-term research plans, as well as other national projects, such as nano-Green project (Global Research for Environment and Energy based on Nanomaterials science). In this lecture, the research trends in Japan and NIMS are firstly reviewed, and the typical achievements are highlighted over key nanotechnology fields. As one of the key nanotechnologies, the quantum beam research in NIMS focused on synchrotron radiation, neutron beams and ion/atom beams, having complementary attributes. The facilities used are SPring-8, nuclear reactor JRR-3, pulsed neutron source J-PARC and ion-laser-combined beams as well as excited atomic beams. Materials studied are typically fuel cell materials, superconducting/magnetic/multi-ferroic materials, quasicrystals, thermoelectric materials, precipitation-hardened steels, nanoparticle-dispersed materials. Here, we introduce a few topics of neutron scattering and ion beam nanofabrication. For neutron powder diffraction, the NIMS has developed multi-purpose pattern fitting software, post RIETAN2000. An ionic conductor, doped Pr2NiO4, which is a candidate for fuel-cell material, was analyzed by neutron powder diffraction with the software developed. The nuclear-density distribution derived revealed the two-dimensional network of the diffusion paths of oxygen ions at high temperatures. Using the high sensitivity of neutron beams for light elements, hydrogen states in a precipitation-strengthened steel were successfully evaluated. The small-angle neutron scattering (SANS) demonstrated the sensitive detection of hydrogen atoms trapped at the interfaces of nano-sized NbC. This result provides evidence for hydrogen embrittlement due to trapped hydrogen at precipitates. The ion beam technology can give novel functionality on a nano-scale and is targeting applications in plasmonics, ultra-fast optical communications, high-density recording and bio-patterning. The technologies developed are an ion-and-laser combined irradiation method for spatial control of nanoparticles, and a nano-masked ion irradiation method for patterning. Furthermore, we succeeded in implanting a wide-area nanopattern using nano-masks of anodic porous alumina. The patterning of ion implantation will be further applied for controlling protein adhesivity of biopolymers. It has thus been demonstrated that the quantum beam-based nanotechnology will lead the innovations both for nano-characterization and nano-fabrication.