• Title/Summary/Keyword: Inclined Exposure

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Fabrication of 3-D Structures by Inclined and Rear-side Exposures (선택적 경사 노광과 후면 노광에 의한 3차원 구조물의 제작)

  • 이준섭;신현준;문성욱;송석호;김태엽
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.53 no.1
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    • pp.47-52
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    • 2004
  • 3D microstructures with different side-wall angles and different scales are fabricated by both methods of inclined exposure and rear-side exposure at each of selected areas on a same substrate. Conventional methods of inclined exposure are used to make side-walls with a same inclined angle on one substrate and to get a scale error due to front-side exposure through thick photoresist layer, But, by using the proposed method, we are able to fabricate 3D microstructures on a same substrate with various side-wall angles and accurate dimensions as the original design. In the rear-side exposure, UV exposure light reflects from the chromium mask pattern after passing through the thick photoresist layer, resulting in fabrication of well-defined, inclined 3D structures inside the thick photoresist layer.

Prediction of Photopolymer Solidification for Inclined Laser Beam Exposure (레이저 빛의 경사노광 시 광 경화성 수지의 경화형상 예측)

  • Kim, Young-Hyun;Lim, Jong-Seon;Yu, Gyu-Sang;Lee, In-Hwan;Ko, Tae-Jo
    • Journal of the Korean Society for Precision Engineering
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    • v.27 no.8
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    • pp.98-104
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    • 2010
  • It has been reported that the photopolymer solidification in the stereolithogrpahy process is mainly depend on the laser exposure conditions such as laser power and scanning speed. However, these researches were focused on the vertical laser exposure onto the surface of the photopolymer. In this research, we developed a mathematical model for the photopolymer solidification under the inclined laser beam exposure. Using the developed mathematical model, the photopolymer solidifications were simulated varying inclined laser exposure conditions. Developed mathematical model was in good agreement with the experimental result. This research can be applied to improve the surface roughness in the stereolithogrpahy process.

Development of Micro-Optical Patterned LCD-LGP using UV Inclined-Exposure Process (UV 경사노광에 의한 미세광학패턴 LCD-도광판)

  • Hwang C. J.;Kim J. S.;Ko Y. B.;Heo Y. M.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2005.05a
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    • pp.51-54
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    • 2005
  • Light Guide Plate (LGP) of LCD-BLU(Back Light Unit) is manufactured by forming optical pattern with $5\~100um$ in diameter on the LGP by means of sand blasting or etching method. However, in order to improve the luminance of LCD-LGP, the design of optical pattern has introduced UV inclined-exposure process in this study. This micro-optical pattern, which has asymmetric elliptical column shaped pattern, can change low viewing-angle to high viewing-angle, as well as it contribute to diffusion of light. As a result, this type of micro-optical pattern can introduce the highly luminance. The PR structure obtained in the stage of lithography has asymmetric elliptical column shape and it is processed into a micro-optical pattern. Optical design with this kind of micro-optical pattern, mold fabrication by electroplating and LGP molding with injection molding are under way.

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Hybrid UV Lithography for 3D High-Aspect-Ratio Microstructures (하이브리드 자외선 노광법을 이용한 3차원 고종횡비 미소구조물 제작)

  • Park, Sungmin;Nam, Gyungmok;Kim, Jonghun;Yoon, Sang-Hee
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.40 no.8
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    • pp.731-736
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    • 2016
  • Three-dimensional (3D) high-aspect-ratio (HAR) microstructures for biomedical applications (e.g., microneedle, microadhesive, etc.) are microfabricated using the hybrid ultraviolet (UV) lithography in which inclined, rotational, and reverse-side UV exposure processes are combined together. The inclined and rotational UV exposure processes are intended to fabricate tapered axisymmetric HAR microstructures; the reverse-side UV exposure process is designed to sharpen the end tip of the microstructures by suppressing the UV reflection on a bottom substrate which is inevitable in conventional UV lithography. Hybrid UV lithography involves fabricating 3D HAR microstructures with an epoxy-based negative photoresist, SU-8, using our customized UV exposure system. The effects of hybrid UV lithography parameters on the geometry of the 3D HAR microstructures (aspect ratio, radius of curvature of the end tip, etc.) are measured. The dependence of the end-tip shape on SU-8 soft-baking condition is also discussed.

Exploring the Factors Affecting Intention Behavior Gap in K-entertainment Tourism (외래 관광객의 한류 공연 관람의도와 행동 간 불일치 요인 탐색)

  • Lee, Min-Jae;Kim, Jin-Young;Seo, Won-Seok
    • The Journal of the Korea Contents Association
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    • v.15 no.1
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    • pp.105-113
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    • 2015
  • This paper investigated Korean popular entertainment (K-entertainment, hereafter) tourism using theory of intention-behavior. Dividing the sample of international visitors to Seoul into the groups of "inclined actors", "inclined abstainers", and "disinclined abstainers," we examined the factors affecting such a division. The results showed that between the inclined actors and the inclined abstainers, there was no significant difference in the years of exposure to K-entertainment contents or the frequency of going to K-entertainment performance in the past. In contrast, the inclined actors were found to have a greater level of knowledge, ability, and cooperation compared to the inclined abstainers. In addition, we found that the K-entertainment performance in Korea was perceived as a substitute, rather than a complement to the performance held elsewhere in the world. Our findings suggest that interests in K-entertainment alone are not sufficient to drive the international visitors' intention to the action of attending K-entertainment performance during their visit to Korea. To this end, this study implies that it is necessary to design attractive tourism packages that include K-entertainment performance.

Monitoring of Initial Stages of Atmospheric Zinc Corrosion in Simulated Acid Rain Solution under Wet-dry Cyclic Conditions

  • EL-Mahdy, Gamal A.;Kim, Kwang B.
    • Corrosion Science and Technology
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    • v.3 no.6
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    • pp.251-256
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    • 2004
  • Exposure of zinc samples in simulated acid rain solution (SARS) was investigated under a periodic wet-dry conditions using an AC impedance technique. The periodic wet and dry exposure consisted of the immersion of zinc samples in SARS for one hour followed by exposure to 7 hours drying at 60% RH. Phases of the corrosion products were indentified by X-ray diffraction (XRD). The influence of relative humdiity (RH), temperature, and surface inclination on the atmospheric corrosion of zinc is described. The reciprocal of polarization resistance (1/Rp) decreases rapidly during the initial stages then slowly and eventually attains a steady state as exposure time progresses. The average of reciprocal of polarization resistance per cycle, (ARPR) was calculated and found to decrease as number of exposure cycle increases. An increase of temperature enhances the corrsion rate of zinc. The values of ARPR, of a sample inclined at 30 o are lower than those for a sample oriented horizontally. The experiment result shows a pronounced dependence of reciprocal of polarization resistance on RH. Exposure in the presence of carbonate anions gives rise to more protective corrosion products than in nitrate anion solution. The corrosion mechanism during the initial stages of atmospheric zinc corrosion under wet-dry cyclic conditions is suggested.

Development of Proximity Exposure System with Vertical Structure for Plasama Display Panel (PDP용 수직형 구조의 근접 노광장치 개발)

  • Park, Jeong-Gyu;Jeong, Su-Hwa;Lee, Hang-Bu
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.24 no.9 s.180
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    • pp.2371-2380
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    • 2000
  • In this paper, we developed the proximity exposure system with the vertical structure of glass and mask stage to minimize the mask's warp caused by the pull of gravity. This system, which canirradiate the ultra violet through 1440 H 850 $\textrm{mm}^2$ and 1330X 1015 $\textrm{mm}^2$ exposure area, has the followingcharacteristics. The glass stage can be inclined by 80 degrees at vertical structure to load substrate withsafety on it. When the glass stage is the vertical state, the gap control, alignment control and exposureof ultra violet are executed. So, it enhances the pattern uniformity by minimizing the mask's warp. Theglass stage can also control the gap between the mask and the substrate by the coarse and fine motioncontrol. The mask stage can adjust the posture of photomask to the position of substrate by imageprecessing method. The galss stage for the gap control and the mask stage for the alignment aredesigned independently for each function.

Microlens Micro V-groove Fabrication by the Modified LIGA Process (변형 DEEP X-ray를 이용한 마이크로 렌즈 및 V-groove 제작)

  • 이정아;이승섭;전병희
    • Transactions of Materials Processing
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    • v.13 no.3
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    • pp.290-295
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    • 2004
  • Mircolens and microlens V-groove are realized using a novel fabrication technology based on the exposure of a resist, usually PMMA, to deep X-rays and subsequent thermal treatment and inclined deep X-ray lithography, respectively. The fabrication technology is very simple and produces microlenses and microlens V-groove with good surface roughness of several nm. The molecular weight and glass transition temperature of PMMA is reduced when it is irradiated with deep X-rays. The microlenses were produced through the effects of volume change, surface tension, and reflow during thermal treatment of irradiated PMMA. Microlenses were produced with diameters ranging from 30 to $1500\mu\textrm{m}$. The surface X-ray mask is also fabricated to realize microlens arrays on PMMA sheet with a large area. The size of the micro V-groove is fabricated in the range of 12~$60\mu\textrm{m}$.