• Applied Chemistry for Engineering
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• v.10 no.3
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• pp.343-348
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• 1999

The iron silicide films were prepared by chemical vapor deposition method using rf-plasma in variations of substrate temperature. rf-power, and ratio of $SiH_4$ and Fe-precursor. While iron silicide films are generally grown by ion beam synthesis (IBS) method of multi-step process, it is confirmed that iron silicide or $\beta$-phase consolidated $Fe_aSi_bC_cH_d$ was formed by one-step process in this study. The characteristics of films is variable because the different amounts of carbon and hydrogen was involved in the films as a function of dilute ratio of Fe-precursors and silane. It was shown that the different characteristics of films in carbon and hydrogen following the ratio of Fe-precursor and silane. The optical gap energy of films fabricated according to substrate temperature was invariant because active site brought in desorption of hydrogen was limiled. When rf-power was above 240 watt, the optical gap energy turned out to have high values because of dangling bonds increased by etching.

• Proceedings of the Korean Society of Medical Physics Conference
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• 2002.09a
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• pp.228-230
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• 2002

The relative electron density resolution was discussed by the noise power spectrum (NPS) in the heavy ion CT image. The heavy ion beam $\^$12/C accelerated up to 400MeV/u by RIMAC was used in this study. The two-dimensional (2-D) NPS in the CT image was obtained from the one-dimensional (1-D) NPS of the measured residual range distribution of water phantom for single projection, and the noise variance in the CT image was calculated from 2-D NPS. The technique used in the reconstruction was the filtered back-projection method with Shepp-Logan filter. The calculated value suggests the result of our previous works using the density resolution phantom, assuming that the relative electron density resolution is twice the standard deviation. Therefore, the estimation of the noise in CT images by 2-D NPS obtained the measured residual range distribution is the useful method.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.07b
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• pp.976-979
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• 2002

A focusing grating coupler (FGC) was not fabricated by the 'Continuous Path Control' writing strategy but by an electron-beam lithography system of more general exposure mode, which matches not only the address grid with the grating period but also an integer multiple of the address grid resolution (5 nm), To more simplify the fabrication, we are able to reduce a process step without large decrease of pattern quality by excluding a conducting material or layer such as metal (Al, Cr, Au), which are deposited on top or bottom of an e-beam resist to prevent charge build-up during e-beam exposure. A grating pitch period and an aperture feature size of the FGC designed and fabricated by e-beam lithography and reactive ion etching were ranged over 384.3 nm to 448.2 nm, and $0.5{\times}0.5mm^2$ area, respectively, This fabrication method presented will reduce processing time and improve the grating quality by means of a consideration of the address grid resolpution, grating direction, pitch size and shapes when exposing. Here our investigations concentrate on the design and efficient fabrication results of the FGC for coupling from slab waveguide to a spot in free space.

• Transactions on Electrical and Electronic Materials
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• v.3 no.1
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• pp.30-37
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• 2002

A focusing grating coupler (FGC) was not fabricated by the 'Continuous Path Control'writing strategy but by an electron-beam lithography system of more general exposure mode, which matches not only the address grid with the grating period but also an integer multiple of the address grid resolution (5 nm). To more simplify the fabrication, we are able to reduce a process step without large decrease of pattern quality by excluding a conducting material or layer such as metal (Al, Cr, Au), which are deposited on top or bottom of an e-beam resist to prevent charge build-up during e-beam exposure. A grating pitch period and an aperture feature size of the FGC designed and fabricated by e-beam lithography and reactive ion etching were ranged over 384.3 nm to 448.2 nm, and 0.5 $\times$ 0.5 mm$^2$area, respectively. This fabrication method presented will reduce processing time and improve the grating quality by means of a consideration of the address grid resolution, grating direction, pitch size and shapes when exposing. Here our investigations concentrate on the design and efficient fabrication results of the FGC for coupling from slab waveguide to a spot in free space.

• Journal of Radiation Protection and Research
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• v.9 no.1
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• pp.19-25
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• 1984

There is not yet an universal method of electron dosimetry. The Authors measured dose distributions of the electron beams from Clinac-18 by means of silicon detector connected to X-Y recorder, and compared them in water phantom with dose distributions measured by film and ion chamber, both inserted in polystyrene phantom. The results are as followings, 1. Dose in build-up region increased with the field size for all energy, and depth dose profiles of $6{\sim}12MeV$ beam under the depth of maximum dose were independent of field size, but those of 15 and 18 MeV beam were dependent on the field size. 2. The widths of penumbra by semiconductor detector were narrower than those by film for same energy beam. 3. Depth dose profiles by three different dosimeter did not coincide each other. In the build-up region, dose by semiconductor detector was lower than that by any other dosimeter.

• Proceedings of the KIEE Conference
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• 1994.07b
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• pp.1268-1270
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• 1994

Fine lithographic technology in a submicron design regime is necessary for the fabrication of VLSI circuits. In such lithography, fine pattern delineation is performed by electron beam, ion beam and X-ray lithography instead of photolithography. Therefore, the new resist materials and development method have been required. So, we are investigating another positive E-beam resists which have high sensitivity and dry etching resistance, Plasma co-polymerized resist was prepared using an interelectrode gas-flow-type reacter. Methymethacrylate, tetramethyltin and styrene were chosen as the monomer to be used. The delineated pattern in the resist was developed with gas-flow-type reactor using an argon and 02 as etching gas. We studied about the effects of discharge power and mixing rate of the co-polymerized thin :film. The molecular structure of thin film was investigated by ESCA and IR, and then was discussed in relation to its quality as a resist.

• Progress in Medical Physics
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• v.15 no.2
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• pp.100-104
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• 2004

The detector size effect due to the spatial response of detectors is a critical source of inaccuracy in clinical dosimetry that has been the subject of numerous studies. Conventionally, the detector response kernel contains all the information about the influence that the detector size has on the measured beam profile. Various analytical models for this kernel have been proposed and studied in theoretical and experimental works. Herein, a method to simply determine the detector response kernel using the Monte Carlo simulation and convolution theory has been proposed. Based on this numerical method, the detector response kernel for a Farmer type ion chamber embedded in a water phantom has been obtained. The obtained kernel shows characteristics of both the pre-existing parabolic model proposed by Sibata et al. and the Gaussian model used by Garcia-Vicente et al. From this kernel and deconvolution technique, the detector size effect can be removed from measurements for 6MV, 10${\times}$10 $\textrm{cm}^2$ and 0.5${\times}$10 $\textrm{cm}^2$photon beams. The deconvolved beam profiles are in good agreements with the measurements performed by the film and pin-point ion chamber, with the exception of in the tail legion.

• Korean Journal of Optics and Photonics
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• v.15 no.4
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• pp.309-312
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• 2004

Two-dimensionally arrayed nanocolumn lattices were fabricated by using double-exposure laser holographic method. The hexagonal lattice was formed by rotating the sample with 60 degree while the square lattice by 90 degree before the second laser-exposure. The size and period of nanocolumns could be controlled accurately from 125 to 145 nm in diameter and 220 to 290 nm in period for square lattice by changing the incident angle of laser beam. The reactive ion etching for a typical time of 30 min using CH$_4$/H$_2$ plasma enhanced the aspect-ratio by more than 1.5 with a slight increase of the bottom width of columns.

• Journal of the Korean institute of surface engineering
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• v.34 no.2
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• pp.125-134
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• 2001

($Ti_{1-x}$ $Cr_{x}$ )N coatings were deposited by an ion-plating method in a reactor with two separate metal sources, Ti and Cr. Ti was evaporated using an electron beam, while Cr evaporation was carried out by resistant heating. The Ti and Cr concentrations in the coatings were controlled by the Ti and Cr evaporation ratio. The coating hardness increased with increasing the Cr content(x) and showed a maximum value of 6,000 HK at around x=0.8. The critical load of the coatings, measured by the scratch test, was around 30 N. The wear resistance properties of the ($Ti_{1-x}$$Cr_{ x}$)N coatings were evaluated using a CSEM pin-on-disk type tribometer. A Cr-steel ball as well as a SiC ball, which had hardness values of 590 HK and 2,600 HK respectively, were used as the pin. After the wear test, the surface morphology, roughness and the concentration of the coatings were investigated, with the main focus being on the effect of wear debris and the transferred layer on the wear behavior.

• Proceedings of the Korean Society of Medical Physics Conference
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• 2002.09a
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• pp.432-435
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• 2002

We have developed and proposed the heavy ion CT system which consists of fluorescent screen and CCD camera equipped with image intensifier. In our system, we have measured the residual range of particles that passed a phantom and reconstructed the CT image for the distribution of relative stopping power by filtered back projection method with Shepp '||'&'||' Logan filter. The heavy ion $\^$12/C accelerated up to 400 MeV/u by HIMAC (Heavy Ion Medical Accelerator in Chiba) was used. Intensity of the beam output changes like macro pulse, the period being 3.3 sec and the width being 2 sec. The series of data was acquired in synchronizing with the pulse, leading to the improvement of S/N in the CT image. The fundamental performance was experimentally evaluated in the proposed system. The spatial resolution was estimated to be about 1 mm and the density resolution (electron density referred to water) to be about 0.01.