• Korean Journal of Remote Sensing
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• v.37 no.1
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• pp.57-67
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• 2021

An earthquake occurred on 17 November 2017 in Pohang, South Korea with a strength of 5.4 Mw. This is the second strongest earthquake recorded by local authorities since the equipment was first installed. In order to improve understanding of earthquakes and surface deformation, many studies have been conducted according to these phenomena. In this research, we will estimate the surface deformation using the Okada model equation. The SAR images of three satellites with different wavelengths (ALOS-2, Cosmo SkyMed and Sentinel-1) were used to produce the interferogram pairs. The interferogram is used as a reference for surface deformation changes by using Okada to determine the source of surface deformation that occurs during an earthquake. The Non-linear optimization (Levemberg-Marquadrt algorithm) and Monte Carlo restart was applied to optimize the fault parameter on modeling process. Based on the modeling results of each satellite data, the fault geometry is ~6 km length, ~2 km width and ~5 km depth. The root mean square error values in the surface deformation model results for Sentinel, CSK and ALOS are 0.37 cm, 0.79 cm and 1.47 cm, respectively. Furthermore, the results of this modeling can be used as learning material in understanding about seismic activity to minimize the impacts that arise in the future.

• Current Optics and Photonics
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• v.1 no.5
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• pp.505-513
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• 2017

Measuring the thickness of thin films is strongly required in the display industry. In recent years, as the size of a pattern has become smaller, the substrate has become larger. Consequently, measuring the thickness of the thin film over a wide area with low spatial sampling size has become a key technique of manufacturing-yield management. Interferometry is a well-known metrology technique that offers low spatial sampling size and the ability to measure a wide area; however, there are some limitations in measuring the thickness of the thin film. This paper proposes a method to calculate the thickness of the thin film in the following two steps: first, pre-estimation of the thickness with the phase at the peak position of the interferogram at the bottom surface of the thin film, using white-light phase-shift interferometry; second, accurate correction of the measurement by fitting the interferogram with the theoretical pattern through the estimated thickness. Feasibility and accuracy of the method has been verified by comparing measured values of photoresist pattern samples, manufactured with the halftone display process, to those measured by AFM. As a result, an area of $880{\times}640$ pixels could be measured in 3 seconds, with a measurement error of less than 12%.

• Journal of the Optical Society of Korea
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• v.18 no.3
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• pp.236-243
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• 2014

Surface profiling and film thickness measurement play an important role for inspection. White light interferometry is widely used for engineering surfaces profiling, but its applications are limited primarily to opaque surfaces with relatively simple optical reflection behavior. The conventional bucket algorithm had given inaccurate surface profiles because of the phase error that occurs when a thin-film exists on the top of the surface. Recently, reflectometry and white light scanning interferometry were combined to measure the film thickness and surface profile. These techniques, however, have found that many local minima exist, so it is necessary to make proper initial guesses to reach the global minimum quickly. In this paper we propose combing reflectometry and white light scanning interferometry to measure the thin-film thickness and surface profile. The key idea is to divide the measurement into two states; reflectometry mode and interferometry mode to obtain the thickness and profile separately. Interferogram modeling, which considers transparent thin-film, was proposed to determine parameters such as height and thickness. With the proposed method, the ambiguity in determining the thickness and the surface has been eliminated. Standard thickness specimens were measured using the proposed method. Multi-layered film measurement results were compared with AFM measurement results. The comparison showed that surface profile and thin-film thickness can be measured successfully through the proposed method.

• Journal of Astronomy and Space Sciences
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• v.14 no.1
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• pp.117-125
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• 1997

A Fabry-Perot interferometer has a very high (~1,000,000) resolution, so recently this has been widely used for many fields of space science. To understand the working principle of this a mathematical modeling is needed, and to analyze the interferogram it is essential to know the precise instrument function. The spectrum from the interferometer is mixed with a true signal from the light source and the instrument function through convolution. The true signal has the information about the quantum state of mo lecules, temperature and bulk motion of the gas. Therefore if we model the signal and convolve this with the theoretical instrument function we can predict the spectrum for the real case.