• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.04a
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• pp.56-57
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• 2006

In this paper, the inorganic multi-layer thin film encapsulation was newly adopted to protect the organic layer from moisture and oxygen. Using the electron beam, Sputter, inorganic multi-layer thin-film encapsulation was deposited onto the Ethylene Terephthalate(PET) and their interface properties between inorganic and organic layer were investigated. In this investigation, the SiON SiO2 and parylene layer showed the most suitable properties. Under these conditions, the WVTR for PET can be reduced from a level of $0.57\;g/m^2/day$ (bare subtrate) to 1*10-5 g/$m^2$/day after application of a SiON and SiO2 layer. These results indicates that the PET/SiO2/SiON/Parylene barrier coatings have high potential for flexible organic light-emitting diode(OLED) applications.

• Composites Research
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• v.34 no.4
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• pp.264-268
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• 2021

In this study, we propose a method for fabricating hydrophobic coatings/films with three-dimensional (3D) hierarchical nanostructured organic/inorganic composite surfaces. An epoxy-based, large-area 3D ordered nanoporous template is first prepared through an advanced photolithography technique called Proximity-field nanoPatterning (PnP). Then, a hierarchically structured surface is generated by densely impregnating the template with silica nanoparticles with an average diameter of 22 nm through dip coating. Due to the coexisting micro- and nano-scale roughness on the surface, the fabricated composite film exhibits a higher contact angle (>137 degrees) for water droplets compared to the reference samples. Therefore, it is expected that the materials and processes developed through this study can be used in various ways in the traditional coating/film field.

• Korean Journal of Materials Research
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• v.9 no.4
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• pp.414-418
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• 1999

Typical metal oxide thin films having optical and electrical properties are widely used as inorganic functional materials. Liquid phase deposition(LPD) method, a new low temperature process, has been developed for the several advantages of no vacuum system, low cost, high throughput, and low processing temperature(<$50^{\circ}C$). Silica powder was added to 40wt% hydrofluoro-silicic acid($H_2$SiF\ulcorner) to obtain an immersing solution of silica-saturated hydrofluorosilicic acid solution. Boric acid solution was continuously added in the range from 0 to 0.05M to prepare supersaturated hydrofluorosilicic acid solution. LPD $SiL_2$film was formed with the variation of added amount of $H_2$O. The SiO$_2$thin film could be prepared from hydrofluorosilicic acid by LPD method. The thickness of LPD $_SiO2$film was influenced by the boric acid concentration and added amount of $H_2$O. Silicon in thin film existed as SiF\ulcorner by Raman spectrum.

• Journal of Applied Reliability
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• v.17 no.1
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• pp.72-77
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• 2017

Purpose: The electrochemical corrosion behavior of tin oxide film coated on PET substrates has been studied under varying concentrations of acrylic acid to investigate possible corrosion in contact with the acidic environment. Method: Potentiodynamic test was performed for a commercial ITO/PET film in 0.1, 0.3, and 0.5 M of acrylic acid. The surface morphology was analyzed by scanning electron microscope (SEM) and energy dispersive spectroscopy (EDS). Results: Potentiodynamic test results showed an increase in Icorr and decrease in Ecorr value with increasing concentration of acid. Microscopic evaluation suggested the presence of certain deep cracks on the surface of the film in addition with a severe acidic attack. Conclusion: Exposure of ITO to acrylic acid resulted in the stress corrosion cracking of ITO film due to the mechanical mismatch between brittle inorganic ITO fim and a compliant organic PET substrate leading to the subsequent failure of the film.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.06a
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• pp.432-433
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• 2006

Electro-optical (EO) characteristics of twisted nematic (TN) - liquid crystal display (LCD) on the NDLC thin film using obliquely ion beam (IB) exposure as new ion beam (IB) type system (DuoPIGatrion ion source). A good uniform alignment of the nematic liquid crystal (NLC) alignment with the ion beam exposure on the NDLC thin film was observed. In addition, it can be achieved the good EO properties of the ion-beam-aligned TN-cell on polyimide surface ; the stable VT curve in the ion-beam-aligned TN cell on the NDLC thin film with ion beam exposure using new type IB equipment was obtained. and the fast response time in the ion-beam-aligned TN cell on the NDLC thin film with ion beam exposure using new type IB equipment was obtained.

• Journal of the Society of Naval Architects of Korea
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• v.47 no.5
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• pp.743-749
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• 2010

Multi-nozzle spray painting procedure of the inorganic zinc shop primer was established in order to obtain uniform film thickness. The shop primer paint prevents the corrosion of steel block during shipbuilding. When the dry film thickness of shop primer is insufficient, rust will be generated on the steel block. Otherwise, thick coating of shop primer may be a problem of weld defect. So, it is important to obtain the uniform film thickness of shop primer. The uniformity of dry film thickness is affected by spray speed, distance from spray gun to target surface and overlapping span of spray path. In order to uniformly maintain coating thickness of shop primer, the coating procedure was established based on the correlation of shop primer spray variables.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.22 no.3
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• pp.127-133
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• 2012

To achieve low-cost and high-efficiency of thin-film solar cells applications, the sol-gel method that can be coated on a large area substrate, obtain homogeneous thin films of high purity was used. We studied structural and optical characteristics versus annealing temperature of $Cu_2ZnSnS_4$ which has kesterite structure by substitution low-cost sulfur (S) instead of high-cost selenium (Se). By analyzing XRD patterns, main peak was observed at $2{\theta}=28.5^{\circ}$ when Zn/Sn ratio is 0.8/1.2. And when we observed kesterite structure which has orientation of (112) direction, the more annealing temperature increase the bigger strength of (112) direction is. $Cu_2ZnSnS_4$ thin film showed characteristics of kesterite structure at $550^{\circ}C$. And when we calculated lattice constant, a = 5.5047 and $c=11.014{\AA}$ as same JCPDS (Joint Committee on Powder Standards) data measured. We measured optical transmittance to analyze optical characteristics. Optical transmittance was lower than 65 % at visible ray (${\lambda}=380{\sim}770nm$).

• Journal of the Korean Ceramic Society
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• v.39 no.10
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• pp.928-934
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• 2002

Gallium doped Zinc Oxide(GZO) films were deposited by dc magnetron sputtering using a GZO ceramic target at various conditions such as substrate temperature (RT, 400), residual water pressure ($P_{H_2O}$; 1.61${\times}10^{-4}∼2.2{\times}10^{-3}$ Pa), introduction of $H_2$ gas (8.5%) and different magnetic field strengths(250, 1000G). GZO films deposited without substrate heating showed clear degradation in film crystallinity and electrical properties with increasing $P_{H_2O}$. The resistivity increased from 3.0${\times}10^{-3}$ to 3.1${\times}10^{-2}{\Omega}㎝$ and the grain size of the films decreased from 24 to 3 nm when PH2O was increased from 1.61${\times}10^{-4}$ to 2.2${\times}10^{-3}$ Pa. However, degradation in electrical properties with increasing $P_{H_2O}$ was not observed for the films deposited with introduction of 8.5% $H_2$. When magnetic field strength of the cathode increased from 250G to 1000G, crystallinity and electrical properties of GZO films improved remarkably about all the $P_{H_2O}$. This result could be attributed to the decrease in film damage caused by the decrease in plasma impedance.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.29 no.2
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• pp.71-76
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• 2019

Recently, the demand of labels for product management is increasing, as the automation system becomes more common. the development of functional labels which can be used in various environments has been rapidly proceeded. In the case of a printed circuit board, barcode labels with thermal and chemical stability are generally used due to a high temperature process around $300^{\circ}C$ and chemical cleaning in the manufacturing process. However, the yellowing phenomenon of labels that can lower the resolution of printed barcode image still needs to be prevented. In this study, we prepared a composite coating layer using a silica inorganic binder and a titanium dioxide white pigment, and developed a functional labels with thermal and chemical stability. The silica inorganic binder prepared by sol-gel process was confirmed to show excellent adhesion and abrasion resistance with the polyimide film. The white coating layer could be formed on the polyimide film with mixing the silica inorganic binder and titanium dioxide white pigment. The prepared coating layer showed excellent whiteness and glossiness above $400^{\circ}C$. The excellent chemical stability of the coating layer was also confirmed by the chemical treatment with acidic (pH 1.6) and basic (pH 13.6) cleaners.

• Composites Research
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• v.32 no.6
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• pp.368-374
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• 2019

Basalt fiber reinforced epoxy composites with inorganic filler (BFRP-F) such as Mg(OH)₂ (magnesium hydroxide), Al(OH)₃ (aluminum hydroxide), Al₂O₃ (aluminum oxide) and AlOOH (boehmite) were prepared by hand lay-up and hot pressing. The combustive properties of BFRP-F were improved comparing with basalt fiber reinforced epoxy composite (BFRP) without inorganic filler. At a 30 wt% resin content, the limited oxygen index (LOI) of BFRP is 28.9, which is higher than that of epoxy (21.4), and the LOI of BFRP-F is higher than that of BFRP. The BFRP-F showed the lower peak heat release rate (PHRR), total heat release (THR) and total smoke release rate (TSR) than those of BFRP. We confirmed that the flame retardant properties of the composite were improved by the addition of inorganic filler through the dehydration reaction and oxide film formation.