• Title/Summary/Keyword: Ion beam method

검색결과 411건 처리시간 0.037초

TiC 이온 주입 층에 증착된 DLC 박막의 트라이볼로지적 특성 (Tribological Properties of DLC film on Modified Surface by TiC Plasma Immersion Ion Implantation and Deposition)

  • 이진우;김종국;김석삼
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2004년도 춘계학술대회
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    • pp.956-960
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    • 2004
  • Effects of ion implantation and deposition on the tribological properties of DLC film as a function of implanted energies and process times were investigated. TiC ions were implanted and deposited on the Si-wafer substrates followed by DLC coating using ion beam deposition method. In order to study tribological properties such as friction coefficient and behavior of DLC film on the modified surface as a function of implanted energies and process times, we used a ball-on-disc type apparatus in the atmospheric environment. From results of wear test, as the implanted energy was increased, the friction coefficient was more stable below 0.1.

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Design Study of an Axial Injection System for MC50 Cyclotron at KIRAMS

  • Kim, Jae-Hong;Cho, Sung-Jin;Choi, Jun-Yong;Hong, Seung-Pyo;Yu, In-Gong;Park, Hyun;Lee, Ji-Sup
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.262-262
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    • 2012
  • A multi-purpose cyclotron, MC50 has been operated to provide multi-ions of proton, deuteron and alpha at Korea Institute of Radiological and Medical Sciences (KIRAMS). Neutron is also produced through the (p,n) nuclear process with a Be target. However, a wide spectrum of current of ions is requested by beam users for carrying their various application fields. Therefore a simulation study is requested on the design of an axial injection system for high current proton and alpha beam extraction for radio-isotope productions and scientific researches. The purpose of this study is seeking a relatively simple method for the MC50 having higher alpha beam capability and also improving proton and deuteron beams currently used. We are considering two possibilities to improve the internal ion source and to install a new external axial injection system. The external injection system will be consisted of an Einzel lens, a steering magnet, a buncher, and a glazer lens placed in front of an inflector, which is located at the center of the main magnet.

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급속열처리산화법으로 형성시킨 $SiO_2$/나노결정 Si의 전기적 특성 연구 (Electrical properties of metal-oxide-semiconductor structures containing Si nanocrystals fabricated by rapid thermal oxidation process)

  • 김용;박경화;정태훈;박홍준;이재열;최원철;김은규
    • 한국진공학회지
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    • 제10권1호
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    • pp.44-50
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    • 2001
  • 전자빔증착법과 이온빔의 도움을 받는 전자빔 증착법(ion beam assisted electron beam deposition; IBAED)법으로 비정질 Si(-200nm) 박막을 p-Si 기판위에 성장하고 이 두 구조를 급속열처리산화(Rapid Thermal Oxidation; RTO)를 시킴으로서 $SiO_2$/나노결정 Si(nanocrystal Si)/p-Si구조를 형성하였다. 그 후 시료 위에 Au 막을 증착함으로서 최종적으로 나노결정이 함유된 MOS(metal-oxide-semiconductor)구조를 완성하였다. 이 MOS구조내의 나노결정 Si의 전하충전 특성을 바이어스 sweep 비율을 변화시키면서 Capacitance-Voltage(C-V) 특성을 측정하여 조사하였다. 전자빔증착시료의 경우에는 $\DeltaV_{FB}$(flatband voltage shift)가 1V 미만의 작은 C-V 이력곡선이 관측된 반면 IBAED 시료의 경우는 $\DeltaV_{FB}$가 22V(2V/s Voltage Sweep비율) 이상인 대단히 큰 C-V 이력곡선이 관측되었다. 전자빔증착중 Ar ion beam을 조사하면 표면 흡착원자이동이 활성화되고 따라서 비정질 Si내에 Si의 핵 생성율이 증가하여 후속 급속열처리산화공정중 이 높은 농도의 핵들이 나노결정 Si으로 자라나게 되고 이렇게 형성된 높은 농도의 나노결정의 전하 충전 및 방전현상이 큰 이력곡선을 나타내는 원인이라고 생각된다. 따라서 IBAED 방법이 고농도의 나노결정 Si을 형성시키는데 유용한 방법이라고 판단된다.

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플라즈마 증착방식에 의해 DLC코팅된 알루미나 세라믹의 코팅박막 특성에 관한 연구 (CHARACTERISTICS OF DIAMONDLIKE CARBON COATED ALUMINA SEALS AT TEMPERATURES UP TO $400^{\circ}C$)

  • 옥철호;김병용;강동훈
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.397-397
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    • 2007
  • Diamondlike carbon (DLC) coatings were deposited on alumina ceramic seals using a plasma immersion ion deposition technique (PIID). Then they were subjected to tribological tests using a pin-on-disc tribometer under a high load (1.3 GPa) and under elevated temperatures up to 400C. Coefficients of friction (COFs) were recorded and compared with that of the untreated alumina while the wear tracks were analyzed using SEM with EDS to characterize the DLC films. To enhance the DLC adhesion to the substrate, various interlayers including Si and Cr were deposited using the PIID process or an ion beam assisted deposition (IBAD) method. It was observed that the DLC coating, if adhering well to the substrate, reduced the COFs significantly, from 0.4-0.8 for the uncoated alumina to about 0.05-0.1, within the tested temperature range. The adhesion was determined by the interlayer type and possibly by the application method. Cr interlayer did not perform as well as the Si interlayer. This could also be due to the fact that the Cr interlayer and the subsequent DLC coating had to be done in two different processing systems, while both the Si interlayer and the subsequent DLC film were deposited in one system without breaking the chamber. The coating failure mode was found to be delamination between the Cr and the alumina substrate. In contrast, the Si interlayer with proper DLC deposition procedures resulted in very good adhesion and hence excellent tribological performance. Further study may lead to future DLC applications of ceramic seals.

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멀티채널 방식에 의한 초미세 바늘 전극의 제작 및 빔 특성 (Manufacture of an Ultra-Sharp Tungsten Electrode for Field-Emission Electron Beam and Its Beam Characteristics)

  • 임연찬;현정우;김성수;박철우;이종항;강승언
    • 한국공작기계학회:학술대회논문집
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    • 한국공작기계학회 2004년도 춘계학술대회 논문집
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    • pp.508-512
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    • 2004
  • An ultra-sharp tungsten electrode for field emission was manufactured by using an electrochemical etching method, and its beam characteristics were investigated. KOH and NaOH were the electrolytes used in this research, and the taper length of the tip varied form 150 $\mu\textrm{m}$ to 250 $\mu\textrm{m}$ according to the applied voltage and the concentration of the electrolyte. The electron-beam stability was measured to be within 5% for a total emission current of 5 ${\mu}\textrm{A}$ during 4 hours of operation, and the Ignition voltages were found to be ∼300 V. The tip radius was experimentally found to be 250${\AA}$ from a linear fitting of Fowler-Nordheim plots, which was in remarkably good agreement with that of the image size from scanning ion-microscopy.

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Fabrication of a Graphene Nanoribbon with Electron Beam Lithography Using a XR-1541/PMMA Lift-Off Process

  • Jeon, Sang-Chul;Kim, Young-Su;Lee, Dong-Kyu
    • Transactions on Electrical and Electronic Materials
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    • 제11권4호
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    • pp.190-193
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    • 2010
  • This report covers an effective fabrication method of graphene nanoribbon for top-gated field effect transistors (FETs) utilizing electron beam lithography with a bi-layer resists (XR-1541/poly methtyl methacrylate) process. To improve the variation of the gating properties of FETs, the residues of an e beam resist on the graphene channel are successfully taken off through the combination of reactive ion etching and a lift-off process for the XR-1541 bi-layer. In order to identify the presence of graphene structures, atomic force microscopy measurement and Raman spectrum analysis are performed. We believe that the lift-off process with bi-layer resists could be a good solution to increase gate dielectric properties toward the high quality of graphene FETs.

Electro-Optical Performances of In plane Switching (IPS) Cell on the Inorganic Thin Film by Ion Beam (IB) Method

  • Kim, Sang-Hoon;Hwang, Jeoung-Yeon;Kim, Jong-Hwan;Han, Jung-Min;Seo, Dae-Shik;Kim, Sung-Yeon;Oh, Byeong-Yun;Myoung, Jae-Min
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.796-799
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    • 2006
  • We studied the nematic liquid crystal (NLC) alignment capability by the Ion beam (IB) alignment method on a NDLC (Nitrogen doped Diamond Like Carbon) as a C:H thin film, and investigated electro-optical (EO) performances of the IB aligned In plane switching (IPS) cell with NDLC surface. A good LC alignment by IB exposure on a NDLC surface was achieved. Monodomain alignment of the IB aligned IPS cell can be observed. The good electro-optical characteristics of the IB aligned IPS cell was observed with oblique IB exposure on the NDLC as a-C:H thin film for 1min.

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