• Progress in Superconductivity
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• 제7권1호
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• pp.1-5
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• 2005

A pseudogap in the normal-state quasiparticle density of states of $high-T_c$ superconductors has been revealed in many different kinds of experiments. The existence of the pseudogap and the superconducting gap, and the correlation between them has attracted considerable attention because they are believed to be a key to understanding the mechanism of the $high-T_c$ superconductivity. The interlayer tunneling spectroscopy, excluding the surface-dependent effect, is one of the most accurate means to examine the electron spectral characteristics both in the superconducting and the normal states. In this study, a new constant-temperature intrinsic tunneling spectroscopic technique, excluding the overheating effect using the in-situ temperature monitoring combined with the digital proportional-integral-derivative control, is introduced. The implication on the $high-T_c$ superconductivity of the detailed temperature dependencies of the observed spectral weight in $Bi_{2}Sr_{2}CaCu_{2}O_{8+x}\;high-T_c$ material for overdoped and underdoped levels is discussed.

• Journal of Magnetics
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• 제9권2호
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• pp.52-59
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• 2004

As deposited and annealed MTJs with the structure of $Ta(5 nm)/Cu(10 nm)/Ta(5 nm)/Ni_{80}Fe_{20}(2 nm)/Cu(5 nm)/ Ir_{25}Mn_{75}(10 nm)/Co_{70}Fe_{30}(2.5 nm)/Al-O/Co_{70}Fe_{30}(2.5nm)/Ni_{80}Fe_{20}(t)/Ta(5nm)/Ni_{80}Fe_{20}(t)/Ta(5 nm)$, where t=10, 30, 60 and 100 nm were characterized by XRD and magnetic hysteresis loops measurements. The XRD measurements were done in grazing incidence $(GID scan-2{\theta})$ and ${\theta}-2{\theta}$ geometry, by rocking curve $(scan-{\omega})$ and pole figures in order to establish correlation between texture and crystallites size and magnetic parameters of exchange biased and interlayer coupling. The variations of shifting and coercivity field of free and pinned layers after annealing in $300^{\circ}C$ correlate with the improvement of ［111］ texture and grains size of $Ni_{80}Fe_{20}$ and $Ir_{25}Mn_{75}$ respectively. The exchange biased and the coercivity fields of the pinned layer linearly increased with increasing grain size of $Ir_{25}Mn_{75}$, The reciprocal proportionality between interlayer coupling and coercivity fields of the free layer and grain size of $Ni_{80}Fe_{20}$ was found. The enhancement of interlayer coupling between pinned and free layers, after annealing treatment, indicates on the correlated in-phase roughness of dipolar interacting interfaces due to increase of crystallites size of $Ni_{80}Fe_{20}$.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.217-217
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• 2012

Solution-processed tungsten oxide thin film with thickness of about 30 nm is prepared from ammonium tungstate. This layer is introduced into the interface between the poly(3-hexylthiophene):[6,6]-phenyl-C61-butyric acid methyl ester (P3HT:PCBM) layer and the ITO electrode to be used as an electron blocking layer. The annealed tungsten oxide thin films at $150^{\circ}C$ and $300^{\circ}C$ show amorphous phase, while the $400^{\circ}C$ -annealed tungsten oxide film shows crystalline phase. At $150^{\circ}C$ annealing temperature, the conversion efficiency is significantly improved from 0.71% to 1.42% as the condition is changed from vacuum to air atmosphere, which is related to oxidation state of tungsten in amorphous phase. For the air annealing condition, the conversion efficiency is further increased from 1.42% to 2.01% as the temperature is increased from $150^{\circ}C$ to $300^{\circ}C$, which is mainly due to the removal of the chemisorbed water. However, a slight deterioration in photovoltaic performance is observed when the temperature is increased to $400^{\circ}C$, which is ascribed to poor electron blocking ability due to the formation of crystalline phase. It is concluded that $W^{6+}$ oxidation state and amorphous nature in tungsten oxide interlayer is essential for blocking electron effectively from the active layer to the ITO electrode.

• Bulletin of the Korean Chemical Society
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• 제28권1호
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• pp.108-114
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• 2007

The lyotropic behaviors to form the structure of distearoylphosphatidylcholine (DSPC)-based liquid crystal (LC) hydrated by only propylene glycol (PG) without water were examined by differential scanning calorimetry (DSC), X-ray diffractions (XRD), polarized microscope (PM) and transmission electron microscope (TEM). By increasing the amount of PG instead of water, it showed the phase transition to be gradually changed from anisotropic structures to other structures more close to isotropic ones and their appearance to be changed from solid-like states to liquid-like ones with more fluidity. Below 50% w/w PG, the mixtures of DSPC and PG resulted in no direct observation of LC structure through PM because they were very close to solid-states. From 55% w/w to 90% w/w of PG, the dense lamella crystalline structures were observed through PM, and their thickness and area decreased as the content of PG increased. Measured by DSC with heating process, the main phase transition from α -lamella phase to isotropic phase appeared from 52.89 °C to 47.41 °C to show linearly decreasing behaviors because PG affects the hydrophobic region of DSPC-based lamella phase. The repeating distance of the lamella phase and the interlayer distance between bilayers were calculated with XRDs and the average number of bilayers related to the thickness in LC structure was approximately estimated by combining with TEM results. The WAXS and DSC measurements showed that all of PG molecules contributed to swelling both the lipid layer in the edge region of lamella phase close to phosphate groups and the interlayer between bilayers below 90% w/w of PG. The phase and thermal behaviors were found to depend on the amount of PG used by means of dissolving DSPC as a phospholipid and rearranging its structure. Instead of water, the inducement of PG as a polar solvent in solid-lamella phase is discussed in terms of the swelling effect of PG for DSPC-based lamella membrane.

• 한국재료학회지
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• 제17권1호
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• pp.25-30
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• 2007

The in-situ scanning electron microscopy observation of real-time hillock evolution in pure hi thin films on glass substrate during Isothermal annealing was analyzed quantitatively to understand the compressive stress relaxation mechanism by focusing on the effect of Mo interlayer between Al film and glass substrate. There is a good correlation between the hillock-induced stress relaxation by in-situ scanning electron microscopy observation ana the measured stress relaxation by wafer curvature method. It is also clearly shown that the existence of Mo interlayer plays an important role in hillock formation probably due to the large difference in interfacial diffusivity of Al films.

• 한국재료학회지
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• 제13권6호
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• pp.369-373
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• 2003

Magneto-optic Kerr Effect(MOKE), AFM and magnetoresistance measurements have been carried out on as-deposited and annealed Magnetic Tunnel Junctions(MTJs) with junction sizes 180, 250, 320 and 380 $\mu\textrm{m}$ in order to investigate the correlation among interlayer exchange coupling, surface roughness and junction size. Relatively irregular variations of coercivity $H_{c}$ (∼17.5 Oe) and interlayer exchange coupling $H_{E}$ (∼17.5 Oe) are observed over the junction in as-deposited sample prepared by DC magnetron sputtering. After annealing at $200^{\circ}C$, $H_{c}$ decreases to 15 Oe, while $H_{ E}$ increases to 20 Oe with smooth local variation. $H_{E}$ shows very good correlation with surface roughness across the junction in agreement with Neel's orange peel coupling. The increasing slope per $\mu\textrm{m}$ of normalized $H_{c}$ and $H_{E}$ are same near junction edge along free-layer direction irrespective of junction size, giving relatively uniform $H_{c}$ and $H_{ E}$ for wider junction size. Thickness profiles of the junctions measured with $\alpha$-step show increasingly flat top surface for larger junctions, indicating better uniformity for large. junctions in agreement with the normalized$ H_{c}$ and H$/_{E}$ curves. TMR ratios also increase with increasing junction size, indicating improvement for larger uniform junctions.

• 한국전기전자재료학회논문지
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• 제21권4호
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• pp.362-367
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• 2008

We have Manufactured the low-k dielectric interlayer fabricated by plasma enhanced chemical vapor deposition (PECVD), The thin film of SiOCH is studied correlation between components and Dielectric constant. The precursor was evaporated and introduced with the flow rates from 16 sccm to 25 sccm by 1sccm step in the constant flow rate of 60 sccm $O_2$ in process chamber. The chemical characteristics of SiOCH were analyzed by measuring FT/IR absorption lines and obtained each dielectric constant measuring C-V. Then compare respectively. ILD of BTMSM/$O_2$ could have low dielectric constant about $k\sim2$, and react sensitively. Also dielectric constant could be decreased by the effects of decreasing $CH_3$ and growing Si-O-Si(C) after annealing process.

• 광물과 암석
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• 제33권3호
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• pp.143-152
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• 2020

버네사이트(birnessite)는 약 7Å의 d-spacing을 가지는 대표적인 층상형 산화망간광물로 높은 양이온 교환능력을 가지기 때문에 지하수나 퇴적물 공극 유체의 화학조성을 결정짓는 중요한 역할을 한다. 버네사이트의 양이온 교환 반응 기작을 규명하기 위해서는 층간 내 양이온의 배위 환경과 결정구조에 대한 원자 수준의 이해가 매우 중요하다. 이번 연구에서는 원자 수준의 계산광물학 방법인 고전 분자동역학(classical molecular dynamics; MD) 시뮬레이션을 이용하여 기존 실험에서 보고된 화학조성을 가지는 삼사정계 Na-와 K-버네사이트의 결정구조, 층간 양이온의 배위 환경 및 적층 구조를 계산하였다. 계산 결과는 기존 X-선 실험에서 보고된 격자 상수와 층간 배위 환경을 잘 재현하여 시뮬레이션 방법의 신뢰성을 보여주었으며, X-선 실험만으로는 구분하기 어려운 층간의 양이온과 물 분자 위치를 구별한 원자 수준의 정보를 제공하였다. 망간 팔면체 층의 적층 순서는 동일하지만 층간 내 Na⁺와 K⁺의 위치가 서로 상이하고, 층간 양이온의 배위 환경과 결정구조 간의 상관관계를 보인다. 원자 수준의 분자동역학 시뮬레이션은 버네사이트의 양이온 교환 반응 기작 규명에 크게 기여할 것으로 기대한다.

• 한국전기전자재료학회논문지
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• 제21권4호
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• pp.354-361
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• 2008

The dielectric characteristics of low-k interlayer dielectric materials was fabricated by plasma enhanced chemical vapor deposition (PECVD). BTMSM precursor was evaporated and introduced with the flow rates from 16 sccm to 25 sccm by 1sccm step in the constant flow rate of 60 sccm $O_2$ in process chamber. Manufactured samples are analyzed components by measuring FT/IR absorption lines. Decomposition each Microscopic structures through two-dimensional correlation analysis about mechanisms for the formation of SiOCH in $SiOCH_3$, Si-O-Si and Si-$CH_3$ bonding group and analyzed correlation between the micro-structure of each group. It is a tendency that seems to be growing of Si-O-Ci(C) bonding group and narrowing of Si-O-$CH_3$ bonding group relative to the increasing flow-rate BTMSM. The order of changing sensitivity about changes of flow-rate in Si-O-Si(C) bonding group is cross link mode$(1050cm^{-1})$ $\rightarrow$ open link mode$(1100cm^{-1})\rightarrow$ cage link mode $(1140cm^{-1})$.

• 대한화학회지
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• 제21권4호
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• pp.246-255
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• 1977

여러 종류의 層間 陽이온을 가지고 있는 層狀 硅酸鹽上에서 일어난 methylmethacrylate의 吸着에 關하여 赤外線 分光法과 X-ray로 硏究하였다. 吸着된 methylmethacrylate의 여러 개의 特性 carbonyl band가 陽이온의 種과 脫水溫度에 따라서 다르게 1723∼1547$cm^{-1}$의 範圍에서 나타났다. 190$cm^{-1}$程度로 shift한 carbonyl 伸縮 band는 polyvalent 陽이온에만 나타났으며 $>C=O{\cdot}{\cdot}{\cdot}M^{n+}$型 着物形成 基因하는 것이었다. 1703∼1640$cm^{-1}$에서 나타난 band는 carbonyl 酸素와 陽이온 水 또는 陽이온 水酸基와의 水素結合에 依한 것이었고 shift한 정도는 層間 陽이온의 polarizing power와 좋은 相互 關係를 이루었다. 그러나 1723$cm^{-1}$에서 나타난 band는 陽이온의 鍾과는 相互 關係가 없었으며 carbonyl ,酸素와 表面 水酸基와의 相互 作用으로 因한 것이었다. Interlamellar spacing을 계산해 본 結果 methylmethacrylate의 分子平面은 硅酸鹽의 層과 平行하게 놓여 있는 것 같다.