• 제목/요약/키워드: Ion beam-assisted deposition method

검색결과 32건 처리시간 0.029초

BIOCOMPATIBISITY OF ION BEAM PROCESSED FILMS DEPOSITED ON SURGICAL TI-6AI-4V

  • Lee, I-S;Song and I-j Yu
    • 한국진공학회지
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    • 제6권S1호
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    • pp.16-22
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    • 1997
  • ion beam processing of materials for medical application has gained increasing interest in the last decade and the implantation of nitrogen into TI-6AI-4V to improve corrosive-wear performance is currently used for processing of total hip and knee joints. Oxides and nitrides of Ti, Zr, Al, Cr were deposited on TI-6AI-4V substrates by DC magnetron sputtering dual ion beam sputtering and ion beam assisted deposition. The cytotoxicity of these films were investigated by MTT method and showed comparable to untreated TI-6AI-4V Plasm-sprayed hydroxyapatite(HAp) coatings showed excellent cytotoxicity regardless of heat treatment. intermediate layer coatings of nitrides and oxides increased the bond strength of HAp to substrate by intrdducing chemical bond at interface. Heat treatment of HAp coatings also improved the chemical bond at interfaces and increased the bond strength of untreated TI-6AI-4V to 16.4 kg/$\textrm{cm}^2$ but still lower than 33.1 kg./$\textrm{cm}^2$ of ir oxide as a imtermediate layer caoting.

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이온빔을 이용한 STS304와 알루미나 브레이징 접합효과 (Effects of the Brazing Bonding between Al2O3 and STS304 with an Ion Beams)

  • 박일수
    • 한국산학기술학회논문지
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    • 제16권12호
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    • pp.8679-8683
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    • 2015
  • 세라믹은 고온에서 뛰어난 내마모성, 내부식성을 가지기 때문에 산업적 응용에 있어서 널리 사용된다. 세라믹은 금속과 비교해서 고온에서 더 큰 강도를 가지고 있고, 더 낮은 열전도도 및 열팽창 계수를 가진다. 그러나, 세라믹이 가진 취성의 성질은 전기전자산업과 고온에서의 구조적 적용에의 넓은 적용을 제한한다. Ti 활성금속과 STS304를 IBAD 기술을 이용해서 동시에 증착시켜 STS304 스테인레스강에 $Al_2O_3$(알루미나)의 브레이징 접합강도에 어떤 영향을 미치는지 알아보았으며, 시험편들은 Ti 타겟과 Ti+ STS304 타겟 두 종류를 이용하여 두께를 변화시켜가며 증착하였다. 브레이징 접합을 위한 삽입금속으로는 일반적으로 사용되는 Ag-Cu 공정조성의 합금이 사용되었다. 브레이징 접합품의 강도는 Ag-Cu 삽입금속과 알루미나 사이의 반응층의 두께와 반응 생성물 조직에 의해 결정되며, 본 실험에서는 계면 반응의 메커니즘을 보다 구체화하고 계면 반응에 의한 경사기능성의 접합계면을 더욱 향상시키는 결과를 얻고자 한다.

Characterion of Calcium Phosphate Films Grown on Surgicl Ti-6AI-4V By Ion Beam Assisted Deposition

  • Lee, I-S.;Song, J-S.;Choi, J-M;Kim, H-E.
    • 한국진공학회지
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    • 제7권s1호
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    • pp.30-36
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    • 1998
  • The plasma-spray technique is currently the most frequently used method to produce calcium phosphate coatings. Hydroxyapatite(HAp), one form of calcium phosphate, is preferred by its ability to form a direct bond with living bone, resulting in improvements of implant fixation and faster bone healing. Recently, concerns have been raised regarding the viable use and long-term stability of plasma-spray HAp coatings due to its nature of comparatively thick, porous, and poor bonding strength to metal implants. Thin layers (maximum of few microns) of calcium phosphate were formed by an e-beam evaporation with and without ion bombardments. The Ca/P ration of film was controlled by either using the evaporants having the different ration of Ca/P with addition of CaO, or adjusting the ion beam assist current. The Ca/P ration had great effects on the structure formation after heat treatment and the dissolution bahavior. The calcium phosphate films produced by IBAD exhibited high adhesion strength.

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급속열처리산화법으로 형성시킨 $SiO_2$/나노결정 Si의 전기적 특성 연구 (Electrical properties of metal-oxide-semiconductor structures containing Si nanocrystals fabricated by rapid thermal oxidation process)

  • 김용;박경화;정태훈;박홍준;이재열;최원철;김은규
    • 한국진공학회지
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    • 제10권1호
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    • pp.44-50
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    • 2001
  • 전자빔증착법과 이온빔의 도움을 받는 전자빔 증착법(ion beam assisted electron beam deposition; IBAED)법으로 비정질 Si(-200nm) 박막을 p-Si 기판위에 성장하고 이 두 구조를 급속열처리산화(Rapid Thermal Oxidation; RTO)를 시킴으로서 $SiO_2$/나노결정 Si(nanocrystal Si)/p-Si구조를 형성하였다. 그 후 시료 위에 Au 막을 증착함으로서 최종적으로 나노결정이 함유된 MOS(metal-oxide-semiconductor)구조를 완성하였다. 이 MOS구조내의 나노결정 Si의 전하충전 특성을 바이어스 sweep 비율을 변화시키면서 Capacitance-Voltage(C-V) 특성을 측정하여 조사하였다. 전자빔증착시료의 경우에는 $\DeltaV_{FB}$(flatband voltage shift)가 1V 미만의 작은 C-V 이력곡선이 관측된 반면 IBAED 시료의 경우는 $\DeltaV_{FB}$가 22V(2V/s Voltage Sweep비율) 이상인 대단히 큰 C-V 이력곡선이 관측되었다. 전자빔증착중 Ar ion beam을 조사하면 표면 흡착원자이동이 활성화되고 따라서 비정질 Si내에 Si의 핵 생성율이 증가하여 후속 급속열처리산화공정중 이 높은 농도의 핵들이 나노결정 Si으로 자라나게 되고 이렇게 형성된 높은 농도의 나노결정의 전하 충전 및 방전현상이 큰 이력곡선을 나타내는 원인이라고 생각된다. 따라서 IBAED 방법이 고농도의 나노결정 Si을 형성시키는데 유용한 방법이라고 판단된다.

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이온성고분자-금속복합체를 이용한 유연고분자 구동체의 표면특성 개선과 구동성 향상 (Surface Electrode Modification and Improved Actuation Performance of Soft Polymeric Actuator using Ionic Polymer-Metal Composites)

  • 정성희;이명준;송점식;이석민;문무성
    • 공업화학
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    • 제16권4호
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    • pp.527-532
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    • 2005
  • 이온성고분자-금속복합체(Ionic Polymer Metal Composites, IPMC)는 전기활성 고분자이며, 낮은 구동전압에서도 큰 변위를 나타내는 유연한 스마트 소재(soft smart material)이다. 이온성고분자-금속복합체의 표면전극 제조는 일반적으로 화학적 환원방법(무전해 전기도금)에 의해 제조되고 있지만, 이러한 방법에서는 그 재료가 다공성 고분자 막으로 표면이 균일한 전극을 제조하기에 어려움이 있다. 본 연구에서는 전극의 표면 저항을 감소시켜 응답속도를 증가시킴과 동시에 낮은 전압에서 큰 변위를 낼 수 있는 IPMC 제조방법을 고안하여 수행하였다. 화학적 환원방법으로 이온고분자-금속 복합체를 형성시킨 후, 이온빔보조증착법(Ion Beam Assisted Deposition)으로 균질한 표면 전극 층을 형성시켜 화학적 특성을 개선하여 전기적 자극에 의한 구동반응 속도를 향상시킬 수 있는 구동체 제조방법을 제안하였다.

The histometric analysis of osseointegration in hydroxyapatite surface dental implants by ion beam-assisted deposition

  • Kim, Min-Kyung;Choi, Jung-Yoo;Chae, Gyung-Joon;Jung, Ui-Won;Kim, Sung-Tae;Lee, In-Seop;Cho, Kyoo-Sung;Kim, Chong-Kwan;Choi, Seong-Ho
    • Journal of Periodontal and Implant Science
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    • 제38권sup2호
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    • pp.363-372
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    • 2008
  • Purpose: This study compared the effects of coating implants with hydroxyapatite (HA) using an ion beam-assisted deposition (IBAD) method prepared with machined, anodized, sandblasted and large-grit acid etched (SLA) surfaces in minipigs, and verified the excellency of coating method with HA using IBAD. Material and Methods: 4 male Minipigs(Prestige World Genetics, Korea), 18 to 24 months old and weighing approximately 35 to 40 kg, were chosen. All premolars and first molars of the maxilla were carefully extracted on each side. The implants were placed on the right side after an 8 week healing period. The implant stability was assessed by resonance frequency analysis (RFA) at the time of placement. 40 implants were divided into 5 groups; machined, anodized, anodized plus IBAD, SLA, and SLA plus IBAD surface implants. 4 weeks after implantation on the right side, the same surface implants were placed on the left side. After 4 weeks of healing, the minipigs were sacrificed and the implants were analyzed by RFA, histology and histometric. Results: RFA showed a mean implant stability quotient (ISQ) of $75.625{\pm}5.021$, $76.125{\pm}3.739$ ISQ and $77.941{\pm}2.947$ at placement, after 4 weeks healing and after 8 weeks, respectively. Histological analysis of the implants demonstrated newly formed, compact, mature cortical bone with a nearby marrow spaces. HA coating was not separated from the HA coated implant surfaces using IBAD. In particular, the SLA implants coated with HA using IBAD showed better contact osteogenesis. Statistical and histometric analysis showed no significant differences in the bone to implant contact and bone density among 5 tested surfaces. Conclusion: We can conclude that rough surface implants coated with HA by IBAD are more biocompatible, and clinical, histological, and histometric analysis showed no differences when compared with the other established implant surfaces in normal bone.

이온빔 합성법에 의해 증착된 다이아몬드성 카본 필름의 구조 및 특성 (Structure and properties of ion beam deposited diamond-like carbon films)

  • 김성화;이광렬;은광용
    • 한국진공학회지
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    • 제8권3B호
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    • pp.346-352
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    • 1999
  • Diamond-like carbon (DLC) lims were deposited by using end hall type ion gun. Benzene gas was used for the generation of carbon ions. In order to systematically control the ion energy, we applied to the substrate DC, pulsed DC or 250 kHz medium frequency bias voltage, DLC films of superior mechanical properties of hardness 39$\pm$4 GPa and elastic mudulus 290$\pm$50GPa (2 to 6 times better than those of the films deposited by plasma assisted CVD method) could be obtained. Deposition rate was much higher than when using Kaufman type ion source, which results from higher ion beam current of end hall type ion gun. The mechanical properties and atomic bond structure were independent of the bias voltage type ion gun. The mechanical properties and atomic bond structure were independent of the bias voltage type but intimately related with the magnitude of the bias voltage. With increasing the negative bias voltage, the structure of the films changed to graphitic one resulting in decreased content of three dimensional inter-links. Degradation of the mechanical properties with increasing bias voltage could be thus understood in terms of the content odf three dimensional inter-links.

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Effect of deposition method of source/drain electrode on a top gate ZnO TFT Performance

  • Kopark, Sang-Hee;Hwang, Chi-Sun;Yang, Shin-Hyuk;Yun, Young-Sun;Park, Byung-Chang
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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    • pp.254-257
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    • 2008
  • We have investigated the effect of source/drain electrode deposition method on a performance of top gate structured ZnO TFT performance. TFT using S/D of ITO film, consisted of bi-layer which deposited by ion beam assisted sputtering at the initial stage then deposited by DC magnetron sputtering, showed better performance compared to that using S/D of ITO deposited by just DC magnetron sputtering. Two ITO films exhibited different grain shapes and these resulted in different etching properties. We also suspect that charge trapping on the glass substrate (back channel) during the ITO film deposition may influence the characteristics of top gate structured ZnO TFT.

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IBAD 방법으로 코팅된 PTFE 박막의 마이크로/나노 응착 및 마찰 특성 (Micro/Nano Adhesion and Friction Characteristics of PTFE Coating Film Deposited by IBAD Method)

  • 윤의성;오현진;한흥구;공호성;장경영
    • Tribology and Lubricants
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    • 제20권5호
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    • pp.237-244
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    • 2004
  • Micro/nano tribological characteristics of PTFE coating films were experimentally studied. PTFE (polytetrafluoroethylene) modified polyethylene and low molecular weight PTFE were used as a coating materials. These films were deposited on Si-wafer (100) by IBAD (ion beam assisted deposition) method. The Ar ion beam sputtering was performed to change the surface topography of films using a hollow cathode ion gun under different Ar ion dose conditions in a vacuum chamber. Micro/nano tribological characteristics, water wetting angles and roughness were measured with a micro tribotester, SPM (scanning probe microscope), contact anglemeter and profilometer, respectively. The durability of the films were measured with macro tribotester. Results showed that the PTFE coating surfaces were converted to hydrophobic. The water contact angle of coated surfaces and surface roughness increased with the coating thickness. Adhesion and friction in micro and nano scale were governed by magnitude of normal load in soft material such as PTFE films. As the increase of sputtering time on low molecular weight PTFE films, the surface roughness was increased and nano adhesion and friction were decreased. The nano tribological characteristics of surfaces are mainly improved by chemical modification such as PTFE coating and given a synergy effect by the physical modification such as topographic modification.

이온빔보조증착으로 제작한 저굴절률 $SiO_xF_y$ 광학박막의 특성 연구 (Preparation of low refractive index $SiO_xF_y$ optical thin films by ion beam assisted deposition)

  • 이필주;황보창권
    • 한국광학회지
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    • 제9권3호
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    • pp.162-167
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    • 1998
  • CF4 이온빔보조증착법으로 굴절률이 유리보다 낮은 SiOxFy 박막을 제작하고 광학적, 구조적 및 화학적 특성을 연구하였다. End-Hall 이온총의 양극전압의 간소에 따라 SiOxFy 박막의 굴절률은 1.455까지 변하였으며, 이온빔 전류밀도의 증가에 따라서 굴절률은 1.462에서 1.430까지 변하였다. XPS와 FT-IR 분석으로부터 SiOxFy 박막의 F양이 증가함에 따라 Si-O 결합은 파수가 높은 쪽으로 이동하였고, F이 약 8.5at.%인 SiOxFy 박막은 OH 결합이 매우 감소하였으여, 박막 표면의 F이 H2O와 결합하여 탈착되는 것을 알았다. SiOxFy 박막의 응력은 0.3GPa 이하의 압축응력이었으며, 결정구조는 비정질이었다. SiOxFy 박막의 응용으로서 SiOxFy 박막과 흡수층 Si 박막을 이용하여 2층 반사방지막을 제작하였다.

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